• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.25 no.3
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• pp.282-288
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• 2014

In this paper, we have analyzed and designed a digital RF receiver based on the optimization of the dynamic range parameter to secure the wideband characteristics and linearity of digital radar receivers. To improve the wideband characteristics and dynamic range, a low noise amplifier is matching design with a noise source to minimize the noise figure in 1 GHz bandwidth and we improved the linearity of RF-receiver by securing the conversion gain characteristics of receiver through the design of active mixer. RF receiver is designed to give gain 63 dB, noise figure 1.2 dB and dynamic range of RF receiver has 75.8 dB in a wide band of 8.8~9.8 GHz. It is shown to be applicable to X-band digital radar receiver.

• Korean Journal of Materials Research
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• v.22 no.10
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• pp.508-512
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• 2012

ZnO thin films were grown on a sapphire substrate by RF magnetron sputtering. The characteristics of the thin films were investigated by ellipsometry, X-ray diffraction (XRD), atomic force microscopy (AFM), photoluminescence (PL), and Hall effect. The substrate temperature and growth time were kept constant at $200^{\circ}C$ at 30 minutes, respectively. The RF power was varied within the range of 200 to 500 W. ZnO thin films on sapphire substrate were grown with a preferred C-axis orientation along the (0002) plan; X-ray diffraction peak shifted to low angles and PL emission peak was red-shifted with increasing RF power. In addition, the electrical characteristics of the carrier density and mobility decreased and the resistivity increased. In the electrical and optical properties of ZnO thin films under variation of RF power, the crystallinity improved and the roughness increased with increasing RF power due to decreased oxygen vacancies and the presence of excess zinc above the optimal range of RF power. Consequently, the crystallinity of the ZnO thin films grown on sapphire substrate was improved with RF sputtering power; however, excess Zn resulted because of the structural, electrical, and optical properties of the ZnO thin films. Thus, excess RF power will act as a factor that degrades the device characteristics.

• Journal of IKEEE
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• v.19 no.3
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• pp.371-377
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• 2015

This paper is about the RF transceiver designed and implementation for common data link. The trasmitter is configured as a frequency up-converter, a power amplifier and a duplexer. The receiver is configured as a duplxer, a frequency down-converter and a low noise amplifier. The maximum transmission distance, the reception sensitivity is designed to meet the electrical and temperature characteristics and the like. Using a modeling and simulation in order to meet the requirements of the RF transceiver has been designed and implemented. Transmitting output power and Noise Figure has been measured with 38.58dBm and 5.5dB, respectively. All of the electrical and temperature specifications was meet. Was confirmed all of the requirement specification by electrical characteristics test and temperature characteristics test.

• Journal of Broadcast Engineering
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• v.8 no.2
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• pp.126-135
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• 2003

To investigate the DTV coverage especially in downtown areas and improve the performance of DTV receivers, it is necessary to capture the receiving DTV signals that contain the complex characteristics of the real-world RF environments and regenerate them in a laboratory without the performance degradation. In this paper, we developed a DTV RF capture and regeneration system adapting digital signal processing and high speed hard disk storage techniques and analyze its characteristics. The system can capture and replay the DTV RF signals based on a real-time condition in a hard disk. There Is no time limit for capturing RF data within the installed storage capacity. We can expect various Possible applications for this system such as a tool for the development of the receiver performance analysis, design and analysis for the DTV coverage areas, etc.

• Journal of the Korean Vacuum Society
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• v.20 no.5
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• pp.345-355
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• 2011

GaAs-based metamorphic high electron mobility transistors (MHEMTs) and InP-based high electron mobility transistors (HEMTs) have good microwave and millimeter-wave frequency performance with lower minimum noise figure. MHEMTs have some advantages, especially for cost, compared with InP-based ones. In this paper, InAlAs/InxGa1-xAs/GaAs MHEMTs are simulated for DC/RF small-signal analysis. The hydrodynamic simulation parameters are calibrated to a fabricated 0.1-${\mu}m$ ${\Gamma}$-gate MHEMT device having the modulation-doped $In_{0.52}Al_{0.48}As/In_{0.53}Ga_{0.47}As$ heterostructure on the GaAs substrate, and the simulations for RF small-signal characteristics are performed, compared with the measured data, and analyzed for the devices. In addition, the simulations for the DC/RF characteristics of the MHEMTs with different gate-recess structures are performed, compared and analyzed.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2018.10a
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• pp.470-473
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• 2018

Using High-order Modulation in wideband system is sensitive to change of wireless channel environment as well as changes in ripple characteristics that can occur when baseband signals pass through RF equipment. Therefore, it is necessary to design and RF tuning that minimizes ripple characteristics change, which is difficult to implement systematically and takes a long time. In this paper, we analyze the fixed ripple characteristics of the baseband signal distored through the RF transmitting and receiving equipment. And the function of compensating the compensation filter by the modem receiver is implemented in 256 TCM. Also, it is confirmed that SNR and received sensitivity are improved by applying a digital compensation filter in a channel with poor RF equipment ripple characteristics.

• Journal of the Korean Ceramic Society
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• v.31 no.6
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• pp.643-650
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• 1994

Highly [100]-oriented MgO thin films were deposited on Si(100) single crystal substrates by reactive RF magnetron sputtering. The effects of substrate temperature, gas pressure, RF input powder, and gas composition on the characteristics of MgO thin films were studied. The higher substrate temperature and the lower operating pressure were, the better crystallinity of the deposited MgO thin films were. The influences of the RF input power and oxygen to argon ratio were very complex. The physical characteristics of the films changed dramatically with deposition conditions. Highly smooth and epitaxial MgO films were obtained at the deposition conditions as follows; subatrate temperature, $600^{\circ}C$; operating pressure, 10 mtorr; RF input power density, 2 W/$\textrm{cm}^2$; the percentage of oxygen, 10%.

• Journal of the Korean Society for Heat Treatment
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• v.22 no.3
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• pp.143-148
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• 2009

We have fabricated Ti metal films on Cu wire substrates by using a RF magnetron sputtering method at different RF powers (0, 30 and 60 W) in a high vacuum, and we have investigated the thin film characteristics and resistivity. The ion bombardment effect is increased by the method to superimpose RF power to DC power applied to two poles of the base; thus, the thin film is deposited at sputtering gas pressures below 1 Pa. Moreover, the thin film formation of the multilayer structure becomes possible by gradually injecting the RF power, and the thin film quality is improved.

• Applied Science and Convergence Technology
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• v.26 no.4
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• pp.74-78
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• 2017

The discharge characteristics of the radio frequency (RF) surface dielectric barrier discharge have been simulated for the investigation of the ratio of the ion transit time to the RF period. From one-dimensional particle-in-cell (PIC) simulation for a planar dielectric barrier discharge (DBD), it was observed that the high-frequency driving voltage confines the ions in the plasma because of a shorter RF period than the ion transit time. For two-dimensional surface dielectric barrier discharges, a fluid simulation is performed to investigate the characteristics of RF discharges from 1 MHz to 40 MHz. The ratio of the peak density to the average density decreases with the increasing frequency, and the spatiotemporal discharge patterns change abruptly with the change in the ratio of ion transit time to the RF period.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.2
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• pp.68-71
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• 2006

A class-E power amplifier is designed using 0.25$\mu$m standard CNMOS technology at 900MHz and the reliability characteristics are studied with the load network. The reliability characteristics is improved when a finite DC-feed inductor is used instead of RF choke. At the one you halt, the PAE(Power Added Efficiency) decreases from 58.0$\%$ to 35.7$\%$ and output power decreases from 120mW to 74mW in power amplifier using RF choke. However, when a finite DC-feed inductor is used with load the PAE decreases from 58.5$\%$ to 54.8$\%$ and output power decreases from 121mW to 112mW. From the simulated results, the class-E power amplifier with a finite DC-feed inductor shows superior reliability characteristics compared to rower amplifier using RF choke inductor.