• 제목/요약/키워드: Pulsed I-V

검색결과 86건 처리시간 0.029초

스케일링이 가능한 AlGaN/GaN HEMT 소자의 열 모델에 관한 연구 (Scalable AlGaN/GaN HEMTGs Model Including Thermal Effect)

  • 김동기;김성호;오재응;권영우
    • 한국전자파학회논문지
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    • 제14권7호
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    • pp.705-711
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    • 2003
  • 본 연구에서는 고출력 소자로서 각광받고 있는 AlGaN/GaN HEMT 2$\times$100 $\mu\textrm{m}$ 소자(사파이어 기판)에 대해 열 효과가 포함된 대신호 모델링을 수행하였다. 완성된 대신호 모델을 이용하여 9 mm, 15 mm 사이즈 소자로의 스케일링을 통해 전력증폭기를 설계하였으며 제작된 결과와 비교, 해석하였다. 대신호 모델링은 수렴성과 해석 속도면에서 탁월한 장점을 갖는 수식 기반의 경험적 방법을 사용하였다. Pulsed I-V 측정을 통하여 열모델의 가장 중요한 파라미터인 열 시상수 및 열 저항을 추출하였으며 이를 통하여 완벽한 열 모델 제작이 가능하였다. 제작된 전력증폭기 모듈의 측정결과와 비교를 통하여 본 연구에서 제안된 열 모델이 매우 정확함을 확인할 수 있으며 전력증폭기와 같이 큰 사이즈의 소자를 사용해야 하는 회로의 경우에는 열 효과가 포함된 모델을 사용하여 더욱 정확한 모델링 결과를 얻을 수 있음을 확인할 수 있다.

Genetic Relatedness within Streptococcus pneumoniae Serotype 19F and 23F Isolates in Korea by Pulsed-Field Gel Electrophoresis

  • Lee, Kwang-Jun;Bae, Song-Mee;Hwang, Kyu-Jam;Lee, Young-Hee;Kim, Ki-Sang
    • Journal of Microbiology
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    • 제41권1호
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    • pp.1-6
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    • 2003
  • The genetic relatedness of multidrug-resistant pneumococcal isolates of serotypes 19F and 23F was investigated. The DNA fragments digested with Sma I were resolved by pulsed-field gel electrophoresis (PFGE). PFGE analysis of 365. pneumoniae isolates showed 13 different patterns. Among 22 isolates of serotype 19F, 9 different PFGE patterns were present and 14 isolates of serotype 23F isolates represented 5 distinct PFGE patterns. Two isolates of serotype 19F and six isolates of serotype 23F shared the same PFGE pattern (Pattern I). Based on the genetic relatedness within the strains (one genetic cluster was defined as having more than 85% homology), we divided the pneumococcal strains into genefic clusters (Ⅰ, II, III, IV, V, and VI). The 22 strains of serotype 19F belonged to five distinct genetic clusters (I, II, III, IV, V and VI) and 14 strains of serotype 23F represented two genetic clusters (I and II ). These results showed that strains of serotype 19F are genetically more diverse than those of serotype 23F, Serotype 19F isolates with PFGE patterns H and I appeared to be less related to those of the remaining PFCE patterns (A to G) (less than 60% genetic relatedness), but those strains were genetically closely related with serotype 23f. These results suggest that the latter isolates originated from horizontal transfer of the capsular type 19F gene locus to 23F pneumococcal genotypes. In conclusion, the multidrug-resistant pneumococcal isolates of serotype 19f and 23F isolated in Korea are the result of the spread of a limited number of resistant clones.

Pulsed Magnetron Sputtering Deposit ion of DLC Films Part I : Low-Voltage Bias-Assisted Deposition

  • Oskomov, Konstantin V.;Chun, Hui-Gon;You, Yong-Zoo;Lee, Jing-Hyuk;Kim, Kwang-Bok;Cho, Tong-Yul;Sochogov, Nikolay S.;Zakharov, Alexender N.
    • 한국표면공학회지
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    • 제36권1호
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    • pp.27-33
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    • 2003
  • Pulsed magnetron sputtering of graphite target was employed for deposition of diamond-like carbon (DLC) films. Time-resolved probe measurements of magnetron discharge plasma have been performed. It was shown that the pulsed magnetron discharge plasma density ($∼10^{17}$ $m^{-3}$ ) is close to that of vacuum arc cathode sputtering of graphite. Raman spectroscopy was sed to examine DLC films produced at low ( $U_{sub}$ / < 1 kV) pulsed bias voltages applied to the substrate. It has been shown that maximum content of diamond-like carbon in the coating (50-60%) is achieved at energy per deposited carbon atom of $E_{c}$ =100 eV. In spite of rather high percentage of $sp^3$-bonded carbon atoms and good scratch-resistance, the films showed poor adhesion because of absence of ion mixing between the film and the substrates. Electric breakdowns occurring during the deposition of the insulating DLC film also thought to decrease its adhesion.

Boron 확산공정을 이용한 5,000V, 4인치 광 사이리스터의 제작 및 특성 평가 (Fabrication of 5,000V, 4-Inch Light Triggered Thyristor using Boron Diffusion Process and its Characterization)

  • 박건식;조두형;원종일;이병하;배영석;구인수
    • 전력전자학회논문지
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    • 제24권6호
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    • pp.411-418
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    • 2019
  • Light-triggered thyristors (LTTs) are essential components in high-power applications, such as HVDC transmission and several pulsed-power applications. Generally, LTT fabrication includes a deep diffusion of aluminum as a p-type dopant to form a uniform p-base region, which needs careful concern for contamination and additional facilities in silicon semiconductor manufacturing factories. We fabricated 4-inch 5,000 V LTTs with boron implantation and diffusion process as a p-type dopant. The LTT contains a main cathode region, edge termination designed with a variation of lateral doping, breakover diode, integrated resistor, photosensitive area, and dV/dt protection region. The doping concentration of each region was adjusted with different doses of boron ion implantation. The fabricated LTTs showed good light triggering characteristics for a light pulse of 905 nm and a blocking voltage (VDRM) of 6,500 V. They drove an average on-state current (ITAVM) of 2,270 A, peak nonrepetitive surge current (ITSM) of 61 kA, critical rate of rise of on-state current (di/dt) of 1,010 A/㎲, and limiting load integral (I2T) of 17 MA2s without damage to the device.

반응성 증착용 펄스 플라즈마 공정의 진단 (A Diagnostic Study of Pulsed Plasma Process for Reactive Deposition)

  • 주정훈
    • 한국표면공학회지
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    • 제45권4호
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    • pp.168-173
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    • 2012
  • A real-time monitoring of an immersed antenna type inductively coupled plasma (ICP) was done with optical emission spectroscopy (OES) to check the reports that sputtered atom density is decreasing as the ICP power is increased. At 10 mTorr pressure of Ar, Mg was sputtered by a bipolar pulsed power supply into 2 MHz ICP which has an insulator covered 2.5 turn antenna. Emitted light was collected in two different positions: above the target and inside the ICP region. With 100 W of Mg sputtering power, the intensities of Mg I (285.06 nm), Mg II (279.48 nm), Ar I (420.1 nm) were increased constantly with ICP power from 100 W to 600 W. At 500 W, the intensity of $Mg^+$ exceeded that of Mg under PID controlled discharge voltage of 180 V. The ratio of Mg II/Mg I was increased from 0.45 to 2.71 approximately 6 times.

IGBT 직렬구동에 의한 60KV 펄스 전원장치 개발 (Development of 60KV Pulsed Power Supply using IGBT Stacks)

  • Ryoo, Hong-Je;Kim, Jong-Soo;Rim, Geun-Hie;Goussev, G.I.;Sytykh, D.
    • 전기학회논문지
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    • 제56권1호
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    • pp.88-99
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    • 2007
  • In this paper, a novel new pulse power generator based on IGBT stacks is proposed for pulse power application. Because it can generate up to 60kV pulse output voltage without any step- up transformer or pulse forming network, it has advantages of fast rising time, easiness of pulse width variation and rectangular pulse shape. Proposed scheme consists of series connected 9 power stages to generate maximum 60kV output pulse and one series resonant power inverter to charge DC capacitor voltage. Each power stages are configured as 8 series connected power cells and each power cell generates up to 850VDC pulse. Finally pulse output voltage is applied using total 72 series connected IGBTs. To reduce component for gate power supply, a simple and robust gate drive circuit is proposed. For gating signal synchronization, full bridge invertor and pulse transformer generates on-off signals of IGBT gating with gate power simultaneously and it has very good characteristics of short circuit protection.

PLD 법으로 증착된 n-ZnO:In/p-Si (111) 이종접합구조의 특성연구 (A Study on the Characteristic of n-ZnO:In/p-Si (111) Heterostructure by Pulsed Laser Deposition)

  • 장보라;이주영;이종훈;김준제;김홍승;이동욱;이원재;조형균;이호성
    • 한국전기전자재료학회논문지
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    • 제22권5호
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    • pp.419-424
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    • 2009
  • ZnO films doped with different contents of indium ($0.1{\sim}10$ at.%) were deposited on Si (111) substrate by Pulsed Laser Deposition (PLD). The structural, electrical and optical properties of the films were investigated using XRD, AFM, Hall and PL measurement. Results showed that un-doped ZnO film had (002) plane as the c-axis orientated growth, whereas indium doped ZnO films exhibited the peak of (002) and the weak (101) plane. In addition, in the indium doped ZnO films, the electron concentration is ten times higher than that of un-doped ZnO film, while the resistivity is ten times lower than that of un-doped ZnO film. The indium doped ZnO films have UV emission about 380 nm and show a red shift with increasing contents of indium. The I-V curve of the fabricated diode show the typical diode characteristics and have the turn on voltage of about 2 V.

문턱전압 조절 이온주입에 따른 MCT (MOS Controlled Thyristor)의 스위칭 특성 연구 (Effects of Vth adjustment ion implantation on Switching Characteristics of MCT(MOS Controlled Thyristor))

  • 박건식;조두형;원종일;곽창섭
    • 전자공학회논문지
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    • 제53권5호
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    • pp.69-76
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    • 2016
  • MCT (MOS Controlled Thyristor)의 전류 구동능력은 도통상태의 MCT를 턴-오프 시킬 수 있는 능력, 즉 off-FET의 성능에 의해 결정되고, MCT의 주된 응용분야인 펄스파워 분야에서는 턴-온 시의 피크전류($I_{peak}$)와 전류상승기울기(di/dt) 특성이 매우 중요하다. 이러한 요구사항을 만족시키기 위해서는 MCT의 on/off-FET 성능 조절이 중요하지만, 깊은 접합의 P-웰과 N-웰을 형성하기 위한 삼중 확산공정과 다수의 산화막 성장공정은 이온주입 불순물의 표면농도를 변화시키고 on/off-FET의 문턱전압($V_{th}$) 조절을 어렵게 한다. 본 논문에서는 on/off-FET의 $V_{th}$를 개선하기 위한 채널영역 문턱전압 이온주입에 대하여 시뮬레이션을 진행하고 이를 토대로 제작한 MCT의 전기적 특성을 비교 평가하였다. 그 결과 문턱전압 이온주입을 진행한 MCT의 경우(활성영역=$0.465mm^2$) $100A/cm^2$ 전류밀도에서의 전압손실($V_F$)은 1.25V, 800V의 어노드 전압에서 $I_{peak}$ 및 di/dt는 290A와 $5.8kA/{\mu}s$로 문턱전압 이온주입을 진행하지 않은 경우와 유사한 특성을 나타낸 반면, $100A/cm^2$의 구동전류에 대한 턴-오프 게이트전압은 -3.5V에서 -1.6V로 감소하여 MCT의 전류 구동능력을 향상시킴을 확인하였다.

Novel Fabrication of Platinum Counter Electrode in Dye-sensitized Solar Cells Using Nano-second Pulsed Laser Sintering

  • Lee, Jin Ah;Yoo, Kicheon;Kim, Woong;Ko, Min Jae
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.234-234
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    • 2013
  • The counter electrodes in dye-sensitized solar cells (DSSCs) play roles in not only collecting electrons from external circuit but also reducing I3- to I- in electrolytes. Generally, conventional counter electrodes for DSSCs are prepared from the high temperature treatment of the H2PtCl6 precursor solution at $400^{\circ}C$ However, the more simplified fabrication process of counter electrodes is required for the commercialization of DSSCs. In this work, we developed novel fabrication process of counter electrodes using nano-second pulsed laser. DSSCs employing counter electrodes prepared by laser process showed conversion efficiency of 6.75% with short-circuit current of 12.73 mA/cm2, open-circuit voltage of 0.74 V and fill factor of 0.72. Closer investigating of photovoltaic properties will be reported.

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냉음극형 대면적 펄스 전자빔 가속기의 빔인출 특성 (Characteristics of Electron Beam Extraction in Cold Cathode Type Large Cross-Sectional Pulsed Electron Beam Generator)

  • 우성훈;이광식;이동인;이홍식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2001년도 하계학술대회 논문집 C
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    • pp.1609-1611
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    • 2001
  • A large cross-section pulsed electron beam generator of cold cathode type has been developed for industrial applications, for example, waste water cleaning, flue gas cleaning, and pasteurization etc. The operational principle is based on the emission of secondary electrons from cold cathode when ions in the plasma hit the cathode, which are accelerated toward exit window by the gradient of an electric potential. The conventional electron beam generators need an electron scanning beam because the small cross section thermal electron emitter is used. The electron beam of large cross-section pulsed electron beam generator do not need to be scanned over target material because the beam cross section is large by 300$cm^2$. We have fabricated the large cross-sectional pulsed electron beam generator with the peak energy of 200keV and beam diameter of 200mm and obtained the large area electron beam in the air. The electron beam current has been investigated as a function of accelerating voltage, glow discharge current, helium pressure, distance from the exit window and radial distribution in front of the exit window.

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