• Title/Summary/Keyword: Pseudomorphic high electron mobility transistor

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High Performance MMIC Star Mixer for Millimeter-wave Applications (밀리미터파 응용을 위한 우수한 성능의 MMIC Star 혼합기)

  • Ryu, Keun-Kwan;Yom, In-Bok;Kim, Sung-Chan
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.36 no.10A
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    • pp.847-851
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    • 2011
  • In this paper, we reported on a high performance MMIC star mixer for millimeter-wave applications. The star mixer was fabricated using drain-source-connected pseudomorphic high electron mobility transistor (PHEMT) diodes considering the PHEMT MMIC full process on 2 mil thick GaAs substrate. The average conversion loss of 13 dB was measured in the RF frequency range of 81 GHz to 86 GHz at LO frequency of 75 GHz with LO power of 10 dBm. The RF-LO isolation characteristics are greater than 30 dB and the input 1-dB compression are approximately 4 dBm. The total chip size is 0.8 mm ${\times}$ 0.8 mm.

Studies on the High-gain Low Noise Amplifier for 60 GHz Wireless Local Area Network (60 GHz 무선 LAN의 응용을 위한 고이득 저잡음 증폭기에 관한 연구)

  • 조창식;안단;이성대;백태종;진진만;최석규;김삼동;이진구
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.11
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    • pp.21-27
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    • 2004
  • In this paper, millimeter-wave monolithic integrated circuit(MIMIC) low noise amplifier(LNA) for V-band, which is applicable to 60 GHz wireless local area network(WLAN), was fabricated using the high performance 0.1 ${\mu}{\textrm}{m}$ $\Gamma$-gate pseudomorphic high electron mobility transistor(PHEMT). The DC characteristics of PHEMT are drain saturation current density(Idss) of 450 mA/mm and maximum transconductance(gm, max) of 363.6 mS/mm. The RF characteristics were obtained the current gain cut-off frequency(fT) of 113 GHz and the maximum oscillation frequency(fmax) of 180 GHz. V-band MIMIC LNA was designed using active and passive device library, which is composed of 0.1 ${\mu}{\textrm}{m}$ $\Gamma$-gate PHEMT and coplanar waveguide(CPW) technology. The designed V-band MIMIC LNA was fabricated using integrated unit processes of active and passive device. The measured results of V-band MIMIC LNA are shown S21 gain of 21.3 dB, S11 of -10.6 dB at 60 GHz and S22 of -29.7 dB at 62.5 GHz. The measured result of V-band MIMIC LNA was shown noise figure (NF) of 4.23 dB at 60 GHz.

A Ku-band 3 Watt PHEMT MMIC Power Amplifier for satellite communication applications (위성 통신 응용을 위한 Ku-대역 3 Watt PHEMT MMIC 전력 증폭기)

  • Uhm, Won-Young;Lim, Byeong-Ok;Kim, Sung-Chan
    • Journal of IKEEE
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    • v.24 no.4
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    • pp.1093-1097
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    • 2020
  • This work describes the design and characterization of a Ku-band monolithic microwave integrated circuit (MMIC) power amplifier (PA) for satellite communication applications. The device technology used relies on 0.25 ㎛ gate length gallium arsenide (GaAs) pseudomorphic high electron mobility transistor (PHEMT) of wireless information networking (WIN) semiconductor foundry. The developed Ku-band PHEMT MMIC power amplifier has a small-signal gain of 22.2~23.1 dB and saturated output power of 34.8~35.4 dBm over the entire band of 13.75 to 14.5 GHz. Maximum saturated output power is a 35.4 dBm (3.47 W) at 13.75 GHz. Its power added efficiency (PAE) is 30.6~37.83% and the chip dimensions are 4.4 mm×1.9 mm. The developed 3 W PHEMT MMIC power amplifier is expected to be applied in a variety of Ku-band satellite communication applications.

Digital recess etching for advanced performance of 0.25$\mu\textrm{m}$­ Double-heterostructure AIGaAs/GaAs PHEMT (0-25 $\mu\textrm{m}$ gate Double-heterostructure AIGaAs/GaAs PHEMT의 성능향상을 위한 디지털 리세스에 대한 연구)

  • 류충식;장효은;범진욱
    • Proceedings of the IEEK Conference
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    • 2002.06b
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    • pp.213-216
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    • 2002
  • A double-heterostructure AIGaAs/GaAs PHEMT (Pseudomorphic High Electron Mobility Transistor) using digital recess has been successfully realized. Futhermore, the differences of gm,nax, fT, fmax between two samples are as low as 0.62%, 1.58% and 2.56 % respectively. Experimental results are presented demonstrating the etch rate and Process invariability with respect to hydrogen peroxide and acid exposure times with uniformity among devices on a sample.

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PHEMT MMIC Broad-Band Power Amplifier for LMDS (Ka 대역 광대역 MMIC 전력증폭기)

  • 백경식;김영기;맹성재;이진희;박철순
    • Proceedings of the IEEK Conference
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    • 1999.11a
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    • pp.177-180
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    • 1999
  • A two-stage monolithic microwave integrated circuits (MMIC) broad-band power amplifier with AlGaAs/InGaAs/GaAs pseudomorphic high electron mobility transistor (PHEMT) has been developed for the up-link and down-link applications for local multipoint distribution systems (LMDS) in the frequency range of 24~28㎓. The amplifier has a small signal gain of 18.6㏈ at 24.5㎓ and 16.7㏈ at 27.1㎓. It achieved output powers of 19.8㏈m with PAE of 19.8% at 24.5㎓ and 18.8㏈m at 27.1㎓.

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High Performance Ku-band 2W MMIC Power Amplifier for Satellite Communications (위성 통신 시스템 응용을 위한 우수한 성능의 Ku 대역 2W MMIC 전력증폭기)

  • Ryu, Keun-Kwan;Ahn, Ki-Burm;Kim, Sung-Chan
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.18 no.11
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    • pp.2697-2702
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    • 2014
  • In this paper, we demonstrated a Ku-band 2W MMIC power amplifier for satellite communication applications. The device technology used relies on $0.25{\mu}m$ GaAs pseudomorphic high electron mobility transistor (PHEMT) of Wireless Information Networking (WIN) Semiconductor foundry. The 2W MMIC power amplifier has gain of over 29 dB and saturation output power of over 33.4 dBm in the frequency range of 13.75 ~ 14.5 GHz. Power added efficiency (PAE) is a 29 %. To our knowledge, this is the highest power added efficiency reported for any commercial GaAs-based 2W MMIC power amplifier in the Ku-band.

The Design and Fabrication of X-Band MMIC Low Noise Amplifier for Active antennal using P-HEMT (P-HEMT를 이용한 능동 안테나용 X-Band MMIC 저잡음 증폭기 설계 및 제작)

  • 강동민;맹성재;김남영;이진희;박병선;윤형섭;박철순;윤경식
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.9 no.4
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    • pp.506-514
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    • 1998
  • The design and fabrication of X-band(11.7~12 GHz) 2-stage monolithic microwave integrated circuit(MMIC) low noise amplifier (LNA) for active antenna are presented using $0.15{\mu}m\times140{\mu}m$ AlGaAs/InGaAs/GaAs pseudomorphic high electron mobility transistor (P-HEMT). In each stage of the LNA, a series feedback by using a source inductor is used for both input matching and good stability. The measurement results are achieved as an input return loss under -17 dB, an output return loss under -15dB, a noise figure of 1.3dB, and a gain of 17 dB at X-band. This results almost concur with a design results except noise figure(NF). The chip size of the MMIC LNA is $1.43\times1.27$.

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A fabrication and characterization of asymmetric 0.1 ${\mu}{\textrm}{m}$ $\Gamma$-gate PHEMT device using electron beam lithography (전자선 묘화 장치를 이용한 비대칭적인 0.1 ${\mu}{\textrm}{m}$ $\Gamma$-게이트 PHEMT 공정 및 특성에 관한 연구)

  • 임병옥;김성찬;김혜성;신동훈;이진구
    • Proceedings of the IEEK Conference
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    • 2001.06b
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    • pp.189-192
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    • 2001
  • We have studied fabrication processes that form asymmetric $\Gamma$-gate with a 0.1${\mu}{\textrm}{m}$ gate length in MMIC's(Monolithic Microwave Integrated Circuits). Asymmetric $\Gamma$-gate was fabricated using mixture of PMMA and MCB. Thus pseudomorphic high electron mobility transistor (PHEMT's) with 0.1${\mu}{\textrm}{m}$ gate length was fabricated via several steps such as mesa isolation, metalization, recess, passivation. PHEMT's has the -1.75 V of pinch-off voltage (Vp), 63 mA of drain saturation current(Idss and 363.6 mS/mm of maximum transconductance (Gm) in DC characteristics and current gain cut-off frequency of 106 GHz and maximum frequency of oscillation of 160 GHz in RF characteristics.

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High Output Power and High Fundamental Leakage Suppression Frequency Doubler MMIC for E-Band Transceiver

  • Chang, Dong-Pil;Yom, In-Bok
    • Journal of electromagnetic engineering and science
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    • v.14 no.4
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    • pp.342-345
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    • 2014
  • An active frequency doubler monolithic microwave integrated circuit (MMIC) for E-band transceiver applications is presented in this letter. This MMIC has been fabricated in a commercial $0.1-{\mu}m$ GaAs pseudomorphic high electron mobility transistor (pHEMT) process on a 2-mil thick substrate wafer. The fabricated MMIC chip has been measured to have a high output power performance of over 13 dBm with a high fundamental leakage suppression of more than 38 dBc in the frequency range of 71 to 86 GHz under an input signal condition of 10 dBm. A microstrip coupled line is used at the output circuit of the doubler section to implement impedance matching and simultaneously enhance the fundamental leakage suppression. The fabricated chip is has a size of $2.5mm{\times}1.2mm$.