• 제목/요약/키워드: Oxide Semiconductor

검색결과 1,419건 처리시간 0.026초

Simulation of Quantum Effects in the Nano-scale Semiconductor Device

  • Jin, Seong-Hoon;Park, Young-June;Min, Hong-Shick
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제4권1호
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    • pp.32-40
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    • 2004
  • An extension of the density-gradient model to include the non-local transport effect is presented. The governing equations can be derived from the first three moments of the Wigner distribution function with some approximations. A new nonlinear discretization scheme is applied to the model to reduce the discretization error. We also developed a new boundary condition for the $Si/SiO_2$ interface that includes the electron wavefunction penetration into the oxide to obtain more accurate C-V characteristics. We report the simulation results of a 25-nm metal-oxide-semiconductor field-effect transistor (MOSFET) device.

작동중인 모스 전계 효과 트랜지스터 단면에서의 상대온도 및 전위 분포 측정 (Cross Sectional Thermal and Electric Potential Imaging of an Operating MOSFET)

  • 권오명
    • 대한기계학회논문집B
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    • 제27권7호
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    • pp.829-836
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    • 2003
  • Understanding of heat generation in semiconductor devices is important in the thermal management of integrated circuits and in the analysis of the device physics. Scanning thermal microscope was used to measure the temperature and the electric potential distribution on the cross-section of an operating metal-oxide-semiconductor field-effect transistor (MOSFET). The temperature distributions were measured both in DC and AC modes in order to take account of the leakage current. The measurement results showed that as the drain bias was increased the hot spot moved to the drain. The density of the iso-potential lines near the drain increased with the increase in the drain bias.

Langmuir-Blodgett 법을 이용한 P(VDF-TrFE) 박막 트랜지스터 (P(VDF-TrFE) Thin Film Transistors using Langmuir-Blodgett Method)

  • 김광호
    • 반도체디스플레이기술학회지
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    • 제19권2호
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    • pp.72-76
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    • 2020
  • The author demonstrated organic ferroelectric thin-film transistors with ferroelectric materials of P(VDF-TrFE) and an amorphous oxide semiconducting In-Ga-Zn-O channel on the silicon substrates. The organic ferroelectric layers were deposited on an oxide semiconductor layer by Langmuir-Blodgett method and then annealed at 128℃ for 30min. The carrier mobility and current on/off ratio of the memory transistors showed 9 ㎠V-1s-1 and 6 orders of magnitude, respectively. We can conclude from the obtained results that proposed memory transistors were quite suitable to realize flexible and werable electronic applications.

마이크로 칩의 정전기 방지를 위한 DPS-GG-EDNMOS 소자의 특성 (Characteristics of Double Polarity Source-Grounded Gate-Extended Drain NMOS Device for Electro-Static Discharge Protection of High Voltage Operating Microchip)

  • 서용진;김길호;이우선
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.97-98
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    • 2006
  • High current behaviors of the grounded gate extended drain N-type metal-oxide-semiconductor field effects transistor (GG_EDNMOS) electro-static discharge (ESD) protection devices are analyzed. Simulation based contour analyses reveal that combination of BJT operation and deep electron channeling induced by high electron injection gives rise to the 2-nd on-state. Thus, the deep electron channel formation needs to be prevented in order to realize stable and robust ESD protection performance. Based on our analyses, general methodology to avoid the double snapback and to realize stable ESD protection is to be discussed.

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InGaN/GaN Micro-LED구조를 위한 그래핀 양자점 기반의 산화막 기판 특성 (Characteristics of Graphene Quantum Dot-Based Oxide Substrate for InGaN/GaN Micro-LED Structure)

  • 황성원
    • 반도체디스플레이기술학회지
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    • 제20권3호
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    • pp.167-171
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    • 2021
  • The core-shell InGaN/GaN Multi Quantum Well-Nanowires (MQW-NWs) that were selectively grown on oxide templates with perfectly circular hole patterns were highly crystalline and were shaped as high-aspect-ratio pyramids with semi-polar facets, indicating hexagonal symmetry. The formation of the InGaN active layer was characterized at its various locations for two types of the substrates, one containing defect-free MQW-NWs with GQDs and the other containing MQW-NWs with defects by using HRTEM. The TEM of the defect-free NW showed a typical diode behavior, much larger than that of the NW with defects, resulting in stronger EL from the former device, which holds promise for the realization of high-performance nonpolar core-shell InGaN/GaN MQW-NW substrates. These results suggest that well-defined nonpolar InGaN/GaN MQW-NWs can be utilized for the realization of high-performance LEDs.

스핀코팅법으로 제작한 산화아연/산화구리 이종접합의 정류 및 일산화질소 가스 감지 특성 (Rectifying and Nitrogen Monoxide Gas Sensing Properties of a Spin-Coated ZnO/CuO Heterojunction)

  • 황현정;김효진
    • 한국재료학회지
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    • 제26권2호
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    • pp.84-89
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    • 2016
  • We present the rectifying and nitrogen monoxide (NO) gas sensing properties of an oxide semiconductor heterostructure composed of n-type zinc oxide (ZnO) and p-type copper oxide thin layers. A CuO thin layer was first formed on an indium-tin-oxide-coated glass substrate by sol-gel spin coating method using copper acetate monohydrate and diethanolamine as precursors; then, to form a p-n oxide heterostructure, a ZnO thin layer was spin-coated on the CuO layer using copper zinc dihydrate and diethanolamine. The crystalline structures and microstructures of the heterojunction materials were examined using X-ray diffraction and scanning electron microscopy. The observed current-voltage characteristics of the p-n oxide heterostructure showed a non-linear diode-like rectifying behavior at various temperatures ranging from room temperature to $200^{\circ}C$. When the spin-coated ZnO/CuO heterojunction was exposed to the acceptor gas NO in dry air, a significant increase in the forward diode current of the p-n junction was observed. It was found that the NO gas response of the ZnO/CuO heterostructure exhibited a maximum value at an operating temperature as low as $100^{\circ}C$ and increased gradually with increasing of the NO gas concentration up to 30 ppm. The experimental results indicate that the spin-coated ZnO/CuO heterojunction structure has significant potential applications for gas sensors and other oxide electronics.

$N_2$O 분위기에서 RTP로 제조한 실리콘 산화막의 산화 반응 (Oxidation Reaction of silicon Oxids fabricated by Rapid Thermal Process in $N_2$O ambient)

  • 박진성;이우성;심태언
    • 한국재료학회지
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    • 제3권1호
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    • pp.7-11
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    • 1993
  • 실리콘 산화막을 $N_2$O 분위기에서 RTP로 제조하여 그 성장 기구를 고찰 했다. 산화막과 기판 실리콘 계면 사이에 질소성분이 포함된 oxynitride층이 존재한다. $N_2$O 기체를 이용한 산화막 성장은 삼화제 확산에 의해 성장이 지배되는 포물선 성장론을 따르고 산화제 확산 억제작용은 실리콘 산화막과 실리콘 기판사이에 존재하는 oxynitride막에서 일어난다. 확산이 산화막 성장을 결정하는 구간에서 포물선 성장율 상수 B의 활성화 에너지는 약 1.5 eV이고 산화막 두께 증가에 따라 증가한다.

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Discrimination of Gasoline and Diesel Fuels Using Oxide Semiconductor Gas Sensors

  • Moon, Young Kook;Shin, Min Sung;Jo, Young-Moo;Lim, Kyeorei;Lee, Jong-Heun
    • 센서학회지
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    • 제27권4호
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    • pp.221-226
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    • 2018
  • Misfueling accidents significantly damage the engines of both gasoline and diesel vehicles, and should be avoided by rapid and accurate fuel discrimination. Gasoline fuel contains bioethanol. Thus, the detection of ethanol vapor produced by gasoline can be used to distinguish between gasoline and diesel. In the present study, Pt-doped $SnO_2$ hollow nanospheres, Mg-doped $In_2O_3$ hollow microspheres, and Pt-doped ZnO nanostructures have been used as gas sensors to discriminate between gasoline and diesel fuels. All three sensors are able to detect and discriminate between gases evaporating from gasoline and diesel. Among the sensors, the Mg-doped $In_2O_3$ hollow microspheres show a significant gas response (resistance ratio = 4.97) quickly (~3 s) after exposure to gasoline-evaporated gas at $225^{\circ}C$, but did not show any substantial response to diesel-evaporated gas. This demonstrates that gasoline and diesel fuels can be discriminated using small and cost-effective oxide semiconductor gas sensors.

Effect of Dopants on Cobalt Silicidation Behavior at Metal-oxide-semiconductor Field-effect Transistor Sidewall Spacer Edge

  • Kim, Jong-Chae;Kim, Yeong-Cheol;Kim, Byung-Kook
    • 한국세라믹학회지
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    • 제38권10호
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    • pp.871-875
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    • 2001
  • Cobalt silicidation at sidewall spacer edge of Metal-Oxide-Semiconductor Field-Effect Transistors (MOSFETs) with post annealing treatment for capacitor forming process has been investigated as a function of dopant species. Cobalt silicidation of nMOSFET with n-type Lightly Doped Drain (LDD) and pMOSFET with p-type LDD produces a well-developed cobalt silicide with its lateral growth underneath the sidewall spacer. In case of pMOSFET with n-type LDD, however, a void is formed at the sidewall spacer edge with no lateral growth of cobalt silicide. The void formation seems to be due to a retarded silicidation process at the LDD region during the first Rapid Thermal Annealing (RTA) for the reaction of Co with Si, resulting in cobalt mono silicide at the LDD region. The subsequent second RTA converts the cobalt monosilicide into cobalt disilicide with the consumption of Si atoms from the Si substrate, producing the void at the sidewall spacer edge in the Si region. The void formed at the sidewall spacer edge serves as a resistance in the current-voltage characteristics of the pMOSFET device.

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Novel properties of erbium-silicided n-type Schottky barrier metal-oxide-semiconductor field-effect-transistors

  • Jang, Moon-Gyu;Kim, Yark-Yeon;Shin, Jae-Heon;Lee, Seong-Jae;Park, Kyoung-Wan
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제4권2호
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    • pp.94-99
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    • 2004
  • silicided 50-nm-gate-length n-type Schottky barrier metal-oxide-semiconductor field-effect-transistors (SB-MOSFETs) with 5 nm gate oxide thickness are manufactured. The saturation current is $120{\mu}A/{\mu}m$ and on/off-current ratio is higher than $10^5$ with low leakage current less than $10{\mu}A/{\mu}m$. Novel phenomena of this device are discussed. The increase of tunneling current with the increase of drain voltage is explained using drain induced Schottky barrier thickness thinning effect. The abnormal increase of drain current with the decrease of gate voltage is explained by hole carrier injection from drain into channel. The mechanism of threshold voltage increase in SB-MOSFETs is discussed. Based on the extracted model parameters, the performance of 10-nm-gate-length SB-MOSFETs is predicted. The results show that the subthreshold swing value can be lower than 60 mV/decade.