• Title/Summary/Keyword: InP quantum dots

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Studies on single electron-hole recombination in InAs/GaAs Quantum dots (InAs/GaAs 양자점의 단전자-정공 재결합 연구)

  • 이주인;임재영;서정철
    • Journal of the Korean Vacuum Society
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    • 제10권2호
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    • pp.257-261
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    • 2001
  • InAs/GaAs quantum dots between InGaAs/GaAs superlattices were grown by MBE. The quantum dots size is shown to be very uniform by measuring photoluminescence spectra of quantum dots. Single photon structures based on self-consistent calculation were grown and single photon devices were fabricated by e-beam lithography. The electrical hystereses of I-V curves for single Photon devices would result from single electron-hole recombination, where the resonant-tunneling voltages of electron and hole are different.

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Size Control of PbS Colloidal Quantum Dots and Their Application to Photovoltaic Devices

  • Lee, Wonseok;Ryu, Ilhwan;Choi, Geunpyo;Yim, Sanggyu
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.249.1-249.1
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    • 2015
  • Quantum dots (QDs) are attracting growing attention for photovoltaic device applications because of their unique electronic, optical and physical properties. Lead sulfide (PbS) QDs are one of the most widely studied materials for the devices and known to have size-tunable properties. In this context, we investigated the relationship between the size of PbS QDs and two synthesizing conditions, a concentration of ligand, oleic acid in this work, and injection temperature. The inverted colloidal quantum dot solar cells based on the heterojunction of n-type zinc oxide layer and p-type PbS QDs were also fabricated. The size of the QDs and cell properties were observed to depend on both the QD synthesizing conditions, and hence the overall efficiency of the cell could vary even though the size of QDs used was same. The QD synthesizing conditions were finally optimized for the maximum cell efficiency.

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Study on Surface-defect Passivation of InP System Quantum Dots by Photochemical Method (광화학적 방법을 통한 InP계 양자점 표면결함 부동태화 연구)

  • Kim, Doyeon;Park, Hyun-Su;Cho, Hye Mi;Kim, Bum-Sung;Kim, Woo-Byoung
    • Journal of Powder Materials
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    • 제24권6호
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    • pp.489-493
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    • 2017
  • In this study, the surface passivation process for InP-based quantum dots (QDs) is investigated. Surface coating is performed with poly(methylmethacrylate) (PMMA) and thioglycolic acid. The quantum yield (QY) of a PMMA-coated sample slightly increases by approximately 1.3% relative to that of the as-synthesized InP/ZnS QDs. The QYs of the uncoated and PMMA-coated samples drastically decrease after 16 days because of the high defect state density of the InP-based QDs. PMMA does not have a significant effect on the defect passivation. Thioglycolic acid is investigated in this study for the effective surface passivation of InP-based QDs. Surface passivation with thioglycolic acid is more effective than that with the PMMA coating, and the QY increases from 1.7% to 11.3%. ZnS formed on the surface of the InP QDs and S in thioglycolic acid show strong bonding property. Additionally, the QY is further increased up to 21.0% by the photochemical reaction. Electron-hole pairs are formed by light irradiation and lead to strong bonding between the inorganic and thioglycolic acid sulfur. The surface of the InP core QDs, which does not emit light, is passivated by the irradiated light and emits green light after the photochemical reaction.

Fabrication of Silicon Quantum Dots in Si3N4 Matrix Using RF Magnetron Co-Sputtering (RF 마그네트론 코스퍼터링을 이용한 Si3N4 매트릭스 내부의 실리콘 양자점 제조연구)

  • Ha, Rin;Kim, Shin-Ho;Lee, Hyun-Ju;Park, Young-Bin;Lee, Jung-Chul;Bae, Jong-Seong;Kim, Yang-Do
    • Korean Journal of Materials Research
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    • 제20권11호
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    • pp.606-610
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    • 2010
  • Films consisting of a silicon quantum dot superlattice were fabricated by alternating deposition of silicon rich silicon nitride and $Si_3N_4$ layers using an rf magnetron co-sputtering system. In order to use the silicon quantum dot super lattice structure for third generation multi junction solar cell applications, it is important to control the dot size. Moreover, silicon quantum dots have to be in a regularly spaced array in the dielectric matrix material for in order to allow for effective carrier transport. In this study, therefore, we fabricated silicon quantum dot superlattice films under various conditions and investigated crystallization behavior of the silicon quantum dot super lattice structure. Fourier transform infrared spectroscopy (FTIR) spectra showed an increased intensity of the $840\;cm^{-1}$ peak with increasing annealing temperature due to the increase in the number of Si-N bonds. A more conspicuous characteristic of this process is the increased intensity of the $1100\;cm^{-1}$ peak. This peak was attributed to annealing induced reordering in the films that led to increased Si-$N_4$ bonding. X-ray photoelectron spectroscopy (XPS) analysis showed that peak position was shifted to higher bonding energy as silicon 2p bonding energy changed. This transition is related to the formation of silicon quantum dots. Transmission electron microscopy (TEM) and electron spin resonance (ESR) analysis also confirmed the formation of silicon quantum dots. This study revealed that post annealing at $1100^{\circ}C$ for at least one hour is necessary to precipitate the silicon quantum dots in the $SiN_x$ matrix.

Growth mechanism of InP and InP/ZnS synthesis using colloidal synthesis (반응 용기법을 이용한 InP/ZnS 양자점 합성과정에서 InP 코어의 성장기구)

  • Seo, Han wook;Jeong, Da-woon;Lee, Bin;Hyun, Seoung kyun;Kim, Bum Sung
    • Journal of Powder Materials
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    • 제24권1호
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    • pp.6-10
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    • 2017
  • This study investigates the main growth mechanism of InP during InP/ZnS reaction of quantum dots (QDs). The size of the InP core, considering a synthesis time of 1-30 min, increased from the initial 2.56 nm to 3.97 nm. As a result of applying the proposed particle growth model, the migration mechanism, with time index 7, was found to be the main reaction. In addition, after the removal of unreacted In and P precursors from bath, further InP growth (of up to 4.19 nm (5%)), was observed when ZnS was added. The full width at half maximum (FWHM) of the synthesized InP/ZnS quantum dots was found to be relatively uniform, measuring about 59 nm. However, kinetic growth mechanism provides limited information for InP / ZnS core shell QDs, because the surface state of InP changes with reaction time. Further study is necessary, in order to clearly determine the kinetic growth mechanism of InP / ZnS core shell QDs.

Luminescence Properties of InP/ZnS Quantum Dots depending on InP Core synthesis Temperature (InP 코어 합성온도에 따른 InP/ZnS의 코어/쉘 양자점의 발광특성)

  • Seo, Han Wook;Jeong, Da-Woon;Kim, Min Young;Hyun, Seoung Kyun;On, Ji Sun;Kim, Bum Sung
    • Journal of Powder Materials
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    • 제24권4호
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    • pp.321-325
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    • 2017
  • In this study, we investigate the optical properties of InP/ZnS core/shell quantum dots (QDs) by controlling the synthesis temperature of InP. The size of InP determined by the empirical formula tends to increase with temperature: the size of InP synthesized at $140^{\circ}C$ and $220^{\circ}C$ is 2.46 nm and 4.52 nm, respectively. However, the photoluminescence (PL) spectrum of InP is not observed because of the formation of defects on the InP surface. The growth of InP is observed during the deposition of the shell (ZnS) on the synthesized InP, which is ended up with green-red PL spectrum. We can adjust the PL spectrum and absorption spectrum of InP/ZnS by simply adjusting the core temperature. Thus, we conclude that there exists an optimum shell thickness for the QDs according to the size.

Carrier Dynamics of P-modulation Doped In(Ga)A/InGaAsP Quantum Dots (P 변조도핑한 In(Ga)As/InGaAsP 양자점에 대한 운반자 동역학)

  • Jang, Y.D.;Park, J.;Lee, D.;Hong, S.U.;Oh, D.K.
    • Journal of the Korean Vacuum Society
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    • 제15권3호
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    • pp.301-307
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    • 2006
  • We have investigated optical properties of p-modulation doped In(Ga)As quantum dots (QDs) on InP substrate with a comparison with the undoped QDs. Photoluminscence (PL) intensity of doped QDs at 10 K was about 10 times weaker than that of undoped QD sample. The decay time of doped QD sample at its PL peak, obtained from the time-resolved PL (TR-PL) experiment at 10 K, was very fast compared to that of undoped sample. We interpret that this fast decay time of the doped QD sample comes from the addition of non-radiative recombination paths, which are originated from the doping-related defects.

Electrical and Magnetic Properties of Tunneling Device with FePt Magnetic Quantum Dots (FePt 자기 양자점 터널링 소자의 전기적 특성과 자기적 특성 연구)

  • Pak, Sang-Woo;Suh, Joo-Young;Lee, Dong-Uk;Kim, Eun-Kyu
    • Journal of the Korean Vacuum Society
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    • 제20권1호
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    • pp.57-62
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    • 2011
  • We have studied the electrical and magnetic transport properties of tunneling device with FePt magnetic quantum dots. The FePt nanoparticles with a diameter of 8~15 nm were embedded in a $SiO_2$ layer through thermal annealing process at temperature of $800^{\circ}C$ in $N_2$ gas ambient. The electrical properties of the tunneling device were characterized by current-voltage (I-V) measurements under the perpendicular magnetic fields at various temperatures. The nonlinear I-V curves appeared at 20 K, and then it was explained as a conductance blockade by the electron hopping model and tunneling effect through the quantum dots. It was measured also that the negative magneto-resistance ratio increased about 26.2% as increasing external magnetic field up to 9,000 G without regard for an applied electric voltage.