• Title/Summary/Keyword: ISRC

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High voltage MOSFET fabricated by using a standard CMOS logic process to drive the top emission OLEDs in silicon-based OELDs

  • Lee, Cheon-An;Kwon, Hyuck-In;Jin, Sung-Hun;Lee, Chang-Ju;Lee, Myung-Won;Kyung, Jae-Woo;Cho, Il-Whan;Lee, Jong-Duk;Park, Byung-Gook
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.981-983
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    • 2003
  • Using the conventional standard CMOS logic process, the high voltage MOSFET to drive top emission OLEDs was fabricated for the silicon-based organic electroluminescent display. The drift region of the conventional high voltage MOSFET was implemented by the n-well of the logic process. The measurement result shows a good saturation characteristic up to 50 V without breakdown phenomena.

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Triple Layer Passivation for Organic Thin-Film Transistors

  • Ryoo, Ki-Hyun;Lee, Cheon-An;Jin, Sung-Hun;Jung, Keum-Dong;Park, Chang-Bum;Lee, Jong-Duk;Shin, Hyung-Cheol;Park, Byung-Gook
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1310-1312
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    • 2005
  • Passivation of organic thin-film transistors (OTFTs) using organic and metal thin-film was presented. Parylene-C and titanium were used as an organic and metal layer, respectively. With the proposed passivation method the degradation of electric parameters of OTFTs was relieved compared with non-passivated devices. Several electric parameters such as on/off current, field-effect mobility, and threshold voltage were shown.

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Electrical performance and contact resistance with the substrate temperature in the pentacene organic thin-film transistors

  • Lee, Cheon-An;Jang, Kyoung-Chul;Kim, Sung-Won;Ryoo, Ki-Hyun;Jin, Sung-Hun;Lee, Jong-Duk;Shin, Hyung-Cheol;Park, Byung-Gook
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1317-1319
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    • 2005
  • Bottom contact pentacene organic thin-film transistors are fabricated at three different substrate temperatures, $70^{\circ}C$, $80^{\circ}C$ and $90^{\circ}C$. The maximum effective mobility was obtained at $80^{\circ}C$. The contact resistance was extracted by applying two different methods, TLM method and channel-resistance method, and the value shows the minimum at $80^{\circ}C$, which is thought to be the important reason for the best performance.

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Analysis of Current Characteristics Determined by Doping Profiles in 3-Dimensional Devices (3차원 구조 소자에서의 doping profile에 따른 전류 특성 분석)

  • Cho, Seong-Jae;Yun, Jang-Gn;Park, Il-Han;Lee, Jung-Hoon;Kim, Doo-Hyun;Lee, Gil-Seong;Lee, Jong-Duk;Park, Byung-Gook
    • Proceedings of the IEEK Conference
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    • 2006.06a
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    • pp.475-476
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    • 2006
  • Recently, the demand for high density MOSFET arrays are increasing. In implementing 3-D devices to this end, it is inevitable to ion-implant vertically in order to avoid screening effects caused by high silicon fins. In this study, the dependency of drain current characteristics on doping profiles is investigated by 3-D numerical analysis. The position of concentration peak (PCP) and the doping gradient are varied to look into the effects on primary current characteristics. Through these analyses, criteria of ion-implantation for 3-D devices are established.

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Concept of Effective Gate-Source Overlap Length in Invertedstaggered TFT Structures

  • Jung, Keum-Dong;Kim, Yoo-Chul;Kim, Byeong-Ju;Park, Byung-Gook;Shin, Hyung-Cheol;Lee, Jong-Duk
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1270-1272
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    • 2007
  • Analytic equations are derived from physical quantities in the gate-source overlap region and the concept of effective gate-source overlap length is proposed. The effective overlap length can be affected by gate voltage, insulator thickness and semiconductor thickness, and the overlap length should be larger than the length to obtain maximum driving current.

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Investigation of Frequency Dependent Sensitivity of Noise Figure on Device Parameters in 65 nm CMOS

  • Koo, Min-Suk;Jung, Hak-Chul;Jhon, Hee-Sauk;Park, Byung-Gook;Lee, Jong-Duk;Shin, Hyung-Cheol
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.9 no.1
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    • pp.61-66
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    • 2009
  • We have investigated the noise sensitivity of low noise amplifier (LNA) at different frequency. This noise sensitivity analysis provides insights about noise parameters and it is very beneficial for making appropriate design trade-offs. From this work, the circuit designer can choose the adequate noise parameters tolerances.

Extraction of Ballistic Parameters in 65 nm MOSFETs

  • Kim, Jun-Soo;Lee, Jae-Hong;Kwon, Yong-Min;Park, Byung-Gook;Lee, Jong-Duk;Shin, Hyung-Cheol
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.9 no.1
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    • pp.55-60
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    • 2009
  • The channel backscattering coefficient and injection velocity have been extracted experimentally in 65nm MOSFETs. Thanks to an experimental extraction methodology taking into account multi-subband population, we demonstrate that the short channel ballistic efficiency is slightly greater than long channel ballistic efficiency.

Performance improvement in bottom-contact pentacene organic thin-film transistors by the PMMA layer insertion

  • Lyoo, Ki-Hyun;Kim, Byeong-Ju;Lee, Cheon-An;Jung, Keum-Dong;Park, Dong-Wook;Park, Byung-Gook;Lee, Jong-Duk
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.1139-1141
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    • 2006
  • For the bottom-contact pentacene organic thin-film transistors (OTFTs), the insertion of a thin PMMA layer $(20{\AA})$ between the pentacene and the electrode improves the electrical performances, such as carrier mobility and on-current magnitude, about 4 times larger than those of the devices without the PMMA. The performance enhancement is presumably due to the decreased contact resistance between metal and pentacene by inserting the thin PMMA layer.

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A new driving circuit for the low power and reduced layout area in silicon based AM-OELDs

  • Lee, Cheon-An;Yoon, Yong-Jin;Jin, Sung-Hun;Kim, Jin-Wook;Kwon, Hyuck-In;Lee, Jong-Duk;Park, Byung-Gook
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.11-14
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    • 2003
  • A silicon based OELD driving circuit that has a new type of column driving method is proposed to reduce the driving circuit area. In comparison with the conventional method, latches in each column are removed and one DAC (digital-to-analog converter) drives several column lines. To make the DAC operate during a specific period for the low power consumption, a simple DESG (DAC Enable Signal Generator) circuit was devised and confirmed by the simulation.

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An Arbitrary Waveform 16 Channel Neural Stimulator with Adaptive Supply Regulator in 0.35 ㎛ HV CMOS for Visual Prosthesis

  • Seo, Jindeok;Lim, Kyomuk;Lee, Sangmin;Ahn, Jaehyun;Hong, Seokjune;Yoo, Hyungjung;Jung, Sukwon;Park, Sunkil;Cho, Dong-Il Dan;Ko, Hyoungho
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.13 no.1
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    • pp.79-86
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    • 2013
  • We describe a neural stimulator front-end with arbitrary stimulation waveform generator and adaptive supply regulator (ASR) for visual prosthesis. Each pixel circuit generates arbitrary current waveform with 5 bit programmable amplitude. The ASR provides the internal supply voltage regulated to the minimum required voltage for stimulation. The prototype is implemented in $0.35{\mu}m$ CMOS with HV option and occupies $2.94mm^2$ including I/Os.