• Title/Summary/Keyword: Gallium

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High Performance InGaZnO Thin Film Transistor by Atmospheric Pressure Ar Plasma Treatment (대기압 아르곤 플라즈마 처리를 통한 IGZO TFT의 전기적 특성 향상 연구)

  • Jeong, Byung-Jun;Jeong, Jun-Kyo;Park, Jung-Hyun;Kim, Yu-Jung;Lee, Hi-Deok;Choi, Ho-Suk;Lee, Ga-Won
    • Journal of the Semiconductor & Display Technology
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    • v.16 no.4
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    • pp.59-62
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    • 2017
  • In this paper, atmospheric pressure plasma treatment was proposed for high performance indium gallium zinc oxide thin film transistor (IGZO TFT). RF Ar plasma treatment is performed at room temperature under atmospheric pressure as a simple and cost effective channel surface treatment method. The experimental results show that field effect mobility can be enhanced by $2.51cm^2/V{\cdot}s$ from $1.69cm^2/V{\cdot}s$ to $4.20cm^2/V{\cdot}s$ compared with a conventional device without plasma treatment. From X-ray photoelectron spectroscopy (XPS) analysis, the increase of oxygen vacancies and decrease of metal-oxide bonding are observed, which suggests that the suggested atmospheric Ar plasma treatment is a cost-effective useful process method to control the IGZO TFT performance.

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Effect of calcium hydroxide on inflammatory root resorption and ankylosis in replanted teeth compared with other intracanal materials: a review

  • Jahromi, Maryam Zare;Kalantar Motamedi, Mahmood Reza
    • Restorative Dentistry and Endodontics
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    • v.44 no.3
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    • pp.32.1-32.13
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    • 2019
  • Calcium hydroxide (CH) is the gold-standard intracanal dressing for teeth subjected to traumatic avulsion. A common complication after the replantation of avulsed teeth is root resorption (RR). The current review was conducted to compare the effect of CH with that of other intracanal medications and filling materials on inflammatory RR and replacement RR (ankylosis) in replanted teeth. The PubMed and Scopus databases were searched through June 2018 using specific keywords related to the title of the present article. The materials that were compared to CH were in 2 categories: 1) mineral trioxide aggregate (MTA) and endodontic sealers as permanent filling materials for single-visit treatment, and 2) Ledermix, bisphosphonates, acetazolamide, indomethacin, gallium nitrate, and enamel matrix-derived protein (Emdogain) as intracanal medicaments for multiple-visit management of avulsed teeth prior to the final obturation. MTA can be used as a single-visit root filling material; however, there are limited data on its efficacy due to a lack of clinical trials. Ledermix and acetazolamide were comparable to CH in reducing RR. Emdogain seems to be an interesting material, but the data supporting its use as an intracanal medication remain very limited. The conclusions drawn in this study were limited by the insufficiency of clinical trials.

Optimal Design of GaN-FET based High Efficiency and High Power Density Boundary Conduction Mode Active Clamp Flyback Converter (GaN-FET 기반의 고효율 및 고전력밀도 경계전류모드 능동 클램프 플라이백 컨버터 최적설계)

  • Lee, Chang-Min;Gu, Hyun-Su;Ji, Sang-Keun;Ryu, Dong-Kyun;Kang, Jeong-Il;Han, Sang-Kyoo
    • The Transactions of the Korean Institute of Power Electronics
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    • v.24 no.4
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    • pp.259-267
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    • 2019
  • An active clamp flyback (ACF) converter applies a clamp circuit and circulates the energy of leakage inductance to the input side, thereby achieving a zero-voltage switching (ZVS) operation and greatly reducing switching losses. The switching losses are further reduced by applying a gallium nitride field effect transistor (GaN-FET) with excellent switching characteristics, and ZVS operation can be accomplished under light load with boundary conduction mode (BCM) operation. Optimal design is performed on the basis of loss analysis by selecting magnetization inductance based on BCM operation and a clamp capacitor for loss reduction. Therefore, the size of the reactive element can be reduced through high-frequency operation, and a high-efficiency and high-power-density converter can be achieved. This study proposes an optimal design for a high-efficiency and high-power-density BCM ACF converter based on GaN-FETs and verifies it through experimental results of a 65 W-rated prototype.

Development of Si(110) CMOS process for monolithic integration with GaN power semiconductor (질화갈륨 전력반도체와 Si CMOS 소자의 단일기판 집적화를 위한 Si(110) CMOS 공정개발)

  • Kim, Hyung-tak
    • Journal of IKEEE
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    • v.23 no.1
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    • pp.326-329
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    • 2019
  • Gallium nitride(GaN) has been a superior candidate for the next generation power electronics. As GaN-on-Si substrate technology is mature, there has been new demand for monolithic integration of GaN technology with Si CMOS devices. In this work, (110)Si CMOS process was developed and the fabricated devices were evaluated in order to confirm the feasibility of utilizing domestic foundry facility for monolithic integration of Si CMOS and GaN power devices.

Transient Liquid Phase Diffusion Bonding Technology for Power Semiconductor Packaging (전력반도체 접합용 천이액상확산접합 기술)

  • Lee, Jeong-Hyun;Jung, Do-hyun;Jung, Jae-Pil
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.4
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    • pp.9-15
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    • 2018
  • This paper shows the principles and characteristics of the transient liquid phase (TLP) bonding technology for power modules packaging. The power module is semiconductor parts that change and manage power entering electronic devices, and demand is increasing due to the advent of the fourth industrial revolution. Higher operation temperatures and increasing current density are important for the performance of power modules. Conventional power modules using Si chip have reached the limit of theoretical performance development. In addition, their efficiency is reduced at high temperature because of the low properties of Si. Therefore, Si is changed to silicon carbide (SiC) and gallium nitride (GaN). Various methods of bonding have been studied, like Ag sintering and Sn-Au solder, to keep up with the development of chips, one of which is TLP bonding. TLP bonding has the advantages in price and junction temperature over other technologies. In this paper, TLP bonding using various materials and methods is introduced. In addition, new TLP technologies that are combined with other technologies such as metal powder mixing and ultrasonic technology are also reviewed.

Photocatalytic Properties of Hydrothermally Synthesized Gallium Oxides at Different Phase Polymorphs (수열합성 공정으로 합성된 산화갈륨의 상변화에 따른 광촉매 특성)

  • Ryou, Heejoong;Kim, Sunjae;Lee, In Gyu;Oh, Hoon-Jung;Hwang, Wan Sik
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.2
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    • pp.98-102
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    • 2021
  • GaOOH is obtained via hydrothermal synthesis procedure. The formed GaOOH is turned into α-Ga2O3 at 500℃ annealing. As the annealing temperatures increase the α-Ga2O3 is in part turned into β-Ga2O3 and fully turned into β-Ga2O3 after 1100℃. XPS and PL results reveal that heterojunction interface between α-Ga2O3 and β-Ga2O3 become maxim at 500℃ annealing condition, which result in the highest photocatalytic activity. The presence of heterojunction interface slows down the recombination process by separating photogenerated electron-hole pairs and thereby enhance the overall photocatalytic activity.

Photoelectrochemical (PEC) Water Splitting using GaN-based Photoelectrode (GaN 기반 광전극을 이용한 광전기화학적 물분해 수소 생산)

  • Heo, Jiwon;Bae, Hyojung;Ha, Jun-Seok
    • Journal of the Microelectronics and Packaging Society
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    • v.28 no.1
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    • pp.13-20
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    • 2021
  • GaN has shown good potential owing to its better chemical stability than other materials and tunable bandgap with materials such as InN and AlN. Tunable bandgap allows GaN to make the maximum utilization of the solar spectrum, thus improves the solar-to-hydrogen (STH) efficiency. In addition, GaN band gap contains the oxidation and reduction level of water, so it can split water without external voltage. However, STH efficiency using GaN itself is low and has been actively studied recently to improve it. In this thesis, we have summarized the studies related to the use of GaN as a photoelectrode for photoelectrochemical water splitting.

Interface Trap Effects on the Output Characteristics of GaN Schottky Barrier MOSFET (GaN Schottky Barrier MOSFET의 출력 전류에 대한 계면 트랩의 영향)

  • Park, Byeong-Jun;Kim, Han-Sol;Hahm, Sung-Ho
    • Journal of Sensor Science and Technology
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    • v.31 no.4
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    • pp.271-277
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    • 2022
  • We analyzed the effects of the interface trap on the output characteristics of an inversion mode n-channel GaN Schottky barrier (SB)-MOSFET based on the Nit distribution using TCAD simulation. As interface trap number density (Nit) increased, the threshold voltage increased while the drain current density decreased. Under Nit=5.0×1010 cm-2 condition, the threshold voltage was 3.2 V for VDS=1 V, and the drain current density reduced to 2.4 mA/mm relative to the non-trap condition. Regardless of the Nit distribution type, there was an increase in the subthreshold swing (SS) following an increase in Nit. Under U-shaped Nit distribution, it was confirmed that the SS varied depending on the gate voltage. The interface fixed charge (Qf) caused an shift in the threshold voltage and increased the off-state current collectively with the surface trap. In summary, GaN SB-MOSFET can be a building block for high power UV optoelectronic circuit provided the surface state is significantly reduced.

Technological Trends of C-/X-/Ku-band GaN Monolithic Microwave Integrated Circuit for Next-Generation Radar Applications (차세대 레이더용 C-/X-/Ku-대역 GaN 집적회로 기술 동향)

  • Ahn, H.K.;Lee, S.H.;Kim, S.I.;Noh, Y.S.;Chang, S.J.;Jung, H.U.;Lim, J.W.
    • Electronics and Telecommunications Trends
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    • v.37 no.5
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    • pp.11-21
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    • 2022
  • GaN (Gallium-Nitride) is a promising candidate material in various radio frequency applications due to its inherent properties including wide bandgap, high carrier concentration, and high electron mobility/saturation velocity. Notably, AlGaN/GaN heterostructure field effect transistor exhibits high operating voltage and high power-density/power at high frequency. In next-generation radar systems, GaN power transistors and monolithic microwave integrated circuits (MMICs) are significant components of transmitting and receiving modules. In this paper, we introduce technological trends for C-/X-/Ku-band GaN MMICs including power amplifiers, low noise amplifiers and switch MMICs, focusing on the status of GaN MMIC fabrication technology and GaN foundry service. Additionally, we review the research for the localization of C-/X-/Ku-band GaN MMICs using in-house GaN transistor and MMIC fabrication technology. We also discuss the results of C-/X-/Ku-band GaN MMICs developed at Defense Materials and Components Convergence Research Department in ETRI.

Recent Advances in a-IGZO Thin Film Transistor Devices: A Short Review

  • Jingwen Chen;Fucheng Wang;Yifan Hu;Jaewoong Cho;Yeojin Jeong;Duy Phong Pham;Junsin Yi
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.36 no.5
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    • pp.463-473
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    • 2023
  • In recent years, the transparent amorphous oxide thin film transistor represented by indium-gallium-zinc-oxide (IGZO) has become the first choice of the next generation of integrated circuit control components. This article contributes an overview of IGZO thin-film transistors (TFTs), including their fundamental principles and recent advancements. The paper outlines various TFT structures and places emphasis on the fabrication process of the active layer. The result showed that the size of the active layer including the length-to-width ratio and the width could have a significant effect on the mobility. And the process of TFT could influence the crystal structure of IGZO thin film. Furthermore, the article presents an overview of recent applications of IGZO TFTs, such as their use in display drivers and TFT memories. At last, the future development of IGZO TFT is forecasted in this paper.