• Title/Summary/Keyword: GaZnO

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Highly Luminescent (Zn0.6Sr0.3Mg0.1)2Ga2S5:Eu2+ Green Phosphors for a White Light-Emitting Diode

  • Jeong, Yong-Kwang;Cho, Dong-Hee;Kim, Kwang-Bok;Kang, Jun-Gill
    • Bulletin of the Korean Chemical Society
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    • v.33 no.8
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    • pp.2523-2528
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    • 2012
  • Green phosphors $(Zn_{1-a-b}M_aM^{\prime}_b)_xGa_yS_{x+3y/2}:Eu^{2+}$ (M, M' = alkali earth ions) with x = 2 and y = 2-5 were prepared, starting from ZnO, MgO, $SrCO_3$, $Ga_2O_3$, $Eu_2O_3$, and S with a flux $NH_4F$ using a conventional solidstate reaction. A phosphor with the composition of $(Zn_{0.6}Sr_{0.3}Mg_{0.1})_2Ga_2S_5:Eu^{2+}$ produced the strongest luminescence at a 460-nm excitation. The observed XRD patterns indicated that the optimized phosphor consisted of two components: zinc thiogallate and zinc sulfide. The characteristic green luminescence of the $ZnS:Eu^{2+}$ component on excitation at 460 nm was attributed to the donor-acceptor ($D_{ZnGa_2S_4}-A_{ZnS}$) recombination in the hybrid boundary. The optimized green phosphor converted 17.9% of the absorbed blue light into luminescence. For the fabrication of light-emitting diode (LED), the optimized phosphor was coated with MgO using magnesium nitrate to overcome their weakness against moisture. The MgO-coated green phosphor was fabricated with a blue GaN LED, and the chromaticity index of the phosphor-cast LED (pc-LED) was investigated as a function of the wt % of the optimized phosphor. White LEDs were fabricated by pasting the optimized green (G) and the red (R) phosphors, and the commercial yellow (Y) phosphor on the blue chips. The three-band pc-WLED resulted in improved color rendering index (CRI) and corrected color temperature (CCT), compared with those of the two-band pc-WLED.

ZnO 박막을 이용한 광재료 개발 현황

  • 서효원;정연식;최원국
    • Electrical & Electronic Materials
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    • v.17 no.5
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    • pp.13-20
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    • 2004
  • 1996년 GaN와 near band edge emission(NBE) 및 yellow deep-defect level emission의 발광 기구가 ZnO의 greene mission과 매우 유사하다는 점이 발견된 이 후[1,2], II-VIZnO반도체에 대한 광학적 성질에 많은 관심이 집중되기 시작하였다. 1960년대 C. Klingshirin[3]에 의해 bulk ZnO의 exciton luminescence가 관측된 이래로, 1980년대 후반부터 적층 박막 성장 법들이 급속도로 발전을 하여 오고 1988 S. Bethke등이 CVD로 성장한 ZnO의 NBE emission에 관심을 갖기 시작하였고[4], 1996년 2K에서 GaN, ZnO사이의 유사한 발광기구가 알려졌고[5], 도호쿠 및 일본 공업대에서 ZnO의 적층 성장 및 상온에서 defect에 기인한 emission이 없는 깨끗한 PL 의 관측, 상온 lasing, 육방정계 결정 구조에서 비롯된 6-fold symmetry PL 등이 보고되기 시작하였다. [6-8] 2000년에 들어서면서 MgO와 CdO와의 solid solution에 의한 밴드갭을 2.6-4.2 eV 까지 조절하는 가능성이 보고되었고 이를 이용한 ZnO/MgZnO MQW 구조에 대한 연구도 병행되었다.(중략)

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Compositional Dependence of Photoluminescence of $ZnGa_2O_4$

  • Lee, Yong-Jei;Sahn Nahm;Kim, Myong-Ho;Suh, Kyung-Soo;Cho, Kyung-Ik;Yoo, Hyung-Joon;Byun, Jae-Dong
    • The Korean Journal of Ceramics
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    • v.3 no.2
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    • pp.139-143
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    • 1997
  • The photoluminescence characteristics of the zinc gallate have been investigated as a function of the composition and the firing atmosphere. Two distinct emission bands were observed whose peaks are 360 nm and 430 nm respectively. These emission bands are considered to be from two different emission centers. For $ZnO/Ga_2O_3$=49.3/50.7 or higher, 430 nm band is predominant and for $ZnO/Ga_2O_3$=49.2/50.8 or lower, 360nm band becomes predominant, whereas 430 nm band is almost completely suppressed. The shift of emission peak is though to be due to the change of the cation distribution with the zinc content in the spinel zinc gallate. Also, the emission centers responsible for the 360nm band are considered to be more efficient energy absorbers than the ones for the 430 nm band. Highly efficient green emitting phosphor was obtained by activating Zn-deficient zinc gallate with manganeses.

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Effect of Ga Dopants on Electrical and Optical Characteristics of ZnO Thin Films (Ga 첨가물이 ZnO의 전기적, 광학적 특성에 미치는 영향)

  • Kim, Jun-Sik;Jang, Gun-Eik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.9
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    • pp.685-690
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    • 2010
  • ZnO with the wide band gap near 3.37 eV is typically an n-type semiconductor in which deviation from stoichiometry is electrically active. It was known that the films with a resistivity of the order of $10^{-4}{\Omega}cm$ is not easy to obtain. In order to improve electrical characteristic of ZnO, we added 1, 3, 5 wt% Ga element in ZnO. The Ga-doped ZnO (GZO) was grown on a glass substrate by radio frequency (RF) magnetron sputtering at the temperature range from 100 to $500^{\circ}C$. X-ray diffraction (XRD) patterns of GZO films showed preferable crystal orientation of (002) plane. The lowest resistivity of the GZO films was $8.9{\times}10^{-4}{\Omega}cm$. GZO films significantly influenced by the working temperature. The average transmittance of the films was over 80% in the visible ranges.

Effect of InGaZnO Solution Concentration on the Electrical Properties of Drop-Cast Oxide Thin-Film Transistors (InGaZnO 용액의 농도가 Drop-casting으로 제작된 산화물 박막 트랜지스터의 전기적 특성에 미치는 영향)

  • Noh, Eun-Kyung;Yu, Kyeong Min;Kim, Min-Hoi
    • Journal of Sensor Science and Technology
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    • v.29 no.5
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    • pp.332-335
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    • 2020
  • Drop casting, a solution process, is a simple low-cost fabrication technique that does not waste material. In this study, we elucidate the effect of the concentration of a InGaZnO solution on the electrical properties of drop-cast oxide thin-film transistors. The higher the concentration the larger the amount of remnant InGaZnO solutes, which yields a thicker thin film. Accordingly, the electrical properties were strongly dependent on the concentration. At a high concentration of 0.3 M (or higher), a large current flowed but did not lead to switching characteristics. At a concentration lower than 0.01 M, switching characteristics were observed, but the mobility was small. In addition to a high mobility, sufficient switching characteristics were obtained at a concentration of 0.1 M owing to the appropriate thickness of the semiconductor layer. This study provides a technical basis for the low-cost fabrication of switching devices capable of driving a sensor array.

Synthesis and Photoluminescence Characteristics of Zinc Gallate (ZnGa2O4) Thin Film Phosphors (Zinc Gallate (ZnGa2O4)박막 형광체의 합성과 발광특성)

  • Kim, Su-Youn;Yun, Young-Hoon;Choi, Sung-Churl
    • Journal of the Korean Ceramic Society
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    • v.44 no.1 s.296
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    • pp.32-36
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    • 2007
  • Zinc gallate $(ZnGa_2O_4)$ thin film phosphors have been formed on ITO glass substrates by a sol-gel spinning coating method. For the formation of the film phosphors, the starting materials of zinc acetate dihydrate, gallium nitrate hydrate and 2-methoxyethanol as a solution were used. The thin films deposited were firstly dried at $100^{\circ}C$ and fired at $500^{\circ}C\;or\;600^{\circ}C$ for 30 min and then, annealed $500^{\circ}C\;or\;600^{\circ}C$ at for 30 min under an annealing atmosphere of 3% $H_2/Ar$. The thin films deposited on ITO glass plates showed the (220), (222), (400), (422), (511), and (440) peaks of spinel structure as well as the (311) peak indicating a standard powder diffraction pattern. The surface morphologies of the thin film phosphors were observed with a firing and an annealing condition. The $ZnGa_2O_4$ film phosphors showed the blue emission spectra around 410 nm as well as the emission spectra in the UV region (360-380 nm).

RF Magentron Sputtering deposited by ZnO:Ga thin film characterization for a transparent thin film transistor an application (투명 박막 트랜지스터 응용을 위한 RF Magnetron Sputtering으로 증착된 ZnO:Ga 박막의 특성)

  • Lee, Seok-Jin;Kwon, Soon-Il;Park, Seung-Beum;Jung, Tae-Hwan;Lim, Dong-Gun;Park, Jea-Hwan;Yang, Kea-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.146-147
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    • 2008
  • In this paper we report upon an investigation into the effect of sputter RF power on the electrical properties of Gallium doped zinc oxide (ZnO:Ga) film. Structural, electrical and optical properties of the ZnO:Ga films were investigation in terms of the sputtering power. Working pressure fixed in 5 mtorr and RF powers the variable did with 50~100 W. The result, We were able to without substrate temperature obtain resistivity of $9.3\times10^{-4}{\Omega}cm$ and optical transmittance of 90%.

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Structural and optical properties of Ga-doped ZnO nanowires synthesized by pulsed laser deposition in furnace (갈륨 도핑된 ZnO 나노와이어의 합성과 구조적 광학적 특성 분석)

  • Kim, Chang-Eun;Ahn, Byung-Du;Jean, Kyung-Ah;Son, Hyo-Jeong;Kim, Gun-Hee;Lee, Sang-Yeol
    • Proceedings of the KIEE Conference
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    • 2006.10a
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    • pp.46-47
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    • 2006
  • Ga-doped ZnO nanowires have been synthesized by pulsed laser deposition (PLD) in furnace on gold coated (0001) sapphire substrates. The effect of repetition rate on structural and optical properties of Ga-doped ZnO nanowires are investigated. By controlling repetition rate, the diameter of nanowires is varied between about 60 and 100 nm, and the length of nanowires is varied between about 2 and 4 um. The X-ray diffraction (XRD) reveals the structural defects induced by the Ga doping. The room temperature photoluminescence (PL) spectra of Ga-doped ZnO nanowires show strong UV emission between 382.394 and 385.279 nm with negligible visible emission.

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Characteristics of $ZnGa_2O_4$ phosphor prepared by Precipitation method and Solid-state reaction method (침전법과 고상반응법으로 제조한 $ZnGa_2O_4$ 형광체의 특성)

  • Cha, Jae-Hyeok;Kim, Se-Jun;Kwak, Hyun-Ho;Choi, Hyung-Wook
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.383-384
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    • 2007
  • The nano and micro-sized $ZnGa_2O_4$ phosphor were prepared by precipitation method and solid-state method. The luminescence, formation process and structure of phosphor powders were investigated by means of XRD, SEM and PL. The result of XRD analysis showed that $ZnGa_2O_4$ spinel structure was formed at as-prepared in the case of precipitation method. However, micro-sized phosphor was required high heating treatment to have a satisfactory spinel structure. The CL intensity of nano-sized phosphor was about 4-fold higher than that of micro-sized phosphor. The emission spectra of all $ZnGa_2O_4$ phosphor show a self activated blue emission band at around 420 nm in the wide range of 300~600 nm.

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Effect of Process Variation of Al Grid and ZnO Transparent Electrode on the Performance of Cu(In,Ga)Se2 Solar Cells (Al 그리드와 ZnO 투명전도막 의 공정변화에 따른 Cu(In,Ga)Se2 박막태양전지의 특성 연구)

  • Cho, Bo Hwan;Kim, Seon Cheol;Mun, Sun Hong;Kim, Seung Tae;Ahn, Byung Tae
    • Current Photovoltaic Research
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    • v.3 no.1
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    • pp.32-38
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    • 2015
  • CIGS solar cell consisted of various films. In this research, we investigated electrode materials in $Cu(In,Ga)Se_2$ (CIGS) cells, including Al-doped ZnO (ZnO:Al), intrinsic ZnO (i-ZnO), and Al films. The sputtered ZnO:Al film with a sputtering power at 200W showed the lowest series resistance and highest cell efficiency. The electrical resistivity of the 200-W sputtered ZnO:Al film was $5.2{\times}10^{-4}{\Omega}{\cdot}cm$ by the rapid thermal annealing at $200^{\circ}C$ for 1 min. The electrical resistivity of i-ZnO was not measurable due to its high resistance. But the optical transmittance was highest with less oxygen supply and high efficiency cell was achieved with $O_2/(Ar+O_2)$ ratio was 1% due to the increase of short-circuit current. No significant change in the cell performance by inserting a Ni layer between Al and ZnO:Al films was observed.