• 제목/요약/키워드: Dual process

검색결과 997건 처리시간 0.028초

경수로 사용후핵연료 건식저장을 위한 진공건조공정 개발 (Development of the Vacuum Drying Process for the PWR Spent Nuclear Fuel Dry Storage)

  • 백창열;조천형
    • 방사성폐기물학회지
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    • 제14권4호
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    • pp.435-443
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    • 2016
  • 본 논문은 국내 원전의 습식저장조에 저장 중인 경수로형 사용후핵연료를 금속겸용용기를 이용해 건식으로 운영하기 위한 운영공정을 개발하는 것이다. 국내 경수로형 원전의 사용후핵연료는 1990년대 초부터 습식으로 소내에서 운반을 한 경험은 많으나 건식으로 운전한 경험은 전혀 없는 실정이다. 이에 따라 금속겸용용기를 운영할 수 있는 세부 운영공정을 개발하였으며 주요 운영공정에서 금속겸용용기의 주요 구성품 및 사용후핵연료의 안전성이 유지됨을 확인하였다. 단기운영공정은 총 21시간 내에 이루어지도록 절차를 수립하였고 단계별로 허용운전 시간(15시간 습식공정, 3시간 배수공정, 그리고 3시간 진공공정)도 제시하였다.

웨이퍼의 2단 이면공정이 반도체 칩의 휨 강도에 미치는 영향 (The Effect of Dual Wafer Back-Lapping Process on Flexural Strength of Semiconductor Chips)

  • 이성민
    • 한국재료학회지
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    • 제15권3호
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    • pp.183-188
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    • 2005
  • It was studied in this article how the flexural strength of bare silicon chips is influenced by adopting dual wafer back-lapping process. The experimental results showed that an additional finishing process after the conventional grinding process improves the flexural strength of bare chips by more than 2-fold. In particular, this work showed that the proper removal of the grinding marks$(Ra=0.1\;{\mu}m)$existing on the wafer back-surface resulting from the grinding process significantly contiributes to the enhancement of chip strength.

Dual Select Diode AMLCDs;A Path Towards Scalable Two Mask Array Designs

  • Boer, Willem Den;Smith, G. Scott
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.383-388
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    • 2004
  • In this paper an alternative Active Matrix LCD technology is described with scalable, low cost processing. The Dual Select Diode AMLCD requires 60% lower capital investment in the array process than a-Si TFT arrays and results in 20% lower cost LCD modules. Development at several AMLCD manufacturers is in progress.

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Recent Progress in Low Cost Dual-Select-Diode AMLCD Technology

  • Boer, Willem Den;Smith, G. Scott
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.873-877
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    • 2005
  • Recent developments in Dual Select Diode (DSD) AMLCD technology are described. They include a novel array design and drive method with shared select lines, which leads to higher aperture ratio and a further reduction of module cost. A Color-On-Array DSD process and pixel layout compatible with In-Plane-Switching is also proposed.

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A Quasi-Likelihood Approach to Nonlinear Filtering Problems

  • Kim, Yoon-Tae
    • Journal of the Korean Statistical Society
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    • 제27권2호
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    • pp.221-235
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    • 1998
  • Suppose that an observed process can be written as the additive model of the signal process and the noise process with unknown parameters. In practice the signal process is not directly observed. We consider the problem of estimating parameter from the observation process using the quasi-likelihood method.

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쌍대반응표면최적화를 위한 반복적 선호도사후제시법 (An Iterative Posterior Preference Articulation Approach to Dual Response Surface Optimization)

  • 정인준
    • 품질경영학회지
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    • 제40권4호
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    • pp.481-496
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    • 2012
  • Purpose: This paper aims at improving inefficiency of an existing posterior preference articulation method proposed for dual response surface optimization. The method generates a set of non-dominated solutions and then allows a decision maker (DM) to select the best solution among them through an interval selection strategy. Methods: This paper proposes an iterative posterior preference articulation method, which repeatedly generates the predetermined number of non-dominated solutions in an interval which becomes gradually narrower over rounds. Results: The existing method generates a good number of non-dominated solutions not used in the DM's selection process, while the proposed method generates the minimal number of non-dominated solutions necessitated in the selection process. Conclusion: The proposed method enables a satisfactory compromise solution to be achieved with minimal cognitive burden of the DM as well as with light computation load in generating non-dominated solutions.

Nano-technology에 도입된 Dual Poly Gate에서의 DPN 공정 연구 (Impact of DPN on Deep Nano-technology Device Employing Dual Poly Gate)

  • 김창집;노용한
    • 한국전기전자재료학회논문지
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    • 제21권4호
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    • pp.296-299
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    • 2008
  • The effects of radio frequency (RF) source power for decoupled plasma nitridation (DPN) process on the electrical properties and Fowler-Nordheim (FN) stress immunity of the oxynitride gate dielectrics for deep nano-technology devices has been investigated. With increase of RF source power, the threshold voltage (Vth) of a NMOS transistor(TR) decreased and that of a PMOS transistor increased, indicating that the increase of nitrogen incorporation in the oxynitride layer due to higher RF source power induced more positive fixed charges. The improved off-current characteristics and wafer uniformity of PMOS Vth were observed with higher RF source power. FN stress immunity, however, has been degenerated with increasing RF source power, which was attributed to the increased trap sites in the oxynitride layer. With the experimental results, we could optimize the DPN process minimizing the power consumption of a device and satisfying the gate oxide reliability.

이중공진 소형 칩 Meander 안테나에 관한 연구 (A Study on the Small Chip Meander Antenna for Dual-frequency Operation)

  • 김현준;권세웅;심성훈;강종윤;윤석진;김현재;윤영중
    • 한국전자파학회논문지
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    • 제13권7호
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    • pp.633-640
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    • 2002
  • 본 논문에서는 이중공진 칩 meander 안테나를 제안하였다. 제안된 안테나는 기존 meander 안테나의 소형화 특성을 유지하면서 인접한 주파수에서 이중공진하는 특징을 갖는다. LTCC-MLC 공정을 이용하여 제작하였고, 2.20 GHz와 2.883 GHz에서 이중공진(주파수비=1.35)하며, meander 패치의 크기는 15.7 mm $\times$ 6.52 mm( 0.32 λg $\times$ 0.133 λg)이다. 그리고 이중공진 meander 안테나의 추가적인 소형화를 위해 3차원 구조를 제안한다. 이 3차원 구조를 이용하여 약 50 %의 크기를 추가적으로 소형화하였다. 전류분포를 통해 제안된 안테나가 이중공진하는 원리를 확인하였고, 제작된 안테나의 반사손실 및 방사패턴의 특성을 분석하였다.