• 한국전기전자재료학회논문지
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• 제17권3호
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• pp.267-271
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• 2004

The joint strength and fracture surface of Sn-Pb solder bump in photo diode packages after isothermal aging testing were studied experimentally. Cu/Sn-Pb solders were adopted, and aged for up to 900 hours at 12$0^{\circ}C$ and 17$0^{\circ}C$ to analyze the effect of intermetallic compound(IMC). In 900-hour aging experiments, the maximum shea strength of Sn-Pb solder decreased by 20％ and 9％. The diffraction patterns of Cu$_{6}$Sn$_{5}$, scallop-shape IMC, and planar-shape Cu$_3$Sn were observed by Transmission Electron Microscopy (TEM).EM).

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2002년도 추계기술심포지움논문집
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• pp.49-53
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• 2002

The Sn-Cu eutectic solder bump formation ($140{\mu}{\textrm}{m}$ diameter, $250{\mu}{\textrm}{m}$ pitch) by electroplating was studied for flip chip package fabrication. The effect of current density and plating time on Sn-Cu deposit was investigated. The morphology and composition of plated solder surface was examined by scanning electron microscopy. The plating thickness increased with increasing time. The plating rate increased generally according to current density. After the characteristics of Sn-Cu plating were investigated, Sn-Cu solder bumps were fabricated on optimal condition of 5A/dm$^2$, 2hrs. Ball shear test after reflow was performed to measure adhesion strength between solder bump and UBM (Under Bump Metallization). The shear strength of Sn-Cu bump after reflow was higher than that of before reflow.

• 대한전자공학회논문지SD
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• 제40권10호
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• pp.1-8
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• 2003

본 연구는 Cu/Ta/Si 기판 위에 전해 도금법으로 성장시킨 구리 박막을 성장 시켰다. 성장 속도는 음극 전류 밀도에 비례하고, 용액의 유량에 반비례하였다. 성장된 구리 박막의 저항률은 약 2.1 μΩ㎝ 이었고, Int/sub (111)//Int/sub (200)/, 비는 5.4였으며, 박막내에 불순물은 발견되지 않았다. 성막후에 10/sup -3/ torr 진공 중에서 온도를 변화해 가면서 열처리를 수행하였다. 열처리후에 저항률은 17 %, 결정성은 40 ％의 향상을 보였으며 170℃ 까지는 박막의 스트레스는 변화가 없었다.

• Environmental Engineering Research
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• 제23권1호
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• pp.92-98
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• 2018

Suitability of aluminium-based water treatment sludge (WTS), a waste product from water treatment facilities, was assessed for removal of heavy metals from an electroplating wastewater which had high concentrations of copper and chromium along with other heavy metals. Batch tests with simulated wastewater in single- and multi-metal solutions indicated the influence of initial pH and WTS dose on removal of six metals namely Cu(II), Co(II), Cr(VI), Hg(II), Pb(II) and Zn(II). In general, removal of cationic metals such as Pb(II), Cu(II) and Zn(II) increased with increase in pH while that of anionic Cr(VI) showed a reduction with increased pH values. Tests with multi-metal solution showed that the influence of competition was more pronounced at lower WTS dosages. Column test with diluted (100 times) real electroplating wastewater showed complete removal of copper up to 100 bed volumes while chromium removal ranged between 78-92%. Other metals which were present in lower concentrations were also effectively removed. Mass balance for copper and chromium showed that the WTS media had Cu(II) and Cr(VI) sorption capacities of about 1.7 and 3.5 mg/g of dried sludge, respectively. The study thus indicates that WTS has the potential to be used as a filtration/adsorption medium for removal of metals from metal-bearing wastewaters.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2008년도 추계종합학술대회 B
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• pp.95-99
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• 2008

반도체 소자의 소형화에 따라 낮은 비저항을 가진 구리가 ULSI의 금속배선으로 사용되고 있다. 구리선의 비저항은 RC delay와 집적회로의 신호전달에 영향을 미치게 된다. 본 논문에서는 전기도금 된 구리박막의 비저항에 대해 전해액이 미치는 영향을 조사하였다. 4탐침 표면저항측정기로 비저항을 평가하였고, XRD (X-ray Diffraction), AFM (Atomic Force Microscope), FE-SEM (Field Emission Scanning Electron Microscope), XPS (X-ray Photoelectron Spectroscopy)로 박막의 특성을 조사하였다. 실험한 결과, 전해액의 조건이 전기도금으로 증착된 낮은 비저항을 갖는 구리박막의 형성에 있어 중요한 역할을 하는 것을 확인하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.192-193
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• 2007

An evaporated Ti/Pd/Ag contact system is most widely used to make high-efficiency silicon solar cells, however, the system is not cost effective due to expensive materials and vacuum techniques. Commercial solar cells with screen-printed contacts formed by using Ag paste suffer from a low fill factor and a high shading loss because of high contact resistance and low aspect ratio. Low-cost Ni and Cu metal contacts have been formed by using electro less plating and electroplating techniques to replace the Ti/Pd/Ag and screen-printed Ag contacts. Ni/Cu alloy is plated on a silicon substrate by electro-deposition of the alloy from an acetate electrolyte solution, and nickel-silicide formation at the interface between the silicon and the nickel enhances stability and reduces the contact resistance. It was, therefore, found that nickel-silicide was suitable for high-efficiency solar cell applications. Cu was electroplated on the Ni layer by using a light induced plating method. The Cu electroplating solution was made up of a commercially available acid sulfate bath and additives to reduce the stress of the copper layer. In this paper, we investigated low-cost Ni/Cu contact formation by electro less and electroplating for crystalline silicon solar cells.

• JSTS:Journal of Semiconductor Technology and Science
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• 제2권2호
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• pp.102-110
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• 2002

In this paper, we present the fabrication of tunable capacitors and 3-dimensional inductors. This work was related to fabricated 3-dimensional device for need of micro device in developing new intelligence age. This device was fabricated by electroplating used electroplating PR and high-vacuum evaporation of metal. Fabricated micro-inductor is consisted of air-bridge on electroplating rod and electroplated core. Micro-capacitor is consisted of thin metal membrane and electroplated core. Electroplating material is used Cu metal solvent. Air-gap between metal-layers function as almost perfect isolation layer. The most advantage of our micro-inductor and micro-capacitor compared to present device is a possibility that can fabricate on RF MEMS(microelectro-mechanical systems) application with high performance and various function. In this paper, we present the fabrication of tunable capacitors and 3-dimensional inductors. This work was related to fabricated 3-dimensional device for need of micro-device in developing new intelligence age. This device was fabricated by electroplating used electroplating PR and high-vacuum evaporation of metal. Fabricated micro-inductor is consisted of air-bridge on electroplating rod and electroplated core. Micro-capacitor is consisted of thin metal membrane and electroplated core. Electroplating material is used Cu metal solvent. Air-gap between metal-layers function as almost perfect isolation layer. The most advantage of our micro-inductor and micro-capacitor compared to present device is a possibility that can fabricate on RF MEMS application with high performance and various functions.

• 마이크로전자및패키징학회지
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• 제13권4호
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• pp.57-63
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• 2006

칩 스택 패키지의 삼차원 interconnection에 적용을 위해 폭 $75{\sim}10\;{\mu}m$, 길이 3mm의 트랜치 비아에 대해 전기도금전류밀도 및 전류모드에 따른 Cu filling 특성을 분석하였다. 직류모드로 $1.25mA/cm^{2}$에서 Cu filling한 경우, 트랜치 비아의 폭이 $75{\sim}35{\mu}m$ 범위에서는 95% 이상의 높은 Cu filling ratio를 나타내었다. 직류 전류밀도 $2.5mA/cm^{2}$에서 Cu filling한 경우에는 $1.25mA/cm^{2}$ 조건에 비해 열등한 Cu filling ratio를 나타내었으며, 직류모드에 비해 펄스모드가 우수한 Cu filling 특성을 나타내었다.

• 마이크로전자및패키징학회지
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• 제18권4호
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• pp.49-53
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• 2011

TSV(through-silicon-via)를 이용한 3차원 Si 칩 패키징 공정 중 전기 도금을 이용한 비아 홀 내 Cu 고속 충전과 범핑 공정 단순화에 관하여 연구하였다. DRIE(deep reactive ion etching)법을 이용하여 TSV를 제조하였으며, 비아홀 내벽에 $SiO_2$, Ti 및 Au 기능 박막층을 형성하였다. 전도성 금속 충전에서는 비아 홀 내 Cu 충전율을 향상시키기 위하여 PPR(periodic-pulse-reverse) 전류 파형을 인가하였으며, 범프 형성 공정에서는 리소그라피(lithography) 공정을 사용하지 않는 non-PR 범핑법으로 Sn-3.5Ag 범프를 형성하였다. 전기 도금 후, 충전된 비아의 단면 및 범프의 외형을 FESEM(field emission scanning electron microscopy)으로 관찰하였다. 그 결과, Cu 충전에서는 -9.66 $mA/cm^2$의 전류밀도에서 60분간의 도금으로 비아 입구의 도금층 과성장에 의한 결함이 발생하였고, -7.71 $mA/cm^2$에서는 비아의 중간 부분에서의 도금층 과성장에 의한 결함이 발생하였다. 또한 결함이 생성된 Cu 충전물 위에 전기 도금을 이용하여 범프를 형성한 결과, 범프의 모양이 불규칙하고, 균일도가 감소함을 나타내었다.

• 한국재료학회지
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• 제13권2호
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• pp.133-136
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• 2003

Sn-2.5Cu alloy layers were deposited on the Alloy 42 lead-frame substrates by the electroplating method, and their microstructures, adhesion strength, and electrical resistivity were measured to evaluate the applicability of Sn-Cu alloy as a surface finishing material of electronic parts. The Sn-2.5Cu layers were electroplated in the granular form, and composed of pure Sn and Cu$_{6}$Sn$_{5}$ intermetallic compound. Surfaces of the electroplated Sn-2.5Cu layers were rather rough and also the thickness variance was large. The adhesion strength of the Sn-2.5Cu electroplated layers was highly comparable to that of the electroplated Cu alloy layer and the electrical conductivity was about 10 times higher than the pure Sn. After the 20$0^{\circ}C$ 30 min. annealing of the electroplated Sn-2.5Cu layers, the surface roughness was reduced, and adhesion strength and conductivity were improved. These results showed the Sn-Cu alloys can be used as an excellent surface finishing material.ial.