• Title/Summary/Keyword: Convergence sub-layer

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A TiO2-Coated Reflective Layer Enhances the Sensitivity of a CsI:Tl Scintillator for X-ray Imaging Sensors

  • Kim, Youngju;Kim, Byoungwook;Kwon, Youngman;Kim, Jongyul;Kim, MyungSoo;Cho, Gyuseong;Jun, Hong Young;Thap, Tharoeun;Lee, Jinseok;Yoon, Kwon-Ha
    • Journal of the Optical Society of Korea
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    • v.18 no.3
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    • pp.256-260
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    • 2014
  • Columnar-structured cesium iodide (CsI) scintillators doped with thallium (Tl) are frequently used as x-ray converters in medical and industrial imaging. In this study we investigated the imaging characteristics of CsI:Tl films with various reflective layers-aluminum (Al), chromium (Cr), and titanium dioxide ($TiO_2$) powder-coated on glass substrates. We used two effusion-cell sources in a thermal evaporator system to fabricate CsI:Tl films on substrates. The scintillators were observed via scanning electron microscopy (SEM), and scintillation characteristics were evaluated on the basis of the emission spectrum, light output, light response to x-ray dose, modulation transfer function (MTF), and x-ray images. Compared to control films without a reflective layer, CsI:Tl films with reflective layers showed better sensitivity and light collection efficiency, and the film with a $TiO_2$ reflective layer showed the best properties.

Study on Optical Characteristics of Nano Hollow Silica with TiO2 Shell Formation

  • Roh, Gi-Yeon;Sung, Hyeong-Seok;Lee, Yeong-Cheol;Lee, Seong-Eui
    • Journal of the Korean Ceramic Society
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    • v.56 no.1
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    • pp.98-103
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    • 2019
  • Optical filters to control light wavelength of displays or cameras are fabricated by multi-layer stacking process of low and high index thin films. The process of multi-layer stacking of thin films has received much attention as an optimal process for effective manufacturing in the optical filter industry. However, multi-layer processing has disadvantages of complicated thin film process, and difficulty of precise control of film morphology and material selection, all of which are critical for transmittance and coloring effect on filters. In this study, the composite $TiO_2$, which can be used to control of UV absorption, coated on nano hollow silica sol, was synthesized as a coating material for optical filters. Furthermore, systematic analysis of the process parameters during the chemical reaction, and of the structural properties of the coating solutions was performed using SEM, TEM, XRD and photo spectrometry. From the structural analysis, we found that the 85 nm nano hollow silica with 2.5 nm $TiO_2$ shell formation was successfully synthesized at proper pH control and titanium butoxide content. Photo luminescence characteristics, excited by UV irradiation, show that stable absorption of 350 nm-light, correlated with a 3.54 eV band gap, existed for the $TiO_2$ shell-nano hollow silica reacted with 8.8 mole titanium butoxide solution. Transmittance observed on substrate of the $TiO_2$ shell-nano hollow silica showed effective absorption of 200-300 nm UV light without deterioration of visible light transparency.

Atomic Layer Deposition of HfO2 Films on Ge

  • Cho, Young Joon;Chang, Hyo Sik
    • Applied Science and Convergence Technology
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    • v.23 no.1
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    • pp.40-43
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    • 2014
  • We investigated the growth characteristics and interfacial properties of $HfO_2$ films deposited on Ge substrate through atomic layer deposited (ALD) by using an in-situ medium energy ion scattering analysis. The growth kinetics of $HfO_2$ grown on a $GeO_2/Ge$ substrate through ALD is similar to that grown on an $SiO_2/Si$ substrate. However, the incubation period of $HfO_2$ deposition on Ge is shorter than that on Si. The $HfO_2$ grown on the GeO/Ge substrate shows a significant diffusion of Hf atoms into the substrate interface and GeO volatilization after annealing at $700^{\circ}C$. The presence of low-quality Ge oxide or suboxide may degrade the electrical performance of device.

Evaluation of the Characteristics of High-Flux Reverse Osmosis Membranes with Various Additives (다양한 첨가제에 따른 고투과성 역삼투막의 특성평가)

  • Hyun Woong Kwon;Kwang Seop Im;Gede Herry Arum Wijaya;Seong Min Han;Seong Heon Kim;Jun Ho Park;Dong Jun Lee;Sang Min Eom;Sang Yong Nam
    • Membrane Journal
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    • v.33 no.6
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    • pp.427-438
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    • 2023
  • In this study, in order to improve the performance of the reverse osmosis membrane with high water flux and high salt rejection, a study was conducted on the evaluation of characteristics according to the curing temperature and time during various additives and interfacial polymerization. The morphology of the membrane with no additives and the membrane with additives both showed a "rigid-and-valley" structure, confirming that the polyamide layer was successfully polymerized on the surface of the porous support layer. In addition, the additive of 2-Ethyl-1,3-hexanediol (EHD) had improved hydrophilicity and water flux, which was confirmed by measuring the contact angle. Finally, a highly permeable TFC membrane with NaCl and MgSO4 salt rejection of 97.78% and 98.7% and a high water flux of 3.31 L/(m2⋅h⋅bar) was prepared.

Selective Adaptation of Speaker Characteristics within a Subcluster Neural Network

  • Haskey, S.J.;Datta, S.
    • Proceedings of the KSPS conference
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    • 1996.10a
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    • pp.464-467
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    • 1996
  • This paper aims to exploit inter/intra-speaker phoneme sub-class variations as criteria for adaptation in a phoneme recognition system based on a novel neural network architecture. Using a subcluster neural network design based on the One-Class-in-One-Network (OCON) feed forward subnets, similar to those proposed by Kung (2) and Jou (1), joined by a common front-end layer. the idea is to adapt only the neurons within the common front-end layer of the network. Consequently resulting in an adaptation which can be concentrated primarily on the speakers vocal characteristics. Since the adaptation occurs in an area common to all classes, convergence on a single class will improve the recognition of the remaining classes in the network. Results show that adaptation towards a phoneme, in the vowel sub-class, for speakers MDABO and MWBTO Improve the recognition of remaining vowel sub-class phonemes from the same speaker

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Characterization of Alpha-Ga2O3 Epilayers Grown on Ni-Pd and Carbon-Nanotube Based Nanoalloys via Halide Vapor Phase Epitaxy (Ni-Pd-CNT Nanoalloys에서 성장한 α-Ga2O3의 특성분석)

  • Cha, An-Na;Lee, Gieop;Kim, Hyunggu;Seong, Chaewon;Bae, Hyojung;Rho, Hokyun;Burungale, Vishal Vilas;Ha, Jun-Seok
    • Journal of the Microelectronics and Packaging Society
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    • v.28 no.4
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    • pp.25-29
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    • 2021
  • This paper demonstrates the utility of the Ni-Pd and carbon-nanotube (Ni-Pd-CNT)-based nanoalloy to improve the α-Ga2O3 crystal quality using the halide-vapor-phase epitaxy (HVPE) method. As result, the overall thickness of the α-Ga2O3 epitaxial layer increased from a Ni electroless plating time of 40 s to 11 ㎛ after growth. In addition, the surface morphologies of the α-Ga2O3 epilayers remained flat and crack-free. The full-width half-maximum results of the X-ray diffraction analysis revealed that the ($10{\bar{1}}4$) diffraction patterns decreased with increasing nominal thickness.

Formation of Al0.3Ga0.7As/GaAs Multiple Quantum Wells on Silicon Substrate with AlAsxSb1-x Step-graded Buffer (AlAsxSb1-x 단계 성분 변화 완충층을 이용한 Si (100) 기판 상 Al0.3Ga0.7As/GaAs 다중 양자 우물 형성)

  • Lee, Eun Hye;Song, Jin Dong;Yoen, Kyu Hyoek;Bae, Min Hwan;Oh, Hyun Ji;Han, Il Ki;Choi, Won Jun;Chang, Soo Kyung
    • Journal of the Korean Vacuum Society
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    • v.22 no.6
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    • pp.313-320
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    • 2013
  • The $AlAs_xSb_{1-x}$ step-graded buffer (SGB) layer was grown on the Silicon (Si) substrate to overcome lattice mismatch between Si substrate and $Al_{0.3}Ga_{0.7}As$/GaAs multiple quantum wells (MQWs). The value of root-mean-square (RMS) surface roughness for 5 nm-thick GaAs grown on $AlAs_xSb_{1-x}$ step-graded buffer layer was ~1.7 nm. $Al_{0.3}Ga_{0.7}As$/GaAs MQWs with AlAs/GaAs short period superlattice (SPS) were formed on the $AlAs_xSb_{1-x}$/Si substrate. Photoluminescence (PL) peak at 10 K for the $Al_{0.3}Ga_{0.7}As$/GaAs MQW structure showed relatively low intensity at ~813 nm. The RMS surface roughness of the $Al_{0.3}Ga_{0.7}As$/GaAs MQW structure was ~42.9 nm. The crystal defects were observed on the cross-sectional transmission electron microscope (TEM) images of the $Al_{0.3}Ga_{0.7}As$/GaAs MQW structure. The decrease of PL intensity and increase of RMS surface roughness would be due to the formation of the crystal defects.

Effect of Atomic Layer Deposited Al2O3 Thin Films on the Mechanical Properties of Anti-reflective Moth Eye Nanostructured Films (원자층 증착법에 의한 Al2O3 박막 형성에 따른 모스아이 구조 반사방지 필름의 기계적 물성에 미치는 영향)

  • Yun, Eun Young;Lee, Woo-Jae;Jang, Kyung Su;Choi, Hyun-Jin;Choi, Woo-Chang;Kwon, Se Hun
    • Journal of the Korean institute of surface engineering
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    • v.48 no.2
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    • pp.50-55
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    • 2015
  • $Al_2O_3$ thin films were deposited on the moth eye anti-reflective nanostructured polycarbonate films by atomic layer deposition (ALD) techniques. Without ALD-$Al_2O_3$ thin films, moth eye anti-reflective nanostructured films had a high optical transmittance of 95.47% at a wavelength of 550 nm and a very poor hardness of 0.1381 GPa. With increasing the thickness of $Al_2O_3$ thin films from 5 to 25 nm, the transmittance of moth eye anti-reflective nanostructured films was gradually decreased from 94.94 to 93.12%. On the other hand, the hardness of the films was greatly increased from 0.3498 to 0.7806 GPa with increasing the thickness of $Al_2O_3$ thin films. This result shows that ALD thin films can be applied to improve mechanical properties with an adequate optical transmittance of the conventional moth eye anti-reflection nanostructure films.

A Study on the Application of Thin Film Passivation and Crystalline Silicon Solar Cells Using PECVD Process (PECVD 공정을 이용한 후면 패시베이션 및 결정질 실리콘 태양전지 적용에 관한 연구)

  • Kim, Kwan-Do
    • Journal of the Semiconductor & Display Technology
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    • v.19 no.2
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    • pp.68-71
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    • 2020
  • In this study, SiNx and Al2O3 thin film was manufactured using PECVD deposition process and applied to crystalline silicon solar cells, resulting in 16.7% conversion efficiency. The structural improvement experiment of the rear electrode resulted in a 1.7% improvement in conversion efficiency compared to the reference cell by reducing the recombination rate of minority carriers and increasing the carrier lifetime by forming a passivation layer consisting of SiNx and Al2O3 thin films through the PECVD process.

The Effect of Anodizing on the Electrical Properties of ZrO2 Coated Al Foil for High Voltage Capacitor

  • Chen, Fei;Park, Sang-Shik
    • Applied Science and Convergence Technology
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    • v.24 no.2
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    • pp.33-40
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    • 2015
  • $ZrO_2$ and Al-Zr composite oxide film was prepared by vacuum assisted sol-gel dip coating method and anodizing. $ZrO_2$ films annealed above $400^{\circ}C$ have tetragonal structure. $ZrO_2$ layers inside etch pits were successfully coated from the $ZrO_2$ sol. The double layer structures of samples were obtained after being anodized at 100 V to 600 V. From the TEM images, it was found that the outer layer was $Al_2O_3$, the inner layer was multi-layer of $ZrO_2$, Al-Zr composite oxide and Al hydrate. The capacitance of $ZrO_2$ coated foil exhibited about 28.3% higher than that of non-coating foil after being anodized at 100 V. The high capacitance of $ZrO_2$ coated foils anodized at 100 V can be attributed to the relatively high percentage of inner layer in total thickness. The electrical properties, such as withstanding voltage and leakage current of coated and non-coated Al foils showed similar values. From the results, $ZrO_2$ and Al-Zr composite oxide is promising to be used as the partial dielectric of high voltage capacitor to increase the capacitance.