• The Journal of Korea Institute of Information, Electronics, and Communication Technology
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• v.13 no.1
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• pp.64-71
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• 2020

eFuse OTP memory IP is required to trim the analog circuit of the gate driving chip of the power semiconductor device. Conventional NMOS diode-type eFuse OTP memory cells have a small cell size, but require one more deep N-well (DNW) mask. In this paper, we propose a small PMOS-diode type eFuse OTP memory cell without the need for additional processing in the CMOS process. The proposed PMOS-diode type eFuse OTP memory cell is composed of a PMOS transistor formed in the N-WELL and an eFuse link, which is a memory element and uses a pn junction diode parasitic in the PMOS transistor. A core driving circuit for driving the array of PMOS diode-type eFuse memory cells is proposed, and the SPICE simulation results show that the proposed core circuit can be used to sense post-program resistance of 61㏀. The layout sizes of PMOS-diode type eFuse OTP memory cell and 512b eFuse OTP memory IP designed using 0.13㎛ BCD process are 3.475㎛ × 4.21㎛ (= 14.62975㎛2) and 119.315㎛ × 341.95㎛ (= 0.0408mm2), respectively. After testing at the wafer level, it was confirmed that it was normally programmed.

• ETRI Journal
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• v.26 no.6
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• pp.575-582
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• 2004

Fully-depleted silicon-on-insulator (FD-SOI) devices with a 15 nm SOI layer thickness and 60 nm gate lengths for analog applications have been investigated. The Si selective epitaxial growth (SEG) process was well optimized. Both the single- raised (SR) and double-raised (DR) source/drain (S/D) processes have been studied to reduce parasitic series resistance and improve device performance. For the DR S/D process, the saturation currents of both NMOS and PMOS are improved by 8 and 18%, respectively, compared with the SR S/D process. The self-heating effect is evaluated for both body contact and body floating SOI devices. The body contact transistor shows a reduced self-heating ratio, compared with the body floating transistor. The static noise margin of an SOI device with a $1.1\;{\mu}m^2$ 6T-SRAM cell is 190 mV, and the ring oscillator speed is improved by 25 % compared with bulk devices. The DR S/D process shows a higher open loop voltage gain than the SR S/D process. A 15 nm ultra-thin body (UTB) SOI device with a DR S/D process shows the same level of noise characteristics at both the body contact and body floating transistors. Also, we observed that noise characteristics of a 15 nm UTB SOI device are comparable to those of bulk Si devices.

• Journal of the Institute of Electronics and Information Engineers
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• v.54 no.1
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• pp.26-32
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• 2017

This paper presents a low power and high resolution incremental delta-sigma ADC that utilizes a passive integrator instead of an opamp-based active integrator. Opamp is a power-hungry block that involves tight design tradeoffs. To avoid the use of active integrator, the s-domain characteristic of an active integrator is first analyzed. Based on the analysis, an active integrator with low gain design is proposed as an alternative design method. To save power even more aggressively, a passive integrator with no static current is proposed. A 1st order single-bit incremental delta-sigma ADC using the proposed passive integrator is implemented in a 65nm CMOS process. Transistor-level simulation shows that the ADC consumes only 0.6uW under 1.2V supply while achieving SNDR of 71dB with 22kHz bandwidth. The estimated total power consumption including digital filter is 6.25uW, and resulting power efficiency is on a par with state-of-the-art A/D converters.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.129-129
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• 2011

ISFET (ion sensitive field effect transistor)는 용액 중의 각종 이온 농도를 측정하는 반도체 이온 센서이다. ISFET는 작은 소자 크기, 견고한 구조, 즉각적인 반응속도, 기존의 CMOS공정과 호환이 가능하다는 장점이 있다. ISFET의 기본 구조는 기존의 MOSFET (metal oxide semiconductor field effect transistor)에서 고안되었으며, ISFET는 기존의 MOSFET의 게이트 전극 부분이 기준전극과 전해질로 대체되어진 구조를 가지고 있다. ISFET소자의 pH 감지 메커니즘은 감지막의 표면에서 pH용액 속의 이온들이 감지막의 표면에서 속박되어 막의 표면전위의 변화를 유발하는 것을 이용한다. 그 결과, ISFET의 문턱전압의 변화를 일으키게 되고 드레인 전류의 양 또한 달라지게 된다. ISFET의 높은 pH감지능력을 얻기 위하여 높은 high-k물질 들이 감지막으로서 연구되었다. Al2O3와 HfO2는 높은 유전상수, non-ideal 효과에 대한 immunity 그리고 높은 pH 감지능력 등 많은 장점을 가지고 있는 물질로 알려졌다. 본 연구에서는, SiO2/HfO2/Al2O3 (OHA) 적층막을 이용한 EIS (electrolyte- insulator-silicon) pH센서를 제작하였다. EIS구조는 ISFET로의 적용이 용이하며 ISFET보다 제작 방법과 소자 구조가 간단하다는 장점이 있다. HfO2은 22~25의 높은 유전상수를 가지며 높은 pH 감지능력으로 인하여 감지막으로서 많은 연구가 이루어지고 있는 물질이다. 하지만 HfO2의 물질이 가진 고유의 특성상 화학적 용액에 대한 non-ideal 효과는 다른 금속계열 산화막에 비하여 취약한 모습을 보인다. 반면에 Al2O3의 유전상수는 HfO2보다 작지만 화학용액으로 인한 손상에 대하여 강한 immunity가 있는 재료이다. 이러한 물질들의 성질을 고려하여 OHA의 새로운 감지막의 적층구조를 생각하였다. 먼저 Si과 high-k물질의 양호한 계면상태를 이루기 위하여 5 nm의 얇은 SiO2막을 완충막으로서 성장시켰다. 다음으로 높은 유전상수를 가지고 있는 8 nm의 HfO2을 증착시킴으로서 소자의 물리적 손상에 대한 안정성을 향상시켰다. 최종적으로 화학용액과 직접적인 접촉이 되는 부분은 non-ideal 효과에 강한 Al2O3을 적층하여 소자의 화학적 손상에 문제점을 개선시켰다. 결론적으로 감지막의 적층 모델링을 통하여 각각의 high-k 물질이 가진 고유의 특성에 대한 한계점을 극복함으로써 높은 pH 감지능력뿐만 아니라 신뢰성 있는 pH 센서가 제작 되었다.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.284-284
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• 2011

Ion sensitive field effect transistor (ISFET)는 용액 중의 각종 이온 농도를 측정하는 반도체 이온 센서이다. ISFET는 작은 소자 크기, 견고한 구조, 즉각적인 반응속도, 기존의 CMOS공정과 호환이 가능하다는 장점이 있다. ISFET의 기본 구조는 기존의 metal oxide semiconductor field effect transistor (MOSFET)에서 고안되었으며, ISFET는 기존의 MOSFET의 게이트 전극 부분이 기준전극과 전해질로 대체되어진 구조를 가지고 있다. ISFET소자의 pH 감지 메커니즘은 감지막의 표면에서 pH용액의 수소이온이 막의 표면에 속박되어 표면전위의 변화를 유발하는 것에 기인한다. 그 결과, 수소이온의 농도에 따라 ISFET의 문턱전압의 변화를 일으키게 되고 드레인 전류의 양 또한 달라지게 된다. 한편, ISFET의 좋은 pH감지특성과 높은 출력특성을 얻기 위하여 high-k물질들이 감지막으로써 지속적으로 연구되어져 왔다. 그 중 Al2O3와 HfO2는 높은 유전상수와 좋은 pH 감지능력으로 인하여 많은 연구가 이루어져온 물질이다. 하지만 HfO2는 높은 유전상수를 갖음에도 불구하고 화학용액에 대한 non-ideal 효과에 취약하다는 보고가 있다. 반면에 Al2O3의 유전상수는 HfO2보다 작지만 화학용액으로 인한 손상에 대하여 강한 immunity가 있는 재료이다. 본 연구에서는, 이러한 각각의 high-k 물질들의 단점을 보안하기 위하여 SiO2/HfO2/Al2O3(OHA) 적층막을 이용한 ISFET pH 센서를 제작하였으며 SOI 기판에서 구현되었다. SOI기판에서 OHA 적층막을 이용한 ISFET 제작이 이루어짐에 따라서 소자의 signal to noise 비율을 증대 시킬것으로 기대된다. 실제로 SOI-ISFET와 같이 제작된 SOI-MOSFET는 1.8${\times}$1010의 높은 on/off 전류 비율을을 보였으며 65 mV/dec의 subthreshold swing 값을 갖음으로써, 우수한 전기적 특성을 보이는 ISFET가 제작이 되었음을 확인 하였다. OHA 감지 적층막의 각 층은 양호한 계면상태, 높은 출력특성, 화학용액에 대한non-ideal 효과에 강한 immunity을 위하여 적층되었다. 결론적으로 SOI과 OHA 적층감지막을 이용하여 우수한 pH 감지 특성을 보이는 pH 센서가 제작되었다.

• Journal of Sensor Science and Technology
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• v.18 no.1
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• pp.77-85
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• 2009

We propose a new image pixel architecture which has OFD(Over Flow Device) node by improving conventional 3TR pixel structure. Newly designed pixel consists of photo diode which is verified with HSPICE simulation, PMOS reset transistor, several NMOS and several PMOS transistors. Photodiode signals from each PMOS and NMOS are detected by Reset PMOS. These output signals give enough chances to detect wide operation coverage because OFD node has overflow photocurrent. According to various light intensity, we analyzed characteristic of the output voltage with a SPICE tool. Proposed pixel output has specific value which can detect possible from $0.1{\mu}W/cm^2$ to $10W/cm^2$ light intensity. It has wide-dynamic range of 160 dB.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.16 no.1
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• pp.627-633
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• 2015

We designed of a LDO regulator with a OVP and UVLO protection function for a PMIC. Proposed LDO regulator circuit consists of a BGR reference circuit, an error amplifier and a power transistor and so on. The proposed LDO regulator is designed for low voltage input power protection. Proposed LDO circuit generated fixed 2.5 V from a supply of 3.3V. It was designed with 3.3 V power supply using a $0.35{\mu}m$ CMOS technology. SPICE simulation results showed that the proposed circuit provides 0.713 mV/V line regulation with output 2.5 V ~ 3.9 V and $8.35{\mu}V/mA$ load regulation with load current 0 mA to 40 mA.

• The Journal of the Korea Contents Association
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• v.7 no.2
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• pp.92-99
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• 2007

This paper presented a low power design of a 32bit block cypher processor reduced from the original 128bit architecture. The primary purpose of this research is to evaluate physical implementation results rather than theoretical aspects. The data path and diffusion function of the processor were reduced to accommodate the smaller hardware size. As a running example demonstrating the design approach, we employed a modified ARIA algorithm having four S-boxes. The proposed 32bit ARIA processor comprises 13,893 gates which is 68.25% smaller than the original 128bit structure. The design was synthesized and verified based on the standard cell library of the MagnaChip's 0.35um CMOS Process. A transistor level power simulation shows that the power consumption of the proposed processor reduced to 61.4mW, which is 9.7% of the original 128bit design. The low power design of the block cypher Processor would be essential for improving security of battery-less wireless sensor networks or RFID.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.16 no.11
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• pp.2480-2486
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• 2012

The design of low voltage LC-VCO(LC Voltage Controlled Oscillator) has been presented to optimize the phase noise and power consumption for the block of frequency synthesis to satisfy WCDMA system specification in this paper. The parameters for minimum phase noise has been obtained in the region of design, using the lines of the tuning range and the excess gain in the plane of the inductance and the transconductance of MOS transistor to compensate the loss of LC-tank. As a result of simulation, the phase noise characteristics is -113dBc/Hz for offset of 1MHz. The optimum designed LC-VCO has been fabricated using the process of 0.25um CMOS. As a result of measurement for fabricated chip, the phase noise characteristics is -116dBc/Hz for offset of 1MHz. The power consumption is 15mW, and Kvco is 370MHz/V.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.47 no.12
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• pp.31-38
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• 2010

This paper presents the design of a graphic memory for QVGA-scale LCD Driver IC (LDI). The graphic memory is designed based on the pseudo-SHAM for the purpose of small area, and the memory cell structure is designed using a bit line partitioning method to improve sensing characteristics and drivabilties in the line-read operation. Also, a collision protection circuit using C-gate is designed to control collisions between read/write operations and self-refresh/line-read operations effectively. The graphic memory circuit has been designed in transistor level using $0.18{\mu}m$ CMOS technology library and the operations of the graphic memory have been verified using Hspice. The results show that the bit-bitb line voltage difference, ${\Delta}V$ increases by 40%, the charge sharing time between bit and bitb voltages $T_{CHGSH}$ decreases by 30%, and the current during line-read decreases by 40%.