• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.890-893
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• 2004

The ultra precision machining in industrial field are increased day by day. The diamond turning has been used generally, but now is faced with limitation of use, because of higher requirement of production field. The electron beam lithography is alternative in machining area as semiconductor production. For EB lithography, 5 axis vacuum stage is required to duplicate small and large patterns on wafer. The stage is composed of 2 rotational axis and 3 translational axis with 5 DC servo motors. The positioning repeatability and resolution of Z axis feed unit are 3.21$\mu$m and 0.5 $\mu$m/step enough to apply to lithography.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.05a
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• pp.659-660
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• 2012

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2013.05a
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• pp.775-776
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• 2013

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2011.06a
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• pp.435-436
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• 2011

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2011.06a
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• pp.575-576
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• 2011

• Journal of Sericultural and Entomological Science
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• v.16 no.2
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• pp.119-125
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• 1974

When the nomal silkworms reached active time of 3rd instar stage both non-moulting larva and normal silkworms from the same rearing tray were collected and fixed. The silkworms in 4th instar stage whose growth was as dwarfish as those in 1st and 2nd instar stages were also collected and fix with the normal silkworms. Non-moulting larva and normal silkworms were morphologically compared and the examined results from the tissue inspection are summarized as follows： 1. In spite of the fact that the normal silkworms reached the active eating time of 3rd instar stage non-moulting silkworms were dwarfish as if they had been reared for two days. Non-moulting silkworms which were observed at the time of 4th instar stage showed no much difference in their growth. 2. There was the tendency that the exuvial gland as was shown in Fig. 1 and 2 was flat cyslidium of ellipse and its size at thorax was small shile the gland at abdomen was big. 3. The exuvial gland at thorax has been reported to be bigger at thoracic base than at dorsal vessel but according to the present it was examined to be irregular. 4. The size of exuvial gland of silkworms in the active eating stage of 3rd instar was from 151.3${\mu}$ (major axis) to 94.5${\mu}$ (minor axis) at prothorax and from 568.6${\mu}$ (major axis) to 495.1${\mu}$ (minor axis) at 7th abdominal segment. The sire oe exuvial gland of non-moulting silkworm was 57.5${\mu}$ (major axis) to 51.3${\mu}$ (minor axis) at prothorax and from 91.5${\mu}$ (major axis) to 75.5${\mu}$ (minor axis) at 5th abdominal segment (see Fig. 1) 5. When the normal silkworms reached 4th instar active eating stage its exuvial gland was compared to that of dwarfish silkworm. The result was that the size of normal silkworm at prothorax was from 252.2${\mu}$ (major axis) to 131.6${\mu}$ (minor axis) and the size of exuvial gland at 7th abdominal segment was from 691.5${\mu}$ (major axis) to 493.4${\mu}$ (minor axis) while the sire of exuvial gland of non-moulting at prothorax was from 71.4${\mu}$ (major axis) to 61.5${\mu}$ (minor axis) and the size of the non-moulting silkworm's 8th abdominal segment was from 94.6${\mu}$ (major axis) to 71.5${\mu}$ (minor axis) (See Table 2) 6. There was a remarkable difference in the from of exuvial gland of non-moulting silkworm. The size of alveolar of the non-moulting silkworm was many times larger compared to that of normal silkworm 7. There was no great difference between secretory cells of normal and non-moulting silkworms but the granular type exuvial gland was small in sire compared to that of normal silkworm.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.16 no.5
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• pp.211-217
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• 2007

A nano-imprinting stage has been widely used in various fields of nanotechnology. In this study, an analysis method of a nano-imprinting stage machine using FEM and flexible multi-body kinematics and dynamics has been presented. We have developed a virtual imprinting machine to evaluate the prototype design in the early design stage. The simulation using CAE for the imprinting machine is not only to analyze static and dynamic characteristics of the machine but also to determine design parameters of the components for the imprinting machine, such as dimensions and specifications of actuators and sensors. Structural components as the upper plate, the rotator, the shaft and the translator have been modeled with finite elements to analyze flexibility effects during the precision stage motion. In this paper flexible multi-body dynamic simulation is executed to support robust design of the precision stage mechanism. In addition, we made the 4-axis stage model to compare the dynamic behavior with that of 3-axis stage model.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.9 s.186
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• pp.179-189
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• 2006

Recently the electrostatic 2-axis MEMS stages have been fabricated f3r the purpose of an application to PSD (Probe-based Storage Device). However, all of the components (platform, comb electrodes, springs, anchors, etc.) in those stages are placed in-plane so that they have low areal efficiencies such as a few percentage, which is undesirable as data storage devices. In this paper, we present a novel structure of an electrostatic 2-axis MEMS stage that is characterized by having a large areal efficiency of about 25%. For obtaining large area efficiency, the actuator part consisting of mainly comb electrodes and springs is placed right below the platform. The structure and operational principle of the MEMS stage are described, followed by a design and analysis, the fabrication and measurement results. Experimental results show that the driving ranges of the fabricated stage along the x and y axis were 27$\mu$m, 38$\mu$m at the supplied voltages of 65V, 70V, respectively and the natural frequencies along x and y axis were 180Hz, 310Hz, respectively. The total size of the stage is about 5.9$\times$6.8mm$^2$ and the platform size is about 2.7$\times$3.6mm$^2$.

• Journal of the Korean Society for Precision Engineering
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• v.22 no.11 s.176
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• pp.173-181
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• 2005

We report on the design and fabrication of an electrostatic 2-axis MEMS stage possessing a platform with a size of $5{times}5mm^2$. The stage, as a key component, would be used in developing probe-based storage devices in the future. It was fabricated by forming numerous $5{\times}5{\mu}m^2$ etching holes in the central platform, as a result, reducing the total number of masks to 1, thereby simplifying the whole fabrication process. Experimental results show that the driving range of the stage was $32{\mu}m$ at the supplied voltage of 20V and the natural frequency was approximately 300Hz. The mechanical coupling between x- and y-motion was also measured and verified to be $25\%$.

• Journal of the Korean Society for Precision Engineering
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• v.22 no.5 s.170
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• pp.103-112
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• 2005

This paper presents one-axis high precision scanning system and illustrates the design of modified $X-Y-{\theta}$ stage as a tracker using VCM and commercialized air bearings for it. The scanning system for 100nm resolution is composed of the 3-axis stage and one axis long stroke linear motor stage as a follower. In this study a previous proposed and presented structure of VCM for the fine stage is modified. The tracker has 3 DOF($X-Y-{\theta}$ motions by four VCM actuators which are located on the same plane. So 4 actuating forces are suggested and designed to create least pitch and roll motions. This article will show about the design especially about optimal design. The design focus of this fine stage is to have high acceleration to accomplish high throughput. The optimal design of maximizing acceleration is performed in restrained size. The most sensitive constraint of this optimal design is heat dissipation of coil. There are 5 design variables. Because the relationship between design variables and system parameters are quite complicated, it is very difficult to set design variables manually. Due to it, computer based optimal design procedure using MATLAB is used. Then, this paper also describes the procedures of selecting design variables for the optimal design and a mathematical formulation of the optimization problem. Based on the solution of the optimization problem, the final design of the stage is also presented. The results can be verified by MAXWELL. The designed stage has the acceleration of about 5 $m/s^{2}$ with 40kg total mass including wafer chuck and interferometer mirror. And the temperature of coil is increased $50^{\circ}C$. In addition, the tracker is controlled by high precision controller system with HP interferometer for it and linear scaler for the follower. At that time, the scanning system has high precision resolution about 5nm and scanning resolution about 40nm in 25mm/s constant speed