• Korean Journal of Optics and Photonics
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• v.31 no.1
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• pp.31-36
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• 2020

We propose a band-switchable terahertz metamaterial based on an etched vanadium dioxide (VO₂) thin film. A line of etched VO₂ thin film was placed in the center gap of the split square-loop shape for the tunability of the metamaterial. The resonance frequency of the metamaterial can be switched from the 1.4 THz band to the 0.7 THz band, according to the insulator-metal phase transition in the VO₂ thin film. The absolute difference in the transmittance of the metamaterial was 78.5% and 65.8% at 0.7 THz and 1.4 THz respectively, according to the band switching. The differential phase shift was around 90°, and the transmittance was stably maintained between 40% and 60% in the middle band of the two switchable resonance-frequency bands.

• Korean Journal of Optics and Photonics
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• v.17 no.1
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• pp.104-109
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• 2006

Cu-doped $TiO_2$ thin films were prepared by RF magnetron co-sputtering, and their structural, optical and photodegradation. properties were examined as a function of calcination temperature. XRD results showed that the crystallite size of Cu/$TiO_2$ thin films was bigger than that of the pure $TiO_2$ thin films. SEM results revealed that the agglomerated particle size of the Cu/$TiO_2$ films was more uniform and smaller than that of pure $TiO_2$ films. The absorption edge of thin films calcined at $900^{\circ}C$ was red shifted, resulting from the phase transformation from anatase to rutile phase, and the transmittance of the thin film rapidly decreased due to an increase in particle size. The photodegradation properties of the Cu/$TiO_2$ thin films were superior to those of the pure $TiO_2$ thin films.

• Journal of the Korean Society for Precision Engineering
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• v.33 no.5
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• pp.409-417
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• 2016

It is well known that Morpho butterflies show distinctive, brilliant and iridescent colors and have micro-nano scale structures, instead of dyes and pigments, on their wings. This structural coloration is regarded as a novel technique to express color with a long lifetime, ease and precise tenability. Here, we studied optical multilayer thin films with thickness of several tens of nm ($TiO_2$ and $SiO_2$) and lens-shape micro-patterns. Fabrication and characterization of the multilayer stacking structure and the micro-pattern structure were performed and the films were analyzed via several optical measuring techniques. Finally, we discussed how the micro-pattern structure could enhance independence with color changes according to the viewing angle.

• Korean Journal of Optics and Photonics
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• v.7 no.4
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• pp.357-362
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• 1996

The thickness and the spectrum of the complex refractive index in the region 1.5~4.5 eV, of an MNA/PMMA thin film fabricated by spin casting are determined. The film thickness and the refractive index in its transparent region is calculated by modeling the spectroscopic ellipsometry data. The extinction coefficient spectrum is obtained from the absorption spectrum in its non-transparent region. The best fit oscillator parameters of the classical Lorentz oscillator and a quantum mechanical oscillator are found. The complex refractive index spectrum by these oscillators are compared. The present technique can be applied to get the thickness and the complex refractive index of unknown polymer films and thus it will be useful in optical characterization of those films.

• Korean Journal of Optics and Photonics
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• v.22 no.4
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• pp.170-178
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• 2011

The spectroscopic ellipsometric constants are analyzed to determine the thickness and the complex refractive index of a film coated on a semi-transparent substrate, with the reflection from the backside of the substrate properly considered. Expressions representing the effect of the backside reflection on ellipsometric constants are derived using the thickness and the complex refractive index of the substrate. The thickness and the complex refractive of an ITO thin film coated on a glass substrate are obtained by using this method. The results agree quite well with the ones obtained by following the conventional modeling procedure where the backside reflection is neglected during ellipsometric measurement and analysis.

• Korean Journal of Optics and Photonics
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• v.11 no.4
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• pp.255-260
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• 2000

We report that the crack-free organic-inorganic hybrid silica thin films were fabricated by sol-gel process using organometallic compounds as a precursor and that we have established very reproducible fabrication condition with systematic investigation of thickness and refractive index variations for various control parameters, such as, coating type, coating speed, chemical composition, prebake and postbake temperature. Additionally, we measured and compared the change of optical property with the UV exposure dose for three different kinds of photoinitiators. Furthermore, the fabrication of Ix4 MMI optical power splitter using the sol-gel thin film provides the possibility of various applications to the optical waveguide devices. vices.

• Current Optics and Photonics
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• v.1 no.2
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• pp.101-106
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• 2017

Optical structures of a tapered ultra-thin light guide film (LGF) were optimized by optical simulation for increasing coupling efficiency between light sources and the LGF. A serration pattern on the entrance side surface could provide a comparable coupling efficiency to that of the conventional LGF where a linear, asymmetric prism array was formed on the taper surface. Several micro-patterns were applied to the top and/or bottom surface of the LGF for achieving better luminance property, and it was found that an optimized micro-pyramid pattern exhibited the highest average luminance together with satisfactory luminance uniformity.

• Advances in nano research
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• v.3 no.1
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• pp.1-11
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• 2015

Thin film ethanol sensors made from ${\alpha}-Fe_2O_3$ decorated with multiwall carbon nanotubes(MWCNTs) were manufactured by the electron beam deposition method. The morphology of the decorated ${\alpha}-Fe_2O_3$/MWCNTs (25:1 weight ratios) nanocomposite powder was investigated using the scanning electron microscopy and X-ray diffraction techniques. The thickness of thin films has been determined from ellipsometric measurements. The response of manufactured sensors was investigated at different temperatures of the sensor work body and concentration of gas vapors. Good response of prepared sensors to ethanol vapors already at work body temperature of $150^{\circ}C$ was shown.

• Korean Journal of Optics and Photonics
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• v.20 no.1
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• pp.34-40
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• 2009

In-situ pulse laser (Nd-YAG, 2nd harmonics 532 nm) annealing used in physical vapor deposition of $MgF_2$, $SiO_2$ and ZnS thin films was shown to be effective in improving their surface roughness properties. Total integrated scattering (TIS) measurements of $MgF_2$ and $SiO_2$ samples deposited on glass substrates revealed that the laser irradiation of films at an energy of approximately $140\;mJ/cm^2$ at 532 nm with a repetition frequency of 10 Hz and pulse duration of 5 ns during the deposition resulted in total scatterings that were minimum. But in case of the ZnS samples, measurements revealed minimum total scattering at a laser energy of approximately $62\;mJ/cm^2$. Atomic Force Microscopy (AFM) has been used to evaluate the effect of pulse laser annealing on the surface roughness for thin film samples. The results were similar to the TIS measurements, indicating that surface roughness was decreased when the irradiated annealing pulse laser energy increased. But it also increased when the irradiated annealing pulse laser energy was over some limit that depended on the materials.

• Korean Journal of Optics and Photonics
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• v.9 no.3
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• pp.162-167
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• 1998

$SiO_xF_y$ optical thin films of lower refractive indices than glass substrates were fabricated by the CF$_4$ ion beam assisted deposition method and the optical, structural and chemical properties of them were investigated. Refractive index of $SiO_xF_y$ films was varied from 1.455 to 1.394 by decreasing the anode voltage or from 1.462 to 1.430 by increasing the current density of end-Hall ion source. FT-IR and XPS analyses show that as the F concentration increases, the Si-O bond at $1080m^{-1}$ shifts to higher wavenumber, the OH bonds are reduced drastically, and the fluorine atoms at the air-film interface are desorbed out by reacting with $H_2O$ in the atmosphere. $SiO_xF_y$ thin films are amorphous by the XRD analysis and have the compressive stress below 0.3 GPa. As an application of $SiO_xF_y$ thin films a two-layer antireflection coating was fabricated using a $SiO_xF_y$ film as a low refractive index layer and a Si film as an absorbing one.