• Title/Summary/Keyword: step coverage

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Effects of UV ozone annealing on conduction mechanism in Ta2O5 thin films deposited by atomic layer deposition (Atomic layer deposition으로 증착된 Ta2O5 박막의 전도기구에 대한 UV ozone annealing 효과)

  • 엄다일;전인상;노상용;황철성;김형준
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.57-57
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    • 2003
  • High dielectric constant materials (high K) have attracted a great deal of interest because of the dramatic scaling down of DRAM capacitor reaching its physical limit in terms of reduction of thickness. Among high-K materials that can replace silicon dioxide, tantalum pentoxide (Ta2O5) thin film, with their high dielectric constant (∼25) and good step coverage, is the candidate of choice.

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TDEAT single source를 사용한 TiN막의 특성평가

  • 김재호;이재갑;박상준;신현국;황찬용
    • Journal of the Korean Vacuum Society
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    • v.4 no.S1
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    • pp.28-33
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    • 1995
  • TiN 박막은 저온(<$500^{\circ}C$), 저압(1Torr)에서 Tetrakis(diethylamido)titanium[TDEAT, Ti(NEt2)4]single precursor를 사용하여 증착하였다. 증차고딘 박막은 SEM(Scanning Electron Microscopy)으로 surface morphology와 step coverage를 측정하였고, TEM(Transmission Electron Microscopy)분석결과 microcrystalline의 TiN을 확인하였다. XPS(X-ray Photoelectron Spectroscopy)분석결과에 따르면 $200-500^{\circ}C$구간에서는 $\beta$-hydogen elimination에 의한 반응이 일어나고 $600-700^{\circ}C$구간에서는 thermal decomposition에 의한 반응이 일어나고 있음을 알 수 있다. Carbon과 oxygen의 농도는 AES(Auger Electron Spectroscopy)를 사용하여 측정하였으며 온도가 감소할수록 carbon의 농도가 감소하는 경향을 보여주고 있다.

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Characteristics of High Temperature Oxide Thin Film Using Dichlorosilane Gas (Dichlorosilane Gas를 이용한 High Temperature Oxide Thin Film의 특성)

  • 이승석;이석희;김종철;박헌섭;오계환
    • Journal of the Korean Vacuum Society
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    • v.1 no.1
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    • pp.190-197
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    • 1992
  • In this study we have investigated physical and electrical properties of high temperature oxide (HTO) thin film using dichlorosilane (DCS) gas. This film had low etch rate and excellent step coverage, and its characteristics of Si-O bond were similar to those of thermal oxide. I-V curves also showed similar electrical properties to those of thermally grown oxide (SiO2) while time dependent dielectric breakdown (TDDB) results revealed 1/4 value of thermal oxide. However, defect density was measured to be much lower value than that of thermal oxide.

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Initial state of GaN grown by plasma enhanced molecular beam epitaxy (PEMBE로 성장된 GaN 박막의 초기 거동 관찰)

  • Yi, Min-Su;Cho, Tae-Sik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.989-992
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    • 2004
  • PEMBE(plasma enhanced molecular beam epitaxy)방법으로 성장된 GaN 박막의 초기 거동현상을 실시간 X-선 산란을 이용하여 관찰하였다. 표면이 원자 계단(atomic step)을 이루고 있는 사파이어 기판 위에 성장하는 GaN 박막은 layer-by-layer 모드로 성장 후 3D 모드로 성장을 하였다. 거친 표면을 가진 사파이어 기판 위에 성장하는 GaN 박막은 성장 초기는 표면을 평평하게 만든 후, 3D 모드로 성장하였다. 플라즈마로 생성된 이온화된 질소는 표면의 에너지를 변화시켜 GaN 박막의 증착을 증진시키고, 표면의 coverage를 증가시킨다.

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Point and interval estimation for a simple step-stress model with Type-I censored data from geometric distribution

  • Arefi, Ahmad;Razmkhah, Mostafa
    • Communications for Statistical Applications and Methods
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    • v.24 no.1
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    • pp.29-41
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    • 2017
  • The estimation problem of expected time to failure of units is studied in a discrete set up. A simple step-stress accelerated life testing is considered with a Type-I censored sample from geometric distribution that is a commonly used distribution to model the lifetime of a device in discrete case. Maximum likelihood estimators as well as the associated distributions are derived. Exact, approximate and bootstrap approaches construct confidence intervals that are compared via a simulation study. Optimal confidence intervals are suggested in view of the expected width and coverage probability criteria. An illustrative example is also presented to explain the results of the paper. Finally, some conclusions are stated.

Surface Alloy Formation of Nb on Cu(100)

  • 이준희;윤홍식;양경득;여인환
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.170-170
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    • 1999
  • We studied Nb growth mode on Cu(100) surface by scanning tunneling microscopy (STM) at room temperature. Nb/Cu is immiscible at room temperature and thus is an ideal system for studying surface alloy formation. Initially deposited Nb atoms are incorporated subsurface on Cu(100). After annealing, they are preferentially found at step edges and appear as bright dots surrounded by dark rings. Ordering emerges from step edges as annealed. Ordered ({{{{ SQRT { 5} }$\times${{{{ SQRT { 5} }}}})R 26.6$^{\circ}$phase Nb structure is formed at $\theta$<0.2ML after annealing to 50$0^{\circ}C$. At higher coverage, $\theta$>0.25, annealing leads to p(2$\times$2) phase. due to large mismatch in lattice parameters, the domain is limited to a few tens of nm2. Growth kinetics of the system will be discussed.

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An Experimental Study on the Shift Characteristics of a Metal Belt Type Continuously Variable Transmission (CVT) (금속벨트식 무단변속기(CVT)의 변속특성에 관한 실험적 연구)

  • 이충섭
    • Transactions of the Korean Society of Automotive Engineers
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    • v.5 no.6
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    • pp.36-43
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    • 1997
  • To cope with quest to improve the fuel economy and vehicle performance, Continuously Variable Transmission with Changing the speed ratio between minimum and maximum ratio by infinite step, is more efficient than conventional multi-ratio transmission. In this paper, to investigate a specific CVT shift ratio diagram and CVT shift characteristics, CVT vehicle was tested on the proving ground and chassis dynamometer. The test results are as follows; CVT can obtain the excellent vehicle performance and fuel economy changing the shift ratio by infinite step, without rapid change of engine revolution and driving force. And CVT can set up a special shift range that obtains not only the engine brake effect but also the maximum speed driving.

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Electrical Characteristics of Trench Capacitor with Various Structures (여러가지 구조를 갖는 Trench Capacitor의 전기적 특성)

  • Lee, Jin Hee;Nam, Kee Soo;Kim, Mal Moon;Park, Sin Chong
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.24 no.1
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    • pp.85-90
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    • 1987
  • Trench capacitors with four different structures were fabricated using plasma and reactive ion etching technique, and evaluated using their C-V and I-V characteristics. The results shows that the two step plasma etching technique is the best method to fabricate the trench capacitor because of its high breakdown field (~7.75 MV/Cm) and good step coverage. And the fixed oxide charges are comparable between the trench (3.6xE10/Cm\ulcorner~7.5xE10/Cm\ulcorner and the planar(4.5xE10/Cm\ulcorner~6.5E10/Cm\ulcorner capacitors.

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Hydrogen Adsorption on the Stepped Planes of Tungsten : I. (210) Plane (Stepped 텅스텐 결정면의 수소 흡착에 관한 연구 : I.(210)면)

  • 최대선;한종훈;백선목;박노길;김기석;황정남
    • Journal of the Korean Vacuum Society
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    • v.4 no.2
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    • pp.142-149
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    • 1995
  • 본 연구에서는 새로운 장전자 방출법(DOFEC법)으로 W(210)면의 수소 흡착에 의한 일함수의 변화, heat of desorption에 대하여 연구하였다. 텅스텐(210)면에 수소가 흡착될 때 흡착율에 따라 일함수가 증가하다가 다시 감소하는데 이것은 수소가 처음에는(210)면의 step((100)면)에 흡착되고 dose를 증가시킴에 따라 terrace((110)면)에 흡착되기 때문임을 알았다. 즉, terrace보다 step의 sticking coefficient가 더 크며 zero coverage에서의 그 비는 2.57이며 이는 타 연구 결과와 잘 일치한다. (210)면의 step과 terrace의 수소 흡착에 대한 일함수의 정량적인 변화량 그리고 수소 dose량에 대한 각각의 면에 대한 상대적인 흡착율을 얻었으며, 이 결과는 독립된(110)면 또는 (100)면의 결과와 잘 일치됨을 알았다. 또한 이 결과는 흡착 실험에 있어서 dose량을 흡착률로 환산하는데 사용될 수 있다. 텅스텐(210)면에는 4개의 흡착 site가 존재하며 이 site들 중 $\beta$2과 $\beta$4 state는 second order 탈착 과정을 따르며 $\beta$1과 $\beta$3 state는 first order 탈착과정을 따른다. 따라서 텅스텐(210)면에는 수소가 해리적 흡착을 함과 동시에 비해리적 흡착도 함을 알았으며(210)면의 각 흡착 site를 이에 대응되는 (100)면과 (110)면의 흡착 site와 비교 검토하였다.

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