• Title/Summary/Keyword: semiconductor material

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2D transition-metal dichalcogenide (WSe2) doping methods for hydrochloric acid

  • Nam, Hyo-Jik;Park, Jin-Hong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.291.2-291.2
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    • 2016
  • 3D semiconductor material of silicon that is used throughout the semiconductor industry currently faces a physical limitation of the development of semiconductor process technology. The research into the next generation of nano-semiconductor materials such as semiconductor properties superior to replace silicon in order to overcome the physical limitations, such as the 2-dimensional graphene material in 2D transition-metal dichalcogenide (TMD) has been researched. In particular, 2D TMD doping without severely damage of crystal structure is required different conventional methods such as ion implantation in 3D semiconductor device. Here, we study a p-type doping technique on tungsten diselenide (WSe2) for p-channel 2D transistors by adjusting the concentration of hydrochloric acid through Raman spectroscopy and electrical/optical measurements. Where the performance parameters of WSe2 - based electronic device can be properly designed or optimized. (on currents increasing and threshold voltage positive shift.) We expect that our p-doping method will make it possible to successfully integrate future layered semiconductor devices.

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Cu CMP Characteristics and Electrochemical plating Effect (Cu 배선 형성을 위한 CMP 특성과 ECP 영향)

  • Kim, Ho-Youn;Hong, Ji-Ho;Moon, Sang-Tae;Han, Jae-Won;Kim, Kee-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.252-255
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    • 2004
  • 반도체는 high integrated, high speed, low power를 위하여 design 뿐만 아니라 재료 측면에서도 많은 변화를 가져오고 있으며, RC delay time을 줄이기 위하여 Al 배선보다 비저항이 낮은 Cu와 low-k material 적용이 그 대표적인 예이다. 그러나, Cu 배선의 경우 dry etching이 어려우므로, 기존의 공정으로는 그 한계를 가지므로 damascene 또는 dual damascene 공정이 소개, 적용되고 있다. Damascene 공정은 절연막에 photo와 RIE 공정을 이용하여 trench를 형성시킨 후 electrochemical plating 공정을 이용하여 trench에 Cu를 filling 시킨다. 이후 CMP 공정을 이용하여 절연막 위의 Cu와 barrier material을 제거함으로서 Cu 배선을 형성하게 된다. Dual damascene 공정은 trench와 via를 동시에 형성시키는 기술로 현재 대부분의 Cu 배선 공정에 적용되고 있다. Cu CMP는 기존의 metal CMP와 마찬가지로 oxidizer를 이용한 Cu film의 화학반응과 연마 입자의 기계가공이 기본 메커니즘이다. Cu CMP에서 backside pressure 영향이 uniformity에 미치는 영향을 살펴보았으며, electrochemical plating 공정에서 발생하는 hump가 CMP 결과에 미치는 영향과 dishing 결과를 통하여 그 영향을 평가하였다.

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A Calculation of the Cosmic Radiation Dose of a Semiconductor in a Geostationary Orbit Satellite Depending on the Shield Thickness (차폐체 두께에 따른 정지궤도위성용 반도체의 우주방사선 피폭 계산)

  • Heo, Jeong-Hwan;Ko, Bong-Jin;Chung, Bum-Jin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.6
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    • pp.476-483
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    • 2009
  • Cosmic ray is composed of nuclear particles moving at a light speed. The cosmic ray affects the performance and the reliability of semiconductor devices by ionizing the semiconductor material. In this study, the radiation effects of protons, electrons, and photons, which compose the cosmic ray, on the GOS(Geostationary Orbit Satellite) were evaluated using the Monte-Carlo N-Particle code. The GOS was chosen due to the comparatively long exposure to the cosmic ray as it stays in the geostationary orbit more than 10 years. As the absorbed dose of semiconductor from electrons is much larger than those of protons, photons, and the secondary radiation, most of the radiation exposure of the semiconductors in the GOS results from that of electrons. When we compare the calculated absorbed dose with the radio-resistance of semiconductor, the Intel 486 of the Intel company is not suitable for the GOS applications due to its low radio-resistance. However RH3000-20 of MIPS and Motorola 602/603e can be applied to the Satellite when the aluminium shield is thicker than 3 mm.

Humidity Dependence Removal Technology in Oxide Semiconductor Gas Sensors (산화물 반도체 가스 센서의 습도 의존성 제거 기술)

  • Jiho Park;Ji-Wook Yoon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.37 no.4
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    • pp.347-357
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    • 2024
  • Oxide semiconductor gas sensors are widely used for detecting toxic, explosive, and flammable gases due to their simple structure, cost-effectiveness, and potential integration into compact devices. However, their reliable gas detection is hindered by a longstanding issue known as humidity dependence, wherein the sensor resistance and gas response change significantly in the presence of moisture. This problem has persisted since the inception of oxide semiconductor gas sensors in the 1960s. This paper explores the root causes of humidity dependence in oxide semiconductor gas sensors and presents strategies to address this challenge. Mitigation strategies include functionalizing the gas-sensing material with noble metal/transition metal oxides and rare-earth/rare-earth oxides, as well as implementing a moisture barrier layer to prevent moisture diffusion into the gas-sensing film. Developing oxide semiconductor gas sensors immune to humidity dependence is expected to yield substantial socioeconomic benefits by enabling medical diagnosis, food quality assessment, environmental monitoring, and sensor network establishment.

The Improvement of Droop Characteristic of 780nm Monolithic 4-Beam Laser Diode (780nm Monolithic 4-Beam 레이저 다이오드의 Droop 특성 개선)

  • Hong, Hyun-Kwon;Kim, Ji-Ho;Ji, You-Sang;Seong, Yeong-Un;Lee, Sang-Don
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.285-287
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    • 2009
  • When the laser diode is operated with continuous current, the light intensity from the laser diode deceases with time due to the temperature rise in the active layer. The phenomena, which is often called as DROOP, should be minimized in order to be used as a light source for the laser beam printer. We experimently examined the influences of the laser parameters such as threshold current, differential quantum efficiency on droop. It was found that decreasing the differential quantum efficiency of the laser diode is the effective way to minimize droop.

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Mobility-Spectrum Analysis of an Anisotropic Material System with a Single-Valley Indirect-Band-Gap Semiconductor Quantum-Well

  • Joung, Hodoug;Ahn, Il-Ho;Yang, Woochul;Kim, Deuk Young
    • Electronic Materials Letters
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    • v.14 no.6
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    • pp.774-783
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    • 2018
  • Full maximum-entropy mobility-spectrum analysis (FMEMSA) is the best algorithm among mobility spectrum analyses by which we can obtain a set of partial-conductivities associated with mobility values (mobility spectrum) by analyzing magnetic-field-dependent conductivity-tensors. However, it is restricted to a direct band-gap semiconductor and should be modified for materials with other band structures. We developed the modified version of FMEMSA which is appropriate for a material with a single anisotropic valley, or an indirect-band-gap semiconductor quantum-well with a single non-degenerate conduction-band valley e.g., (110)-oriented AlAs quantum wells with a single anisotropic valley. To demonstrate the reliability of the modified version, we applied it to several sets of synthetic measurement datasets. The results demonstrated that, unlike existing FMEMSA, the modified version could produce accurate mobility spectra of materials with a single anisotropic valley.

Fabrication of Low-Cost Physically Unclonable Function (PUF) Chip Using Multiple Process Variables (다중 공정변수를 활용한 저비용 PUF 보안 Chip의 제작)

  • Hong-Seock Jee;Dol Sohn;Ju-Won Yeon;Tae-Hyun Kil;Hyo-Jun Park;Eui-Cheol Yun;Moon-Kwon Lee;Jun-Young Park
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.37 no.5
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    • pp.527-532
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    • 2024
  • Physically Unclonable Functions (PUFs) provide a high level of security for private keys using unique physical characteristics of hardware. However, fabricating PUF chips requires numerous semiconductor processes, leading to high costs, which limits their applications. In this work, we introduce a low-cost manufacturing method for PUF security chips. First, surface roughening through wet-etching is utilized to create random variables. Additionally, physical vapor deposition is added to further enhance randomness. After PUF chip fabrication, both Hamming distance (HD) and Hamming weight (HW) are extracted and compared to verify the fabricated chip. It is confirmed that the PUF chip using two different multiple process variables demonstrates superior uniqueness and uniformity compared to the PUF security chip fabricated using only a single process variable.

The Non-Linear Characteristics of ZnO Devices. (ZnO 소자의 비직선 특성)

  • Hong, Kyung-Jin;Chon, Kyung-Nam;Cho, Jae-Cheol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.05a
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    • pp.43-46
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    • 2001
  • The ZnO devices using semiconductor properties, to include $MnO_2$, $Y_2O_3$ and other material, was fabricated by $Sb_2O_3$ mol ratio from 1 to 4 [mol%]. The non-linearity factor was calculated by setting current to be $1[mA/cm^2]$ and $10[mA/cm^2]$. The spinel structure was fonned by $Sb_2O_3$ addition and it was depressed the ZnO grain formation. The grain growing was controlled by spinel structure that has improved the non-linearity factors. The breakdown voltage characteristics of semiconductor devices to increase with $Sb_2O_3$ was increased in voltage-current. The non-linearity value of ZnO semiconductor devices was 45 over.

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Photo-thermo-elastic interaction in a semiconductor material with two relaxation times by a focused laser beam

  • Jahangir, A.;Tanvir, F.;Zenkour, A.M.
    • Advances in aircraft and spacecraft science
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    • v.7 no.1
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    • pp.41-52
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    • 2020
  • The effect of relaxation times is studied on plane waves propagating through semiconductor half-space medium by using the eigen value approach. The bounding surface of the half-space is subjected to a heat flux with an exponentially decaying pulse and taken to be traction free. Solution of the field variables are obtained in the form of series for a general semiconductor medium. For numerical values, Silicon is considered as a semiconducting material. The results are represented graphically to assess the influences of the thermal relaxations times on the plasma, thermal, and elastic waves.