• Title/Summary/Keyword: rf power

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Structural, Optical, and Electrical Properties of Sputtered Al doped ZnO Thin Film Under Various RF Powers (RF 파워에 따라 스퍼터된 Al doped ZnO 박막의 구조적, 광학적, 전기적 특성)

  • Kim, Jong-Wook;Kim, Deok-Kyu;Kim, Hong-Bae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.3
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    • pp.177-181
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    • 2011
  • We have studied structural, optical, and electrical properties of the Al-doped ZnO (AZO) thin films being usable in transparent conducting oxides. The AZO thin films were deposited on the corning 1737 glass plate by the RF magnetron sputtering system. To find optimal properties of AZO for transparent conducting oxides, the RF power in sputtering process was varied as 40 W, 60 W, and 80 W, respectively. As RF power increased, the crystallinity of AZO thin film was decreased, the optical bandgap of AZO thin film increased. The transmittance of the film was over 80% in the visible light range regardless of the changes in RF power. The measurement of Hall effect characterizes the whole thin film as n-type, and the electrical property was improved with increasing RF power. The structural, optical, and electrical properties of the AZO thin films were affected by Al dopant content in AZO thin film.

Study on conversion efficiency of RF-DC converter with series diode (직렬 연결 RF-DC 변환기의 변환효율에 관한 연구)

  • Choi, Ki-Ju;Hwang, Hee Yong
    • Journal of Industrial Technology
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    • v.30 no.A
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    • pp.69-73
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    • 2010
  • In this paper, we designed the RF-DC converter used in wireless power transmission system and studied how to design the RF-DC converter of high conversion efficiency. The RF-DC converter operate at 2.45GHz and the diode is connected with series. The RF-DC converter uses shorted stub for DC loop and matching. We can divide the RF-DC converter circuit into four blocks. The reflection coefficients between the blocks were optimized for the maximum conversion efficiency at 0 dBm input power and $1300{\Omega}$ load impedance. The final design of the RF-DC converter has a 52 percent conversion efficiency.

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A Study on CdS Deposition using Sputtering (Sputtering을 이용한 CdS 증착에 관한 연구)

  • Lee, Dal-Ho;Park, Jung-Cheul
    • The Journal of Korea Institute of Information, Electronics, and Communication Technology
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    • v.13 no.4
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    • pp.293-297
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    • 2020
  • This paper tried to find the best conditions that could be applied to solar cells by deposition of CdS thin film on ITO glass using multiplex displacement sputter system. RF power was changed to 50W, 100W, and 150W and sputtering time was set to 10 minutes. As a result of the measurement of transmittance, the average transmittance in the area of 400 to 800 nm was measured from 60% to 80% and the best characteristic was measured at 150W at 84%. The band gap was also measured at 3.762eV at 50W, 4.037eV at 100W and 4.052eV at 150W. In XRD analysis, even as RF power was increased, it was observed as a structure called Wurtzite (hexagonal) of CdS. And as RF power increased, the particles were large and uniformly deposited, but at 100W the particles were densely composed and dense. And the thickness measurement showed that the RF power increased uniformly.

An Injection-Locked Based Voltage Boost-up Rectifier for Wireless RF Power Harvesting Applications

  • Lee, Ji-Hoon;Jung, Won-Jae;Park, Jun-Seok
    • Journal of Electrical Engineering and Technology
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    • v.13 no.6
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    • pp.2441-2446
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    • 2018
  • This paper presents a radio frequency-to-direct current (RF-to-DC) converter for special RF power harvesting application at 915 MHz. The major featured components of the proposed RF-to-DC converter is the combination of a cross-coupled rectifier and an active diode: first, the cross-coupled rectifier boosts the input voltage to desired level, and an active diode blocks the reverse current, respectively. A prototype was implemented using $0.18{\mu}m$ CMOS technology, and the performance was proven from the fact that the targeted RF harvesting system's full-operation with higher power efficiency; even if the system's input power gets lower (e.g., from nominal 0 to min. -12 dBm), the proposed RF-to-DC converter constantly provides 1.47 V, which is exactly the voltage level to drive follow up system components like DC-to-DC converter and so on. And, maximum power conversion efficiency is 82 % calculated from the 0 dBm input power, 2.3 mA load current.

An Experimental Study for Optimal RF Output Power Estimation of Wireless Sensor Network (건물 용도별 무선계측 최적 전파강도 산정을 위한 실험적 연구)

  • Yee, Jurng-Jae;Choi, Seok-Yong;Cho, Soo
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.21 no.8
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    • pp.462-467
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    • 2009
  • Researches and developments on BEMS are performed world-widely through sustainable management in various conditions. However, there are many obstacles to adapt the system in existing buildings because it needs highly expensive equipments, which are designed for newly built buildings, to install. Therefore, there are numerous limits exist when applying the BEMS in established buildings. The purpose of this study estimates the optimization of RF output power in WSN(Wireless Sensor Networks), which is the essential technology to develop PEMS. The results of this study is as follows ; 1) Applying WSN technique in buildings was possible. 2) As RF output power increases, the number of relay node reduced, therefore, the WSN showed more stability. 3) When estimating optimal RF output power in school, it should be considered between the number of relay node and RF output power. 4) Considering battery consumption and possibility of reception, the best suited RF output power is -20dbm in apartment house.

Power Control in RF Energy Harvesting Networks (무선 에너지 하비스팅 네트워크에서의 전력 제어 기법)

  • Hwang, Yu Min;Shin, Dong Soo;Kim, Jin Young
    • Journal of Satellite, Information and Communications
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    • v.12 no.2
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    • pp.51-55
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    • 2017
  • This paper aims to maximize the energy harvesting rate and channel capacity in RF-energy harvesting networks (RF-EHNs) under the constraints of maximum transmit power and minimum quality of service (QoS) in terms of rate capacity for each user. We study a multi-user RF-EHN with frequency division multiple access (FDMA) in a Rayleigh channel. An access point (AP) simultaneously transmitting wireless information and power in the RF-EHN serves a subset of active users which have a power-splitting antenna. To gauge the network performance, we define energy efficiency (EE) and propose an optimization solution for maximizing EE with Lagrangian dual decomposition theory. In simulation results, we confirm that the EE is effectively maximized by the proposed solution with satisfying the given constraints.

Effects of RF Power on Physical and Electrical Characteristics of TiC Thin Films Deposited by Magnetron Sputtering (마그네트론 스퍼터링법으로 증착시킨 TiC 박막의 물리적, 전기적 특성에서 RF 파워의 영향)

  • Kim, Nam-Hoon;Park, Yong Seob
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.7
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    • pp.458-461
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    • 2014
  • TiC thin films were deposited on Si wafer by unbalanced magnetron sputtering (UBMS) system with two targets of graphite and titanium. During the TiC sputtering, the RF power was varied from 100 W to 175 W and the physical and electrical properties of TiC films were investigated. The hardness and rms surface roughness of TiC films were improved with increasing RF power and the maximum hardness about 24 GPa and the minimum rms surface roughness about 1.2 nm were obtained. The resistivity of TiC films was decreased with increasing RF power. Consequently, the physical and electrical properties of TiC film wewe improved with increasing RF power.

Electrical and Optical Properties of ITO Films Sputtered by RF -bias Voltage and In-Sn Alloy Target

  • Kim, Hyun-Hoo;Shin, Sung-Ho
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.4
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    • pp.153-157
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    • 2004
  • ITO thin films were deposited on PET and soda-lime glass substrates by a dc reactive magnetron sputtering of In-Sn alloy metal target without substrate heater and post-deposition thermal treatment. The dependency of rf-bias voltage and substrate power during deposition processing was investigated to control the electrical and optical properties of ITO films. The range of rf bias voltage is from 0 to -80 V and the substrate power is applied from 10 to 50 W. The minimum resistivity of ITO film is 5.4${\times}$10$^{-4}$ $\Omega$cm at 50 W power and rf-bias voltage of -20 V. The best transmittance of ITO films at 550 nm wavelength is 91 % in the substrate power of 30 W and rf-bias voltage of -80 V.

TFTs characteristics of amorphous IGZO thin film fabricated with different RF Power (다양한 RF Power로 제작한 비정질 IGZO TFTs의 특성 연구)

  • Jeong, Yeon-Hu;Jo, Gwang-Min;Kim, Se-Yun;Kim, Jeong-Ju;Lee, Jun-Hyeong;Heo, Yeong-U
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2014.11a
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    • pp.254-255
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    • 2014
  • RF magnetron sputtering법으로 증착한 비정질 IGZO 박막과 이를 Active layer로 이용한 TFT의 Transfer 특성에 대한 RF Power의 영향에 대해 연구하였다. Carrier concentration은 Sputtering 공정 중에 산소 분압으로 조절하였다. RF Power가 75에서 150W로 증가할수록 IGZO 박막의 Roughness는 12.2에서 $6.5{\AA}$ 감소하였고 Density는 6.0에서 $6.1g/cm^3$로 증가하였다. 또한, 모든 IGZO 박막은 가시광 영역에서 85% 이상의 투과율을 보였고 Optical band gap은 미세하게 감소하였다. RF Power가 증가할수록 a-IGZO TFT의 Threshold voltage는 0.9에서 7V로 증가하였고, Subthreshold slope은 0.3에서 0.8 V/decade로 증가하였다. 하지만 Mobility는 11에서 $19cm^2/V{\cdot}s$로 증가하였다.

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Impact of DPN on Deep Nano-technology Device Employing Dual Poly Gate (Nano-technology에 도입된 Dual Poly Gate에서의 DPN 공정 연구)

  • Kim, Chang-Jib;Roh, Yong-Han
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.4
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    • pp.296-299
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    • 2008
  • The effects of radio frequency (RF) source power for decoupled plasma nitridation (DPN) process on the electrical properties and Fowler-Nordheim (FN) stress immunity of the oxynitride gate dielectrics for deep nano-technology devices has been investigated. With increase of RF source power, the threshold voltage (Vth) of a NMOS transistor(TR) decreased and that of a PMOS transistor increased, indicating that the increase of nitrogen incorporation in the oxynitride layer due to higher RF source power induced more positive fixed charges. The improved off-current characteristics and wafer uniformity of PMOS Vth were observed with higher RF source power. FN stress immunity, however, has been degenerated with increasing RF source power, which was attributed to the increased trap sites in the oxynitride layer. With the experimental results, we could optimize the DPN process minimizing the power consumption of a device and satisfying the gate oxide reliability.