• Journal of the Korean Society for Heat Treatment
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• v.34 no.2
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• pp.75-80
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• 2021

The crystal grains of polycrystalline diamond vary depending on deposition conditions and growth thickness. The diamond thin film deposited by the CVD method has a very rough growth surface. On average, the surface roughness of a diamond thin film deposited by CVD is in the range of 1-100 um. However, the high surface roughness of diamond is unsuitable for application in industrial applications, so the surface roughness must be lowered. As the surface roughness decreases, the scattering of incident light is reduced, the heat conduction is improved, the mechanical surface friction coefficient can be lowered, and the transmittance can also be improved. In addition, diamond-coated cutting tools have the advantage of enabling ultra-precise machining. In this study, the surface roughness of diamond was improved by thermal diffusion reaction between diamond carbon atoms and ferrous metals at high temperature for diamond thin films deposited by MPCVD.

• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.188-190
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• 2004

As an effort to reduce cost and lead-time and to increase flexibility and responsiveness, manufacturers are using digital printing in numerous process steps. Typically, these processes require the precise dispensing of various fluids. Piezo ink jet printheads are proving to be reliable tools for depositing active materials such as light emitting polymers (LEP) for mobile phone displays and color filter inks for liquid crystal displays. Ink jets are also being used to provide uniform coatings of polyimide alignment layers and spacers for LCDs. Success with legend printing on PCBs using ink jets has encouraged the design of equipment for directly printing both etch resist and solder mask for PCBs. Development of printers for passive components such as capacitors and resistors is underway. This paper will present the attributes of an ink jet printhead designed to a precision deposition tool and discuss how it is being used to digitally print electronic and flat panel display components. Status of commercialization of digital printing will be discussed along with issues to be resolved before wide adoption takes place.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.77-77
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• 2016

Thin films synthesized by plasma processes have been widely applied in a variety of industrial sectors. The structure control of thin film is one of prime factor in most of these applications. It is well known that the structure of this film is closely associated with plasma parameters and species of plasma which are electrons, ions, radical and neutrals in plasma processes. However the precise control of structure by plasma process is still limited due to inherent complexity, reproducibility and control problems in practical implementation of plasma processing. Therefore the study on the fundamental physical properties that govern the plasmas becomes more crucial for molecular scale control of film structure and corresponding properties for new generation nano scale film materials development and application. The thin films are formed through nucleation and growth stages during thin film depostion. Such stages involve adsorption, surface diffusion, chemical binding and other atomic processes at surfaces. This requires identification, determination and quantification of the surface activity of the species in the plasma. Specifically, the ions and neutrals have kinetic energies ranging from ~ thermal up to tens of eV, which are generated by electron impact of the polyatomic precursor, gas phase reaction, and interactions with the substrate and reactor walls. The present work highlights these aspects for the controlled and low-temperature plasma enhanced chemical vapour disposition (PECVD) of Si-based films like crystalline Si (c-Si), Si-quantum dot, and sputtered crystalline C by the design and control of radicals, plasmas and the deposition energy. Additionally, there is growing demand on the low-temperature deposition process with low hydrogen content by PECVD. The deposition temperature can be reduced significantly by utilizing alternative plasma concepts to lower the reaction activation energy. Evolution in this area continues and has recently produced solutions by increasing the plasma excitation frequency from radio frequency to ultra high frequency (UHF) and in the range of microwave. In this sense, the necessity of dedicated experimental studies, diagnostics and computer modelling of process plasmas to quantify the effect of the unique chemistry and structure of the growing film by radical and plasma control is realized. Different low-temperature PECVD processes using RF, UHF, and RF/UHF hybrid plasmas along with magnetron sputtering plasmas are investigated using numerous diagnostics and film analysis tools. The broad outlook of this work also outlines some of the 'Grand Scientific Challenges' to which significant contributions from plasma nanoscience-related research can be foreseen.

• Journal of the Korean Electrochemical Society
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• v.18 no.1
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• pp.38-44
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• 2015

This review article summarizes the recent progress of quantum dot (QD)-sensitized solar cells based on mesoporous $TiO_2$ thin films. From the intrinsic characteristics of nanoscale inorganic QDs with various compositions, it was possible to construct a variety of 3rd-generation thin film solar cells by solution process. Depending on preparation methods, colloidal QD sensitizers are pre-prepared for later deposition onto the surface of $TiO_2$ or in-situ deposition of QDs from chemical bath is done for direct growth of QD sensitizers over substrates. Recently, colloidal QD sensitizers have shown an overall power conversion efficiency of ~7% by a very precise control of composition while a representative CdS/CdSe from chemical bath deposition have done ~5% with polysulfide electrolytes. In the near future, it is necessary to carry out systematic investigations for developing new hole-conducting materials and controlling interfaces within the cell, thus leading to an enhancement of both open-circuit voltage and fill factor while keeping the current high value of photocurrents from QDs towards more efficient and stable QD-sensitized solar cells.

• Fisheries and Aquatic Sciences
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• v.23 no.1
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• pp.1.1-1.14
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• 2020

Background: Dietary protein requirements are dependent on a variety of factors and water temperature is one of the most important abiotic factors affecting protein requirement of fish. This study was, therefore, conducted to investigate effects of water temperature on dietary protein requirement of fry Heteropneustes fossilis which has high demand in most of the Asian markets. Methods: Quadruplicate groups of 30 fish per treatment (2.97 ± 0.65 cm; 5.11 ± 0.34 g) were fed seven isoenergetic diets (17.9 kJ g^-1 gross energy; 14.99 kJ g^-1 digestible energy) containing dietary protein levels ranging from 28 to 52% at two water temperatures (18 and 26 ℃). Experimental diets were fed to apparent satiation as semi-moist cakes thrice daily at 17:00, 12:00, and 17:30 h for 12 weeks. For precise information, various growth parameters, protein deposition, hematological parameters, metabolic enzymes, and stress response were analyzed, and effects of water temperature on dietary protein requirement was recommended on the basis of response from above parameters. Results: Groups held at 26 ℃ attained best growth, feed conversion, and protein deposition at 44% dietary protein indicating that temperature affected dietary protein requirement for optimum growth of H. fossilis fry and protein requirement seems to be satisfied with 44% dietary protein. Interestingly, interactive effects of both dietary protein levels and temperature were not found (P > 0.05). Fish reared at 18 ℃ had comparatively higher values for aspartate and alanine transferases than those reared at 26 ℃ water temperature which exhibited normal physiological value for these enzymes indicating that body metabolism was normal at this temperature. Hematological parameters also followed same pattern. Furthermore, fish reared at 26 ℃ water temperature exhibited more resistant to thermal stress (P < 0.05). The 95% maximum plateau of protein deposition data using second-degree polynomial regression analyses exhibited dietary protein requirement of fry H. fossilis between 40.8 and 41.8% of diet at 26 ℃ water temperature. The recommended range of dietary protein level and protein/digestible energy ratio for fry H. fossilis is 40.8-41.8% and 27.21-27.88 mg protein kJ^-1 digestible energy, respectively. Conclusions: Information developed is of high significance for optimizing growth potential by making better utilization of nutrient at 26 ℃ and, to develop effective management strategies for mass culture of this highly preferred fish species.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.229-229
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• 2010

With the scaling down of ultra large integrated circuits (ULSI) to the sub-50 nm technology node, the need for an ultra-thin, continuous and conformal diffusion barrier and Cu seed layer is increasing. However, diffusion barrier and Cu seed layer formation with a physical vapor deposition (PVD) method has become difficult as the technology node is reduced to 30 nm and beyond. Recent work on self-forming barrier processes using PVD Cu alloys have attracted great attention due to the capability of conformal ultra-thin barrier formation using a simple technique. However, as in the case of the conventional barrier and Cu seed layer, PVD of the Cu alloy seed layer will eventually encounter the difficulty in conformal deposition in narrow line trenches and via holes. Atomic layer deposition (ALD) has been known for its good step coverage and precise thickness control, and is a candidate technique for the formation of a thin conformal barrier layer and Cu seed layer. Conformal Cu-Mn seed layers were deposited by plasma enhanced atomic layer deposition (PEALD) at low temperature ($120^{\circ}C$), and the Mn content in the Cu-Mn alloys were controlled form 0 to approximately 10 atomic percent with various Mn precursor feeding times. Resistivity of the Cu-Mn alloy films decreased by annealing due to out-diffusion of Mn atoms. Out-diffused Mn atoms were segregated to the surface of the film and interface between a Cu-Mn alloy and $SiO_2$, resulting in self-formed $MnO_x$ and $MnSi_xO_y$, respectively. No inter-diffusion was observed between Cu and $SiO_2$ after annealing at $500^{\circ}C$ for 12 h, indicating an excellent diffusion barrier property of the $MnSi_xO_y$. The adhesion between Cu and $SiO_2$ was enhanced by the formation of $MnSi_xO_y$. Continuous and conductive Cu-Mn seed layers were deposited with PEALD into 32 nm $SiO_2$ trench, enabling a low temperature process, and the trench was perfectly filled using electrochemical plating (ECD) under conventional conditions. Thus, it is the resultant self-forming barrier process with PEALD Cu-Mn alloy film as a seed layer for plating Cu that has further potential to meet the requirement of the smaller than 30 nm node.

• Journal of Radiation Protection and Research
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• v.47 no.4
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• pp.181-194
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• 2022

Internal dosimetry is a discipline which brings together a set of knowledge, tools and procedures for calculating the dose received after incorporation of radionuclides into the body. Several steps are necessary to calculate the committed effective dose (CED) for workers or members of the public. Each step uses the best available knowledge in the field of radionuclide biokinetics, energy deposition in organs and tissues, the efficiency of radiation to cause a stochastic effect, or in the contributions of individual organs and tissues to overall detriment from radiation. In all these fields, knowledge is abundant and supported by many works initiated several decades ago. That makes the CED a very robust quantity, representing exposure for reference persons in reference situation of exposure and to be used for optimization and assessment of compliance with dose limits. However, the CED suffers from certain limitations, accepted by the International Commission on Radiological Protection (ICRP) for reasons of simplification. Some of its limitations deserve to be overcome and the ICRP is continuously working on this. Beyond the efforts to make the CED an even more reliable and precise tool, there is an increasing demand for personalized dosimetry, particularly in the medical field. To respond to this demand, currently available tools in dosimetry can be adjusted. However, this would require coupling these efforts with a better assessment of the individual risk, which would then have to consider the physiology of the persons concerned but also their lifestyle and medical history. Dosimetry and risk assessment are closely linked and can only be developed in parallel. This paper presents the state of the art of internal dosimetry knowledge and the limitations to be overcome both to make the CED more precise and to develop other dosimetric quantities, which would make it possible to better approximate the individual dose.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.36 no.12
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• pp.1171-1176
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• 2012

The selective patterning of a carbon nanotube (CNT) forest on a Si substrate has been performed using a femtosecond laser. The high shock wave generated by the femtosecond laser effectively removed the CNTs without damage to the Si substrate. This process has many advantages because it is performed without chemicals and can be easily applied to large-area patterning. The CNTs grown by plasma-enhanced chemical vapor deposition (PECVD) have a catalyst cap at the end of the nanotube owing to the tip-growth mode mechanism. For the application of an electron emission and biosensor probe, the catalyst cap is usually removed chemically, which damages the surface of the CNT wall. Precise control of the femtosecond laser power and focal position could solve this problem. Furthermore, selective CNT cutting using a femtosecond laser is also possible without any phase change in the CNTs, which is usually observed in the focused ion beam irradiation of CNTs.

• Water for future
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• v.10 no.1
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• pp.95-100
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• 1977

The empirical area-reduction method by W.M. Borland and C.R. Miller and its revised procedure by W.T. Moody were made of fitting the area and storage curves to the Van't Hul distributions. It should be noted that the reservoir is classified into one of the four standard types on the basis of the topographical feature of the reservoir in application of the method. In other words, this method did not take into account several considerafble factors affecting the mode of sediment deposition, but only the shape of the reservoir as a governign factor. This is why the method occasionally creates ambiguity in classification and accordingly leads to unexpected mode of deposition. This paper describes a generating an formula to decide the standard classification of four types Van's Hul distributions, taking into consideration quantitatively sediment-loss percent and capacity-inflow ratio as well as the shape of the reservoirs by multiple regression analysis using the least square method to get a better fit to the design curves. The result is expressed as $Y=-1.95+55.8X_1+0.14X_2+0.12X_3$ in which the the values of Y locate the standard type I through type IV in the range from ten to forty with the interval of ten. The regression analysis was correlated well with the standard errors of estimate of around two except for the case of the type IV. This formula does not give big difference from the Borland's work in general sityation, but it demonstrates acceptable results, giving somewhat precise replys for the specific reservoirs. Its application to the Soyang Lake, one of the largest reservoirs in the country, defined clearly the type II, while the original method located it in the boundary of the type II and type III.

• Korean Journal of Optics and Photonics
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• v.16 no.4
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• pp.340-344
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• 2005

Microlens cells of Ge-doped BPSG (Boro-Phospho-Silicate Glass) are fabricated by dicing the film produced by FHD (Flame Hydrolysis Deposition). Microlens arrays of $53.4{\mu}m$ square unit are produced by the thermal reflow of the diced unit cells at $1200^{\circ}C$. The gap between the microlenses was about $70{\mu}m,$ and the thickness of the produced lens was about $28.4{\mu}m$. We analyzed the reflowed shape of the microlens cell by an image-process technique, and the focal length was about $62.2{\mu}m$. This method of fabricating a microlens is simple and inexpensive compared to the conventional method using the photolithographic process. Also, the control of the radius of curvature of the microlens is easier and a more precise microlens way of various types can be fabricated using this method.