• 대한기계학회:학술대회논문집
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• 대한기계학회 2001년도 추계학술대회논문집A
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• pp.871-875
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• 2001

Laser photolithography technique is useful for fabricating micro-patterns of silicon wafers. In this work, the laser photolithography micromachining technique is optimized based on Taguchi method. Sensitivity analysis was performed using laser scanning speed and laser power level as the parameters. The results show that for the photoresist used in this work, a laser scan speed of $70{\mu}m/s$ at 50mW laser power gives the best result.

• 산업경영시스템학회지
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• 제35권1호
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• pp.79-86
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• 2012

This study focuses on the problem of scheduling wafer lots of several recipe(operation condition) types in the photolithography workstation in a semiconductor wafer fabrication facility, and sequence-dependent recipe set up times may be required at the photolithography machines. In addition, a lot is able to be operated at a machine when the reticle(mask) corresponding to the recipe type is set up in the photolithography machine. We suggest various heuristic algorithms, in which developed recipe selection rules and lot selection rules are used to generate reasonable schedules to minimizing the total weighted flowtime. Results of computational tests on randomly generated test problems show that the suggested algorithms outperform a scheduling method used in a real manufacturing system in terms of the total weighted flowtime of the wafer lots with ready times.

• International Journal of Precision Engineering and Manufacturing
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• 제9권1호
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• pp.12-18
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• 2008

This paper describes two run-to-run controllers, a nonlinear multiple exponential-weight moving-average (NMEWMA) controller and a dynamic model-tuning minimum-variance (DMTMV) controller, for photolithography processes. The relationships between the input recipes (exposure dose and focus) and output variables (critical dimensions) were formed using an experimental design method, and the photolithography process model was built using a multiple regression analysis. Both the NMEWMA and DMTMV controllers could update the process model and obtain the optimal recipes for the next run. Quantified improvements were obtained from simulations and real photolithography processes.

• 제어로봇시스템학회:학술대회논문집
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• 제어로봇시스템학회 2005년도 ICCAS
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• pp.389-392
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• 2005

In the maskless photolithography based on the Digital Micromirror Device (DMD) by Texas Instruments Inc. (TI), the micromirror array works as a virtual photomask to write patterns directly onto Flat Panel Display (FPD) at high speed with low cost. However, it is neither simple to generate region-based patterns for the micromirror array nor easy to deliver sequences of patterns for the micromirror controller. Moreover, the quality of lithography yields the precise synchronization between generating sequence of patterns and irradiation rate off micromirrors. In this study, the region-based pattern generating system for maskless photolithography is devised. To verify salient features of devised functionalities, the prototype system is implemented and the system is evaluated with actual DMD based photolithography. The results show that proposed pattern generating method is proper and reliable. Moreover, the devised region-based pattern generating system is robust and precise enough to handle any possible user specified mandate and to achieve the quality of photolithography required by FPD manufacturer.

• 한국산학기술학회논문지
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• 제13권8호
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• pp.3319-3325
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• 2012

본 논문은 반도체 포토장비의 이산 이벤트 시뮬레이터인 TrackSim의 개발에 관한 것이다. TrackSim은 포토 장비의 시뮬레이션 엔진과 사용하기 쉬운 사용자 환경을 포함하는 시뮬레이터로, 다양한 프로세스 모듈의 구성 및 운영 방법을 효율적으로 평가, 검증, 스케쥴링할 수 있는 3차원 시뮬레이션 환경을 제공한다. TrackSim은 반도체 산업에서 많이 사용되는 이산 사건 시뮬레이션 소프트웨어인 AutoMod를 기반으로 개발되어 시뮬레이션 신뢰성이 보장되며, AutoMod로 개발된 반도체 제조라인 시뮬레이션 모델 속에 함께 연동하여 사용이 가능하다는 특징이 있다.

• 대한기계학회논문집B
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• 제36권10호
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• pp.1011-1017
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• 2012

본 논문에서는 롤타입 마스크를 사용한 마이크로/나노 구조 제작용 광학 리소그래피 방법을 소개한다. 이 생산 방법은 다양한 목표 해상도에 따라 위상지연 리소그래피방법과 포토리소그래피로 나뉜다. 사용되는 빛의 파장대보다 작은 해상도를 갖는 패턴을 제작하기 위해서 실린더 형태의 위상지연 마스크를 활용한 근거리 노광 방식을 사용한다. 또한 필름 형태의 금속 마스크를 써서 포토리소그래피를 연속방식으로 수행하였는데 이 방식은 실린더 마스크의 회전수를 조절함으로써 노광 결과 패턴의 주기를 실시간으로 조절할 수 있다. 이 기술의 응용으로 금속 그물패턴으로 만들어진 100 $mm^2$ 넓이의 투명전극을 제작하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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• pp.247-250
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• 2002

SAW filters were fabricated on $LiNbO_3$ substrates to evaluate frequency response and properties of photolithography. In the both of etch and lift-off methods, lift off method was superior to etch method in fabrication process. Frequency response property was measured by network analyzer. From measurement of acoustic property, SAW propagation velocity was 3574.9m/sec for $LiNbO_3$ SAW filter.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2004년도 하계종합학술대회 논문집(2)
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• pp.497-500
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• 2004

In this paper, we developed a new photolithography process which used a water-soluble photoresist instead of organic solvent soluble photoresist, defined pentacene thin film. And pentacene OTFTs were fabricated with the water- soluble photolithography process.

• 한국정밀공학회지
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• 제24권12호
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• pp.128-135
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• 2007

Micro-channels for a wave micropump have been fabricated using the Stereolithography and UV Photolithography. The micro-channel with a channel height of $500\;{\mu}m$ was fabricated with stereolithography. UV photolithography was used for producing micro-channels with a channel length less than $100\;{\mu}m$. The fabrication process data including spinning rpm, pre-bake and post-bake time, and develop time for single layer and multiple layer 3D micro-structures using SU-8 photo resist are experimentally found. A film mask printed with a 40,000 dpi laser printer was used for UV lithography and micro-structures in the order of tens of micrometers in dimension were successfully fabricated.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.217-222
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• 2004

The aim of this paper is to investigate the effect of micro-dimple size on reduction friction and to understand the potential of friction reduction through micro-scale dimple to fabricate by photolithography on pin-on-disk test using flat-on-flat contact geometry. It was verify that the friction property with respect to the same pitch has been influence on the size of dimple under lubricated sliding contact. Also, we can recognize from Stribeck curve that the friction property has a connection with the size of dimple. It can explain a relationship between the friction coefficient and a dimensionless parameter for lubrication condition. The friction property has been an effect on the size of surface texture on reduction friction, not only because the density of dimple, but also because the ratio of diameter/pitch. This ratio of approximately 0.5 is recommend under the tested friction condition. It suggested that the ratio of d/p is an important parameter for surface texture design.