International Journal of Precision Engineering and Manufacturing

Korean Society for Precision Engineering (한국정밀공학회)
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Advanced Process Control of the Critical Dimension in Photolithography

  • Wu, Chien-Feng (Department of Mechanical Engineering, National Chiao Tung University) ;
  • Hung, Chih-Ming (Department of Mechanical Engineering, National Chiao Tung University) ;
  • Chen, Juhn-Horng (Department of Mechanical Engineering, Chung Hua University) ;
  • Lee, An-Chen (Department of Mechanical Engineering, National Chiao Tung University)
  • Published : 2008.01.01
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Abstract

This paper describes two run-to-run controllers, a nonlinear multiple exponential-weight moving-average (NMEWMA) controller and a dynamic model-tuning minimum-variance (DMTMV) controller, for photolithography processes. The relationships between the input recipes (exposure dose and focus) and output variables (critical dimensions) were formed using an experimental design method, and the photolithography process model was built using a multiple regression analysis. Both the NMEWMA and DMTMV controllers could update the process model and obtain the optimal recipes for the next run. Quantified improvements were obtained from simulations and real photolithography processes.

Keywords

References

  1. Crisalle, O. D., Soper, R. A., Mellichamp, D. A. and Seborg, D. E., 'Adaptive Control of Photolithography,' Proceedings of the SPIE, Vol. 1464, pp. 508-526, 1991
  2. Lachman-Shalem, S., Grosman, B. and Lewin, D. R., 'Nonlinear Modeling and Multivariate Control of Photolithography,' IEEE Transactions on Semiconductor Manufacturing, Vol. 15, No. 3, pp. 310-322, 2002 https://doi.org/10.1109/TSM.2002.801392
  3. Grosman, B., Lachman-Shalem, S., Swissa, R. and Lewin, D. R., 'Yield Enhancement in Photolithography through Model-based Process Control: Average Mode Control,' IEEE Transactions on Semiconductor Manufacturing, Vol. 18, No. 1, pp. 86-93, 2005 https://doi.org/10.1109/TSM.2004.836654
  4. Chemali, C. E., Freudenberg, J., Hankinson, M. and Bendik, J. J., 'Run-to-Run Critical Dimension and Sidewall Angle Lithography Control Using the PROLITH Simulator,' IEEE Transactions on Semiconductor Manufacturing, Vol. 17, No. 3, pp. 388-401, 2004 https://doi.org/10.1109/TSM.2004.831530
  5. Yang,D. S., Jung,M. H., Lee,Y. M., Koh,C. W., Yeo,G. S., Woo,S. G., Cho,H. K. and Moon,J. T., 'Statistical Analysis of CD SEM Measurement and Process Control in the Indistinguishable Multi-Process Patterns,' Proceedings of the SPIE, Vol. 6152, pp. 880-886, 2006
  6. Levinson, H. J., 'Principles of Lithography,' SPIE Press, pp. 217-225, 2001
  7. Park, S. J., Lee,M. S., Shin,S. Y., Cho,K. H.,Lim, J. T., Cho,B. S., Jei,Y. H., Kim,M. K. and Park,C. H., 'Run-to-Run Overlay Control of Steppers in Semiconductor Manufacturing Systems Based on History Data Analysis and Neural Network Modeling,' IEEE Transactions on Semiconductor Manufacturing, Vol. 18, No. 4, pp. 605-612, 2005 https://doi.org/10.1109/TSM.2005.858530
  8. Lee,T. Y., Lee,B. H., Chin,S. B., Cho,Y. S., Hong,J. S., Hong,J. S. and Chang L. S., 'Study of Critical Dimension and Overlay Measurement Methodology Using SEM Image Analysis for Process Control,' Proceedings of the SPIE, Vol. 6152, pp. 837-844, 2006
  9. Tseng, S. T., Chou, R. J. and Lee, S. P., 'A Study on a Multiple EWMA Controller,' IIE Transactions, Vol. 34, No. 4, pp.541-549, 2002
  10. Lee, A. C., 'Minimum-Variance Controller for a Class of Non-linear Systems,' International Journal of Systems Science, Vol. 21, No. 11, pp. 2091-2101, 1990 https://doi.org/10.1080/00207729008910532
  11. Castillo, D. E. and Yeh, J. Y., 'An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Semiconductor Processes,' IEEE Transactions on Semiconductor Manufacturing, Vol. 11, No. 2, pp. 285-295, 1998 https://doi.org/10.1109/66.670178
  12. Clarke, D. W. and Gawthrop, P. J., 'Self-Tuning Controller,' Proceedings of the IEE, Vol. 122, No. 9, pp. 929-939, 1975
  13. Belegundu, A. D. and Chandrupatla, T. R., 'Optimization Concepts and Application in Engineering,' Prentice-Hall, pp. 276-279, 1999
  14. Young, P., 'Recursive Estimation and Time-Series Analysis,' Springer-Verlag, pp. 42-54, 1984
  15. Liung, L. and Soderstrom, T., 'Theory and Practice of Recursive Identification,' MIT Press, pp. 16-32, 1986
  16. Graupe, D., 'Time Series Analysis, Identification and Adaptive Filtering,' Kreger, pp. 63-88, 1989