Optimization of Laser Photolithography Micromachining Technique based on Taguchi Method

다구찌 방법을 이용한 레이저 포토리소그라피 미세패턴가공 기술의 최적화

Laser photolithography technique is useful for fabricating micro-patterns of silicon wafers. In this work, the laser photolithography micromachining technique is optimized based on Taguchi method. Sensitivity analysis was performed using laser scanning speed and laser power level as the parameters. The results show that for the photoresist used in this work, a laser scan speed of $70{\mu}m/s$ at 50mW laser power gives the best result.