제어로봇시스템학회:학술대회논문집

Institute of Control, Robotics and Systems (제어로봇시스템학회)
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Region-based Pattern Generating System for Maskless Photolithography

  • Jin, Young-Hun (Dept. of Computer-Aided Mechanical Design Eng., Tongmyong Univ. of I.T.) ;
  • Park, Ki-Won (Dept. of Computer-Aided Mechanical Design Eng., Tongmyong Univ. of I.T.) ;
  • Choi, Jae-Man (Dept. of Computer-Aided Mechanical Design Eng., Tongmyong Univ. of I.T.) ;
  • Kim, Sang-Jin (Thinfilm Technology Group, LG PRC, LG Electronics) ;
  • An, Chang-Geun (Thinfilm Technology Group, LG PRC, LG Electronics) ;
  • Seo, Man-Seung (Dept. of Computer-Aided Mechanical Design Eng., Tongmyong Univ. of I.T.)
  • Published : 2005.06.02
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Abstract

In the maskless photolithography based on the Digital Micromirror Device (DMD) by Texas Instruments Inc. (TI), the micromirror array works as a virtual photomask to write patterns directly onto Flat Panel Display (FPD) at high speed with low cost. However, it is neither simple to generate region-based patterns for the micromirror array nor easy to deliver sequences of patterns for the micromirror controller. Moreover, the quality of lithography yields the precise synchronization between generating sequence of patterns and irradiation rate off micromirrors. In this study, the region-based pattern generating system for maskless photolithography is devised. To verify salient features of devised functionalities, the prototype system is implemented and the system is evaluated with actual DMD based photolithography. The results show that proposed pattern generating method is proper and reliable. Moreover, the devised region-based pattern generating system is robust and precise enough to handle any possible user specified mandate and to achieve the quality of photolithography required by FPD manufacturer.

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