• 한국결정성장학회:학술대회논문집
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• 한국결정성장학회 1999년도 PROCEEDINGS OF 99 INTERNATIONAL CONFERENCE OF THE KACG AND 6TH KOREA·JAPAN EMG SYMPOSIUM (ELECTRONIC MATERIALS GROWTH SYMPOSIUM), HANYANG UNIVERSITY, SEOUL, 06월 09일 JUNE 1999
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• pp.419-431
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• 1999

InP, III-V binary compound semiconductor, single crystal was grown by VGF (vertical gradient freeze) method using quartz ampoule and its electrical optical properties were investigated. Phosphorous powders were put in the bottom of quartz ampoule and Indium metal changed in conical quartz crucible hat was attached at the upper side position inside the quartz ampoule. It was vacuous under the pressure of 10-5 Torr and sealed up. In metal in the quartz crucible was melted at 1070$^{\circ}C$ and phophorous sublimated at 450$^{\circ}C$, there after it was diffused in In melt and so InP composition was formed. By cooling the InP composition melt (2$^{\circ}C$∼5$^{\circ}C$/hr of cooling rate) in range of 1070$^{\circ}C$∼900$^{\circ}C$, InP crystal was grown. the grown InP single crystals were investigated by X-ray analysis and polarized optical microscopy. Electrical properties of them were measured by Van der Pauw method. At the cooling rate of 2$^{\circ}C$/hr, its direction was (111), quality of the ingot ws better upper side of the ingot than lower. It was found that the InP crystals were n-type semiconductor and the carrier concentration, electron mobility and relative resistivity were 1015∼1016/㎤, 2x103∼3x104$\textrm{cm}^2$/Vsec and 2x10-1∼2x10-3Ωcm in the range of 150K∼300K, respectively.

• 한국전기전자재료학회논문지
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• 제33권2호
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• pp.155-160
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• 2020

Ga₂O₃/n-type 4H-SiC heterojunction diodes were fabricated by RF magnetron sputtering. The optical properties of Ga₂O₃ and electrical properties of diodes were investigated. I-V characteristics were compared with simulation data from the Atlas software. The band gap of Ga₂O₃ was changed from 5.01 eV to 4.88 eV through oxygen annealing. The doping concentration of Ga₂O₃ was extracted from C-V characteristics. The annealed oxygen exhibited twice higher doping concentration. The annealed diodes showed improved turn-on voltage (0.99 V) and lower leakage current (3 pA). Furthermore, the oxygen-annealed diodes exhibited a temperature cross-point when temperature increased, and its ideality factor was lower than that of as-grown diodes.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1993년도 하계학술대회 논문집 B
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• pp.1274-1276
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• 1993

The silicon-nitride films formed by laser CVD method are used for passivating GaAs surfaces. The electrical Properties of metal-insulator-GaAs structure are studied to determined the interfacial characteristics by C-V curves and deep level transient spectroscopy(DLTS). The SiN films are photolysisly deposited from $SiH_4\;and\;NH_3$ in the range of $100^{\circ}C-300^{\circ}C$ on P type, (100) GaAs. The hysteresis is reduced and interface trap density is lowered to $10^{12}-10^{13}$ at $100^{\circ}C-200^{\circ}C$. The surface leakage current is studied too. The passivated GaAs have a little leakage current compared to non passivated GaAs.

• 센서학회지
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• 제15권2호
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• pp.84-89
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• 2006

Highly concentrated p-type ZnO thin films can be obtained by doping of N, P and As elements. In this study, undoped ZnO buffer layers were prepared on a (0001) sapphire substrate by a ultra high vaccum pulsed laser deposition(UHV-PLD) method. ZnO buffer layers were deposited with various deposition temperature($400{\sim}700^{\circ}C$) at 350 mtorr of oxygen working pressure. Arsenic doped(1 wt%) ZnO thin films were deposited on the ZnO buffer layers by UHV-PLD. Crystallinity of the samples were evaluated by X-ray diffractometer and scanning electron microscopy. Optical, electrical properties of the ZnO thin films were estimated by photoluminescence(PL) and Hall measurements. The optimal condition of the undoped ZnO buffer layer for the deposition of As-doped ZnO thin films was at $600^{\circ}C$ of deposition temperature.

• 한국산학기술학회논문지
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• 제21권4호
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• pp.596-601
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• 2020

SiC는 큰 밴드 갭 에너지를 갖고, 불순물 도핑에 의해 p형 및 n형 전도의 제어가 용이해서 고온용 전자부품소재로 활용이 가능한 재료이다. 따라서 국내 부존 규조토의 고부가가치 활용을 위해 정제 규조토로부터 합성한 β-SiC 분말의 열전물성에 대해 조사하였다. 정제한 규조토 중의 SiO₂ 성분을 카본블랙으로 환원 탄화 반응시켜 β-SiC 분말을 합성하고, 잔존하는 불순물(Fe, Ca 등)을 제거하기 위해서 산처리 공정을 행하였다. 분말의 성형체를 질소 분위기 2000℃에서 1~5시간 소결시켜 n형 SiC 반도체를 제작하였다. 소결시간이 길어짐에 따라 캐리어 농도의 증가 및 입자간의 연결성 향상에 의해 도전율이 향상되었다. 합성 및 산처리한 β-SiC 분말에 내재하는 억셉터형 불순물(Al 등)로 인한 캐리어 보상효과가 도전율 향상에 저해하는 요인으로 나타났다. 소결시간이 증가함에 따라 입자 및 결정 성장과 함께 적층 결함 밀도의 감소에 의해 Seebeck 계수의 절대값이 증가하였다. 본 연구에서의 열전 변환 효율을 반영하는 power factor는 상용 고순도 β-SiC 분말로 제작한 다공질 SiC 반도체에 비해 다소 작게 나타났지만, 산처리 공정을 정밀하게 제어하면 열전물성은 보다 향상될 것으로 판단된다.

• 한국재료학회지
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• 제13권8호
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• pp.519-523
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• 2003

We report the synthesis of cubic spinel $ZnCo_2$$O_4$thin films and the tunability of the conduction type by control of the oxygen partial pressure ratio. Zinc cobalt oxide films were grown on$ SiO_2$(200 nm)/Si substrates by reactive magnetron sputtering method using Zn and Co metal targets in a mixed Ar/$O_2$atmosphere. We found from X-ray diffraction measurements that the crystal structure of the zinc cobalt oxide films grown under an oxygen-rich condition (the $O_2$/Ar partial pressure ratio of 9/1) changes from wurtzite-type $Zn_{1-x}$ $Co_{X}$O to spinel-type $ZnCo_2$$O_4$with the increase of the Co/Zn sputtering ratio,$ D_{co}$ $D_{zn}$ . We noted that the above structural change accompanied by the variation of the majority electrical conduction type from n-type (electrons) to p-type (holes). For a fixed $D_{co}$ $D_{zn}$ / of 2.0 yielding homogeneous spinel-type $_2$O$ZnCo_4$films, the type of the majority carriers also varied, depending on the$ O_2$/Ar partial pressure ratio: p-type for an $O_2$-rich and n-type for an Ar-rich atmosphere. The maximum electron and hole concentrations for the Zn $Co_2$ $O_4$films were found to be 1.37${\times}$10$^{20}$ c $m^{-3}$ and 2.41${\times}$10$^{20}$ c $m^{-3}$ , respectively, with a mobility of about 0.2 $\textrm{cm}^2$/Vs and a high conductivity of about 1.8 Ω/$cm^{-1}$ /.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제51권6호
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• pp.236-239
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• 2002

Si nanocrystallites thin films on P-type (100) Si substrate have been fabricated by pulsed laser deposition using a Nd:YAG laser. After deposition, samples were annealed in several environmental gases ;It the temperature range of 400 to $800^{\circ}C$ Hydrogen passivation was then performed in the forming gas (95 % $N_2$ + 5 % $H_2$) for 1 hr. Strong violet-indigo photoluminescence has been observed at room temperature on nitrogen ambient-annealed Si nanocrystallites. We report the variation of photoluminescence (PL) properties of Si thin films by changing annealing temperatures and by using hydrogen passivation. The results could suggest that the origin of violet-indigo PL should be related to the Quantum size effect of Si nanocrystallite.

• Korean Chemical Engineering Research
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• 제55권2호
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• pp.253-257
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• 2017

그래핀은 $sp^2$ 결합으로 이루어진 한 겹의 탄소 물질이며, 그래핀 본래의 우수한 물성으로 인해 다양한 분야에서 활용되고 있다. 그래핀의 높은 전기전도도와 전하이동도로 인해서 (광)전자 소자 물질로 주목받고 있다. 화학적 도핑 과정을 통해 n 형과 p 형의 그래핀이 형성 가능하며 이를 이용하여 다양한 구조의 소자 형성이 가능하게 되었다. 본 연구에서 그래핀의 도핑 효과를 선택적으로 증대시키기 위해 유전영동 현상을 도입하였다. 주파수 10 kHz, $5V_{pp}$ (peak-to-peak voltage) 조건에서 유전 영동 현상을 이용하였을 때 금나노입자들이 전극 위치 주변으로 집중됨을 확인하였다. 그래핀의 도핑 효과를 라만 분광법과 전기적 물성 변화를 통하여 조사하였으며, 그래핀에 $AuCl_3$ 용액을 이용한 유전 영동 현상을 통하여, 그래핀 기반 소자의 국소적인 부분에 선택적으로 화학적 도핑이 가능함을 확인하였다. 이러한 연구는 그래핀 기반 소자와 interconnection 등에 활용될 수 있을 것으로 기대된다.

• 한국전기전자재료학회논문지
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• 제31권3호
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• pp.129-134
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• 2018

Herein, we report the manufacture of high-performance, ambipolar organic field-effect transistors (OFETs) and complementary-like electronic circuitry based on a blended, polymeric, semiconducting film. Relatively high and well-balanced electron and hole mobilities were achieved by incorporating a small amount of ionic additives. The equivalent P-channel and N-channel properties of the ambipolar OFETs enabled the manufacture of complementary-like inverter circuits with a near-ideal switching point, high gain, and good noise margins, via a simple blanket spin-coating process with no additional patterning of each active P-type and N-type semiconductor layer.

• 한국정보통신학회논문지
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• 제18권6호
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• pp.1407-1412
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• 2014

근적외선 파장대역 850 nm ~ 1000 nm에서 레이저를 검출하기 위해 포토다이오드의 분광감응도를 향상시키고자 본 논문에서 실리콘 기반 고감도 PIN 포토 다이오드를 제작하고 전기적 및 광학적 특성을 분석하였다. 제작된 소자는 TO-18형으로 패키징 하였고 포토다이오드의 전기적 특성으로 역 바이어스 전압이 5V일 때 암전류는 Anode 1과 Anode 2는 약 0.055 nA 의 값을 나타내었으며 정전용약은 0V 일 때 1 kHz 주파수 대역에서 약 19.5 pF, 200 kHz 주파수 대역에서 약 19.8 pF의 적은 정전용약을 나타내었다. 또한 출력신호의 상승시간은 10 V의 전압일 때 약 30 ns의 고속 응답특성을 확인하였다. 광학적 특성 분석으로는 880 nm에서 최대 0.66 A/W의 분광감응도 값을 나타내었고 1000 nm에서는 0.45 A/W로 비교적 우수한 분광감응도를 나타내었다.