• Title/Summary/Keyword: memory stacking

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Advances in Package-on-Package Technology for Logic + Memory Integration

  • Scanlan Christopher
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2005.09a
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    • pp.111-129
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    • 2005
  • Pop provides OEMs and EMS with a platform to cost effectively expand options for logic + memory 3D integration - Expands device options by simplifying business logistics of stacking - Integration controlled at the system level to best match stacked combinations with system requirements - Eliminates margin stacking and expands technology reuse - Helps manage the huge cost impacts associated with increasing demand for multi media processing and memory. PoP is well timed to enable and leverage: - Mass customization of systems for different use (form, fit and function) requirements o Bband and apps processor + memory stack platforms - Logic transition to flip chip enables PoP size reduction o Area and height reduction. Industry standardization is progressing. Amkor provides full turn-key support for base package, memory package and full system integration.

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Overview of High Performance 3D-WLP

  • Kim, Eun-Kyung
    • Korean Journal of Materials Research
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    • v.17 no.7
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    • pp.347-351
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    • 2007
  • Vertical interconnect technology called 3D stacking has been a major focus of the next generation of IC industries. 3D stacked devices in the vertical dimension give several important advantages over conventional two-dimensional scaling. The most eminent advantage is its performance improvement. Vertical device stacking enhances a performance such as inter-die bandwidth improvements, RC delay mitigation and geometrical routing and placement advantages. At present memory stacking options are of great interest to many industries and research institutes. However, these options are more focused on a form factor reduction rather than the high performance improvements. In order to improve a stacked device performance significantly vertical interconnect technology with wafer level stacking needs to be much more progressed with reduction in inter-wafer pitch and increases in the number of stacked layers. Even though 3D wafer level stacking technology offers many opportunities both in the short term and long term, the full performance benefits of 3D wafer level stacking require technological developments beyond simply the wafer stacking technology itself.

3D SDRAM Package Technology for a Satellite (인공위성용 3차원 메모리 패키징 기술)

  • Lim, Jae-Sung;Kim, Jin-Ho;Kim, Hyun-Ju;Jung, Jin-Wook;Lee, Hyouk;Park, Mi-Young;Chae, Jang-Soo
    • Journal of the Microelectronics and Packaging Society
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    • v.19 no.1
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    • pp.25-32
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    • 2012
  • Package for artificial satellite is to produce mass production for high package with reliability certification as well as develop SDRAM (synchronous dynamic RAM) module which has such as miniaturization, mass storage, and high reliability in space environment. It requires sophisticated technology with chip stacking or package stacking in order to increase up to 4Gbits or more for mass storage with space technology. To make it better, we should secure suitable processes by doing design, manufacture, and debugging. Pin type PCB substrate was then applied to QFP-Pin type 3D memory package fabrication. These results show that the 3D memory package for artificial satellite scheme is a promising candidate for the realization of our own domestic technologies.

A New Smart Stacking Technology for 3D-LSIs

  • Koyanagi Mitsu
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2005.09a
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    • pp.89-110
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    • 2005
  • A new 3D integration technology using wafer-to-wafer and chip-to-wafer stacking method was described. It was demonstrated that 3D microprocessor, 3D shared memory, 3D image processing chip and 3D artificial retina chip fabricated using 3D integration technology were successfully operated. The possibility of applying 3D image processing chip and 3D artificial retina chip to Robot's eye was investigated. The possibility of implanting 3D artificial retina chip into human eye was investigated.

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A Die-Selection Method Using Search-Space Conditions for Yield Enhancement in 3D Memory

  • Lee, Joo-Hwan;Park, Ki-Hyun;Kang, Sung-Ho
    • ETRI Journal
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    • v.33 no.6
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    • pp.904-913
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    • 2011
  • Three-dimensional (3D) memories using through-silicon vias (TSVs) as vertical buses across memory layers will likely be the first commercial application of 3D integrated circuit technology. The memory dies to stack together in a 3D memory are selected by a die-selection method. The conventional die-selection methods do not result in a high-enough yields of 3D memories because 3D memories are typically composed of known-good-dies (KGDs), which are repaired using self-contained redundancies. In 3D memory, redundancy sharing between neighboring vertical memory dies using TSVs is an effective strategy for yield enhancement. With the redundancy sharing strategy, a known-bad-die (KBD) possibly becomes a KGD after bonding. In this paper, we propose a novel die-selection method using KBDs as well as KGDs for yield enhancement in 3D memory. The proposed die-selection method uses three search-space conditions, which can reduce the search space for selecting memory dies to manufacture 3D memories. Simulation results show that the proposed die-selection method can significantly improve the yield of 3D memories in various fault distributions.

Feasibility Study of Non-volatile Memory Device Structure for Nanometer MOSFET (나노미터 MOSFET비휘발성 메모리 소자 구조의 탐색)

  • Jeong, Ju Young
    • Journal of the Semiconductor & Display Technology
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    • v.14 no.2
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    • pp.41-45
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    • 2015
  • From 20nm technology node, the finFET has become standard device for ULSI's. However, the finFET process made stacking gate non-volatile memory obsolete. Some reported capacitor-less DRAM structure by utilizing the FBE. We present possible non-volatile memory device structure similar to the dual gate MOSFET. One of the gates is left floating. Since body of the finFET is only 40nm thick, control gate bias can make electron tunneling through the floating gate oxide which sits across the body. For programming, gate is biased to accumulation mode with few volts. Simulation results show that the programming electron current flows at the interface between floating gate oxide and the body. It also shows that the magnitude of the programming current can be easily controlled by the drain voltage. Injected electrons at the floating gate act similar to the body bias which changes the threshold voltage of the device.

A Cache-based Reconfigurable Accelerator in Die-stacked DRAM (3차원 구조 DRAM의 캐시 기반 재구성형 가속기)

  • Kim, Yongjoo
    • KIPS Transactions on Computer and Communication Systems
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    • v.4 no.2
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    • pp.41-46
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    • 2015
  • The demand on low power and high performance system is soaring due to the extending of mobile and small electronic device market. The 3D die-stacking technology is widely studying for next generation integration technology due to its high density and low access time. We proposed the 3D die-stacked DRAM including a reconfigurable accelerator in a logic layer of DRAM. Also we discuss and suggest a cache-based local memory for a reconfigurable accelerator in a logic layer. The reconfigurable accelerator in logic layer of 3D die-stacked DRAM reduces the overhead of data management and transfer due to the characteristics of its location, so that can increase the performance highly. The proposed system archives 24.8 speedup in maximum.

The Implementation of High speed Memory module Interface in the Military Single Board Computer (군용Single Board Computer에서의 고속메모리모듈 I/F구현)

  • Lee, Teuc-Soo;Kim, Young-Kil
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.15 no.3
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    • pp.521-527
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    • 2011
  • POWER PC series are common to the Central Processing Unit for Military Single Board Computer. Among them, G4 group, which contains the 74xx series supported by Freescale manufacturer is mainly used in the Military applications. We focus on the Interface between memory and controller. PCB stacking method, component routing, impedance matching and harsh environment for Military spec are the main constraints for implementation. Also, we developed memory as a module for the consideration of Military environments. The overall type of SBC should be designed by the form of 6U VME or 3U VME. Therefore this study suggests the electrically optimum Interface matching, Artwork technology based on the signal cross over and PCB stacking method on the harsh environment.

Enhancement of nonvolatile memory of performance using CRESTED tunneling barrier and high-k charge trap/bloking oxide layers (Engineered tunnel barrier가 적용되고 전화포획층으로 $HfO_2$를 가진 비휘발성 메모리 소자의 특성 향상)

  • Park, Goon-Ho;You, Hee-Wook;Oh, Se-Man;Kim, Min-Soo;Jung, Jong-Wan;Lee, Young-Hie;Chung, Hong-Bay;Cho, Won-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.415-416
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    • 2009
  • The tunnel barrier engineered charge trap flash (TBE-CTF) non-volatile memory using CRESTED tunneling barrier was fabricated by stacking thin $Si_3N_4$ and $SiO_2$ dielectric layers. Moreover, high-k based $HfO_2$ charge trap layer and $Al_2O_3$ blocking layer were used for further improvement of the NVM (non-volatile memory) performances. The programming/erasing speed, endurance and data retention of TBE-CTF memory was evaluated.

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Through Silicon Stack (TSS) Assembly for Wide IO Memory to Logic Devices Integration and Its Signal Integrity Challenges

  • Shin, Jaemin;Kim, Dong Wook
    • The Proceeding of the Korean Institute of Electromagnetic Engineering and Science
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    • v.24 no.2
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    • pp.51-57
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    • 2013
  • The current expanding mobile markets incessantly demands small form factor, low power consumption and high aggregate throughput for silicon-level integration such as memory to logic system. One of emerging solution for meeting this high market demand is 3D through silicon stacking (TSS) technology. Main challenges to bring 3D TSS technology to the volume production level are establishing a cost effective supply chain and building a reliable manufacturing processes. In addition, this technology inherently help increase number of IOs and shorten interconnect length. With those benefits, however, potential signal and power integrity risks are also elevated; increase in PDN inductance, channel loss on substrate, crosstalk and parasitic capacitance. This paper will report recent progress of wide IO memory to high count TSV logic device assembly development work. 28 nm node TSV test vehicles were fabricated by the foundry and assembled. Successful integration of memory wide IO chip with less than a millimeter package thickness form factor was achieved. For this successful integration, we discussed potential signal and power integrity challenges. This report demonstrated functional wide IO memory to 28 nm logic device assembly using 3D package architecture with such a thin form factor.