• JSTS:Journal of Semiconductor Technology and Science
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• 제14권2호
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• pp.169-174
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• 2014

As a versatile processing method for nanoscale memory integration, laser-induced epitaxial growth is proposed for the fabrication of vertical Si channel (VSC) transistor. The fabricated VSC transistor with 80 nm gate length and 130 nm pillar diameter exhibited field effect mobility of $300cm^2/Vs$, which guarantees "device quality". In addition, we have shown that this VSC transistor provides memory operations with a memory window of 700 mV, and moreover, the memory window further increases by employing charge trap dielectrics in our VSC transistor. Our proposed processing method and device structure would provide a promising route for the further scaling of state-of-the-art memory technology.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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• pp.199-202
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• 2004

NFGM(Nano-Floating Gate Memory) is a very prospective candidate memory for the next generation with MRAM, PRAM, PoRAM. Among these memory devices for the next generation, NFGM has a lot of merits such as a simple low cost fabrication process, improved retention time, lower operating voltages, high speed program/erase time and so on. Therefore, many intensive researches for NFGM have been performed to improve device performance and reliability, which depends on the ability to control particle size, size distribution, crystallity, areal particle density and tunneling oxide quality. In this paper, we investigate the researches for NFGM up to recently.

• 반도체디스플레이기술학회지
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• 제5권1호
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• pp.17-20
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• 2006

This paper presents of a new type of memory cell that could potentially replace both DRAM and flash memory. The proposed device cell operates by sensing the state of about 1,000 electrons trapped between unique insulating barriers in the channel region of the upper transistor. These electrons are controlled by a side gate on the transistor, and their state in turn controls the gate of the larger transistor, providing signal gain within the memory cell. It becomes faster and more reliable memory with lower operation voltage. Moreover, the use of a multiple tunnel junction (MTJ) fur the vertical transistor can significantly improve the data retention and operation speed.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2010년도 추계학술대회
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• pp.58-61
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• 2010

본 논문에서는 I/O Filter Driver 와 NAND FLASH Memory의 적용을 통한 HDD 저장장치의 느린 I/O 성능을 개선하기 위한 방법에 대해 연구했다. 반도체 부품으로서 빠른 I/O 성능을 보이는 NANDFLASH Memory의 적용과 이를 구동시키기 위한 Filter Driver (Device Driver)를 적용했으며, 이를 통해 HDD 저장장치의 향상된 I/O성능을 분석하고 개선하는 방법을 제안한다.

• 한국산업융합학회 논문집
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• 제24권1호
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• pp.69-77
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• 2021

The widely used low-cost design methodology for IoT devices is very popular. In such a networked device, memory is composed of flash memory, SRAM, DRAM, etc., and because it processes a large amount of data, memory design is an important factor for system performance. Therefore, each device selects optimized design factors such as function, performance and cost according to market demand. The design of a memory architecture available for low-cost IoT devices is very limited with the configuration of SRAM, flash memory, and DRAM. In order to process as much data as possible in the same space, an architecture that supports parallel processing units is usually provided. Such parallel architecture is a design method that provides high performance at low cost. However, it needs precise software techniques for instruction and data mapping on the parallel architecture. This paper proposes an instruction/data mapping method to support optimized parallel processing performance. The proposed method optimizes system performance by actively using hardware and software parallelism.

• ETRI Journal
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• 제44권3호
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• pp.450-461
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• 2022

The Gen-Z protocol is a memory semantic protocol between the memory and CPU used in computer architectures with large memory pools. This study presents the implementation of the Gen-Z hardware system configured using Gen-Z specification 1.0 and reports its performance. A hardware prototype of a DDR4 Gen-Z memory pool with an optimized character, a block device driver, and a file system for the Gen-Z hardware was designed. The Gen-Z IP was targeted to the FPGA, and a 512 GB Gen-Z memory pool was configured on an ×86 server. In the experiments, the latency and throughput of the Gen-Z memory were measured and compared with those of the local memory, SATA SSD, and NVMe using character or block device interfaces. The Gen-Z hardware exhibited superior throughput and latency performance compared with SATA SSD and NVMe at block sizes under 4 kB. The MySQL and File IO benchmark of Gen-Z showed good write performance in all block sizes and threads. Besides, it showed low latency in RocksDB's fillseq dbbench using the ext4 direct access filesystem.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 춘계학술대회 논문집
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• pp.317-318
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• 2010

• JSTS:Journal of Semiconductor Technology and Science
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• 제8권1호
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• pp.1-10
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• 2008

The present status of technical development of a highly scalable, high-speed non-volatile PCM is overviewed. Major technical challenges are described along with solutions that are being pursued in terms of innovative device structures and fabrication technologies, new phase change materials, and new memory schemes.

• 대한임베디드공학회논문지
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• 제7권3호
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• pp.151-156
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• 2012

When mounting the sensor device in the way of Plug&Play, sensor device drivers need to be loaded and linked dynamically. Since a sensor node platform is based on small 8 bit MCU, dynamic loading and linking technique used in Windows and Linux can not be applied. In this paper, we present how to link and load dynamically sensor device drivers for sensor device Plug&Play. We implement a prototype and evaluate it to make sure that there is no performance degradation like sensor device driver connection speed and memory usage. Connection speed overhead increases to 0.2ms. Memory usage overhead increases to hundreds byte. It shows that there is no heavy influence in running the actual program.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2008년도 제39회 하계학술대회
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• pp.1226-1227
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• 2008

In this study, a single p-type Si nanowire - Au nanoparticles nano floating gate memory (NFGM) device is successfully fabricated and characterized their memory effects by comparison of electrical characteristics of p-type Si nanowire-based field effect transistor (FET) devices with Au nanoparticles embedded in the $Al_2O_3$ gate materials and without the Au nanoparticles. Drain current versus gate voltage ($I_{DS}-V_{GS}$) characteristics of a single p-type Si nanowire - Au nanoparticle NFGM device show counterclockwise hysteresis loops with the threshold voltage shift of ${\Delta}V_{th}$= 3.0 V. However, p-type Si nanowire based top-gate device without Au nanoparticles does not exhibit a threshold voltage shift. This behavior is ascribed to the presence of the Au nanoparticles, and is indicative of the trapping and emission of electrons in the Au nanoparticles.