• Title/Summary/Keyword: memory device

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High Quality Vertical Silicon Channel by Laser-Induced Epitaxial Growth for Nanoscale Memory Integration

  • Son, Yong-Hoon;Baik, Seung Jae;Kang, Myounggon;Hwang, Kihyun;Yoon, Euijoon
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.14 no.2
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    • pp.169-174
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    • 2014
  • As a versatile processing method for nanoscale memory integration, laser-induced epitaxial growth is proposed for the fabrication of vertical Si channel (VSC) transistor. The fabricated VSC transistor with 80 nm gate length and 130 nm pillar diameter exhibited field effect mobility of $300cm^2/Vs$, which guarantees "device quality". In addition, we have shown that this VSC transistor provides memory operations with a memory window of 700 mV, and moreover, the memory window further increases by employing charge trap dielectrics in our VSC transistor. Our proposed processing method and device structure would provide a promising route for the further scaling of state-of-the-art memory technology.

Memory Device for the Next Generation(Nano-Floating Gate Memory) (차세대 메모리 개발 동향(나노 플로팅 게이트 메모리))

  • Kil, Sang-Cheol;Kim, Hjun-Suk;Kim, Sang-Sig
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.199-202
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    • 2004
  • NFGM(Nano-Floating Gate Memory) is a very prospective candidate memory for the next generation with MRAM, PRAM, PoRAM. Among these memory devices for the next generation, NFGM has a lot of merits such as a simple low cost fabrication process, improved retention time, lower operating voltages, high speed program/erase time and so on. Therefore, many intensive researches for NFGM have been performed to improve device performance and reliability, which depends on the ability to control particle size, size distribution, crystallity, areal particle density and tunneling oxide quality. In this paper, we investigate the researches for NFGM up to recently.

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A Study of Memory Device based on Tunneling Mechanism (터널링 메커니즘을 이용한 메모리 소자 연구)

  • Lee Jun-Ha
    • Journal of the Semiconductor & Display Technology
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    • v.5 no.1 s.14
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    • pp.17-20
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    • 2006
  • This paper presents of a new type of memory cell that could potentially replace both DRAM and flash memory. The proposed device cell operates by sensing the state of about 1,000 electrons trapped between unique insulating barriers in the channel region of the upper transistor. These electrons are controlled by a side gate on the transistor, and their state in turn controls the gate of the larger transistor, providing signal gain within the memory cell. It becomes faster and more reliable memory with lower operation voltage. Moreover, the use of a multiple tunnel junction (MTJ) fur the vertical transistor can significantly improve the data retention and operation speed.

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A Study of HDD Performance Improvement through Filter Driver & NAND FLASH Memory (Filter Driver 와 NAND FLASH Memory를 이용한 HDD 장치의 성능 개선에 관한 연구)

  • Kim, Woo-Gil;Kim, Young-Kil
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2010.10a
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    • pp.58-61
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    • 2010
  • In this paper, we research the method for HDD I/O Performance improvement by Filter Driver &NAND FLASH Memory. We analyze the effect of the operation of the Device Driver & NAND FLASH Memory and propose the method for the HDD I/O Performance improvement.

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A Study on Improvement of Low-power Memory Architecture in IoT/edge Computing (IoT/에지 컴퓨팅에서 저전력 메모리 아키텍처의 개선 연구)

  • Cho, Doosan
    • Journal of the Korean Society of Industry Convergence
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    • v.24 no.1
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    • pp.69-77
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    • 2021
  • The widely used low-cost design methodology for IoT devices is very popular. In such a networked device, memory is composed of flash memory, SRAM, DRAM, etc., and because it processes a large amount of data, memory design is an important factor for system performance. Therefore, each device selects optimized design factors such as function, performance and cost according to market demand. The design of a memory architecture available for low-cost IoT devices is very limited with the configuration of SRAM, flash memory, and DRAM. In order to process as much data as possible in the same space, an architecture that supports parallel processing units is usually provided. Such parallel architecture is a design method that provides high performance at low cost. However, it needs precise software techniques for instruction and data mapping on the parallel architecture. This paper proposes an instruction/data mapping method to support optimized parallel processing performance. The proposed method optimizes system performance by actively using hardware and software parallelism.

Gen-Z memory pool system implementation and performance measurement

  • Kwon, Won-ok;Sok, Song-Woo;Park, Chan-ho;Oh, Myeong-Hoon;Hong, Seokbin
    • ETRI Journal
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    • v.44 no.3
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    • pp.450-461
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    • 2022
  • The Gen-Z protocol is a memory semantic protocol between the memory and CPU used in computer architectures with large memory pools. This study presents the implementation of the Gen-Z hardware system configured using Gen-Z specification 1.0 and reports its performance. A hardware prototype of a DDR4 Gen-Z memory pool with an optimized character, a block device driver, and a file system for the Gen-Z hardware was designed. The Gen-Z IP was targeted to the FPGA, and a 512 GB Gen-Z memory pool was configured on an ×86 server. In the experiments, the latency and throughput of the Gen-Z memory were measured and compared with those of the local memory, SATA SSD, and NVMe using character or block device interfaces. The Gen-Z hardware exhibited superior throughput and latency performance compared with SATA SSD and NVMe at block sizes under 4 kB. The MySQL and File IO benchmark of Gen-Z showed good write performance in all block sizes and threads. Besides, it showed low latency in RocksDB's fillseq dbbench using the ext4 direct access filesystem.

Overview of the Current Status of Technical Development for a Highly Scalable, High-Speed, Non-Volatile Phase-Change Memory

  • Lee, Su-Youn;Jeong, Jeung-Hyun;Cheong, Byung-Ki
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.8 no.1
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    • pp.1-10
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    • 2008
  • The present status of technical development of a highly scalable, high-speed non-volatile PCM is overviewed. Major technical challenges are described along with solutions that are being pursued in terms of innovative device structures and fabrication technologies, new phase change materials, and new memory schemes.

Sensor Device Plug & Play for Ubiquitous Computing (유비쿼터스 컴퓨팅을 위한 센서 디바이스 Plug & Play)

  • Park, Jung-Sun;Eun, SeongBae;Yoon, Hyeon-Ju
    • IEMEK Journal of Embedded Systems and Applications
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    • v.7 no.3
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    • pp.151-156
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    • 2012
  • When mounting the sensor device in the way of Plug&Play, sensor device drivers need to be loaded and linked dynamically. Since a sensor node platform is based on small 8 bit MCU, dynamic loading and linking technique used in Windows and Linux can not be applied. In this paper, we present how to link and load dynamically sensor device drivers for sensor device Plug&Play. We implement a prototype and evaluate it to make sure that there is no performance degradation like sensor device driver connection speed and memory usage. Connection speed overhead increases to 0.2ms. Memory usage overhead increases to hundreds byte. It shows that there is no heavy influence in running the actual program.

Memory characteristics of p-type Si nanowire - Au nanoparticles nano floating gate memory device (P형 실리콘 나노선과 Au 나노입자를 이용한 나노플로팅게이트 메모리소자의 전기적 특성 분석)

  • Yoon, Chang-Joon;Yeom, Dong-Hyuk;Kang, Jeong-Min;Jeong, Dong-Young;Kim, Sang-Sig
    • Proceedings of the KIEE Conference
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    • 2008.07a
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    • pp.1226-1227
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    • 2008
  • In this study, a single p-type Si nanowire - Au nanoparticles nano floating gate memory (NFGM) device is successfully fabricated and characterized their memory effects by comparison of electrical characteristics of p-type Si nanowire-based field effect transistor (FET) devices with Au nanoparticles embedded in the $Al_2O_3$ gate materials and without the Au nanoparticles. Drain current versus gate voltage ($I_{DS}-V_{GS}$) characteristics of a single p-type Si nanowire - Au nanoparticle NFGM device show counterclockwise hysteresis loops with the threshold voltage shift of ${\Delta}V_{th}$= 3.0 V. However, p-type Si nanowire based top-gate device without Au nanoparticles does not exhibit a threshold voltage shift. This behavior is ascribed to the presence of the Au nanoparticles, and is indicative of the trapping and emission of electrons in the Au nanoparticles.

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