• 반도체디스플레이기술학회지
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• 제9권4호
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• pp.13-18
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• 2010

Extreme ultraviolet (EUV) lithography using 13.5 nm wavelengths is expected to be adopted as a mass production technology for 32 nm half pitch and below. One of the new issues introduced by EUV lithography is the shadowing effect. Mask shadowing is a unique phenomenon caused by using mirror-based mask with an oblique incident angle of light. This results in a horizontal-vertical (H-V) biasing effect and ellipticity in the contact hole pattern. To minimize the shadowing effect, a refilled mask is an available option. The concept of refilled mask structure can be implemented by partial etching into the multilayer and then refilling the trench with an absorber material. The simulations were carried out to confirm the possibility of application of refilled mask in 32 nm line-and-space pattern under the condition of preproduction tool. The effect of sidewall angle in refilled mask is evaluated on image contrast and critical dimension (CD) on the wafer. We also simulated the effect of refilled absorber thickness on aerial image, H-V CD bias, and overlapping process window. Finally, we concluded that the refilled absorber thickness for minimizing shadowing effect should be thinner than etched depth.

• 한국정밀공학회지
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• 제25권1호
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• pp.138-144
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• 2008

Micro-machining of a brittle material such as glass, silicon, etc., is important in micro fabrication. Particularly, micro-abrasive jet machining (${\mu}-AJM$) has become a useful technique for micro-machining of such materials. The ${\mu}-AJM$ process is mainly based on the erosion of a mask which protects brittle substrate against high velocity of micro-particle. Therefore, fabrication of an adequate mask is very important. Generally, for the fabrication of a mask in the ${\mu}-AJM$ process, a photomask based on the semi-conductor fabrication process was used. In this research a rapid mask fabrication technology has been developed for the ${\mu}-AJM$. By scanning the focused UV laser beam, a micro-mask pattern was fabricated directly without photolithography process and photomask. Two kinds of mask patterns were fabricated using SU-8 and photopolymer (Watershed 11110). Using fabricated mask patterns, abrasive-jet machining of Si wafer were conducted successfully.

• 대한의용생체공학회:의공학회지
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• 제43권3호
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• pp.131-135
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• 2022

Due to COVID-19, Correct method of wearing mask is important to prevent COVID-19 and the other respiratory tract infections. And the deep learning technology in the image processing has been developed. The purpose of this study is to create the type of mask wearing dataset for deep learning models and select the deep learning model to detect the wearing mask correctly. The Image dataset is the 2,296 images acquired using a web crawler. Deep learning classification models provided by tensorflow are used to validate the dataset. And Object detection deep learning model YOLOs are used to select the detection deep learning model to detect the wearing mask correctly. In this process, this paper proposes to validate the type of mask wearing datasets and YOLOv5 is the effective model to detect the type of mask wearing. The experimental results show that reliable dataset is acquired and the YOLOv5 model effectively recognize type of mask wearing.

• 공연문화연구
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• 제40호
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• pp.163-192
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• 2020

땅설법의 하나인 신중신탈놀이는 '성주신 일대기'와 관련이 있다. 신중신탈놀이는 성주신이 귀양을 가면서 만난 민속신들에 관한 이야기를 가면극으로 재구성한 것이다. 성주신일대기를 탈놀이의 형태로 진행하며, 설법을 주도하는 스님은 해설과 주요 배역을 맡는다. 다수의 신도들은 여러 배역과 악사의 역할을 한다. 신중신탈놀이에서는 많은 민속신앙이 소개되고, 흥미유발을 위한 소리, 재담 등이 포함되어있다. 신중신탈놀이는 기존 탈놀이와 마찬가지로 단어의 나열과 반복을 통한 연행 방식을 사용한다. 문장이나 구절의 반복은 관중들에게 문맥의 의미를 예지하거나 줄거리의 전개양상을 선지할 수 있는 역할을 한다. 이러한 반복은 장면의 상황을 강조하고 율동감을 조성하기 위한 것이다. 탈놀이는 서민층의 전유물이었기 때문에, 탈놀이꾼들이 민요에서 흔히 사용되는 반복방식을 대사에 활용한다. 그로인해 관중에게 친숙감을 주고, 관중의 취향에 부응하는 것이다. 신중신탈놀이는 대중의 포교를 위해 민중의 연희방식을 차용하였다. 단어 또는 문장이나 구절의 반복, 단어나 문장의 대구, 기존 가요의 차용, 공식적 표현단위 등 전통연희의 극적 형식을 계승하고 있다. 또한 반복적 연행단락을 통하여 신자들이 직간접적으로 쉽게 익히고 이해할 수 있도록 하였다. 신중신탈놀이는 신앙공동체를 중심으로 전승되었고, 불법을 확산하기 위한 민중교화의 수단으로 활용되었다. 불교가 민속신앙을 수용하는 과정을 탈놀이를 통해 외연화하고, 직간접적으로 참여한 신도의 경우 놀이를 통해 자연스럽게 화엄경의 신앙체계를 체득하게 된다. 땅설법 중 하나인 신중신탈놀이는 대중교화나 포교뿐만 아니라 무형문화유산으로서의 가치 또한 지대하다고 할 수 있다.

• 대한두개안면성형외과학회지
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• 제18권4호
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• pp.223-229
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• 2017

The beauty of the laryngeal mask is that it forms an air tight seal enclosing the larynx rather than plugging the pharynx, and avoid airway obstruction in the oropharynx. The goal of its development was to create an intermediate form of airway management face mask and endotracheal tube. Indication for its use includes any procedure that would normally involve the use of a face mask. The laryngeal mask airway was designed as a new concept in airway management and has been gaining a firm position in anesthetic practice. Despite wide spread use the definitive role of the laryngeal mask airway is yet to be established. In some situations, such as after failed tracheal intubation or in oral surgery its use is controversial. There are several unresolved issues, for example the effect of the laryngeal mask on regurgitation and whether or not cricoids pressure prevents placement of mask. We review the techniques of insertion, details of misplacement, and complications associated with use of the laryngeal mask. We then attempt to clarify the role of laryngeal mask in air way management during anesthesia, discussing the advantages and disadvantages as well as indications and contraindications of its use in oral and maxillofacial surgery.

• 한국정보전자통신기술학회논문지
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• 제14권4호
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• pp.323-327
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• 2021

본 논문은 OLED에 사용되는 SUS MASK를 자동액관리 시스템을 사용하여 제작 하였다. SUS MASK의 홀 직경은 0.4 mm으로 설정하여 실험 하였다. 첨가제 F300이 홀 직경이 0.4 mm에 근접하고 오차범위는 평균 0.08로 측정되어 우수함을 알 수 있었다. 그리고 산화환원전위(ORP) 변화에 따른 CuCl2와 FeCl3의 무게 감소량을 측정결과, FeCl3이 ORP 변화에 상대적으로 민감도가 높은 것으로 나타났다. SUS Mask를 연속적으로 에칭하면서 ORP(610 mV)와 비중(1.463)이 자동으로 조절되는지를 실험를 하였다. 실험결과로서는 셋팅 값이 크게 변화되지 않아 자동액관리 시스템이 잘 조절이 잘 되는 것으로 나타났다. 그리고 홀 직경을 0.4 mm로 목표치로 설정한 후 실험 한 결과는 0.36부터 0.44까지 측정되었다. 따라서 SUS MASK 제조공정에서 에칭가공공정은 제작된 자동액관리 시스템을 적용시키면 보다 안정성 높은 정밀도로 향상 시킬 수 있을 것으로 기대된다.

• 한국빅데이터학회지
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• 제7권1호
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• pp.63-73
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• 2022

2020년부터 현재까지 COVID-19가 지속되고 있으며, 사회적으로도 많은 변화가 생겼다. 마스크를 착용하는 것은 필수가 되었고, 마스크 미착용 시, 공공시설이나 식당 등을 이용할 수 없게 되었다. 이로 인해 대부분의 공공시설 출입구에서는 마스크 인식 시스템을 구비하여 마스크 착용 여부를 확인하고 있다. 그러나 목도리로 입을 가린 사람이나 마스크를 제대로 착용하지 않은 사람 등에 대한 판별 여부가 불분명하다. 본 연구에서는 YOLOv5를 이용한 임베디드 마스크 인식 시스템을 제안하였다. 기존 마스크 인식 시스템과는 달리 마스크 착용 여부뿐만 아니라 목도리를 입으로 가린 사람, 손으로 입을 가린 사람 등 다양한 예외 상황에서도 마스크 착용 여부를 구별해낼 수 있었으며, Nvida Jetson Nano Board에 탑재하였을 때 우수한 성능을 보였다.

• 한국포장학회지
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• 제30권1호
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• pp.73-83
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• 2024

In this study, environmental evaluation of high barrier coated paper (coating layer/paper) packaging is conducted in comparison with conventional aluminum laminated (PET/VMPET/LLDPE) plastic packaging. The target product for this packaging is a KF94 mask, which requires a high barrier of water and oxygen to maintain the filtration ability of the mask filter. The functional unit of this study is 10,000 mask packaging materials based on a material capable of blocking oxygen (<1 g/m²day) and moisture (<3 g/m²day) for the preservation of KF94 masks. In order to understand the results easily, paper-based mask packaging system divided into 6 stages (pulp, pulping & paper making, calendaring & coating, printing, packing and waste management), while plastic-based mask packaging consists of 5 stages (material production, processing, printing, packing, waste management) In case of paper-based mask packaging, most contributing stage is calendaring & coating, resulting from heat and electricity production. On the other hand, plastic-based mask packaging is contributed more than 30% by material production, specifically due to linear low density polyethylene and purified terephthalic acid production. The comparison results show that global warming potential of paper-based mask packaging has 32% lower than that of plastic-based mask packaging. Most of other impact indicators revealed in similar trend.

• 동굴
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• 제77호
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• pp.21-30
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• 2007

Photo-lithography lies in the middle of the wafer fabrication process. It is often considered as the most critical step in the IC process. We use a mask in exposure steps of the photo-lithography. Typically, 20 to 25 different levels of masks are required to complete an IC device. That means, if a photo process can be developed with the use of only one photo mask, we can reduce more process cost. To satisfy this, we plan to develop an alternative photo mask. For this reason, we chose to use a LCD. We expect to develop a LCD panel that can be changed by electrical control. This is the main idea about the adjustive photo mask. The Photo mask made of LCD panel will replace the former one.

• Transactions on Electrical and Electronic Materials
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• 제16권6호
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• pp.312-316
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• 2015

Through silicon via (TSV) technology holds the promise of chip-to-chip or chip-to-package interconnections for higher performance with reduced signal delay and power consumption. It includes high aspect ratio silicon etching, insulation liner deposition, and seamless metal filling. The desired etch profile should be straightforward, but high aspect ratio silicon etching is still a challenge. In this paper, we investigate the use of etch hard mask for finer TSVs etching to have clear definition of etched via pattern. Conventionally employed photoresist methods were initially evaluated as reference processes, and oxide and metal hard mask were investigated. We admit that pure metal mask is rarely employed in industry, but the etch result of metal mask support why hard mask are more realistic for finer TSV etching than conventional photoresist and oxide mask.