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http://dx.doi.org/10.17661/jkiiect.2021.14.4.323

A Study on the Etching of SUS MASK using Automatic Liquid Management System  

Lee, Woo-Sik (Department of Chemical & Biological Engineering, Gachon University)
Publication Information
The Journal of Korea Institute of Information, Electronics, and Communication Technology / v.14, no.4, 2021 , pp. 323-327 More about this Journal
Abstract
This paper produced SUS MASK, which is used for OLEDs, using an automatic liquid management system. The SUS MASK was tested by setting the hole diameter to 0.4 mm. The additive F300 was found to be excellent as the hole diameter was close to 0.4 mm and the error range was measured to be 0.08 on average. And as a result of measuring the weight reduction amount of CuCl2 and FeCl3 according to the change in oxidation-reduction potential (ORP), FeCl3 is relatively sensitive to ORP changes. Experiments were conducted on whether ORP (610 mV) and specific gravity (1.463) were automatically controlled while continuously etching the SUS Mask. Experimental results show that the automatic liquid management system is well controlled because the setting value is not significantly changed. After setting the hole diameter to 0.4 mm as the target, the experiment results were measured from 0.36 to 0.44. Therefore, it is expected that etching processing in the manufacturing process of SUS MASK can be improved with higher precision by applying the manufactured automatic liquid management system.
Keywords
Automatic liquid management system; SUS MASK; etching speed; FeCl3; Oxidation-reduction Potential; OLED; specific gravity;
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