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LCD Photo-mask Using Commercial LCD Panel  

Lee, Seung-Ik (명지대학교 전자공학과)
Koh, Jeongh-Hyun (명지대학교 전자공학과)
Lee, Sang-Young (명지대학교 전자공학과)
Park, Jang-Ho (명지대학교 전자공학과)
Soh, Dea-Wha (명지대학교 전자공학과)
Publication Information
Journal of the Speleological Society of Korea / v., no.77, 2007 , pp. 21-30 More about this Journal
Abstract
Photo-lithography lies in the middle of the wafer fabrication process. It is often considered as the most critical step in the IC process. We use a mask in exposure steps of the photo-lithography. Typically, 20 to 25 different levels of masks are required to complete an IC device. That means, if a photo process can be developed with the use of only one photo mask, we can reduce more process cost. To satisfy this, we plan to develop an alternative photo mask. For this reason, we chose to use a LCD. We expect to develop a LCD panel that can be changed by electrical control. This is the main idea about the adjustive photo mask. The Photo mask made of LCD panel will replace the former one.
Keywords
LCD panel; LCD mask; Photo-lithography; Embedded board;
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