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Development of Rapid Mask Fabrication Technology for Micro-abrasive Jet Machining  

Lee, Seung-Pyo (충북대학교 대학원 정밀기계공학과)
Ko, Tae-Jo (영남대학교 기계공학부)
Kang, Hyun-Wook (포항공과대학교 기계공학과)
Cho, Dong-Woo (포항공과대학교 기계공학과)
Lee, In-Hwan (충북대학교 기계공학부)
Publication Information
Journal of the Korean Society for Precision Engineering / v.25, no.1, 2008 , pp. 138-144 More about this Journal
Abstract
Micro-machining of a brittle material such as glass, silicon, etc., is important in micro fabrication. Particularly, micro-abrasive jet machining (${\mu}-AJM$) has become a useful technique for micro-machining of such materials. The ${\mu}-AJM$ process is mainly based on the erosion of a mask which protects brittle substrate against high velocity of micro-particle. Therefore, fabrication of an adequate mask is very important. Generally, for the fabrication of a mask in the ${\mu}-AJM$ process, a photomask based on the semi-conductor fabrication process was used. In this research a rapid mask fabrication technology has been developed for the ${\mu}-AJM$. By scanning the focused UV laser beam, a micro-mask pattern was fabricated directly without photolithography process and photomask. Two kinds of mask patterns were fabricated using SU-8 and photopolymer (Watershed 11110). Using fabricated mask patterns, abrasive-jet machining of Si wafer were conducted successfully.
Keywords
Mask; Micro-abrasive jet machining; SU-8; Photopolymer; Micro-stereolithography;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
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