The Journal of Korea Institute of Information, Electronics, and Communication Technology (한국정보전자통신기술학회논문지)

Korea Information Electronic Communication Technology (한국정보전자통신기술학회)
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A Study on the Etching of SUS MASK using Automatic Liquid Management System

자동액관리 시스템을 이용한 SUS MASK 에칭에 관한 연구

  • Lee, Woo-Sik (Department of Chemical & Biological Engineering, Gachon University)
  • Received : 2021.07.29
  • Accepted : 2021.08.17
  • Published : 2021.08.30
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Abstract

This paper produced SUS MASK, which is used for OLEDs, using an automatic liquid management system. The SUS MASK was tested by setting the hole diameter to 0.4 mm. The additive F300 was found to be excellent as the hole diameter was close to 0.4 mm and the error range was measured to be 0.08 on average. And as a result of measuring the weight reduction amount of CuCl2 and FeCl3 according to the change in oxidation-reduction potential (ORP), FeCl3 is relatively sensitive to ORP changes. Experiments were conducted on whether ORP (610 mV) and specific gravity (1.463) were automatically controlled while continuously etching the SUS Mask. Experimental results show that the automatic liquid management system is well controlled because the setting value is not significantly changed. After setting the hole diameter to 0.4 mm as the target, the experiment results were measured from 0.36 to 0.44. Therefore, it is expected that etching processing in the manufacturing process of SUS MASK can be improved with higher precision by applying the manufactured automatic liquid management system.

본 논문은 OLED에 사용되는 SUS MASK를 자동액관리 시스템을 사용하여 제작 하였다. SUS MASK의 홀 직경은 0.4 mm으로 설정하여 실험 하였다. 첨가제 F300이 홀 직경이 0.4 mm에 근접하고 오차범위는 평균 0.08로 측정되어 우수함을 알 수 있었다. 그리고 산화환원전위(ORP) 변화에 따른 CuCl2와 FeCl3의 무게 감소량을 측정결과, FeCl3이 ORP 변화에 상대적으로 민감도가 높은 것으로 나타났다. SUS Mask를 연속적으로 에칭하면서 ORP(610 mV)와 비중(1.463)이 자동으로 조절되는지를 실험를 하였다. 실험결과로서는 셋팅 값이 크게 변화되지 않아 자동액관리 시스템이 잘 조절이 잘 되는 것으로 나타났다. 그리고 홀 직경을 0.4 mm로 목표치로 설정한 후 실험 한 결과는 0.36부터 0.44까지 측정되었다. 따라서 SUS MASK 제조공정에서 에칭가공공정은 제작된 자동액관리 시스템을 적용시키면 보다 안정성 높은 정밀도로 향상 시킬 수 있을 것으로 기대된다.

Keywords

References

  1. D. W. Kim, I. J. Park, G. H. Kim, B. M. Chae, S. W. Lee, H. L. Choi, H. C. Jung, "Oxidation Process for the Etching Solution Regeneration of Ferric Chloride Using Liquid and Solid Oxidizing Agent", Clean Technol, Vol. 23, No. 2, pp.158-162, 2017 https://doi.org/10.7464/ksct.2017.23.2.158
  2. W. S. Choi, H. Y. Kim, J. W. Jeon, W. S. Chang, S. H. Cho, "Vibration-Assisted Femtosecond Laser Drilling with Controllable Taper Angles for AMOLED Fine Metal Mask Fabrication", Materials, Vol. 10, pp.212-220, 2017 https://doi.org/10.3390/ma10020212
  3. Y. Ito, M. Ueki, T. Kizaki, N.S ugita, M. Mitsuishi, "Precision cutting of glass by laser-assisted machining", Procedia Manuf, Vol. 7, pp.240-245, 2016 https://doi.org/10.1016/j.promfg.2016.12.058
  4. M. R. Park, Y. W. Kim, J. H. Park, C. H. Park, "Separation of Iron and Nickel from Heavily Concentrated Aqueous", Clean Tech., Vol. 13, No. 4, pp.274~280, 2007
  5. M. M. Heravi, F. K. Behbahani, M. Daraie, H. A. Oskooie, "Fe(ClO4)3.6H2O : A mild and efficient catalyst for one-pot three component synthesis of β-acetamido carbonyl compounds under solvent-free conditions", Molecular Diversity, Vol. 13, No 3, pp.375-378. 2009 https://doi.org/10.1007/s11030-009-9118-z
  6. I. J. Park, B. Swanin, D. W. Kim, G. H. Kim, D. H. Han, H. C. Jung, "Preparation of mickel nanoparticles using nickel raffinate separated by solvent extraction from sepent FeCl3 etching solution arch", Metall. Mater, Vol. 64, No 2, pp. 531-534, 2019
  7. E. Najafi and F. K. Behbahani, "Three Component Synthesis of 3-Diarylmethy indoles Using Fe(ClO4)3/SiO2 as Catalystl", ussian Journal of Organic Chemistry, Vol. 53, No. 3, pp.454-458, 2017
  8. S. Tao, B. Wu, S. Lei, "A comparative study of the interaction between microhole sidewall and the plasma generated by nanosecond and femtosecond laser ablation of deep microholes", J. anuf. Process, Vol. 14, pp.233-242. 2012
  9. W. T. Kwon, L. S. Kwon, W. S. Lee, "The Development of New Cost-Effective Optimization Technology for OLED Market Entry", Journal of Distribution Science Vol. 17, No. 4, pp.51-57, 2019 https://doi.org/10.15722/JDS.17.4.201904.51
  10. W. S. Lee, "A Study on SUS MASK Etching using of FeCl3" Korea Information Electron Communication Technology, Vol. 13, No. 5, pp.412-418. 2020