• 한국운동역학회지
• /
• 제15권3호
• /
• pp.95-104
• /
• 2005

To know the proper setup posture for the various clubs, changes of setup variables according to the change of golf club length was investigated. Swing motions of three male low handicappers including a professional were taken using two high-speed videocameras. Four clubs iron 7, iron 5, iron 3 and driver (wood 1) were selected for this experiment. Three dimensional motion analysis techniques were used to get the kinematical variables. Mathcad and Kwon3D motion analysis program were used to analyze the position, distance and angle data in three dimensions. The variables divided into three categories 1) position and width of anterior-posterior direction 2) position and width of lateral direction 3) angles and evaluated based on the theories of many good golf teachers. Major findings of this study were as follows. 1.The stance (distance between ankle joints) was increased as the length of the club increased but the increasing width was not large. It ranges from 5cm to 10cm and professional player showed small changes. 2. Forward lean angle of trunk was decreased (more erected) as the length of the club increased. It ranges from 30 degrees for iron7 to 25 degrees for driver. 3. Angle between horizontal and right shoulder were increased as the length of the club increased. It ranges from 10 degrees to 20 degrees and professional player showed small changes. 4. Anterior-posterior position of the shoulders were located in front of the foot for all clubs and the difference between the shoulder and knee position was decreased as the length of the club increased. 5. Anterior-posterior position of grip (hand) was located almost beneath the shoulders (2.5cm front) for iron7, but it increased to 10cm for the driver. This grip adjustment makes the height of the posture increased only 5cm from iron7 to driver. 6. Lateral position of grip located at 5cm left for the face of iron7, but it located at the right side (behind) for the face of driver. 7. Lateral position of the ball located at the 40%(15cm) of stance from left ankle for iron7 and located at the 10% (5cm) of stance for driver. 8. Head always located at the right side of the stance and the midpoint of the eyes located at the 37% of stance from the right ankle for all clubs. This means that the axis of swing always maintained consistently for all clubs. 9. Left foot opened to the target for all subject and clubs. The maximum open angle was 25 degrees. Overall result shows that the changes of the setup variables vary only small ranges from iron7 to driver. Paradoxically it could be concluded that the failure of swing result from the excessive changes of setup not from the incorrect changes. These findings will be useful for evaluating the setup motion of golf swing and helpful to most golfers.

• 전자공학회논문지C
• /
• 제35C권9호
• /
• pp.64-72
• /
• 1998

본 논문에서는 상보형 high swing cascode 전류미러를 이용하여 저전압, 저전력 구동이 가능하고 고주파수 응용이 가능한 전류 적분기를 설계하였다. 간단한 전류미러로 구성된 적분기는 적분기의 비 이상적인 입력, 출력 저항 때문에 출력 전류 오차가 발생하는데 제안된 전류 적분기는 출력 저항이 증가하여 출력 전류의 오차가 감소하였다. 설계된 무손실, 유손실 전류 적분기를 이용한 설계 예로 3차 버터워스 저역통과 필터를 개구리도약형으로 구현하였다. 필터 구현시 무손실 전류 적분기의 위상 추이 때문에 발생하는 차단주파수 부근에서의 크기 특성 왜곡을 predistortion 설계법을 이용하여 감소시켰다. 설계된 전류모드 필터를 0.8㎛ CMOS n-well 공정 파라미터를 이용하여 SPICE 시뮬레이션한 결과 단일 2V 공급 전압에서 차단주파수는 20MHz, 전력소모는 615㎼를 갖는다. 또한 필터의 차단주파수는 DC 바이어스 전류에 의해 동조 할 수 있다.

• 대한전자공학회논문지SD
• /
• 제43권3호
• /
• pp.21-32
• /
• 2006

본 논문에서는 누설전력 소비뿐만 아니라 스위칭 전력 소비를 동시에 줄일 수 있는 새로운 저전력 SRAM 회로를 제안한다. 제안된 저전력 SRAM은 대기모드와 쓰기동작에서는 셀의 소스라인 전압을 $V_{SSH}$로 증가시키고 읽기동작에서만 소스라인 전압을 다시 $V_{SS}$가 되도록 동적으로 조절한다. SRAM 셀의 소스라인 전압을 동적으로 조절하면 reverse body-bias 효과, DIBL 효과, 음의 $V_{GS}$ 효과를 이용하여 셀 어레이의 누설전류를 1/100 까지 감소시킬 수 있다. 또한 누설전류를 억제하기 위해 사용된 소스라인 드라이버를 이용하여 SRAM의 쓰기동작에서 비트라인 전압의 스윙 폭을 $V_{DD}-to-V_{SSH}$로 감소시킴으로써 SRAM의 write power를 대폭 감소시킬 수 있고 쓰기동작 중에 있는 셀들의 누설 전류 소비도 동시에 줄일 수 있다. 이를 위해 새로운 write driver를 사용하여 low-swing 쓰기동작 시 성능 감소를 최소화하였다. 누설전력 소비 감소 기법과 스위칭 전력 소비 감소 기법을 동시에 사용함으로써 제안된 SRAM은 특히 미래의 큰 누설전류가 예상되는 70-nm 이하 급 초미세 공정에서 유용할 것으로 예측된다. 70-nm 공정 파라미터를 이용해서 시뮬레이션한 결과 누설전력 소비의 93%와 스위칭 전력 소비의 43%를 줄일 수 있을 것으로 보인다. 본 논문에서 제안된 저전력 SRAM의 유용성과 신뢰성을 검증하기 위해서 $0.35-{\mu}m$ CMOS 공정에서 32x128 bit SRAM이 제작 및 측정되었다. 측정 결과 기존의 SRAM에 비해 스위칭 전력이 30% 적게 소비됨을 확인하였고 사용된 메탈 차폐 레이어로 인해서 $V_{DD}-to-V_{SSH}$ 전압이 약 1.1V 일 때까지 오류 없이 동작함을 관측하였다. 본 논문의 SRAM 스위칭 전력감소는 I/O의 bit width가 증가하면 더욱 더 중요해질 것으로 예상할 수 있다.

• 한국정보전자통신기술학회논문지
• /
• 제13권5호
• /
• pp.359-369
• /
• 2020

본 논문에서는 CMOS X-Ray 검출기의 메인 클럭을 발생시키는 위상 고정 루프(phase locked loop, PLL)을 위한 전류 불일치를 줄이면서도 넓은 동작 범위를 가지는 전하 펌프(charge pump, CP) 회로를 제안하였다. CP 회로의 동작 범위와 전류 불일치는 CP 회로를 구성하는 전류원 회로의 동작 범위와 출력 저항에 의해서 결정된다. 제안된 CP 회로는 넓은 동작 범위를 확보하기 위한 wide operating 전류 복사 바이어스 회로와 전류 불일치를 줄이기 위한 출력 저항이 큰 캐스코드 구조의 전류원으로 구현하였다. 제안된 wide operating range 캐스코드 CP 회로는 350nm CMOS 공정을 이용하여 칩으로 제작되었으며 소스 측정 장치(source measurement unit)을 활용하여 전류 일치 특성을 측정하였다. 이때 전원 전압은 3.3V이고 CP 회로의 전류 ICP=100㎂이었다. 제안된 CP 회로의 동작 범위 △VO_Swing=2.7V이고 이때 최대 전류 불일치는 5.15%이고 최대 전류 편차는 2.64%로 측정되었다. 제안된 CP 회로는 낮은 전류 불일치 특성을 가지면서 광대역 주파수 범위에 대응할 수 있으므로 다양한 클럭 속도가 필요한 시스템에 적용할 수 있다.

• 센서학회지
• /
• 제19권1호
• /
• pp.25-30
• /
• 2010

This paper presents a low noise CMOS regulator for a low power capacitive sensor interface in a $0.5{\mu}m$ CMOS standard technology. Proposed LDO regulator circuit consist of a voltage reference block, an error amplifier and a new buffer between error amplifier and pass transistor for a good output stability. Conventional source follower buffer structure is simple, but has a narrow output swing and a low S/N ratio. In this paper, we use a 2-stage wide band OTA instead of source follower structure for a buffer. From SPICE simulation results, we got 0.8 % line regulation and 0.18 % load regulation.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2009년도 하계학술대회 논문집
• /
• pp.95-96
• /
• 2009

A fully depleted capacitorless 1-transistor dynamic random access memory (FD 1T-DRAM) based on a sSOI strained-silicon-on-insulator) wafer was investigated. The fabricated device showed excellent electrical characteristics of transistor such as low leakage current, low subthreshold swing, large on/off current ratio, and high electron mobility. The FD sSOI 1T-DRAM can be operated as memory device by the floating body effect when the substrate bias of -15 V is applied, and the FD sSOI 1T-DRAM showed large sensing margin and several milli seconds data retention time.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 1993년도 추계학술대회 논문집
• /
• pp.29-34
• /
• 1993

In this paper, we used one-dimensional process simulator, SUPREM-II, and two-dimensional device simulator, MINIMOS 4.0 to extract optimal process parameter that can minimize degradation of device characteristics caused by process parameter variation in the case of short channel nMOSFET and pMOSFET device. From this simulation, we have derieved the relationship between process parameter and device characteristics. Here we have presented a method to extract process parameters from design trend curve(DTC) obtained by process and device simulations. We parameters to verify the validity of the DTC method. The experimental result of 0.8 $\mu\textrm{m}$ channel length devices that have been fabricated with optimal that reduces short channel effects, that is, good drain current-voltage characteristics, low body effects and threshold voltage of 1.0 V, high punchthrough and breakdown voltage of 12 V, low subthreshold swing(S.S) values of 105 mV/decade.

• 전자공학회논문지A
• /
• 제29A권4호
• /
• pp.33-37
• /
• 1992

AlGaAs/GaAs quantum well delta-doped channel FET's have been successfully fabricated using by low-pressure metalorganic chemical vapor deposition(LP-MOCVD). The FET's with a gate dimension of 1.8$\mu$m $\times$ 100$\mu$m have a maximum transconductance of 190 mS/mm and a maximum current density of 425 mA/nm. The devices show extremely broad transconductances with a large voltage swing of 2.4V. The S-parameter measurements have indicated that the current gain and power gain cutoff frequencies of the device were 7 and 15 GHz, respectively. These values are among the best performance reported for GaAs based heterojunction FET's with a similar device geometry.

• 한국진공학회지
• /
• 제1권1호
• /
• pp.212-222
• /
• 1992

To use polycrystalline Si Thin Film Transistor (poly-Si TFT) in high density SRAM instead of High Load Resistor (HLR), TFT is needed to show good electrical characteristics such as large carrier mobility, low leakage current, high driver current and low subthreshold swing. To satisfy these electrical characteristics, the trap state density must be reduced in the channel poly. Technological issues pertinent to the channel poly fabrication process are investigated and discussed. They are solid phase growth (SPG), Si-ion implantation, laser annealing and hydrogenation. The electrical properties of several CVD oxides used as the gate oxide of TFT are compared. The dependence of the electrical characteristics of TFT on source-drain ion-implantation dose, drain offset length and dopant lateral diffusion are also described.

• 대한전자공학회:학술대회논문집
• /
• 대한전자공학회 2006년도 하계종합학술대회
• /
• pp.627-628
• /
• 2006

A low-voltage switched-capacitor $2^{nd}$-order $\Sigma\Delta$ modulator using full feed-forward is introduced. It has two advantages: the unity signal transfer function and reduced signal swings inside the $\Sigma\Delta$ loop. These features greatly relax the DC gain and output swing requirements for Op-Amp in the low-voltage $\Sigma\Delta$ modulator. Implemented by a 0.18-${\mu}m$ CMOS technology, the $\Sigma\Delta$ modulator satisfies performance requirements for WCDMA and CDMA2000 standards.