• Title/Summary/Keyword: i-ZnO

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Effect of Process Variation of Al Grid and ZnO Transparent Electrode on the Performance of Cu(In,Ga)Se2 Solar Cells (Al 그리드와 ZnO 투명전도막 의 공정변화에 따른 Cu(In,Ga)Se2 박막태양전지의 특성 연구)

  • Cho, Bo Hwan;Kim, Seon Cheol;Mun, Sun Hong;Kim, Seung Tae;Ahn, Byung Tae
    • Current Photovoltaic Research
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    • v.3 no.1
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    • pp.32-38
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    • 2015
  • CIGS solar cell consisted of various films. In this research, we investigated electrode materials in $Cu(In,Ga)Se_2$ (CIGS) cells, including Al-doped ZnO (ZnO:Al), intrinsic ZnO (i-ZnO), and Al films. The sputtered ZnO:Al film with a sputtering power at 200W showed the lowest series resistance and highest cell efficiency. The electrical resistivity of the 200-W sputtered ZnO:Al film was $5.2{\times}10^{-4}{\Omega}{\cdot}cm$ by the rapid thermal annealing at $200^{\circ}C$ for 1 min. The electrical resistivity of i-ZnO was not measurable due to its high resistance. But the optical transmittance was highest with less oxygen supply and high efficiency cell was achieved with $O_2/(Ar+O_2)$ ratio was 1% due to the increase of short-circuit current. No significant change in the cell performance by inserting a Ni layer between Al and ZnO:Al films was observed.

Development of Inverted Organic Photovoltaics with Anion doped ZnO as an Electron Transporting Layer

  • Jeong, Jae Hoon;Hong, Kihyon;Kwon, Se-Hun;Lim, Dong Chan
    • Journal of the Korean institute of surface engineering
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    • v.49 no.6
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    • pp.490-497
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    • 2016
  • In this study, 3-dimensional ripple structured anion (chlorine) doped ZnO thin film are developed, and used as electron transporting layer (ETL) in inverted organic photovoltaics (I-OPVs). Optical and electrical characteristics of ZnO:Cl ETL are investigated depending on the chlorine doping ratio and optimized for high efficient I-OPV. It is found that optimized chlorine doping on ZnO ETL enhances the ability of charge transport by modifying the band edge position and carrier mobility without decreasing the optical transmittance in the visible region, results in improvement of power conversion efficiency of I-OPV. The highest performance of 8.79 % is achieved for I-OPV with ZnO:Cl-x (x=0.5wt%), enhanced ~10% compared to that of ZnO:Cl-x (x=0wt%).

Electrical Properties of 18[kV] ZnO Surge Arrester Stressed by the Mixed DC and 60[Hz] AC Voltages (직류+60[Hz]교류 중첩전압에 대한 18[kV] ZnO 피뢰기의 전기적 특성)

  • Lee, Su-Bong;Lee, Seung-Ju;Lee, Bok-Hee
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.21 no.10
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    • pp.66-72
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    • 2007
  • This paper describes the characteristics of power loss and leakage currents flowing through new and used 18[kV] zinc oxide(ZnO) surge arrester under the mixed DC and AC voltages. The mixed DC and AC voltage generator of 50[kV] peak was designed and fabricated. The I-V curves of ZnO surge arrester were measured as a function of the voltage ratio K. The I-V curves under the mixed DC and AC voltages lay between the pure DC and AC characteristics, and the cross-over phenomenon in both I-V curves and R-V curves was observed at the low current region. As a result, the increase of DC component in the mixed voltages causes the increase of resistive component of total leakage current of ZnO surge arrester. Also, in the case of same applied voltage, the leakage current flowing through the used ZnO surge arrester was higher than that of the new ZnO surge arrester.

The Effects of Oxygen Partial Pressure and Post-annealing on the Properties of ZnO-SnO2 Thin Film Transistors (ZnO-SnO2 투명박막트랜지스터의 특성에 미치는 산소분압 및 후속열처리의 영향)

  • Ma, Tae-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.4
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    • pp.304-308
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    • 2012
  • Transparent thin film transistors (TTFT) were fabricated using the rf magnetron sputtered ZnO-$SnO_2$ films as active layers. A ceramic target whose Zn atomic ratio to Sn is 2:1 was employed for the deposition of ZnO-$SnO_2$ films. To study the post-annealing effects on the properties of TTFT, ZnO-$SnO_2$ films were annealed at $200^{\circ}C$ or $400^{\circ}C$ for 5 min before In deposition for source and drain electrodes. Oxygen was added into chamber during sputtering to raise the resistivity of ZnO-$SnO_2$ films. The effects of oxygen addition on the properties of TTFT were also investigated. 100 nm $Si_3N_4$ film grown on 100 nm $SiO_2$ film was used as gate dielectrics. The mobility, $I_{on}/I_{off}$, interface state density etc. were obtained from the transfer characteristics of ZnO-$SnO_2$ TTFTs.

Electrical Properties of Zinc Oxide Varistor with $\alpha-Zn_7Sb_2O_{12}$ ($\alpha-Zn_7Sb_2O_{12}$ 첨가에 의한 Zinc Oxide 바리스터의 전기적 특성)

  • 김경남;한상목
    • Journal of the Korean Ceramic Society
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    • v.31 no.11
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    • pp.1396-1400
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    • 1994
  • Electrical properties in the ZnO-Bi2O3-CoO-Zn7Sb2O12 system were investigated with Zn7Sb2O12 content (0.1~2 mol%). The increase of the Zn7Sb2O12 content inhibited the grain growth of ZnO, which showed a narrow grain size distribution of ZnO. The breakdown voltage (Vb) increased markedly with 1 mol% Zn7Sb2O12 addition due to the grain growth control behaviour of the Zn7Sb2O12 . The nonlinear I-V characteristic was significantly influenced by the Zn7Sb2O12 content (or Bi2O3/Zn7Sb2O12 ratio). Addition of 0.5 mol% Zn7Sb2O12 showed the highest nonlinear coefficient ($\alpha$) of 43. The leakage current in prebreakdown region was decreased with increasing Zn7Sb2O12 content.

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Structural, Optical and Electrical Properties of ZnO Thin Films with Zn Concentration (Zn 농도변화에 따른 ZnO 박막의 구조, 광학 및 전기적 특성 연구)

  • 한호철;김익주;태원필;김진규;심문식;서수정;김용성
    • Journal of the Korean Ceramic Society
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    • v.40 no.11
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    • pp.1113-1119
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    • 2003
  • We used isopropanol which has low boiling point to prepare thin films at low temperature and changed mole concentration of zinc acetate from 0.3 to 1.3 mol/l. The structural, optical and electrical properties of ZnO thin films with Zn content were investigated. ZnO thin films highly oriented along the c-axis were obtained at Zn concentration of 0.7 mol/l. ZnO thin films with Zn concentration of 0.7 mol/l showed a homogeneous surface layer of nano structure. The transmittance of ZnO thin films by UV-vis. measurement was about 87% under the Zn concentration of 0.7 mol/l, but rapidly decreased over the 1.0 mol/l. The optical band gap energy was obtained from 3.07 to 3.22 eV which is very close to the band gap of bulk ZnO (3.2 eV). The electrical resistivity of ZnO thin films was about 150 $\Omega$-cm that shows little difference with Zn concentration. I-V curves of ZnO thin films exhibited typical ohmic contact properties.

Electrical Properties as the ratio of ZnO/$Mn_3$$O_4$ of NTC Thermistor with $Mn_3$$O_4$-NiO-CuO-$Co_3$$O_4$-ZnO system for Inrush Current Limited (돌입전류 제한용 $Mn_3$$O_4$-NiO-CuO-$Co_3$$O_4$-ZnO계 NTC 써미스터에서 ZnO/$Mn_3$$O_4$비에 따른 전기적 특성)

  • 윤중락;김지균;권정렬;이현용;이석원
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.6
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    • pp.472-477
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    • 2000
  • Oxides of the form Mn$_{4}$/O$_{4}$-CuO-Co$_{3}$/O$_{4}$-NiO-ZnO present properties that make them useful as power NTC thermistor for current limited. Electrical properties of Mn$_{3}$/O$_{4}$-CuO-Co$_{3}$/O$_{4}$-CuO-Co$_{3}$/O$_{4}$-NiO-ZnO power NTC thermistor such as I-V characteristics tim constant activation energy and heat dissipation coefficient measured as a function of temperature and composition. In Mn$_{4}$/O$_{4}$-CuO-Co$_{3}$/O$_{4}$-NiO-ZnO system with the 5wt% addition of Co$_{3}$/O$_{4}$ it can be seen that resistivity and B-constant were increased as the ratio of ZnO/Mn$_{3}$/O$_{4}$ was increased. Heat dissipation constant, I-V characteristics and time constant showed similar behaviour compared with those of conventional thermistors. In particular resistance change ratio ($\Delta$R) the important factor for reliability varied within $\pm$5% indicating the compositions of these products could be available for power thermistor.

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Studies on Spinel Ferrites (I) Effects of Addition of Rare-Earth Oxides on the Magnetic Properties of Mn-Zn Ferrites (Spinel Ferrite에 관한 연구 (I) Mn-Zn계 Ferrite의 자기특성에 대한 희토류산화물의 첨가효과)

  • 김태옥
    • Journal of the Korean Ceramic Society
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    • v.14 no.2
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    • pp.78-81
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    • 1977
  • The effects of variation in composition and the addition of small amount of the rare-earth oxides La2O3, CeO2 and Sm2O3 on the magnetic properties of Mn-Zn system ferrites, 0.5MnO.0.5ZnO.(1+0.1X) Fe2O3(X=-1, 0, 1, 2), were investigated in the range of frequencies of 0.1~100 kHz. It was shown that the magnetic permeability of the specimens with the composition Mn 0.5 Zn 0.5 Fe2O4 was maximum in the Mn-Zn system ferrites, and that the addition of a small amount of the rare-earth oxides to the composition 0.5 MnO.0.5ZnO.0.9 Fe2O3 caused the sharp increase of magnetic permeability and the decrease of the loss factors.

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Analysis of Photoluminescence for N-doped and undoped p-type ZnO Thin Films Fabricated by RF Magnetron Sputtering Method

  • Liu, Yan-Yan;Jin, Hu-Jie;Park, Choon-Bae;Hoang, Geun C.
    • Transactions on Electrical and Electronic Materials
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    • v.10 no.1
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    • pp.24-27
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    • 2009
  • N-doped ZnO thin films were deposited on n-type Si(100) and homo-buffer layer, and undoped ZnO thin film was also deposited on homo-buffer layer by RF magnetron sputtering method. After deposition, all films were in-situ annealed at $800^{\circ}C$ for 5 minutes in ambient of $O_2$ with pressure of 10Torr. X -ray diffraction shows that the homo-buffer layer is beneficial to the crystalline of N-doped ZnO thin films and all films have preferable c-axis orientation. Atomic force microscopy shows that undoped ZnO thin film grown on homo-buffer layer has an evident improvement of smoothness compared with N-dope ZnO thin films. Hall-effect measurements show that all ZnO films annealed at $800^{\circ}C$ possess p-type conductivities. The undoped ZnO film has the highest carrier concentration of $1.145{\times}10^{17}cm{-3}$. The photoluminescence spectra show the emissions related to FE, DAP and many defects such as $V_{Zn}$, $Zn_O$, $O_i$ and $O_{Zn}$. The p-type defects ($O_i$, $V_{Zn}$, and $O_{Zn}$) are dominant. The undoped ZnO thin film has a better p-type conductivity compared with N-doped ZnO thin film.

Photoluminescence of ZnO:Er Thin Film Phosphors Deposited by RF Magnetron Sputtering (RF 마그네트론 스퍼터링법으로 증착한 ZnO:Er 박막형광체의 발광 특성)

  • Song, Hyun-Don;Kim, Young-Jin
    • Korean Journal of Materials Research
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    • v.16 no.7
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    • pp.401-407
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    • 2006
  • ZnO is well-known as a promising material for optical communication systems and electronic displays. ZnO:Er thin films were deposited on c-plane sapphire substrates by rf magnetron sputtering, and the effects of sputtering parameters and the annealing conditions on the luminescence in the visible range were investigated. Luminescent properties depended on the crystallinity of films and annealing atmosphere. Highly c-axis oriented ZnO:Er films showed a strong emission band at 465 nm and a weak emission at 525 nm due to the energy transition of $^{4}I_{15/2}-^{4}F_{5/2}\;and\;^{4}I_{15/2}-^{2}H_{11/2}$, respectively. ZnO:Er thin films annealed at air atmosphere were superior to those annealed in $H_2$ in photoluminescence intensity.