• 제목/요약/키워드: hot carrier

검색결과 283건 처리시간 0.031초

결정질 실리콘 태양전지 적용을 위한 HWCVD $SiN_x$ 막 연구 ($SiN_x$ Film Deposited by Hot Wire Chemical Vapor Deposition Method for Crystalline Silicon Solar Cells)

  • 김하영;박민경;김민영;최정호;노시철;서화일
    • 반도체디스플레이기술학회지
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    • 제13권3호
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    • pp.27-33
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    • 2014
  • To develop high efficiency crystalline solar cells, the $SiN_x$ film for surface passivation and anti-reflection coating is very important and it is generally deposited by PECVD. In this paper, the $SiN_x$ film deposited by Hot-Wire chemical vapor deposition(HWCVD) that has no plasma damage was studied. First, to optimize the $SiN_x$ film deposition process, $SiH_4$ gas rate and substrate temperature were varied and then refractive index and thickness were measured. When $SiH_4$ gas rate was 22sccm and substrate temperature was $100^{\circ}C$, refractive index was 1.94 and higher than that of other process conditions. Second, the lifetime was measured by varying the annealing temperature and time. The annealing process was made from 5 to 30 minutes at $300{\sim}500^{\circ}C$. When the annealing temperature was $100^{\circ}C$ and time was 10minute, the lifetime was the highest. The lifetime of annealed samples was also measured after the firing process at $975^{\circ}C$. Although the lifetime of all samples was decreased by firing process, the lifetime of annealed samples before the firing process was higher than that of fired samples only. Finally, the characteristics of solar cells with HWCVD $SiN_x$ film were measured.

Schottky 장벽 접합을 이용한 MOS형 소자의 소오스/드레인 구조의 특성 (The characteristics of source/drain structure for MOS typed device using Schottky barrier junction)

  • 유장열
    • 전자공학회논문지T
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    • 제35T권1호
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    • pp.7-13
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    • 1998
  • Submicron급의 고집적 소자에서는 종래의 긴 채널 소자에서 생기지 않던 짧은 채널효과에 기인하는 2차원적인 영향으로 고온전자(hot carrier) 등이 발생하여 소자의 신뢰성을 저하시키는 요인이 되고 있어 이들의 발생을 최소화할 수 있는 다양한 형상의 소오스/드레인 구조가 연구되고 있다. 본 논문에서는 제작공정의 간략화, 소자규모의 미세화, 응답속도의 고속화에 적합한 소오스/드레인에 Schottky장벽 접합을 채택한 MOS형 트랜지스터를 제안하고, p형 실리콘을 이용한 소자의 제작을 통하여 동작특성을 조사하였다. 이 소자의 출력특성은 포화특성이 나타나지 않는 트랜지스터의 작용이 나타났으며, 전계효과 방식의 동작에 비하여 높은 상호콘덕턴스를 갖고 있는 것으로 나타났다. 여기서 고농도의 채널층을 형성하여 구동 전압을 낮게하고 높은 저항의 기판을 사용하므로서 드레인과 기판사이의 누설전류를 감소시키는 등의 개선점이 있어야 할 것으로 나타났다.

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HWE에 의한 $Cd_{1-x}Zn_xS $박막의 성장과 광전도 특성 (Growth of $Cd_{1-x}Zn_xS $ Thin films Using Hot Wall Epitaxy Method and Their Photoconductive Characteristics)

  • 홍광준;유상하
    • 한국결정학회지
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    • 제9권1호
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    • pp.53-63
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    • 1998
  • HWE 방법에 의해 Cd1-xZnxS 박막을 (100)방향을 Si 기판 위에 성장시켰다. 증발원과 기판의 온도를 각각 600℃, 440℃로 하여 성장시킨 Cd1-xZnxS 박막의 이중 결정 X-선 요동곡선(DCRC)의 반폭치(FWHM)값이 265 arcsec로 가장 작았다. Van der Pauw 방법으로 Hall효과를 측정하여 운반자 농도와 Hall 이동도의 온도 의존성을 조사하였다. 광전도 셀의 특성으로 spectral response, 최대 허용소비전력(MAPD), 광전류와 암전류(pc/dc)의 비 및 응답시간을 측정하였다. Cd0.53Zn0.47S광전도 셀을 Cu증기 분위기에서 열처리한 경우 감도(γ)는 0.99, pc/dc은 1.65 ×10 7 그리고 최대 허용소비전력(MAPD)은 338mW, 오름시간 (rise time)은 9.7ms, 내림시간(decay time)은 9.3ms로 가장 좋은 광전도 특성을 얻었다.

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Si0.8Ge0.2계 합금에서 열전특성에 미치는 B의 영향 (Influence of Boron Content on the Thermoelectric Properties of p-type Si0.8Ge0.2 Alloy)

  • 황성두;최우석;박익민;박용호
    • 한국분말재료학회지
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    • 제14권4호
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    • pp.272-276
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    • 2007
  • P-type thermoelectric material $Si_{0.8}Ge_{0.2}$ was sintered by Hot Press process (HP) and the effect of boron ($0.25{\sim}2$ at%) addition on the thermoelectric properties were reported. To enhance the thermoelectric performances, the $Si_{0.8}Ge_{0.2}$, alloys were fabricated by mechanical alloying (MA) and HP. The carrier of p-type SiGe alloy was controlled by B-doping. The effect of sintering condition and thermoelectric properties were investigated. B-doped SiGe alloys exhibited positive seebeck coefficient. The electrical conductivity and thermal conductivity were increased at the small amount of boron content ($0.25{\sim}0.5$ at%). However, they were decreased over 0.5 at% boron content. As a result, the small addition of boron improved the Z value. The Z value of 0.5 at% B doped $Si_{0.8}Ge_{0.2}$ B alloy was $0.9{\times}10{-4}/K$, the highest value among the prepared alloys.

Reduction of Hydrogen Sulphide in Chicken Manure by Immobilized Sulphur Oxidising Bacteria Isolated from Hot Spring

  • Hidayat, M.Y.;Saud, H.M.;Samsudin, A.A.
    • 한국미생물·생명공학회지
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    • 제47권1호
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    • pp.116-124
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    • 2019
  • The rapid development of the poultry industry has led to the production of large amounts of manure, which produce substances like hydrogen sulfide ($H_2S$) that contribute to odor pollution. $H_2S$ is a highly undesirable gas component and its removal from the environment is therefore necessary. Sulfur-oxidizing bacteria (SOB) are widely known to remove contaminating $H_2S$ due to their ability to oxidize reduced sulfur compounds. In this study, three potential SOB (designated AH18, AH25, and AH28) that were previously isolated from a hot spring in Malaysia were identified by 16S rRNA gene analysis. Laboratory-scale biological deodorization experiments were conducted to test the performance of the three isolates-in the form of pure or mixed cultures, with the cells immobilized onto alginate as a carrier-in reducing the $H_2S$ from chicken manure. On the basis of 16S rRNA phylogenetic analysis, isolate AH18 was identified as Pseudomonas sp., whereas isolates AH25 and AH28 were identified as Achromobacter sp. The most active deodorizing isolate was AH18, with an $H_2S$ reduction rate of 74.7% (p < 0.05). Meanwhile, the reduction rates for isolates AH25 and AH28 were 54.2% and 60.8% (p > 0.05), respectively. However, the $H_2S$ removal performance was enhanced in the mixed culture, with a reduction rate of 81.9% (p < 0.05). In conclusion, the three potential SOB isolates were capable of reducing the $H_2S$ from chicken manure in the form of a pure culture immobilized on alginate, and the reduction performance was enhanced in the mixed culture.

Hot wall epitaxy법에 의한 MgGa2Se4 단결정 박막 성장과 광학적 특성 (Growth and optical properties for MgGa2Se4 single crystal thin film by hot wall epitaxy)

  • 문종대;홍광준
    • 한국결정성장학회지
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    • 제21권3호
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    • pp.99-104
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    • 2011
  • 단결정 성장을 위한 $MgGa_2Se_4$ 다결정은 수평 전기로에서 합성하였으며, 결정구조는 rhombohedral이고 격자상수 $a_0$는 3.953 ${\AA}$, $c_0$는 38.890 ${\AA}$였다. $MgGa_2Se_4$ 단결정박막은 HWE(Hot Wall Epitaxy) 방법으로 반절연성 GaAs(100)기판에 성장시켰다. 단결정박막의 성장 조건은 증발원의 온도 $610^{\circ}C$, 기판의 온도 $400^{\circ}C$에서 진행되었으며 성장 속도는 0.5 ${\mu}m/h$였다. 단결정박막의 결정성은 이중 결정 x-선 회절곡선의 반폭치와 X-선 회절무늬의 ${\omega}-2{\theta}$로부터 구하여 최적 성장 조건을 알 수 있었다. Hall 효과는 van der Pauw 방법에 의해 측정되었으며, 온도에 의존하는 운반자 농도와 이동도는 293 K에서 각각 $6.21{\times}10^{18}/cm^3$, 248 $cm^2/v{\cdot}s$였다. $MgGa_2Se_4$/SI(Semi-Insulated) GaAs(100) 단결정 박막의 광흡수 스펙트럼을 10 K에서 293 K까지 측정하였다. 광흡수 스펙트럼으로부터 구한 에너지 갭 $E_g(T)$는 varshni 공식 $E_g(T)=E_g(0)=({\alpha}T^2/T+{\beta})$을 잘 만족함을 알 수 있었다. 여기서 $E_g(0)=2.34\;eV$, ${\alpha}=8.81{\times}10^{-4}\;eV/K$, ${\beta}=251\;K$였다.

Hot Wall Epitaxy(HWE)법에 의한 BaIn2S4 단결정 박막 성장과 광전도 특성 (Growth and optical conductivity properties for BaIn2S4 single crystal thin film by hot wall epitaxy)

  • 정경아;홍광준
    • 한국결정성장학회지
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    • 제25권5호
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    • pp.173-181
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    • 2015
  • A stoichiometric mixture of evaporating materials for $BaIn_2S_4$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $BaIn_2S_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperatures were $620^{\circ}C$ and $420^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by double crystal X-ray diffraction (DCXD). The carrier density and mobility of $BaIn_2S_4$ single crystal thin films measured from Hall effect by van der Pauw method are $6.13{\times}10^{17}cm^{-3}$ and $222cm^2/v{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the $BaIn_2S_4$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=3.0581eV-(3.9511{\times}10^{-3}eV/K)T^2/(T+536K)$. The crystal field and the spin-orbit splitting energies for the valence band of the $BaIn_2S_4$ have been estimated to be 182.7 meV and 42.6 meV, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the ${\Delta}so$ definitely exists in the ${\Gamma}_5$ states of the valence band of the $BaIn_2S_4/GaAs$ epilayer. The three photocurrent peaks observed at 10 K are ascribed to the $A_1$-, $B_1$-exciton for n = 1 and $C_{24}$-exciton peaks for n = 24.

킹크효과 억제를 위한 새로운 f-모양 트리플게이트 구조의 저온 다결정실리콘 박막트랜지스터 (Novel F-shaped Triple Gate Structure for Suppression of Kink Effect and Improvement of Hot Carrier Reliability in Low Temperature polycrystalline Silicon Thin-Film Transistor)

  • 송문규;최성환;국승희;한민구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2011년도 제42회 하계학술대회
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    • pp.1416-1417
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    • 2011
  • 킹크효과를 억제할 수 있는 새로운 f-모양 트리플게이트 구조를 가지는 다결정실리콘 박막트랜지스터는 추가적인 공정과정 없이 제안 및 제작되었다. 이러한 다결정실리콘 박막트랜지스터의 채널에는 순차적인 횡방향 고체화(Sequential Lateral Solidification, SLS)나 CW 레이져 횡방향 결정화(CW laser Lateral Crystallization, CLC) 등과 같은 방법으로 제작된 횡방향으로 성장시킨 그레인이 있다. 이 소자의 전체적인 전류흐름은 횡방향으로 성장시킨 그레인 경계에 강력하게 영향을 받는다. f-모양 트리플게이트에는 횡방향으로 성장시킨 그레인과 평행한 방향으로 위치한 채널, 그리고 수직인 방향으로 위치한 채널이 있다. 이 소자는 f-모양 게이트 구조에서의 비대칭 이동도를 이용하여 다결정실리콘 박막트랜지스터의 킹크효과를 효과적으로 억제시킬 수 있다는 사실을 실험과 시뮬레이션을 통해 검증되었다. 우리의 실험 결과는 이 논문에서 제안된 f-모양 트리플게이트 박막트랜지스터가 기존의 박막트랜지스터와 비교할 때 더 효과적으로 킹크 효과를 감소시킬 수 있다는 것을 보여주었다. 또한 고온 캐리어 스트레스 조건에서의 신뢰성도 개선할 수 있음이 확인되었다.

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PMOSFET의 채널 길이에 따른 NBTI 스트레스와 CHC 스트레스의 신뢰성 특성 비교 분석 (Comparative Analysis of Channel Length Dependence of NBTI and CHC Characteristics in PMOSFETs)

  • 유재남;권성규;신종관;오선호;;장성용;송형섭;이가원;이희덕
    • 한국전기전자재료학회논문지
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    • 제27권7호
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    • pp.438-442
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    • 2014
  • Channel length dependence of NBTI (negative bias temperature instablilty) and CHC (channel hot carrier) characteristics in PMOSFET is studied. It has been considered that HC lifetime of PMOSFET is larger than NBTI lifetime. However, it is shown that CHC degradation is greater than NBTI degradation for PMOSFET with short channel length. 1/f noise and charge pumping measurement are used for analysis of these degradations.

Controllability of Structural, Optical and Electrical Properties of Ga doped ZnO Nanowires Synthesized by Physical Vapor Deposition

  • Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
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    • 제14권3호
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    • pp.148-151
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    • 2013
  • The control of Ga doping in ZnO nanowires (NWs) by physical vapor deposition has been implemented and characterized. Various Ga-doped ZnO NWs were grown using the vapor-liquid-solid (VLS) method, with Au catalyst on c-plane sapphire substrate by hot-walled pulsed laser deposition (HW-PLD), one of the physical vapor deposition methods. The structural, optical and electrical properties of Ga-doped ZnO NWs have been systematically analyzed, by changing Ga concentration in ZnO NWs. We observed stacking faults and different crystalline directions caused by increasing Ga concentration in ZnO NWs, using SEM and HR-TEM. A $D^0X$ peak in the PL spectra of Ga doped ZnO NWs that is sharper than that of pure ZnO NWs has been clearly observed, which indicated the substitution of Ga for Zn. The electrical properties of controlled Ga-doped ZnO NWs have been measured, and show that the conductance of ZnO NWs increased up to 3 wt% Ga doping. However, the conductance of 5 wt% Ga doped ZnO NWs decreased, because the mean free path was decreased, according to the increase of carrier concentration. This control of the structural, optical and electrical properties of ZnO NWs by doping, could provide the possibility of the fabrication of various nanowire based electronic devices, such as nano-FETs, nano-inverters, nano-logic circuits and customized nano-sensors.