The Evaluation for Reliability Characteristics of MOS Devices with Different Gate Materials by Plasma Etching Process (게이트 물질을 달리한 MOS소자의 플라즈마 피해에 대한 신뢰도 특성 분석)
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- Journal of the Korea Institute of Information and Communication Engineering
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- v.4 no.2
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- pp.297-305
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- 2000