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http://dx.doi.org/10.7471/ikeee.2016.20.3.220

Current Sensing Trench Gate Power MOSFET for Motor Driver Applications  

Kim, Sang-Gi (ICT materials & Convergence & Resaerch Lab. ETRI)
Park, Hoon-Soo (Dept. of Green Energy Engineering, Uiduk Uiversity)
Won, Jong-Il (ICT materials & Convergence & Resaerch Lab. ETRI)
Koo, Jin-Gun (ICT materials & Convergence & Resaerch Lab. ETRI)
Roh, Tae-Moon (ICT materials & Convergence & Resaerch Lab. ETRI)
Yang, Yil-Suk (ICT materials & Convergence & Resaerch Lab. ETRI)
Park, Jong-Moon (ICT materials & Convergence & Resaerch Lab. ETRI)
Publication Information
Journal of IKEEE / v.20, no.3, 2016 , pp. 220-225 More about this Journal
Abstract
In this paer, low on-resistance and high-power trench gate MOSFET (Metal-Oxide-Silicon Field Effect Transistor) incorporating current sensing FET (Field Effect Transistor) is proposed and evaluated. The trench gate power MOSFET was fabricated with $0.6{\mu}m$ trench width and $3.0{\mu}m$ cell pitch. Compared with the main switching MOSFET, the on-chip current sensing FET has the same device structure and geometry. In order to improve cell density and device reliability, self-aligned trench etching and hydrogen annealing techniques were performed. Moreover, maintaining low threshold voltage and simultaneously improving gate oxide relialility, the stacked gate oxide structure combining thermal and CVD (chemical vapor deposition) oxides was adopted. The on-resistance and breakdown voltage of the high density trench gate device were evaluated $24m{\Omega}$ and 100 V, respectively. The measured current sensing ratio and it's variation depending on the gate voltage were approximately 70:1 and less than 5.6 %.
Keywords
Trench Gate MOSFET; Current Sensing FET; Trench Gate; Trench Etching; Power MOSFET;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
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