• Title/Summary/Keyword: a diffusion model

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Diffusion Model of Aluminium for the Formation of a Deep Junction in Silicon (실리콘에서 깊은 접합의 형성을 위한 알루미늄의 확산 모델)

  • Jung, Won-Chae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.33 no.4
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    • pp.263-270
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    • 2020
  • In this study, the physical mechanism and diffusion effects in aluminium implanted silicon was investigated. For fabricating power semiconductor devices, an aluminum implantation can be used as an emitter and a long drift region in a power diode, transistor, and thyristor. Thermal treatment with O2 gas exhibited to a remarkably deeper profile than inert gas with N2 in the depth of junction structure. The redistribution of aluminum implanted through via thermal annealing exhibited oxidation-enhanced diffusion in comparison with inert gas atmosphere. To investigate doping distribution for implantation and diffusion experiments, spreading resistance and secondary ion mass spectrometer tools were used for the measurements. For the deep-junction structure of these experiments, aluminum implantation and diffusion exhibited a junction depth around 20 ㎛ for the fabrication of power silicon devices.

A Model for Activation Energy of Moisture Diffusion in Wood (수분확산(水分擴散)의 활성화(活性化)에너지 모델)

  • Kang, Ho-Yang
    • Journal of the Korean Wood Science and Technology
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    • v.20 no.4
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    • pp.21-30
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    • 1992
  • An activation energy equation for moisture diffusion in wood was developed with an assumption that activation energy is directly proportional to wood specific gravity. Theoretical activation energies obtained from the activation energy equation were revealed to be always lower than actual activation energies, which implies that activation energy isn't affected only by wood specific gravity. The other affecting factors are possibly anatomical structures of wood which determine a ratio of vapor diffusion to bound water diffusion in wood. For the convenience of estimating actual activation energy by using the activation energy equation, thirteen kinds of species were categorized into three groups according to their anatomical structures.

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Thin-layer Rewetting Equation for Short Grain Rough Rice (단립종(短粒種)벼의 박층흡습방정식(薄層吸濕方程式))

  • Jung, C.S.;Keum, D.H.;Park, S.J.
    • Journal of Biosystems Engineering
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    • v.12 no.2
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    • pp.38-43
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    • 1987
  • An experimental study was conducted to develop a thin-layer rewetting equation of short grain rough rice of Akihikari variety. Four thin-layer rewetting equations were experimentally determined from $25^{\circ}C$ to $45^{\circ}C$ and 70%RH to 85%RH conditions. Diffusion, Henderson, Page, and Thompson equations widely used as thin-layer drying equations were selected. Experimental data were fitted to these equations using linear regression analysis except diffusion equation. The diffusivity in the diffusion equation was determined by optimization method. Four equations were highly significant. In order to compare the goodness of fit of each equation, the error mean square of each equawas calculated. The diffusion model was not a very good model because the error mean square was very large. The other three models showed the same level or error mean square and could predict satisfactorily the rewetting rate or short grain rough rice.

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Kinetic Analysis of Diffusion Aluminide Coating (확산 알루미나이드 코팅의 속도론적 해석)

  • 손희식;김문일
    • Journal of the Korean institute of surface engineering
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    • v.28 no.3
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    • pp.152-163
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    • 1995
  • A theoretical model which combines gaseous transport and solid state diffusion with the multi-component equilibrium at the gas/pack and gas/coating interfaces was used to study the kinetics of diffusion aluminide coating. The diffusion aluminide coatings were applied by pack cementation with Ni substrate under argon atmosphere in the high activity and the low activity pack containing $NH_4CL$ or $AlF_3$ activator. On the basis of the process conditions, the suggested model allows the surface composition, the growth rate of coating layers and the aluminium concentration profiles in coatings to be calculated. In the case of $NH_4$Cl activator, careful consideration was required in the analysis, because activator contains nitrogen and hydrogen as well as halogen element to activate the pack. A good agreement is obtained between the theoretical predictions and the experimental results.

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GLOBAL EXISTENCE OF WEAK SOLUTIONS FOR A KELLER-SEGEL-FLUID MODEL WITH NONLINEAR DIFFUSION

  • Chung, Yun-Sung;Kang, Kyungkeun;Kim, Jaewoo
    • Journal of the Korean Mathematical Society
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    • v.51 no.3
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    • pp.635-654
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    • 2014
  • We consider the Cauchy problem for a Keller-Segel-fluid model with degenerate diffusion for cell density, which is mathematically formulated as a porus medium type of Keller-Segel equations coupled to viscous incompressible fluid equations. We establish the global-in-time existence of weak solutions and bounded weak solutions depending on some conditions of parameters such as chemotactic sensitivity and consumption rate of oxygen for certain range of diffusive exponents of cell density in two and three dimensions.

The Cubic-Interpolated Pseudo-Particle Lattice Boltzmann Advection-Diffusion Model (이류확산 방정식 계산을 위한 입방보간유사입자 격자볼츠만 모델)

  • Mirae, Kim;Binqi, Chen;Kyung Chun, Kim
    • Journal of the Korean Society of Visualization
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    • v.20 no.3
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    • pp.74-85
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    • 2022
  • We propose a Cubic-Interpolated Pseudo-Particle Lattice Boltzmann method (CIP-LBM) for the convection-diffusion equation (CDE) based on the Bhatnagar-Gross-Krook (BGK) scheme equation. The CIP-LBM relies on an accurate numerical lattice equilibrium particle distribution function on the advection term and the use of a splitting technique to solve the Lattice Boltzmann equation. Different schemes of lattice spaces such as D1Q3, D2Q5, and D2Q9 have been used for simulating a variety of problems described by the CDE. All simulations were carried out using the BGK model, although another LB scheme based on a collision term like two-relation time or multi-relaxation time can be easily applied. To show quantitative agreement, the results of the proposed model are compared with an analytical solution.

NUMERICAL DIFFUSION DECREASE OF FREE-SURFACE FLOW ANALYSIS USING SOURCE TERM IN VOLUME FRACTION TRANSPORT EQUATION (볼륨비 이송방정식의 소스항을 이용한 자유수면 유동 해석의 해 확산 감소)

  • Park, Sunho;Rhee, Shin Hyung
    • Journal of computational fluids engineering
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    • v.19 no.1
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    • pp.15-20
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    • 2014
  • Accurate simulation of free-surface wave flows around a ship is very important for better hull-form design. In this paper, a computational fluid dynamics (CFD) code, termed SNUFOAM, which is based on the open source libraries, OpenFOAM, was developed to predict the wave patterns around a ship. Additional anti-diffusion source term for minimizing a numerical diffusion, which was caused by convection differencing scheme, was considered in the volume-fraction transport equation. The influence of the anti-diffusion source term was tested by applying it to free-surface wave flow around the Wigley model ship. In results, the band width of the volume fraction contours between 0.1 to 0.9 at the hull surface was narrowed by considering the anti-diffusion term.

Calculation of Stretched Laminar Diffusion Flame Using the Coherent Flame Sheet Model (코히어런트 화염면 모델을 이용한 스트레치 층류 확산 화염의 수치 계산)

  • 정진은;진영욱
    • Transactions of the Korean Society of Automotive Engineers
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    • v.8 no.1
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    • pp.17-22
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    • 2000
  • The transient process simplified by the 1-D stretched laminar flame formed at the fuel-oxidizer interface was investigated using the coherent flame sheet model. Under the combustion environment of high temperatures and pressures the results show that the time required to reach the steady state was relatively short compared to the reverse of strain rate. Hence the employment of the tabulation of precalculated steady-flame results in the calculation of turbulent diffusion flames using the coherent flame sheet model is concluded valid, Also upstream temperatures were found to have only a minor effect on the nondimensional flame temperature and nondimensional fuel even through the letter is sensitive to pressure changes.

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Shallow Junction Device Formation and the Design of Boron Diffusion Simulator (박막 소자 개발과 보론 확산 시뮬레이터 설계)

  • Han, Myoung Seok;Park, Sung Jong;Kim, Jae Young
    • 대한공업교육학회지
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    • v.33 no.1
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    • pp.249-264
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    • 2008
  • In this dissertation, shallow $p^+-n$ junctions were formed by ion implantation and dual-step annealing processes and a new simulator is designed to model boron diffusion in silicon. This simulator predicts the boron distribution after ion implantation and annealing. The dopant implantation was performed into the crystalline substrates using $BF_2$ ions. The annealing was performed with a RTA(Rapid Thermal Annealing) and a FA(Furnace Annealing) process. The model which is used in this simulator takes into account nonequilibrium diffusion, reactions of point defects, and defect-dopant pairs considering their charge states, and the dopant inactivation by introducing a boron clustering reaction. FA+RTA annealing sequence exhibited better junction characteristics than RTA+FA thermal cycle from the viewpoint of sheet resistance and the simulator reproduced experimental data successfully. Therefore, proposed diffusion simulator and FA+RTA annealing method was able to applied to shallow junction formation for thermal budget. process.

A Study on The Diffusion Factors and Policies of Advanced Manufacturing Technology (첨단생산기술의 산업 내 확산 요인 및 정책에 관한 연구)

  • Hwang, Seong-Tae;Oh, Hyung-Sik
    • IE interfaces
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    • v.12 no.3
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    • pp.382-389
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    • 1999
  • Recently the strategic importance of Advanced Manufacturing Technology(AMT) has been increased. This paper focuses on the modelling of diffusion process of AMT from the benefit-cost analytic perspective. The mechanism of AMT diffusion includes the decision-making process of individual firms. By using the model, we can forecast the AMT diffusion level.

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