• 한국전기전자재료학회논문지
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• 제26권1호
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• pp.38-43
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• 2013

In this study we aims to examine the effects of $Co_3O_4$ and NiO doping on the defects and electrical properties in ZnO-$Bi_2O_3-Sb_2O_3$ (Sb/Bi=0.5) varistors. It seemed to form ${Zn_i}^{{\cdot}{\cdot}}$(0.20 eV) and ${V_o}^{\cdot}$(0.33 eV) as dominant defects in Co and Ni co-doped ZBS system, however only ${V_o}^{\cdot}$ appeared in Co- or Ni-doped ZBS. Even though the same defects it was different in capacitance (1.5~4.5 nF) and resistance ($0.3{\sim}9.5k{\Omega}$). The varistor characteristics were improved with Co and Co+Ni doping (non-linear coefficient, ${\alpha}$= 36 and 29, relatively) in ZBS. The various parameters ($N_d=1.43{\sim}2.33{\times}10^{17}cm^{-3}$, $N_t=1.40{\sim}2.28{\times}10^{12}cm^{-2}$, ${\Phi}b$=1.76~2.37 V, W= 98~118 nm) calculated from the C-V characteristics in our systems did not depend greatly on the type of dopant, which were in the range of a typical ZnO varistors. It should be derived a improved C-V equation carefully for more reliable parameters because the variation of the varistor capacitance as a function of the applied dc voltage is depend on the defect, frequency, and temperature.

• 한국세라믹학회지
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• 제37권2호
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• pp.186-193
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• 2000

Effects of 1.0 mol% CoO addition on sintering and the electrical properties of ZnO-Bi2O3-Sb2O3(ZBS) varistor system with 3.0 mol% co-addition of Sb2O3 and Bi2O3 at various Sb/Bi ratio (0.5, 1.0, and 2.0) were investigated. Cobalt had little influence on the liquid-phase formation and the pyrochlore decomposition temepratures of ZBS, while densification was mainly dependent on Sb/Bi ratio: when Sb/Bi=0.5, excess Bi2O3 irrelevant to the formation of pyrochore(Zn2Sb3Bi3O14) forms eutectic liquid at ~75$0^{\circ}C$ which promotes densification and grain growth; with Sb/Bi=2.0, the second phase Zn7Sb2O12 formed by excess Sb2O3 irrelevant to the formation of the pyrochlore retards densification up to ~100$0^{\circ}C$. These phases caused the coarsening and uneven distribution of the second phase particles on the grain boundaries of ZnO above the pyrochlore decomposition temperature(~105$0^{\circ}C$), which led to broad size dist-ribution of ZnO; the specimen with Sb/Bi=1.0 showed homogeneous microstructure compared with the others, which enabled improved varistor characteristics. Doping of Co increased the nonlinearity and the potential barrier height of ZBS, which is thought to stem from improved sintering behavior such as homogenized microstructure due to size reduction and even distribution of the second phase and suppressed volatility of Bi2O3, as well as the improvement in the potential barrier structure via increased donor and interface electron trap densities.

• Korean Chemical Engineering Research
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• 제59권1호
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• pp.42-48
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• 2021

본 연구에서는 LiNi0.85Co0.15O2의 전기화학적 특성과 열적 안정성을 향상시키기 위하여 LiNi0.85Co0.15O2에 이종원소인 Zn와 Al을 함께 첨가하여 고상법으로 합성하였다. 물질의 결정 구조, 크기 및 표면 상태는 XRD, SEM을 이용하여 분석하였고 전기화학적 특성은 충방전기를 이용하여 CV(cyclic voltammetry), 초기 충·방전 프로파일, 출력 특성, 수명 특성 등을 측정하였다. Al-O의 강한 결합에너지는 양극활물질의 구조적 안정성을 향상시켰으며, Li+와 Ni2+의 양이온 혼합을 막아 전기화학적 특성 또한 향상되었다. Zn의 큰 이온반경은 양극활물질의 격자상수를 증가시켜 단위 셀의 부피가 확장되었다. Zn와 Al을 0.025몰씩 첨가한 물질의 경우, 0.5 C-rate의 전류밀도에서 100 사이클 동안 80%의 용량 유지율을 보여주었으며 이 결과는 NC 양극활물질보다 12% 높은 수치이다. 또한, 5 C-rate에서의 방전용량은 104 mAh/g으로 기존의 NC 양극활물질보다 36 mAh/g 높은 수치를 보였다. Zn과 Al이 0.025몰씩 첨가된 NC 양극활물질은 출력 특성, 수명 특성에서 우수한 특성을 보여주었다.

• 한국세라믹학회:학술대회논문집
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• 한국세라믹학회 2003년도 추계총회 및 연구발표회 초록집
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• pp.188.1-188
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• 2003

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2007년도 The 1st International Symposium on Advanced Magnetic Materials
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• pp.47.1-47.1
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• 2007

• 한국진공학회:학술대회논문집
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• 한국진공학회 2004년도 제27회 학술발표회 초록집
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• pp.263-263
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• 2004

• 대한전기학회:학술대회논문집
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• 대한전기학회 2009년도 제40회 하계학술대회
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• pp.1096_1097
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• 2009

Aluminium doped zinc oxide(ZnO:Al) thin film, which is mainly used as a transparent conducting electrode in electronic devices, has many advantages compared with conventional indium tin oxide(ITO). In this paper in order to investigate the possible application of ZnO:Al thin films as a transparent conducting electrode for flexible film-typed dye sensitized solar cell (FT-DSCs), ZnO:Al and ITO thin films were prepared on the polyethylene terephthalate (PET) substrate by r. f. magnetron sputtering method. Specially one-inched FT-DSCs using either a ZnO:Al or ITO electrode were also fabricated separately under the same manufacturing conditions. Some properties of both the FT-DSCs with ZnO:Al and ITO transparent electrodes, such as conversion efficiency, fill factor, and photocurrent were measured and compared with each other. The results showed that by doping the ZnO target with 2 wt% of $Al_2O_3$, the film deposited at discharge power of 200W resulted in the minimum resistivity of $2.2\times10^{-3}\Omega/cm$ and at ransmittance of 91.7%, which are comparable with those of commercially available ITO. Two types of FT-DSCs showed nearly the same tendency of I-V characteristics and the same value of conversion efficiencies. Efficiency of FT-DSCs using ZnO:Al electrode was around 2.6% and that of fabricated FT-DSCs using ITO was 2.5%. This means that ZnO:Al thin film can be used in FT-DSCs as a transparent conducting layer.

• 한국결정성장학회지
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• 제6권3호
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• pp.368-376
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• 1996

균일한 조성과 doping 효과를 얻을 수 있는 floating zone(FZ)법으로 조화용융조성의 undoped $LiNbO_{3}$ 및 5 mol%의 MgO 또는 ZnO를 각각 첨가한 $LiNbO_{3}$ 단결정을 육성하였다. 결정성장시 최적성장조건을 실험적으로 확립하였으며, 결정내에 존재하는 domain 구조, 전위구조, slip band, 미세쌍정등의 결함구조를 조사 및 분석하였다.

• 한국재료학회지
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• 제5권5호
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• pp.568-574
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• 1995

We investigated the effects of B-doping on the growth mechanism of ZnO films. The B-doped ZnO films, which were widely applied for transparent conducting electrode, were deposited by plasma enhanced chemcial vapor depostion(PECVD) using diethylzinc(DEZ), No.sub 2/. and B$_{2}$H$_{6}$. The deposition conditions were a sbustrate temperature of 30$0^{\circ}C$, an rf power of 200, and a chamber pressure of 1 torr. At the given depostion condition, the growth rate of B-doped ZnO thin films was higher than that of undoped ones, but didn't change even with further increasing B$_{2}$H$_{6}$ flow rate and the interplanar distance between(0002) planes was reduced as B atoms substituted Zn sites.s.

• 한국자기학회지
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• 제15권3호
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• pp.181-185
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• 2005

반응성 스퍼터링 방법으로 성장시킨 $Zn_{0.09}Cr_{0.01}O$ 묽은 자성반도체 박막의 구조와 전기 수송과 자기 특성에 미치는 Al 첨가 효과를 탐구하였다. Al이 첨가되지 않은 $Zn_{0.09}Cr_{0.01}O$ 박막은 반도체적인 수송 특성과 함께 미약한 강자성 특성을 보였다. Al을 첨가함으로써 n-형 나르개인 전자의 농도 증가와 더불어 금속성 수송 특성을 나타냈으며 포화자기화가 현저하게 증가하고 이력곡선이 뚜렷하게 나타나는 등 자기 특성의 격렬한 변화가 관찰되었다. 이 결과들은 Cr이 첨가된 ZnO에서 나르개에 의한 강자성 질서의 향상을 보여준다.