• Title/Summary/Keyword: Weight Mask

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Shape Optimal Design to Minimize the Weight of a Mask-Frame for OLED Vapor Deposition (OLED 증착용 마스크 프레임의 무게 최소화를 위한 형상최적설계)

  • Lee, Boo-Youn
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.14 no.10
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    • pp.4685-4693
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    • 2013
  • Present work deals with a shape optimal design to minimize the weight of the mask-frame used in the process of OLED vapor deposition by the fine metal mask. A design concept for an optimal shape of the frame to increase the stiffness and to reduce the weight is derived using the topology optimization, shape design variables of the frame by adopting slots being defined. An optimal shape is determined by solving the shape optimization problem to minimize the weight of the frame under constraints of the maximum displacement. Weight of the optimal design is 117.6 kg, which is reduced by 138.4 kg(54.1%) of that of the first design, 256 kg.

Analysis of physical properties for the development of non-woven fabric sheet for mask pack (마스크 팩 부직포 시트 개발을 위한 기본특성 분석)

  • Choi, Sola;Kwon, MiYeon
    • Journal of the Korea Fashion and Costume Design Association
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    • v.24 no.1
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    • pp.35-43
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    • 2022
  • This study aims to analyze the physical properties of non-woven fabric sheets, which continue to grow in the cosmetic market. Non-woven fabric sheets were used as specimens, and a total of 17 samples were analyzed. To evaluate the physical properties of the non-woven fabric sheet, the weight, tensile strength, surface properties, free swell absorption, and wet stiffness were tested. Through the results itw was determined that non-woven fabric sheets for mask packs should be manufactured considering fiber arrangement so that the weight is 40 g/m2, and the tensile strength should be maintained near 12 kgf. In addition, it was confirmed that the material selection and process conditions should be adjusted so that the free swell absorption is at least 8 g/g, and the wet stiffness is 200 mg. Therefore, since the non-woven fabrics for the mask sheets can be used in various products depending on fabric composition, this study will be expected to be basic data for the continuous growth of the sheet-type mask packs coming to market.

Effect of Impact Angle on the Etching of Glass by Powder Blasting (Powder Blasting 을 이용한 유리의 표면부식시 분사각도의 영향)

  • 김광현;박경호;박동삼
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2001.10a
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    • pp.349-354
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    • 2001
  • In this study, we investigated the effect of the impacting ang1e of particles, the scanning times and the stand-off distance on the surface roughness and the weight-loss rate of samples with no mask, and the wall profile and overetching of samples with different mask pattern in powder blasting of soda-lime glass. The varying parameters were the different impact angles between 50$^{\circ}$ and 90$^{\circ}$, scanning times of nozz1e up to 40 and the stand-off distances 70mm and 100mm. The widths of mask pattern were 0.2mm, 0.5mm and 1mm. The powder was alumina sharp particles, WA#600. The mass flow rate of powder during the erosion test was fixed constant at 175g/min and the blasting pressure of powder at 0.2MPa

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Memory Propagation-based Target-aware Segmentation Tracker with Adaptive Mask-attention Decision Network

  • Huanlong Zhang;Weiqiang Fu;Bin Zhou;Keyan Zhou;Xiangbo Yang;Shanfeng Liu
    • KSII Transactions on Internet and Information Systems (TIIS)
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    • v.18 no.9
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    • pp.2605-2625
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    • 2024
  • Siamese-based segmentation and tracking algorithms improve accuracy and stability for video object segmentation and tracking tasks simultaneously. Although effective, variability in target appearance and background clutter can still affect segmentation accuracy and further influence the performance of tracking. In this paper, we present a memory propagation-based target-aware and mask-attention decision network for robust object segmentation and tracking. Firstly, a mask propagation-based attention module (MPAM) is constructed to explore the inherent correlation among image frames, which can mine mask information of the historical frames. By retrieving a memory bank (MB) that stores features and binary masks of historical frames, target attention maps are generated to highlight the target region on backbone features, thus suppressing the adverse effects of background clutter. Secondly, an attention refinement pathway (ARP) is designed to further refine the segmentation profile in the process of mask generation. A lightweight attention mechanism is introduced to calculate the weight of low-level features, paying more attention to low-level features sensitive to edge detail so as to obtain segmentation results. Finally, a mask fusion mechanism (MFM) is proposed to enhance the accuracy of the mask. By utilizing a mask quality assessment decision network, the corresponding quality scores of the "initial mask" and the "previous mask" can be obtained adaptively, thus achieving the assignment of weights and the fusion of masks. Therefore, the final mask enjoys higher accuracy and stability. Experimental results on multiple benchmarks demonstrate that our algorithm performs outstanding performance in a variety of challenging tracking tasks.

A Study on the Etching of SUS MASK using Automatic Liquid Management System (자동액관리 시스템을 이용한 SUS MASK 에칭에 관한 연구)

  • Lee, Woo-Sik
    • The Journal of Korea Institute of Information, Electronics, and Communication Technology
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    • v.14 no.4
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    • pp.323-327
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    • 2021
  • This paper produced SUS MASK, which is used for OLEDs, using an automatic liquid management system. The SUS MASK was tested by setting the hole diameter to 0.4 mm. The additive F300 was found to be excellent as the hole diameter was close to 0.4 mm and the error range was measured to be 0.08 on average. And as a result of measuring the weight reduction amount of CuCl2 and FeCl3 according to the change in oxidation-reduction potential (ORP), FeCl3 is relatively sensitive to ORP changes. Experiments were conducted on whether ORP (610 mV) and specific gravity (1.463) were automatically controlled while continuously etching the SUS Mask. Experimental results show that the automatic liquid management system is well controlled because the setting value is not significantly changed. After setting the hole diameter to 0.4 mm as the target, the experiment results were measured from 0.36 to 0.44. Therefore, it is expected that etching processing in the manufacturing process of SUS MASK can be improved with higher precision by applying the manufactured automatic liquid management system.

The Robustness Wavelet Watermarking with Adaptive Weight MASK (적응 가중치 마스크 처리 기반 강인한 웨이브릿 워터마킹)

  • 정성록;김태효
    • Journal of the Institute of Convergence Signal Processing
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    • v.4 no.2
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    • pp.46-52
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    • 2003
  • In this paper, the wavelet watermarking algorithm based on adaptive weight MASK processing as a watermark embedded-method for Copyright Protection of Digital contents is Proposed. Because watermark induce as a noise of original image, the watermark size should be limited for preventing quality losses and embedding watermark into images. Therefore, it should be preserve the best condition of the factors, robustness, capacity and visual quality. Tn order to solve this problem, we propose watermarking embedded method by applying adaptive weight MASK to the algorithm and optimize its efficiency. In that result, the watermarked images are improved about external attack. Specifically, correlation coefficient has over 0.8 on both modifications of brightness and contrast. Also, correlation coefficient of wavelet compression of embedded watermark last by over 0.65.

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Salt and Pepper Noise Removal Algorithm based on Euclidean Distance Weight (유클리드 거리 가중치를 기반한 Salt and Pepper 잡음 제거 알고리즘)

  • Chung, Young-Su;Kim, Nam-Ho
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.26 no.11
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    • pp.1637-1643
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    • 2022
  • In recent years, the demand for image-processing technology in digital marketing has increased due to the expansion and diversification of the digital market, such as video, security, and machine intelligence. Noise-processing is essential for image-correction and reconstruction, especially in the case of sensitive noises, such as in CT, MRI, X-ray, and scanners. The two main salt and pepper noises have been actively studied, but the details and edges are still unsatisfactory and tend to blur when there is a lot of noise. Therefore, this paper proposes an algorithm that applies a weight-based Euclidean distance equation to the partial mask and uses only the non-noisy pixels that are the most similar to the original as effective pixels. The proposed algorithm determines the type of filter based on the state of the internal pixels of the designed partial mask and the degree of mask deterioration, which results in superior noise cancellation even in highly damaged environments.

Image Restoration Algorithm based on Segmented Mask and Standard Deviation in Impulse Noise Environment (임펄스 잡음 환경에서 분할 마스크와 표준편차에 기반한 영상 복원 알고리즘)

  • Cheon, Bong-Won;Kim, Woo-Young;Sagong, Byung-Il;Kim, Nam-Ho
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.25 no.8
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    • pp.1039-1045
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    • 2021
  • In modern society, due to the influence of the 4th industrial revolution, camera sensors and image-based automation systems are being used in various fields, and interest in image and signal processing is increasing. In this paper, we propose a digital filter algorithm for image reconstruction in an impulse noise environment. The proposed algorithm divides the image into eight masks in vertical, horizontal, and diagonal directions based on the local mask set in the image, and compares the standard deviation of each segmentation mask to obtain a reference value. The final output is calculated by applying the weight according to the spatial distance and the weight using the reference value to the local mask. To evaluate the performance of the proposed algorithm, it was simulated with the existing algorithm, and the performance was compared using enlarged images and PSNR.

Audio fingerprint matching based on a power weight (파워 가중치를 이용한 오디오 핑거프린트 정합)

  • Seo, Jin Soo;Kim, Junghyun;Kim, Hyemi
    • The Journal of the Acoustical Society of Korea
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    • v.38 no.6
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    • pp.716-723
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    • 2019
  • Fingerprint matching accuracy is essential in deploying a music search service. This paper deals with a method to improve fingerprint matching accuracy by utilizing an auxiliary information which is called power weight. Power weight is an expected robustness of each hash bit. While the previous power mask binarizes the expected robustness into strong and weak bits, the proposed method utilizes a real-valued function of the expected robustness as weights for fingerprint matching. As a countermeasure to the increased storage cost, we propose a compression method for the power weight which has strong temporal correlation. Experiments on the publicly-available music datasets confirmed that the proposed power weight is effective in improving fingerprint matching performance.

A Stdudy on SUS MASK Etching using of FeCl3 (FeCl3를 이용한 SUS MASK 에칭에 관한 연구)

  • Lee, Woo-Sik
    • The Journal of Korea Institute of Information, Electronics, and Communication Technology
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    • v.13 no.5
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    • pp.412-418
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    • 2020
  • This paper produced an automatic fluid management system that can accurately control the specific gravity of etching solution(FeCl3), and produced a SUS MASK applied to OLED. The target was set at 0.4 mm in diameter of the hole. As a result of this misconception, the etching speed increased when the specific gravity(S.G) value of FeCl3 was changed from 1.43 to 1.49. And when the weight was 1.49, it was found that the vertical diameter was 0.405 mm, approaching the target. When pressure injection was varied from 2.0kg/cm2 to 3.5kg/cm2, the hole diameter at 3.0 kg/cm2 averaged 0.4mm, matching the target. The characteristics of the change in gravity were analyzed by applying the additive 1.2% and setting the weight at 1.430 by mixing HCl and H2O in FeCl3 and fixing the injection pressure at 3.0 kg/cm2. When the weight changed from 1.460 to 1.469 the etching speed increased from 0.564 to 0.540. When the weight was 1.467, the hole diameter was measured at 0.4 mm and the target was reached.