• 제목/요약/키워드: Thermal Process

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STS316 용사코팅의 최적 공정 설계 (Process Optimization of Thermal-sprayed STS316 Coating)

  • 김균택;김영식
    • 한국해양공학회지
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    • 제24권1호
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    • pp.161-165
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    • 2010
  • In the present study, process optimization for thermal-sprayed STS316 coating has been performed using $L_9(3^4)$ orthogonal array and analysis of variance (ANOVA). STS316 coatings were fabricated by flame spray process on steel substrate, and the hardness test and microstructure observation of the coatings were studied. The results of hardness test were analyzed by ANOVA. The ANOVA results showed that the spray distance had the greatest effect on hardness of the coating, on the other hands, the effects of oxygen gas flow and spray distance were ignorable. From these results, the optimal combination of the flame spray parameters could be derived, and confirmation experiment was carried out to verify these derived results. The calculated hardness of the coatings by ANOVA was found to approximately close to that of confirmation experimental result. Thus, it was considered that design of experiments using orthogonal array and ANOVA was effective for process optimization of thermal-sprayed STS316 coating.

알루미늄 양극산화를 사용한 LED COB 패키지 (ED COB Package Using Aluminum Anodization)

  • 김문정
    • 한국산학기술학회논문지
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    • 제13권10호
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    • pp.4757-4761
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    • 2012
  • 알루미늄 기판 및 양극산화 공정을 사용하여 LED Chip on Board(COB) 패키지를 제작하였다. 선택적 양극산화 공정을 적용하여 알루미늄 기판 상에 알루미나를 형성하고 이를 COB 패키지 절연층으로 사용하였으며, 비아홀 내부가 충진된 구조의 Thermal Via를 구현하였다. 패키지 기판 종류에 따른 열저항 및 발광효율 변화를 파악하기 위해 알루미늄 기판과 알루미나 기판을 제작하고 이를 각각 비교 분석하였다. Thermal Via가 적용된 알루미늄 기판이 51%의 열저항 개선 및 14%의 발광효율 향상 특성을 보여주었다. 이러한 결과는 선택적 양극산화 공정 및 Thermal Via 구조적용으로 COB 패키지의 방열 특성이 향상되었음을 의미한다. 또한 동일한 전력 소모시 LED 칩 개수에 따른 COB 패키지의 열저항 및 발광효율 변화를 분석함으로써 다수 칩의 효율적인 배치가 열저항 및 발광효율을 증가시킬 수 있음을 확인하였다.

이차전지온도퓨즈용 In-Bi-Sn계 가용합금박판 연구 (In-Bi-Sn Alloy Sheet for Thermal Fuse Element of Secondary Battery Safety System)

  • 윤기병
    • 자원리싸이클링
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    • 제26권5호
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    • pp.22-28
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    • 2017
  • 이차전지온도퓨즈시스템에 In-Bi-Sn계 저온가용합금 박판이 사용되고 있다. 본 연구에서는 온도퓨즈시스템에 사용될 수 있는 적절한 조성을 갖는 In-Bi-Sn계 합금을 용융하고 테이프캐스팅공정에 의하여 박판으로 제조하여 온도퓨즈용 저온가용합금 박판소재로 활용하는 가능성을 조사하였다. In-Bi-Sn계 용융합금은 기존의 박판제조공정보다 단순하고 생산성이 향상된 테이프캐스팅공정을 사용하여 박판화가 가능하다. 테이프캐스팅공정을 사용하여 얻은 62.5 wt%-In 20.0 wt%-Bi 17.5 wt%-Sn(융점 $92.4^{\circ}C$) 합금박판으로 휴대폰용 온도퓨즈시스템을 구성하여 $95^{\circ}C$에서 용락되는 기능이 나타남을 확인하였다. 이러한 공정은 폐In-Bi-Sn계 합금스크랩 처리에도 적용하여 합금조성과 박판두께를 적절히 조정하면 온도퓨즈시스템 가용합금 박판소재로 재활용할 수 있을 것으로 기대된다.

Optimization of arc brazing process parameters for exhaust system parts using box-behnken design of experiment

  • Kim, Yong;Park, Pyeong-Won;Park, Ki-Young;Ryu, Jin-Chul
    • Journal of Welding and Joining
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    • 제33권2호
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    • pp.23-31
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    • 2015
  • Stainless steel is used in automobile muffler and exhaust systems. However, in comparison with other steels it has a high thermal expansion rate and low thermal conductivity, and undergoes excessive thermal deformation after welding. To address this problem, we evaluated the use of arc brazing in place of welding for the processing of an exhaust system, and investigated the parameters that affect the joint characteristics. Muffler parts STS439 and hot-dipped Al coated steel were used as test specimens, and CuAl brazing wire was used as the filler metal for the cold metal transfer (CMT) welding machine, which is a low heat input arc welder. In addition, a Box-Behnken design of experiment was used, which is a response surface methodology. The main process parameters (current, speed, and torch angle) were used to determine the appropriate welding quality and the mechanical properties of the brazing part was evaluated at the optimal welding condition. The optimal processing condition for arc brazing was 135A current, 51cm/min speed and $74^{\circ}$ torch angle. The process was applied to an actual exhaust system muffler and the prototype was validated by thermal fatigue, thermal shock, and endurance limit tests.

Numerical and Experimental Investigation of the Heating Process of Glass Thermal Slumping

  • Zhao, Dachun;Liu, Peng;He, Lingping;Chen, Bo
    • Journal of the Optical Society of Korea
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    • 제20권2호
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    • pp.314-320
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    • 2016
  • The glass thermal forming process provides a high volume, low cost approach to producing aspherical reflectors for x-ray optics. Thin glass sheets are shaped into mirror segments by replicating the mold shape at high temperature. Heating parameters in the glass thermal slumping process are crucial to improve surface quality of the formed glass. In this research, the heating process of a thermal slumping glass sheet on a concave parabolic mold was simulated with the finite-element method (FEM) to investigate the effects of heating rate and soaking temperature. Based on the optimized heating conditions, glass samples 0.5 mm thick were formed in a furnace with a steel concave parabolic mold. The figure errors of the formed glass were measured and discussed in detail. It was found that the formed glass was not fully slumped at the edges, and should be trimmed to achieve better surface deviation. The root-mean-square (RMS) deviation and peak-valley (PV) deviation between formed glass and mold along the axial direction were 2.3 μm and 4.7 μm respectively.

이리듐 첨가에 의한 니켈모노실리사이드의 고온 안정화 (Thermal Stability Enhancement of Nickel Monosilicides by Addition of Iridium)

  • 윤기정;송오성
    • 한국재료학회지
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    • 제16권9호
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    • pp.571-577
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    • 2006
  • We fabricated thermal evaporated 10 nm-Ni/(poly)Si and 10 nm-Ni/1 nm-Ir/(poly)Si films to investigate the thermal stability of nickel monosilicide at the elevated temperatures by rapid annealing them at the temperatures of $300{\sim}1200^{\circ}C$ for 40 seconds. Silicides for salicide process was formed on top of both the single crystal silicon actives and the polycrystalline silicon gates. A four-point tester is used for sheet resistance. Scanning electron microscope and field ion beam were employed for thickness and microstructure evolution characterization. An x-ray diffractometer and an auger depth profile scope were used for phase and composition analysis, respectively. Nickel silicides with iridium on single crystal silicon actives and polycrystalline silicon gates showed low resistance up to $1200^{\circ}C$ and $800^{\circ}C$, respectively, while the conventional nickel monosilicide showed low resistance below $700^{\circ}C$. The grain boundary diffusion and agglomeration of silicides led to lower the NiSi stable temperature with polycrystalline silicon substrates. Our result implies that our newly proposed Ir added NiSi process may widen the thermal process window for nano CMOS process.

탄소강의 퀜칭처리 과정에서 변형율이력을 고려한 탄소성열응력의 유한요소 해석(II) - 탄점소성 열응력 해석 - (An Finite Element Analysis for Elasto-Plastic Thermal Stresses Considerating Strain Hysteresis at Quenching Process of Carbon Steel(II) - Analysis of elasto-viscoplastic thermal stress -)

  • 김옥삼;구본권
    • 열처리공학회지
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    • 제9권2호
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    • pp.147-158
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    • 1996
  • Generally, analytical consideration on the behaviour of metallic structures during quenching process, and analysis on the thermal stress and deformation after heat treatment are very important in presumption of crack and distorsion of quenched material. In this study a set of constitute equations relevant to the analysis of thermo elasto-viscoplastic materials with strain hysteresis during quenching process way presented on the basis of contimuum thermo-dynamics mechanics. The thermal stresses were numerically calculated by finite element technique of weighted residual method and the principle of virtual work. In the calculation process, the temperature depandency of physical and mechaniclal properties of the material in consideration. On the distribution of elasto-viscoplastic thermal stresses according to radial direction, axial and tangential stress are tensile stress(50MPa, 1.5GPa and 300MPa) in surface and compressive stress(-1.2GPa, -1.14GPa and -750MPa) in the inner part on the other hand, radial stress is tensile stress(900MPa) in area of analysis. According to axial direction, tangential stress gradients are average 60MPa/mm on the whole. The reversion of stress takes place at 11.5 to 16.8mm from the center in area of analysing.

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분무건조 및 대기 플라즈마 용사에 의한 지르코니아 열차폐 코팅재의 제조 및 평가 (Fabrication and Characterization of Zirconia Thermal Barrier Coatings by Spray Drying and Atmospheric Plasma Spraying)

  • 김철;허용석;김태우;이기성
    • 한국세라믹학회지
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    • 제50권5호
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    • pp.326-332
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    • 2013
  • In this study, we prepared yttria stabilized zirconia granules for thermal barrier coatings using a spray drying process. First, we characterized the properties of granules such as flow rate and packing density for utilizing the air plasma spray process. The flow rate and packing density data showed 0.732 g/sec and 2.14 $g/cm^3$, respectively, when we used larger and denser particles, which are better than hollow granules or smaller spherical granules. Second, we chose larger, spherical granules fabricated in alcohol solvent as starting powders and sprayed it on the bondcoat/nimonic alloy by an atmospheric plasma spray process varying the process parameters, the feeding rate, gun speed and spray distance. Finally, we evaluated representative thermal and mechanical characteristics. The thermal expansion coefficients of the coatings were $11{\sim}12.7{\times}10^{-6}/^{\circ}C$ and the indentation stress measured was 2.5 GPa at 0.15 of indentation strain.

플라즈마 이용 메탄 분해 특성 (Characteristics of $CH_4$ Decomposition by Plasma)

  • 김관태;이대훈;차민석;류정인;송영훈
    • 한국연소학회지
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    • 제10권4호
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    • pp.24-32
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    • 2005
  • Various types of plasma source applied in $CH_4$ decomposition process are compared. DBD by pulse and AC power, spark by pulse and AC power, rotating arc and hollow cathode plasma are chosen to be compared. The results show that $CH_4$ conversion per given unit power is relatively high in hollow cathode plasma and rotating arc that induces rather high temperature condition and that is why both thermal dehydration and plasma induced decomposition contribute for the overall process. In case of DBD wherein high temperature electron and low temperature gas molecule coexist, the process shows low conversion rate, for in rather low temperature condition the contribution of thermal dehydration is lowered. Selectivity of $C_2H_6$ and $C_2H_2$ is shown to be a good parameter of the relative contribution of plasma chemistry in the overall process. From the results we concluded that required condition of plasma source for a cost effective and high yield $CH_4$ decomposition is to have characteristics of both thermal plasma and non thermal plasma in which temperature is high above a certain threshold state for thermal dehydration and electron induced collision is maximized in the same breath.

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ZnO 나노 입자 분산 레진의 thermal imprinting 공정을 통한 기능성 패턴 제작 (Fabrication of Functional ZnO Nano-particles Dispersion Resin Pattern Through Thermal Imprinting Process)

  • 권무현;이헌
    • 한국정밀공학회지
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    • 제28권12호
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    • pp.1419-1424
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    • 2011
  • Nanoimprint lithography is a next generation lithography technology, which enables to fabricate nano to micron-scale patterns through simple and low cost process. Nanoimprint lithography has been applied in various industry fields such as light emitting diodes, solar cells and display. Functional patterns, including anti-reflection moth-eye pattern, photonic crystal pattern, fabricated by nanoimprint lithography are used to improve overall efficiency of devices in that fields. For these reasons, in this study, sub-micron-scaled functional patterns were directly fabricated on Si and glass substrates by thermal imprinting process using ZnO nano-particles dispersion resin. Through the thermal imprinting process, arrays of sub-micron-scaled pillar and hole patterns were successfully fabricated on the Si and glass substrates. And then, the topography, components and optical property of the imprinted ZnO nano-particles/resin patterns are characterized by Scanning Electron Microscope, Energy-dispersive X-ray spectroscopy and UV-vis spectrometer, respectively.