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Fabrication of Functional ZnO Nano-particles Dispersion Resin Pattern Through Thermal Imprinting Process  

Kwon, Moo-Hyun (Department of Applied Chemistry, Woosuk Univ.)
Lee, Heon (Department of Materials Science and Engineering, Korea Univ.)
Publication Information
Journal of the Korean Society for Precision Engineering / v.28, no.12, 2011 , pp. 1419-1424 More about this Journal
Abstract
Nanoimprint lithography is a next generation lithography technology, which enables to fabricate nano to micron-scale patterns through simple and low cost process. Nanoimprint lithography has been applied in various industry fields such as light emitting diodes, solar cells and display. Functional patterns, including anti-reflection moth-eye pattern, photonic crystal pattern, fabricated by nanoimprint lithography are used to improve overall efficiency of devices in that fields. For these reasons, in this study, sub-micron-scaled functional patterns were directly fabricated on Si and glass substrates by thermal imprinting process using ZnO nano-particles dispersion resin. Through the thermal imprinting process, arrays of sub-micron-scaled pillar and hole patterns were successfully fabricated on the Si and glass substrates. And then, the topography, components and optical property of the imprinted ZnO nano-particles/resin patterns are characterized by Scanning Electron Microscope, Energy-dispersive X-ray spectroscopy and UV-vis spectrometer, respectively.
Keywords
ZnO Nano-particles Dispersion Resin; Nanoimprint Lithography; Thermal imprinting;
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