• 제목/요약/키워드: Surface patterning

검색결과 287건 처리시간 0.033초

Effects of DC Biases and Post-CMP Cleaning Solution Concentrations on the Cu Film Corrosion

  • Lee, Yong-K.;Lee, Kang-Soo
    • Corrosion Science and Technology
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    • 제9권6호
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    • pp.276-280
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    • 2010
  • Copper(Cu) as an interconnecting metal layer can replace aluminum (Al) in IC fabrication since Cu has low electrical resistivity, showing high immunity to electromigration compared to Al. However, it is very difficult for copper to be patterned by the dry etching processes. The chemical mechanical polishing (CMP) process has been introduced and widely used as the mainstream patterning technique for Cu in the fabrication of deep submicron integrated circuits in light of its capability to reduce surface roughness. But this process leaves a large amount of residues on the wafer surface, which must be removed by the post-CMP cleaning processes. Copper corrosion is one of the critical issues for the copper metallization process. Thus, in order to understand the copper corrosion problems in post-CMP cleaning solutions and study the effects of DC biases and post-CMP cleaning solution concentrations on the Cu film, a constant voltage was supplied at various concentrations, and then the output currents were measured and recorded with time. Most of the cases, the current was steadily decreased (i.e. resistance was increased by the oxidation). In the lowest concentration case only, the current was steadily increased with the scarce fluctuations. The higher the constant supplied DC voltage values, the higher the initial output current and the saturated current values. However the time to be taken for it to be saturated was almost the same for all the DC supplied voltage values. It was indicated that the oxide formation was not dependent on the supplied voltage values and 1 V was more than enough to form the oxide. With applied voltages lower than 3 V combined with any concentration, the perforation through the oxide film rarely took place due to the insufficient driving force (voltage) and the copper oxidation ceased. However, with the voltage higher than 3 V, the copper ions were started to diffuse out through the oxide film and thus made pores to be formed on the oxide surface, causing the current to increase and a part of the exposed copper film inside the pores gets back to be oxidized and the rest of it was remained without any further oxidation, causing the current back to decrease a little bit. With increasing the applied DC bias value, the shorter time to be taken for copper ions to be diffused out through the copper oxide film. From the discussions above, it could be concluded that the oxide film was formed and grown by the copper ion diffusion first and then the reaction with any oxidant in the post-CMP cleaning solution.

UV-NIL(Ultraviolet-Nano-Imprinting-Lithography) 방법을 이용한 나노 패터닝기술 (Nano-patterning technology using an UV-NIL method)

  • 심영석;정준호;손현기;신영재;이응숙;최성욱;김재호
    • 한국진공학회지
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    • 제13권1호
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    • pp.39-45
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    • 2004
  • UV-나노임프린팅 (Ultraviolet-Nanoimprinting Lithography:UV-NIL) 공정 기술은 수십 나노에서 수 나노미터 크기의 구조물을 적은 비용으로 대량생산 할 수 있다는 장점을 가지고 있는 기술로 최근 전세계적으로 연구가 활발히 진행되고 있다. 본 연구에서는 반도체 공정 중 마스크 제작 공정을 이용하여 나노패턴을 가진 5${\times}$5${\times}$0.09 인치 크기의 수정스탬프(quartz stamp)를 제작하였고, 임프린팅 (imprinting)시에 레지스트(resist)와 스탬프(stamp) 사이에서 발생하는 점착현상(adhesion)을 방지하고자 그 표면에 Fluoroalkanesilane(FAS) 표면처리를 하였다. 웨이퍼의 평탄도를 개선하고 친수(hydrophilic) 상태의 표면을 만들기 위해 그 표면에 평탄화층을 스핀코팅하였고, 1 nl의 분해능을 가진 디스펜서(dispenser)를 이용하여 레지스트 액적을 도포하였다. 스템프 상의 패턴과 레지스트에 임프린트된 패턴은 SEM, AFM 등을 이용하여 측정하였으며, EVG620-NIL 장비를 이용한 임프린팅 실험에서 370 nm - 1 um 크기의 다양한 패턴을 가진 스탬프의 패턴들이 정확하게 레지스트에 전사됨을 확인하였다.

The Spatial Distribution of Quercus mongolica and Its Association with Other Tree Species in Two Quercus mongolica Stands in Mt. Jiri, Korea

  • Jang, Woong-Soon;Park, Pil-Sun;Han, Ah-Reum;Kim, Kyung-Youn;Kim, Myung-Pil;Park, Hak-Ki
    • Journal of Ecology and Environment
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    • 제33권1호
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    • pp.67-77
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    • 2010
  • Stand structure and spatial associations of the dominant tree species in Quercus mongolica stands were investigated to understand interspecific relationships and the persistent dominance of Q. mongolica. We examined the species composition, DBH (diameter at breast height) distribution, and spatial distribution of trees (${\geq}\;2.5\;cm$ DBH) in two permanent $100\;m\;{\times}\;100\;m$ plots in Q. mongolica-dominant stands on the western part of Mt. Jiri. Ripley's K-function was used to characterize the spatial patterns and associations of dominant tree species. Q. mongolica showed a continuous and reverse-J shaped DBH distribution with clumped spatial distribution in both study sites. Q. mongolica and Abies koreana exhibited a negative association implying potential interspecific competition. The positive spatial association between Q. mongolica and Alnus hirsuta var. sibirica and Fraxinus sieboldiana were affected by site characteristics: limited habitat conditions with a large proportion of rock surface. Our results suggest that interactions among species were complex and ranged from positive to negative. Differences in stand and site characteristics and regeneration mechanisms among the species play an important role in regulating their spatial distribution patterns, while competition between individuals also contributes to spatial patterning of these communities. The high density and the early developmental stage of spatial distribution and structural characteristics of Q. mongolica and the relatively low importance values of other species in the stands imply that Q. mongolica will remain dominant in the study sites in the near future.

Photocatalytic Activity of Hierarchical N doped TiO2 Nanostructures

  • Naik, Brundabana;Kim, Sun Mi;Jung, Chan Ho;Park, Jeong Young
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.669-669
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    • 2013
  • Hierarchical N doped TiO2 nanostructured catalyst with micro, meso and macro porosity have been synthesized by a facile self-formation route using ammonia and titanium isopropoxide precursor. The samples were calcined in different calcination temperature ranging from $300^{\circ}C$ to $800^{\circ}C$ at slow heating rate ($5^{\circ}C$/min) and designated as NHPT-300 to NHPT-800. $TiO_2$ nanostructured catalyst have been characterized by physico-chemical and spectroscopy methods to explore the structural, electronic and optical properties. UV-Vis diffuse reflectance spectra confirmed the red shift and band gap narrowing due to the doping of N species in TiO2 nanoporous catalyst. Hierarchical macro porosity with fibrous channel patterning was observed (confirmed from FESEM) and well preserved even after calcination at $800^{\circ}C$, indicating the thermal stability. BET results showed that micro and mesoporosity was lost after $500^{\circ}C$ calcination. The photocatalytic activity has been evaluated for methanol oxidation to formaldehyde in visible light. The enhanced photocatalytic activity is attributed to combined synergetic effect of N doping for visible light absorption, micro and mesoporosity for increase of effective surface area and light harvestation, and hierarchical macroporous fibrous structure for multiple reflection and effective charge transfer.

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Micro to Nano-scale Electrohydrodynamic Nano-Inkjet Printing for Printed Electronics: Fundamentals and Solar Cell Applications

  • 변도영
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 춘계학술발표대회
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    • pp.3.2-3.2
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    • 2011
  • In recent years, inkjet printing technology has received significant attention as a micro/nanofabrication technique for flexible printing of electronic circuits and solar cells, as well for biomaterial patterning. It eliminates the need for physical masks, causes fewer environment problems, lowers fabrication costs, and offers good layer-to-layer registration. To fulfill the requirements for use in the above applications, however, the inkjet system must meet certain criteria such as high frequency jetting, uniform droplet size, high density nozzle array, etc. Existing inkjet devices are either based on thermal bubbles or piezoelectric pumping; they have several drawbacks for flexible printing. For instance, thermal bubble jetting has limitations in terms of size and density of the nozzle array as well as the ejection frequency. Piezoelectric based devices suffer from poor pumping energy in addition to inadequate ejection frequency. Recently, an electrohydrodynamic (EHD) printing technique has been suggested and proposed as an alternative to thermal bubble or piezoelectric devices. In EHD jetting, a liquid (ink) is pumped through a nozzle and a strong electric field is applied between the nozzle and an extractor plate, which induce charges at the surfaces of the liquid meniscus. This electric field creates an electric stress that stretches the meniscus in the direction of the electric field. Once the electric field force is larger than the surface tension force, a liquid droplet is formed. An EHD inkjet head can produce droplets smaller than the size of the nozzle that produce them. Furthermore, the EHD nano-inkjet can eject high viscosity liquid through the nozzle forming tiny structures. These unique features distinguish EHD printing from conventional methods for sub-micron resolution printing. In this presentation, I will introduce the recent research results regarding the EHD nano-inkjet and the printing system, which has been applied to solar cell or thin film transistor applications.

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후면 위상 패턴을 이용한 투과율 조절 포토마스크 (Transmittance controlled photomasks by use of backside phase patterns)

  • 박종락;박진홍
    • 한국광학회지
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    • 제15권1호
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    • pp.79-85
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    • 2004
  • 후면의 석영면에 위상 패턴을 형성하여 투과율 조절을 구현한 포토마스크에 대해 보고한다. 위상 패턴의 크기와 패턴 조밀도에 따른 조명 동공의 형태 변화에 관한 이론적 결과와 투과율 조절 포토마스크를 사용한 웨이퍼 상 CD(critical dimension) 균일도 개선에 관한 실험적 결과에 대해 기술한다. 투과율 조절을 위한 위상 패턴은 패턴이 형성되지 않은 영역에 대해 180$^{\circ}$의 상대적 위상을 갖도록 석영면을 식각한 콘택홀 형태의 패턴을 사용하였다. 콘택홀 패턴의 크기가 작을수록 본래의 조명동공 형태를 유지하게 되며, 동일한 패턴 조밀도에서 더욱 큰 노광 광세기 저하가 일어남을 알 수 있었다. 패턴 조밀도를 위치별로 변화시켜 CD균일도 개선에 적합한 투과율 분포를 포토마스크 후면에 형성하였다. 투과율 조절 포토마스크를 140nm 디자인 롤을 갖고 있는 DRAM(Dynamic Random Access Memory)의 한 주요 레이어에 적용하여 CD 균일도를 3$\sigma$값으로 24.0nm에서 10.7nm 로 개선할 수 있었다.

2-beam Coupling 방법을 이용한 광 고분자 형광 패턴 형성 (Fluorescent Pattern Generation on the Fluorescent Photopolymer with 2-beam Coupling Method)

  • 김윤정;김정훈;심보연;이명규;김은경
    • 한국광학회지
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    • 제21권1호
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    • pp.6-11
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    • 2010
  • 아크릴레이트계 모노머를 사용한 최적화 된 포토폴리머에 안트라센 형광폴리머를 첨가하여 형광 특성을 가지는 포토폴리머를 제조하고, 514 nm 레이저를 이용하여 2-beam coupling 방법으로 형광 포토폴리머 필름 위에 회절격자를 형성하였다. 기록 시작 후 30초 이내에 선명한 fluorescent line pattern 이 형성되었으며, 회절격자 형성 뒤, 패턴이 형성된 부분에서 형광 세기의 증가가 관찰되었다. 기록 시 간섭 빔 앞에 mask pattern 을 이용하여 $50\;{\mu}m$ gap electrode 패턴을 형성하였다. 이 때 형성된 패턴은 micron scale gap패턴 안에 회절격자로부터 생성된 submicron scale의 grating line을 보였다. 이는 beam의 광 고분자 film 표면에 대한 각도($3.6^{\circ}$, $15^{\circ}$), 패턴에 사용된 광 고분자의 굴절률 등으로부터 Bragg's equation 을 사용하여 계산된 이론적인 grating 간격 ($0.6\;{\mu}m$) 과 오차범위 안에서 일치 하였다.

$BaTiO_3$$TiO_2$ 연마제 첨가를 통한 BTO박막의 CMP (CMP of BTO Thin Films using $TiO_2$ and $BaTiO_3$ Mixed Abrasive slurry)

  • 서용진;고필주;김남훈;이우선
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.68-69
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    • 2005
  • BTO ($BaTiO_3$) thin film is one of the high dielectric materials for high-density dynamic random access memories (DRAMs) due to its relatively high dielectric constant. It is generally known that BTO film is difficult to be etched by plasma etching, but high etch rate with good selectivity to pattern mask was required. The problem of sidewall angle also still remained to be solved in plasma etching of BTO thin film. In this study, we first examined the patterning possibility of BTO film by chemical mechanical polishing (CMP) process instead of plasma etching. The sputtered BTO film on TEOS film as a stopper layer was polished by CMP process with the self-developed $BaTiO_3$- and $TiO_2$-mixed abrasives slurries (MAS), respectively. The removal rate of BTO thin film using the$ BaTiO_3$-mixed abrasive slurry ($BaTiO_3$-MAS) was higher than that using the $TiO_2$-mixed abrasive slurry ($TiO_2$-MAS) in the same concentrations. The maximum removal rate of BTO thin film was 848 nm/min with an addition of $BaTiO_3$ abrasive at the concentration of 3 wt%. The sufficient within-wafer non-uniformity (WIWNU%)below 5% was obtained in each abrasive at all concentrations. The surface morphology of polished BTO thin film was investigated by atomic force microscopy (AFM).

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고정밀 회전 및 축방향 이송을 위한 신개념 원통형 자기부상 스테이지 (Novel Cylindrical Magnetic Levitation Stage for Rotation as well as Translation along Axles with High Precisions)

  • 전정우;;이창린;정연호;김종문;오현석;김성신
    • 전기학회논문지
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    • 제61권12호
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    • pp.1828-1835
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    • 2012
  • In this paper, a conceptual design and a detailed design of novel cylindrical magnetic levitation stage is introduced. This is came from planar-typed magnetic levitation stage. The proposed stage is composed of cylinder-typed permanent magnet array and semi-cylinder-typed 3 phase winding module. When a proper current is induced at winding module, a magnetic levitation force between the permanent magnet array and winding module is generated. The proposed stage can precisely move the cylinder to rotations and translations as well as levitations with the magnetic levitation force. This advantage is useful to make a nano patterning on the surface of cylindrical specimen by using electron beam lithography under vacuum. Two methods are used to calculate required magnetic levitation forces. The one is 2D FEM analysis, the other is mathematical modeling. This paper shown that results of two methods are similar. An assistant plate is introduced to reduce required currents of winding module for levitations in vacuum. The mathematical model of cylindrical magnetic levitation stage is used for dynamic simulation of magnetic levitations. A lead-lag compensator is used for control of the model. Simulation results shown that the detail designed model of the cylindrical magnetic levitation stage with the assistant plate can be controlled very well.

고분자 전해질 연료전지 유로의 수분배출 특성의 실험 및 해석적 평가 (Experimental and Numerical Assessment of Liquid Water Exhaust Performance of Flow Channels in PEM Fuel Cells)

  • 김현일;남진현;신동훈;정태용;김영규
    • 대한기계학회논문집B
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    • 제33권2호
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    • pp.85-92
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    • 2009
  • Polymer electrolyte membrane (PEM) fuel cells are a promising technology for short-term power generation required in residential and automobile applications. Proper management of water has been found to be essential for improving the performance and durability of PEM fuel cells. This study investigated the liquid water exhaust capabilities of various flow channels having different geometries and surface properties. Three-pass serpentine flow fields were prepared by patterning channels of 1 mm or 2 mm width onto hydrophilic Acrylic plates or hydrophobic Teflon plates, and the behaviors of liquid water in those flow channels were experimentally visualized. Computational fluid dynamics (CFD) simulations were also conducted to quantitatively assess the liquid water exhaust capabilities of flow channels for PEM fuel cells. Numerical results showed that hydrophobic flow channels have better liquid water exhaust capabilities than hydrophilic flow channels. Flow channels with curved corners showed less droplet stagnation than the channels with sharp corners. It was also found that a smaller width is desirable for hydrophobic flow channels while a larger width is desirable for hydrophilic ones. The above results were explained as being due to the different droplet morphologies in hydrophobic and hydrophilic channels.