• 한국재료학회지
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• 제12권10호
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• pp.809-813
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• 2002

Commercial nano crystalline $TiO_2$ powders were used to characterize photocatalyst, using thermal spray coating technique. The microstructure of coating layers were examined by SEM, FE-SEM and TEM. Also the cross sectional areas of TiO$_2$ coating layers were observed by SEM. The phases were analyzed by X-ray diffraction methed. Surface roughness and hardness were measured. It was found that phase transformation from anatase to rutile occurred, and the melted splats are all rutile, and unmeted nano particles were anatase. These unmelted anatase phase may enhance te play a role of photocatalyst.

• 한국표면공학회지
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• 제55권3호
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• pp.143-155
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• 2022

Ceramic oxide layers successfully were formed on the surface of cast Al alloys with high Si contents using plasma electrolytic oxidation (PEO) process in electrolytes containing Na₂SiO₃, NaOH, and additives. The microstructure of the oxide layers was systematically analyzed using scanning electron microscopy (SEM), cross-sectional transmission electron microscopy (TEM), X-ray diffraction patterns (XRD), and energy X-ray dispersive spectroscopy (EDS). XRD analysis indicated that the PEO untreated high-silicon Al alloys (i.e., 17.1 and 11.7 wt.% Si) consist of Al, Si and Al₂Cu phases whereas Al₂Cu phase selectively disappeared after PEO treatment. PEO process yielded an amorphous oxide layer with few second phases including γ-Al₂O₃ and Fe-rich phases. The corrosion behaviors of high-silicon Al alloys treated by PEO process were investigated using electrochemical impedance spectroscopy (EIS) and other electrochemical techniques (i.e., open circuit potential and polarization curve). Electroanalytical studies indicated that high-silicon Al alloys treated by PEO process have greater corrosion resistance than high-silicon alloys untreated by PEO process.

• International Journal of Naval Architecture and Ocean Engineering
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• 제11권2호
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• pp.858-864
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• 2019

The increasing demands of lifting lugs can be attributed to the rapid advancement of shipbuilding and offshore-structure production technologies and an exponential increase in the size of the block units of ship structures. Therefore, to ensure safety during the transportation and turnover of large blocks, it is important to determine the structural integrity and position of lifting lugs. However, because the manufacturing cost and availability of lugs are important considerations, low cost and easily obtainable steel compositions of grades different from those of the blocks are often used as alternatives. The purpose of this study is to investigate the effect of a lifting-lug metal on the physical properties of a base metal in a dissimilar welding between the base metal and lifting lug. The effect was evaluated by observing the metal microstructures and determining the hardness and dilution values on the cross-sectional surface of the lifting lug. According to the results of the metal microstructures, impact, hardness, and emission spectrochemical analysis at the surface from where the lug was removed confirmed that the chemical composition of the lifting-lug metal did not influence the physical properties of the base metal.

• 한국재료학회지
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• 제18권1호
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• pp.5-11
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• 2008

Thermally evaporated 10 nm-Ni/1 nm-Au/(30 nm-poly)Si structures were fabricated in order to investigate the thermal stability of Au-inserted nickel silicide. The silicide samples underwent rapid thermal annealing at $300{\sim}1100^{\circ}C$ for 40 seconds. The sheet resistance was measured using a four-point probe. A scanning electron microscope and a transmission electron microscope were used to determine the cross-sectional structure and surface image. High-resolution X-ray diffraction and a scanning probe microscope were employed for the phase and surface roughness. According to sheet resistance and XRD analyses, nickel silicide with Au had no effect on widening the NiSi stabilization temperature region. Au-inserted nickel silicide on a single crystal silicon substrate showed nano-dots due to the preferred growth and a self-arranged agglomerate nano phase due to agglomeration. It was possible to tune the characteristic size of the agglomerate phase with silicidation temperatures. The nano-thick Au-insertion was shown to lead to self-arranged microstructures of nickel silicide.

• 대한금속재료학회지
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• 제46권11호
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• pp.762-769
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• 2008

Hydrogenated amorphous silicon(a-Si : H) layers, 120 nm and 50 nm in thickness, were deposited on 200 $nm-SiO_2$/single-Si substrates by inductively coupled plasma chemical vapor deposition(ICP-CVD). Subsequently, 30 nm-Ni layers were deposited by E-beam evaporation. Finally, 30 nm-Ni/120 nm a-Si : H/200 $nm-SiO_2$/single-Si and 30 nm-Ni/50 nm a-Si:H/200 $nm-SiO_2$/single-Si were prepared. The prepared samples were annealed by rapid thermal annealing(RTA) from $200^{\circ}C$ to $500^{\circ}C$ in $50^{\circ}C$ increments for 30 minute. A four-point tester, high resolution X-ray diffraction(HRXRD), field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), and scanning probe microscopy(SPM) were used to examine the sheet resistance, phase transformation, in-plane microstructure, cross-sectional microstructure, and surface roughness, respectively. The nickel silicide on the 120 nm a-Si:H substrate showed high sheet resistance($470{\Omega}/{\Box}$) at T(temperature) < $450^{\circ}C$ and low sheet resistance ($70{\Omega}/{\Box}$) at T > $450^{\circ}C$. The high and low resistive regions contained ${\zeta}-Ni_2Si$ and NiSi, respectively. In case of microstructure showed mixed phase of nickel silicide and a-Si:H on the residual a-Si:H layer at T < $450^{\circ}C$ but no mixed phase and a residual a-Si:H layer at T > $450^{\circ}C$. The surface roughness matched the phase transformation according to the silicidation temperature. The nickel silicide on the 50 nm a-Si:H substrate had high sheet resistance(${\sim}1k{\Omega}/{\Box}$) at T < $400^{\circ}C$ and low sheet resistance ($100{\Omega}/{\Box}$) at T > $400^{\circ}C$. This was attributed to the formation of ${\delta}-Ni_2Si$ at T > $400^{\circ}C$ regardless of the siliciation temperature. An examination of the microstructure showed a region of nickel silicide at T < $400^{\circ}C$ that consisted of a mixed phase of nickel silicide and a-Si:H without a residual a-Si:H layer. The region at T > $400^{\circ}C$ showed crystalline nickel silicide without a mixed phase. The surface roughness remained constant regardless of the silicidation temperature. Our results suggest that a 50 nm a-Si:H nickel silicide layer is advantageous of the active layer of a thin film transistor(TFT) when applying a nano-thick layer with a constant sheet resistance, surface roughness, and ${\delta}-Ni_2Si$ temperatures > $400^{\circ}C$.

• 대한금속재료학회지
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• 제46권3호
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• pp.159-168
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• 2008

Thermally-evaporated 10 nm-Ni/1 nm-Ru/(30 nm or 70 nm-poly)Si structures were fabricated in order to investigate the thermal stability of Ru-inserted nickel monosilicide. The silicide samples underwent rapid thermal anne aling at $300{\sim}1,100^{\circ}C$ for 40 seconds. Silicides suitable for the salicide process were formed on the top of the single crystal and polycrystalline silicon substrates mimicking actives and gates. The sheet resistance was measured using a four-point probe. High resolution X-ray diffraction and Auger depth profiling were used for phase and chemical composition analysis, respectively. Transmission electron microscope and scanning probe microscope(SPM) were used to determine the cross-sectional structure and surface roughness. The silicide, which formed on single crystal silicon and 30 nm polysilicon substrate, could defer the transformation of $Ni_2Si $i and $NiSi_2 $, and was stable at temperatures up to $1,100^{\circ}C$ and $1,100^{\circ}C$, respectively. Regarding microstructure, the nano-size NiSi preferred phase was observed on single crystalline Si substrate, and agglomerate phase was shown on 30 nm-thick polycrystalline Si substrate, respectively. The silicide, formed on 70 nm polysilicon substrate, showed high resistance at temperatures >$700^{\circ}C$ caused by mixed microstructure. Through SPM analysis, we confirmed that the surface roughness increased abruptly on single crystal Si substrate while not changed on polycrystalline substrate. The Ru-inserted nickel monosilicide could maintain a low resistance in wide temperature range and is considered suitable for the nano-thick silicide process.

• 열처리공학회지
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• 제12권2호
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• pp.166-173
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• 1999

Commercial carbon steels containing 0.2~0.55 wt.----C were plasma-nitrided or plasma nitrocarburized at $550^{\circ}C$ for 21.6Ks using $H_2-N_2$ or $H_2-N_2$-CO mixed gas respectively. The characteristics of hardening and wear-resistance of each treatment were studied and compared. And also microstructure of nitrided layer and nitrides formed in compound layer near surface were studied. All plasma-nitrided steels investigated showed remarkable increase of surface hardness with the increase of carbon content. But nitrocarburized steels resulted in higher surface-hardness than plasma-nitrided steels, which means that nitrocarburized has higher surface-hardening effect. Plasma-nitrided steels showed hardness increase in through-thickness direction near surface. And also nitrocarburized steels showed similar hardness distribution in through-thickness direction to that of plasma-nitrided steel. However, nitrocarburized steels had higher cross-sectional maximum-hardness than plasma-nitrided steels as much as 100Hv. Wear test showed that the amount of specific wear was reduced by both plasma-nitriding and nitrocarburized, showing that the amount of specific wear was not related to the hardness. But non-treated specimen showed that the amount of specific wear was related to the hardness.

• Membrane and Water Treatment
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• 제13권6호
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• pp.291-301
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• 2022

In this study, cement/PVDF hollow-fiber hybrid membranes were prepared via a mixed process of diffusion-induced phase separation and hydration. The presence of X-ray diffraction peaks of Ca(OH)₂, an AFt phase, an AFm phase, and C-S-H phase confirmed the hydration reaction. Good hydrophilicity was obtained. The cross-sectional and surface morphologies of the hybrid membranes showed that an asymmetric pore structure was formed. Hydration products comprising parallel plates of Ca(OH)₂, fibrous ettringite AFt, and granulated particles AFm were obtained gradually. For the hybrid membranes cured for different time, the pore-size distribution was similar but the porosity decreased because of blocking of the hydration products. In addition, the water flux decreased with hydration time, and carbon retention was 90% after 5 h of rejection treatment. Almost all the Zn²⁺ ions were adsorbed by the hybrid membrane. The above results proved that the obtained membrane could be alternative as basement membrane for separation application.

• 한국재료학회지
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• 제12권11호
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• pp.865-869
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• 2002

We investigated the reaction stability of titanium, cobalt and their bilayer films with side-wall spacer materials of SiO$_2$ for the salicide process. We prepared Ti 350 $\AA$, Co 150 $\AA$, Co 150 $\AA$/Ti 100 $\AA$ and Ti 100 $\AA$/Co 150 $\AA$ films on 1000 $\AA$-thick thermally grown SiO$_2$ substrates, respectively. Then the samples were rapid thermal annealed at the temperatures of $500^{\circ}C$, $600^{\circ}C$, and $700^{\circ}C$ for 20 seconds. We characterized the sheet resistance of the metallic layers with a four-point probe, surface roughness with scanning probe microscope, residual phases with an Auger depth profilometer, phase identification with a X-ray diffractometer, and cross-sectional microstructure evolution with a transmission electron microscope, respectively. We report that Ti reacted with silicon dioxide spacers above $700^{\circ}C$, Co agglomerated at $600^{\circ}C$, and Co/Ti, Ti/Co formed CoTi compound requiring a special wet process.

• 대한금속재료학회지
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• 제48권12호
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• pp.1109-1115
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• 2010

ZnO thin films were deposited on Si(100) substrates at low temperatures ($44^{\circ}C{\sim}210^{\circ}C$) by atomic layer deposition using DEZn (diethyl zinc) and water as precursors. The film thickness was measured by ellipsometry calibrated with cross-sectional TEM. The phase formation, microstructure evolution, UV-absorbance, and chemical composition changes were examined by XRD, SEM, AFM, TEM, UV-VIS-NIR, and AES, respectively. A uniform amorphous ZnO layer was formed even at $44^{\circ}C$ while stable crystallized ZnO films were deposited above $90^{\circ}C$. All the samples showed uniform surface roughness below 3 nm. Fully crystallized ZnO layers with a band-gap of 3.37 eV without carbon impurities can be formed at substrate temperatures of less than $90^{\circ}C$.