• 한국결정성장학회지
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• 제9권2호
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• pp.173-179
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• 1999

본 연구에서는 비정질 규소 박막의 결정화를 촉진시키기 위하여 표면 활성화 처리의 영향을 관찰하였다. 표면 활성화 방법으로는 습식 연마법(Wet Blasting)과 Nd:YAG 레이저의 빔을 사용하였고, 700~$800^{\circ}C$에서 관상로 열처리를 행하여 고살 결정화에 미치는 영향을 보았다. 결정화 정도의 기준으로는 XRD 분석을 통해 얻은 (111) 피크강도를 이용하였으며, 결정의 품질을 분석하기 위해 Raman 분석을 행하였다. 결정화의 표면 형상에 대한 관찰은 주사전자 현미경(SEM)을 사용하였다. 본 실험 결과 표면 활성화 처리는 비정질 규소박막의 결정화를 촉진하고, 결정의 품질을 향상시키는 것으로 확인되었다. 습식 연마법(Wet Blasting)의 경루 2 Kgf/$\textrm{cm}^2$의 압력이 가장 효과적이었고, 레이저의 에너지는 100~200mJ/$\textrm{cm}^2$가 효과적이었다. 이것은 표면활성화처리를 통하여 비정질 실리콘 박막의 표면에 strain energy가 형성되어 결정화에 필요한 엔탈피에 영향을 미친 효과 때문으로 예상된다.

• 대한의용생체공학회:의공학회지
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• 제44권6호
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• pp.465-475
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• 2023

In this study, we demonstrated a silica nanofibrous membrane based on the electrospinning process and evaluated its DNA isolation and purification performance in PCR pretreatment. Generally, silica membranes made of non-woven fabric are used for PCR pretreatment, but this study aimed to improve the efficiency of the pretreatment process by developing a nanofiber-type silica membrane with high specific surface area and porosity. In order to manufacture a nanofiber-shaped silica film while maintaining the original physical properties of silica, nanofiber membranes produced by adding various concentrations of PEO (5 wt%, 8 wt%, and 10 wt%) to silica prepared by the sol-gel method were compared. In terms of nanofiber membrane production, the higher the PEO concentration, the more effective it was in producing nanofiber membranes. The produced silica nanofiber membrane was inserted to a pretreatment device used in commercial PCR equipment, and the pretreatment performance was compared and verified using Salmonella bacteria. When Salmonella was used, samples containing 5 wt% PEO showed superior PCR efficiency compared to samples containing 8 wt% and 10 wt% PEO. These results show that adding 5 wt% of PEO can effectively improve DNA purification and separation by producing a nanofiber-shaped silica film while maintaining the physical properties of silica. We expect that this study will contribute to the development of effective PCR pretreatment technology essential for various molecular biology applications.

• 센서학회지
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• 제16권1호
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• pp.77-83
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• 2007

Nanoporous silica aerogels with various surface modifiers were prepared by ambient drying process. Tetraethylorthosilicate (TEOS) were used a raw material. Ambient drying process for various surface modifier was studied in the point of view of a crack-free monolith and thin films and low cost. Various kinds of surface modifiers like as hexamethyldisilazane (HMDSZ), trimethlychlorosilane (TMCS), methlytriethoxylsilane (MTES), and methlytrimethoxysilane (MTMS) were studied in order to enhance hydrophobicity for the silica aerogel. Surface modified aerogels were evaluated by FT-IR, TG, BET, SEM and wetting angle measurement. Homogeneous and crack-free aerogels were obtained by modifying the HMDSZ and the TMCS. However silica xerogel was obtained when modified with MTMS, MTES.

• 한국재료학회지
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• 제16권5호
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• pp.308-311
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• 2006

The purpose of this study is to investigate the difference of the wafer nanotopography impact on the oxide-film thickness variation between the STI CMP using ceria slurry and STI CMP using fumed silica slurry. The nanotopography impact on the oxide-film thickness variation after STI CMP using ceria slurry is 2.8 times higher than that after STI CMP using fumed silica slurry. It is attributed that the STI CMP using ceria slurry follows non-Prestonian polishing behavior while that using fumed silica slurry follows Prestonian polishing behavior.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.1733-1736
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• 2006

Nanosilver has intrinsic problem to adhesion on the surface of silica. To improve interfacial properties between nanosilver and silica substrate, a thin titanium film is introduced in this study. The titaniumcoated silica substrates are prepared by sputter technique. The commercial silver nanopaste with size around 3-7nm is used in this study. The results indicate thin layer of titanium can improve the bonding properties of nanosilver and expect to be used in fabrication of TFT display panel.

• ETRI Journal
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• 제24권5호
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• pp.398-400
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• 2002

Using $Cr_2O_3$ thin film, we developed a novel etch-stop technique for the protection of silicon surface morphology during deep ion coupled plasma etching of silica layers. With this technique we were able to etch a silica trench with a depth of over 20 ${\mu}m$ without any damage to the exposed silicon terrace surface. This technique should be well applicable to fabricating silica planar lightwave circuit platforms for opto-electronic hybrid integration.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2008년도 추계학술대회 초록집
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• pp.6-7
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• 2008

Composite nanoparticles of silica-polyaniline were synthesized and tested as an electrochromic material. For the optical application, the size of the nanoparticle was intended to be less than 100 nm in diameter. The synthesis was done by using a microemulsion synthesis method where the silica-polyaniline composite nanoparticle was obtained by dispersing two acidic aqueous phases containing aniline and polymerization agent, respectively. Microstructure analysis such as TEM and BET surface area measurement showed the possibility that polyaniline is incorporated in porous silica structure. The composite structure of the particle was proved to enhance chemical stability of the prepared electrochromic film.

• 접착 및 계면
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• 제16권3호
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• pp.95-100
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• 2015

본 연구에서는 실리카, 산화아연, 아연이온이 코팅된 실리카가 carboxylic acid로 변성된 스티렌계 열가소성 엘라스토머(m-TPS) film의 마찰시 표면 파괴에 미치는 영향을 관찰하였다. 일반 실리카를 첨가한 m-TPS film은 실리카 입자간의 강한 filler-filler interaction에 의한 낮은 분산성 때문에 기계적 강도, 내마모성과 마찰시 표면 파괴가 저하되는 것으로 나타났다. 산화아연 또는 아연이온이 코팅된 실리카를 첨가한 m-TPS는 zinc ion과 carboxylic acid group 간의 ionic cluster 형성을 통하여 기계적 강도, 내마모성과 마찰 시 표면 파괴가 개선되었다. Zinc ion과 carboxylic acid group 간의 ionic cluster 형성은 $1550{\sim}1650cm^{-1}$의 zinc carboxylate group stretch 피크의 FT-IR 분석 결과로 확인하였다.

• 한국세라믹학회지
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• 제34권2호
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• pp.188-194
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• 1997

TMCS(Trimethylchlorosilane)로 표면개질한 습윤겔을 에탄올에 재분산시켜 코팅용 재분산 실리카 졸을 제조하였고 제조된 졸을 실리콘 기판에 스핀 코팅한 후 상압 하에서 건조(8$0^{\circ}C$) 및 열처리(>25$0^{\circ}C$)하여 열처리온도에 따른 박막의 물성 변화를 관찰하였다. 습윤겔의 재분산시 안정한 재분산 실리카 졸의 제조를 위한 최적 재분산 조건을 습윤겔:에탄올=1g110$m\ell$로 하였고, 이렇게 제조된 재분산 실리카 졸의 농도와 점도는 각각 0.11 M, 2.0-2.2cP였으며 평균 졸 입자크기는 약 30nm정도였다. 1500rpm, 10회 스핀 코팅한 후 8$0^{\circ}C$에서 2시간 건조, 45$0^{\circ}C$에서 2시간 열처리에 의하여 굴절율이 약 1.14, 두께가 400nm정도인 균열이 없는 박막을 얻을 수 있었다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 1999년도 추계학술발표강연 및 논문개요집
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• pp.146-146
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• 1999