• 제목/요약/키워드: Semiconductor single crystals

검색결과 50건 처리시간 0.029초

Fabrication, Structure and Gas Sensing Properties of Pt-functionalized ZnS Nanowires

  • Kim, Soohyun;Park, Sunghoon;Jung, Jihwan;Lee, Chongmu
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.315.2-315.2
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    • 2014
  • Pt-functionalized ZnS nanowires were synthesized on Au-deposited c-plane sapphire substrates by thermal evaporation of ZnS powders followed by wet Pt coating and annealing. The $NO_2$ gas sensing properties of multiple-networked Pt-functionalized ZnS nanowire sensors were examined. Scanning electron microscopy showed the nanowires with diameters of 20-80 nm. Transmission electron microscopy and X-ray diffraction showed that the nanowires were wurtzite-structured ZnS single crystals. The Pt-functionalized ZnS nanowire sensors showed enhanced sensing performance to $NO_2$ gas at $150^{\circ}C$ compared to pristine ZnS nanowire sensors. Pristine and Pt-functionalized ZnS nanowire sensors showed responses of 140-211% and 207-488%, respectively, to 1-5 ppm $NO_2$, which are better than or comparable to those of many oxide semiconductor sensors. In addition, the underlying mechanism of the enhancement of the sensing properties of ZnS nanowires by Pt functionalization is discussed.

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수열합성을 이용한 ZnO 마이크로 구조의 성장 및 전사 (Fabrication of Vertically Oriented ZnO Micro-crystals array embedded in Polymeric matrix for Flexible Device)

  • 양동원;이원우;박원일
    • 마이크로전자및패키징학회지
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    • 제24권4호
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    • pp.31-37
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    • 2017
  • 최근, 유연하며 몸에 부착 가능한 소자들에 대한 관심이 늘어나고 있다. 이런 관심을 뒷받침 하여 이와 관련된 다양한 연구들이 진행되고 있는데, 기존 딱딱한 성질을 가진 소자에 사용되던 무기물 기반의 재료의 경우 유연 소자로 만들기에 여러 가지 제약이 있어 유연하게 제작할 수 있는 유기물 반도체나 탄소 나노튜브 필름 등을 이용한 소자들이 주로 연구되고 개발되어 왔다. 하지만 이런 재료들을 이용한 소자의 경우 유기물 분자와 분자 사이 또는 탄소 나노튜브와 나노튜브 사이에서 전하들이 산란되는 등 재료 자체의 한계로 인해 기존의 재료를 사용한 소자들보다 전기적 성능이 떨어지는 단점을 가지고 있다. 이런 단점들을 해결하기 위하여 이 연구에서는 수직 정렬된 반도체 결정 어레이를 투명 유연한 폴리머와 결합하는 방법을 이용, 고품질 나노/마이크로 반도체 결정을 유연한 기판으로 전사 시킬 수 있는 방법을 제시한다. 위와 같은 구조는 재료에 가해지는 힘을 완화 시켜줄 수 있으며, 이로 인해 큰 변형에도 재료의 손상이 없는 소자 제작이 가능하다. 이런 구조를 구현하기 위해 위치 및 크기가 정교하게 제어된 ZnO 나노막대 단결정을 저온에서 용액공정을 통하여 합성시킨다. 이후 성장시킨 ZnO 단결정 어레이와 polydimethylsiloxane (PDMS) 폴리머를 결합시킨 후 단단한 기판에서 기계적으로 박리시켜 ZnO/폴리머 복합체를 분리해 낸다. 추가적으로 전사된 ZnO의 결정성을 확인하기 위하여 photoluminescent 분석을 진행하였으며, ZnO/폴리머 복합체를 이용한 외부 힘에 반응하는 압력 센서를 제작하였다.

수직온도구배냉각법으로 크롬과 인듐이 함께 도핑된 반절연 갈륨비소 단결정의 성장 및 특성평가 (Growth and characterization of semi-insulating GaAs co-doped with Cr and In by vertical gradient freeze technique)

  • Young Ju Park;Suk-Ki Min;Kee Dae Shim;Mann J. Park
    • 한국결정성장학회지
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    • 제4권1호
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    • pp.83-91
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    • 1994
  • 직경 2인치 갈륨비소 단결정을 위한 수직온도구배냉각 결정성장치를 제작하여 크롬과 인듐이 함께 도핑된 반절연 갈륨비소 단결정을 성장하였다. 함께 도핑된 결정에 대해서,불순물의 편석계수는 크롬 또는 인듐만을 도핑한 결정에서 편석계수와 비교할 때 변하지 않고 같은 값을 갖는다. 크롬과 인듐의 농도는 결정의 종자부분 부터 꼬리부분까지 각각 $2{\Times}10^{16}~3{\Times}10^{17} cm^{-3}$$2{\Times}10^{19}~3{\Times}10^{20} cm^{-3}$의 범위내에서 분포되었다. 평균 전위밀도는 결정의 전 영역에 걸쳐 약 $8000cm^{-2}$ 미만으로 관측되었다. 또한 인듐농도가 증가함에 따라 전위 밀도가 $1000m^{-2}$ 미만으로 감소하는 격자강화의 효과도 관찰할 수 있었다. 갈륨비소의 결정성장 방향에 따라 캐리어의 농도는 $10^{16}$에서 $10^8cm^{-3}$로 감소한 반면 비저항 값은 $10^{-2}$에서 $10^8$ Ohm-cm로 급격하게 증가하였다. 반절연의 특성은 크롬농도 약 $6{\Times}10^{16}cm^{-3}$의 농도이상에서 얻을 수 있었다. 성장된 단결정 내의 깊은 준위는 두 개의 전자덫인 $E_C-0.81eV, E_C-0.35eV$와 두 개의 정공덫인$E_V+0.89eV, E_V+0.65eV$이다.

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고온, 고압에서의 요오드 치환 Polycarbosilane의 합성 및 특성 (Synthesis of Iodine Substituted Polycarbosilane by High Temperature and Pressure Reaction Process and Properties Characterization)

  • 변지철;라케쉬 산다난드 샤르비드레;김윤호;박승민;고명석;민효진;이나영;류재경;김택남
    • 한국재료학회지
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    • 제30권9호
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    • pp.489-494
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    • 2020
  • SiC is a material with excellent strength, heat resistance, and corrosion resistance. It is generally used as a material for SiC invertors, semiconductor susceptors, edge rings, MOCVD susceptors, and mechanical bearings. Recently, SiC single crystals for LED are expected to be a new market application. In addition, SiC is also used as a heating element applied directly to electrical energy. Research in this study has focused on the manufacture of heating elements that can raise the temperature in a short time by irradiating SiC-I2 with microwaves with polarization difference, instead of applying electric energy directly to increase the convenience and efficiency. In this experiment, Polydimethylsilane (PDMS) with 1,2 wt% of iodine is synthesized under high temperature and pressure using an autoclave. The synthesized Polycarbosilane (PCS) is heat treated in an argon gas atmosphere after curing process. The experimental results obtain resonance peaks using FT-IR and UV-Visible, and the crystal structure is measured by XRD. Also, the heat-generating characteristics are determined in the frequency band of 2.45 GHz after heat treatment in an air atmosphere furnace.

Cross Talk Experiment with Two-element CdTe Detector and Collimator for BNCT-SPECT

  • Manabe, Masanobu;Ohya, Ryosuke;Saraue, Nobuhide;Sato, Fuminobu;Murata, Isao
    • Journal of Radiation Protection and Research
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    • 제41권4호
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    • pp.328-332
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    • 2016
  • Background: Boron Neutron Capture Therapy (BNCT) is a new radiation therapy. In BNCT, there exists some very critical problems that should be solved. One of the severest problems is that the treatment effect cannot be known during BNCT in real time. We are now developing a SPECT (single photon emission computed tomography) system (BNCT-SPECT), with a cadmium telluride (CdTe) semiconductor detector. BNCT-SPECT can obtain the BNCT treatment effect by measuring 478 keV gamma-rays emitted from the excited state of $^7Li$ nucleus created by $^{10}B(n,{\alpha})$ $^7Li$ reaction. In the previous studies, we investigated the feasibility of the BNCT-SPECT system. As a result, the S/N ratio did not meet the criterion of S/N > 1 because deterioration of the S/N ratio occurred caused by the influence of Compton scattering especially due to capture gamma-rays of hydrogen. Materials and Methods: We thus produced an arrayed detector with two CdTe crystals to test cross talk phenomenon and to examine an anti-coincidence detection possibility. For more precise analysis for the anti-coincidence detection, we designed and made a collimator having a similar performance to the real BNCT-SPECT. Results and Discussion: We carried out experiments with the collimator to examine the effect of cross talk of scattering gamma-rays between CdTe elements more practically. As a result of measurement the coincidence events were successfully extracted. Conclusion: We are now planning to carry out evaluation of coincidence rate from the measurement and comparison of it with the numerical calculations.

다양한 질소분압에서 펄스레이저법으로 성장된 AlN박막의 특성 (Characterization of AlN Thin Films Grown by Pulsed Laser Deposition with Various Nitrogen Partial Pressure)

  • 정준기;하태권
    • 소성∙가공
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    • 제28권1호
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    • pp.43-48
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    • 2019
  • Aluminum nitride (AlN) is used by the semiconductor industry, and is a compound that is required when manufacturing high thermal conductivity. The AlN films with c-axis orientation and thermal conductivity characteristic were deposited by using the Pulsed Laser Deposition (PLD). The AlN thin films were characterized by changing the deposition conditions. In particular, we have researched the AlN thin film deposited under optimal conditions for growth atmosphere. The epitaxial AlN films were grown on sapphire ($c-Al_2O_3$) single crystals by PLD with AlN target. The AlN films were deposited at a fixed temperature of $650^{\circ}C$, while conditions of nitrogen ($N_2$) pressure were varied between 0.1 mTorr and 10 mTorr. The quality of the AlN films was found to depend strongly on the $N_2$ partial pressure that was exerted during deposition. The X-ray diffraction studies revealed that the integrated intensity of the AlN (002) peak increases as a function the corresponding Full width at half maximum (FWHM) values decreases with lowering of the nitrogen partial pressure. We found that highly c-axis orientated AlN films can be deposited at a substrate temperature of $650^{\circ}C$ and a base pressure of $2{\times}10^{-7}Torr$ in the $N_2$ partial pressure of 0.1 mTorr. Also, it is noted that as the $N_2$ partial pressure decreased, the thermal conductivity increased.

A topological metal at the surface of an ultrathin BiSb alloy film

  • Hirahara, T.;Sakamoto, Y.;Saisyu, Y.;Miyazaki, H.;Kimura, S.;Okuda, T.;Matsuda, I.;Murakami, S.;Hasegawa, S.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.14-15
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    • 2010
  • Recently there has been growing interest in topological insulators or the quantum spin Hall (QSH) phase, which are insulating materials with bulk band gaps but have metallic edge states that are formed topologically and robust against any non-magnetic impurity [1]. In a three-dimensional material, the two-dimensional surface states correspond to the edge states (topological metal) and their intriguing nature in terms of electronic and spin structures have been experimentally observed in bulk Bi1-xSbx single crystals [2,3,4]. However, if we want to know the transport properties of these topological metals, high purity samples as well as very low temperature will be needed because of the contribution from bulk states or impurity effects. In a recent report, it was also shown that an intriguing coupling between the surface and bulk states will occur [5]. A simple solution to this bothersome problem is to prepare a topological metal on an ultrathin film, in which the surface-to-bulk ratio is drastically increased. Therefore in the present study, we have investigated if there is a method to make an ultrathin Bi1-xSbx film on a semiconductor substrate. From reflection high-energy electron diffraction observation, it was found that single crystal Bi1-xSbx films (0${\sim}30\;{\AA}A$ can be prepared on Si(111)-$7{\times}7$. The transport properties of such films were characterized by in situ monolithic micro four-point probes [6]. The temperature dependence of the resistivity for the x=0.1 samples was insulating when the film thickness was $240\;{\AA}A$. However, it became metallic as the thickness was reduced down to $30\;{\AA}A$, indicating surface-state dominant electrical conduction. Figure 1 shows the Fermi surface of $40\;{\AA}A$ thick Bi0.92Sb0.08 (a) and Bi0.84Sb0.16 (b) films mapped by angle-resolved photoemission spectroscopy. The basic features of the electronic structure of these surface states were shown to be the same as those found on bulk surfaces, meaning that topological metals can be prepared at the surface of an ultrathin film. The details will be given in the presentation.

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EFG 방법으로 성장한 β-Ga2O3 단결정의 영역별 품질 분석 (Spatial variation in quality of Ga2O3 single crystal grown by edge-defined film-fed growth method)

  • 박수빈;제태완;장희연;최수민;박미선;장연숙;문윤곤;강진기;이원재
    • 한국결정성장학회지
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    • 제32권4호
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    • pp.121-127
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    • 2022
  • 초광역대 반도체인 β-Ga2O3은 고전력 반도체 소재에 대한 유망한 응용으로 인해 큰 주목을 받고 있다. 5가지 다른 다형 중 가장 안정적인 상인 β-Ga2O3는 4.9 eV의 넓은 밴드갭과 8 MV/cm의 높은 항복 전계를 갖는다. 또한, 이는 용융 소스로부터 성장될 수 있어 전력반도체용 SiC, GaN 및 다이아몬드와 같은 다른 와이드 밴드갭 반도체보다 더 높은 성장률과 더 낮은 제조 비용으로 성장이 가능하다. 이 연구에서 β-Ga2O3 단결정 성장은 EFG(edge-defined film-fed growth) 방법에 의해 성장되었다. 성장 방향과 주면을 각각 β-Ga2O3 결정의 [010] 방향과 (100)면으로 성장하였다. Raman 분석의 스펙트럼으로 β-Ga2O3 잉곳의 결정상과 불순물을 확인하였고, 고해상도 X선 회절(HRXRD)을 이용하여 결정 품질과 결정 방향을 분석하였다. 또한 EFG 방법으로 성장한 β-Ga2O3 리본형태의 잉곳을 각 위치별로 결정 품질과 다양한 특성을 체계적으로 분석하였다.

반응소결법으로 제조한 n형 β-SiC의 열전특성 (Thermoelectric Properties of the Reaction Sintered n-type β-SiC)

  • 배철훈
    • 한국산학기술학회논문지
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    • 제20권3호
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    • pp.29-34
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    • 2019
  • SiC는 큰 에너지 밴드 갭을 갖고, 불순물 도핑에 의해 p형 및 n형 전도의 제어가 용이해서 고온용 전자부품 소재로 활용이 가능한 재료이다. 특히 $N_2$ 분위기, $2000^{\circ}C$에서 ${\beta}-SiC$ 분말로부터 제조한 다공질 n형 SiC 반도체의 경우, $800{\sim}1000^{\circ}C$에서의 도전율 값이 단결정 SiC와 비교해서 비슷하거나 오히려 높은 값을 나타내었으며, 반면에 열전도율은 치밀한 SiC 세라믹스와 비교시 1/10~1/30 정도로 낮은 값을 나타내었다. 본 연구에서는 소결온도를 낮추기 위해 n형 ${\beta}-SiC$에 함침 시킨 polycarbosilane (PCS)의 열분해에 의한 반응소결 공정 ($1400{\sim}1600^{\circ}C$)으로 다공질 소결체를 제작하였다. 함침 및 소결공정($N_2$ 분위기, $1600^{\circ}C$, 3시간)을 반복함에 따라 상대밀도는 크게 증가하지 않았지만 Seebeck 계수 및 도전율은 크게 증가하였다. 본 연구에서의 열전변환 효율을 반영하는 power factor는 고온에서 상압소결 공정으로 제작한 다공질 SiC 반도체에 비해 1/100~1/10 정도 작게 나타났지만, 미세구조 및 캐리어 밀도를 정밀하게 제어하면, 본 연구에서의 반응소결 공정으로 제작한 SiC 반도체의 열전물성은 크게 향상될 것으로 판단된다.

유기 금속 화학 증착법(MOCVD)의 희석된 SiH4을 활용한 Si-Doped β-Ga2O3 에피 성장 (Growth of Si-Doped β-Ga2O3 Epi-Layer by Metal Organic Chemical Vapor Deposition U sing Diluted SiH4)

  • 김형윤;김선재;천현우;이재형;전대우;박지현
    • 한국재료학회지
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    • 제33권12호
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    • pp.525-529
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    • 2023
  • β-Ga2O3 has become the focus of considerable attention as an ultra-wide bandgap semiconductor following the successful development of bulk single crystals using the melt growth method. Accordingly, homoepitaxy studies, where the interface between the substrate and the epilayer is not problematic, have become mainstream and many results have been published. However, because the cost of homo-substrates is high, research is still mainly at the laboratory level and has not yet been scaled up to commercialization. To overcome this problem, many researchers are trying to grow high quality Ga2O3 epilayers on hetero-substrates. We used diluted SiH4 gas to control the doping concentration during the heteroepitaxial growth of β-Ga2O3 on c-plane sapphire using metal organic chemical vapor deposition (MOCVD). Despite the high level of defect density inside the grown β-Ga2O3 epilayer due to the aggregation of random rotated domains, the carrier concentration could be controlled from 1 × 1019 to 1 × 1016 cm-3 by diluting the SiH4 gas concentration. This study indicates that β-Ga2O3 hetero-epitaxy has similar potential to homo-epitaxy and is expected to accelerate the commercialization of β-Ga2O3 applications with the advantage of low substrate cost.