• 전자공학회논문지
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• 제52권10호
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• pp.64-69
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• 2015

본 연구에서는 실제적 구조를 가지는 bulk와 SOI FinFET에서의 self-heating 효과를 3차원 TCAD 전산모사를 통하여 분석하였다. 기존 연구들에서와 마찬가지로 self-heating 효과에 의해 나타나는 정적인 구동전류의 감소는 SOI FinFET에서 bulk FinFET보다 더 심각함을 보여주고 있다.. 그러나 고속의 logic 동작 및 실제적 구조를 감안하면 SOI FinFET에서의 동적 self-heating 효과는 bulk FinFET과 큰 차이가 없음을 강조한다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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• pp.1065-1070
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• 2007

The effects of hot carriers and self-heating on the electrical stability of p-channel TFTs have been analysed combining experimental data and numerical simulations. While hot carrier effects were shown not to induce appreciable degradation, self-heating related instability was found to more seriously affect the device characteristics. New models have been developed to explain the reported results.

• 반도체디스플레이기술학회지
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• 제3권4호
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• pp.29-32
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• 2004

Fully depleted Silicon-on-Insulator (FD-SOI) devices lead to better electrical characteristics than bulk CMOS devices. However, the presence of a thin top silicon layer and a buried SiO2 layer causes self-heating due to the low thermal conductivity of the buried oxide. The electrical characteristics of FDSOI devices strongly depend on the path of heat dissipation. In this paper, we present a new three-dimensional (3-D) analysis technique for the self-heating effect of the finger-type and bar-type transistors. The 3-D analysis results show that the drain current of the finger-type transistor is 14.7% smaller than that of the bar-type transistor due to the 3-D self-heating effect. We have learned that the rate of current degradation increases significantly when the width of a transistor is smaller that a critical value in a finger-type layout. The current degradation fro the 3-D structures of the finger-type and bar-type transistors is investigated and the design issues are also discussed.

• 전자공학회논문지
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• 제50권2호
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• pp.91-97
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• 2013

높은 전류밀도를 갖는 AlGaN/GaN 전력소자는 소자 동작 시에 발생하는 자체발열 현상으로 인해 소자의 전류-전압특성이 저하된다. 특히 열전도도가 낮은 Si 기판을 사용할 경우 더욱 심각한 문제를 발생시킨다. 본 논문에서는 Si기판에 성장한 AlGaN/GaN-on-Si 웨이퍼를 사용하여 전력소자를 제작하였으며, 채널 폭과 Si기판의 두께에 따른 자체 발열 현상을 측정과 시뮬레이션을 통하여 분석하였다. 그리고 이를 기반으로 다채널을 갖는 대면적 전력소자 설계에서 최대전류를 얻기 위하여 열방출을 효과적으로 할 수 있는 구조를 제안하였다. 비아홀과 공통전극을 사용하고 Si 기판을 100 ${\mu}m$로 얇게 하였을 때 래핑을 하지 않은 소자 대비 약 75%의 온 상태 전류증가와 68% 이상의 채널온도 감소가 기대된다.

• 한국전기전자재료학회논문지
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• 제33권2호
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• pp.88-92
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• 2020

Thermal effects in bulk and SOI FinFETs are briefly reviewed herein. Different techniques to measure these thermal effects are studied in detail. Self-heating effects show a strong dependency on geometrical parameters of the device, thereby affecting the reliability and performance of FinFETs. Mobility degradation leads to 7% higher current in bulk FinFETs than in SOI FinFETs. The lower thermal conductivity of SiO₂ and higher current densities due to a reduction in device dimensions are the potential reasons behind this degradation. A comparison of both bulk and SOI FinFETs shows that the thermal effects are more dominant in bulk FinFETs as they dissipate more heat because of their lower lattice temperature. However, these thermal effects can be minimized by integrating 2D materials along with high thermal conductive dielectrics into the FinFET device structure.

• 한국전기전자재료학회논문지
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• 제35권1호
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• pp.86-92
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• 2022

Despite otherwise advantageous properties, the performance and reliability of devices manufactured in β-Ga₂O₃ on semi-insulating Ga₂O₃ substrates may degrade because of poorly mitigated self-heating, which results from the low thermal conductivity of Ga₂O₃ substrates. In this work, we investigate and compare self-heating and device performance of β-Ga₂O₃ MESFETs on substrates of semi-insulating Ga₂O₃ and 4H-SiC. Electron mobility in β-Ga₂O₃ is negatively affected by increasing lattice temperature, which consequently also negatively influences device conductance. The superior thermal conductivity of 4H-SiC substrates resulted in reduced β-Ga₂O₃ lattice temperatures and, thus, mitigates MESFET drain current degradation. This, in turn, allows practically reduced device dimensions without deteriorating the performance and improved device reliability.

• 한국세라믹학회지
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• 제41권7호
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• pp.534-540
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• 2004

• 한국정밀공학회지
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• 제15권12호
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• pp.120-127
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• 1998

The finite element method has been used to model and analyze the heat transfer phenomena during manufacturing process of $MoSi_2$ by SHS(Self-propagating High-temperature Synthesis). For this purpose nonlinear transient heat transfer analyses by using ANSYS have been performed to estimate the temperature distributions and the peak temperature in the test specimen. The effects of manufacturing process parameters such as pre-heating temperatures, the velocity of reaction zone have been investigated. The results of the analysis have been compared with the experimental results.

• 전자공학회논문지A
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• 제32A권3호
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• pp.124-133
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• 1995

A theoretical self-consistent thermoelectric model has been developed for optimal thermal design in the self-signal processing infraed detectors. The model is achived by employing the coupled thermoelectric equation which allows which allows the simultaneous investigation of the termal and electrical aspects of device behavior. The thermal limitation of detectivity and responsivity are determined by the enegy gap, carrier concentration, lifetime, and mobility as a function of the temperature. The calculated results indicate that the detectivity is decreased at bias fields above about 50 V/cm, because the performence is limiting by temperature when the bias voltage reached the level associated with Joule heating. It has been also found that the improvement in the mid-band modulation transfer function(MTF) may be restricted by increasing the bias fields. Further, the important paramerers in the thermal optimization of SPIR detector, such as temperature in the device, ambipolar velocity, element thickness and length, are also considered. The analytical study provides a mathematical basis for optimal design of such a photoconductive IR detector and the agreement between the experimental and theoretical results are seen to be good.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 1994년도 추계학술대회 논문집
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• pp.303-308
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• 1994

The finite element method has been used to model and analyze the heat transfer phenomena during manufacturing process of MoSi $_{2}$ by SHS. For this urpose nonlinear transient heat transfer analyses by using ANSYS have been performed to compute the temperature distributiuon and the peak temperature in the test specimen. The effects of manufacturing process parameters such as a pre-heating temperature, the velocity of reaction zone have also been investigated. The results of the analysis have been compared with the experimental results.