• Title/Summary/Keyword: Seed orientation

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Fabrication of a high magnetization YBCO bulk superconductor by a bottom-seeded melt growth method

  • Hong, Yi-Seul;Park, Soon-dong;Kim, Chan-Joong;Lee, Hee-Gyoun
    • Progress in Superconductivity and Cryogenics
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    • v.21 no.4
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    • pp.19-23
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    • 2019
  • A large grain YBCO bulk superconductor is fabricated by the top-seeded melt growth (TSMG) method. In the TSMG process, the seed crystal is placed on the top surface of a partially melted compact and therefore the seed crystal is frequently tilted during the melt process due to intrinsic unstable nature of Y211 particle +liquid phase mixture. In this work, we report the successful growth of single-domain YBCO bulk superconductors by a bottom-seeded melt growth (BSMG) method. Investigations on the trapped magnetic field and the microstructures of the synthesized specimens show that a bottom-seeded melt growth method has hardly affected on the crystal growth behavior, the microstructure development and the magnetic properties of the large grain YBCO bulk superconductors. The bottom-seeded melt growth method is clearly beneficial for the stable control of seed orientation through the melt process for the fabrication of a large grain YBCO bulk superconductor.

Characteristics of Copper Thin Films and Patter Filling by Electrochemical Deposition(ECD) (전기화학증착법에 의한 구리박막과 패턴충전 특성)

  • Kim, Yong-An;Yang, Seong-Hun;Lee, Seok-Hyeong;Lee, Gyeong-U;Park, Jong-Wan
    • Korean Journal of Materials Research
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    • v.9 no.6
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    • pp.583-588
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    • 1999
  • The characteristics of copper thin films and pattern filling capability were investigated by ECD. Prior to deposition of copper film, seed-Cu/Ta(TaN)/$SIO_2$(BPSG)/Si structure was manufactured. Copper deposition was performed with various current waveforms(DC/PC, 1~10,000Hz) and current densities(10~60 mA/$\textrm{cm}^2$) after pretreatment (Oxident removal, wetting) of seed-layer. Conformal pattern filling was performed using PC method with fast deposition rate of 6,000~8,000$\AA$/min. Heat-treated($450^{\circ}C$, 30min) copper films showed good resistivities of 1.8~2.1$\mu$$\Omega$.cm. According to the XRD analysis, (111)-preferred orientation of copper film was found in ECD-Cu/seed-Cu/Ta/$Sio_2$/Si structure. Also, we have successfully achieved to fill via holes with 0.35$\mu\textrm{m}$ width and 4:1 aspect ratio.

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다양한 온도에서 열처리한 씨앗 층 위에 열수화법을 이용한 ZnO 나노 막대의 성장

  • Bae, Yeong-Suk;Kim, Yeong-Lee;Kim, Dong-Chan;Gong, Bo-Hyeon;An, Cheol-Hyeon;Choe, Mi-Gyeong;U, Chang-Ho;Han, Won-Seok;Jo, Hyeong-Gyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.433-433
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    • 2009
  • ZnO-based materials have been extensively studied for optoelectronic applications due to their superiors physical properties such as wide direct bandgap (~3.37 eV), large exciton binding energy (~60 meV), high transparency in the visible region, and low cost. Especially, one-dimensional (1D) ZnO nanostructures have attracted considerable attention owing to quantum confinement effect and high crystalline quality. Additionally, various nanostructures of ZnO such as nanorods, nanowires, nanoflower, and nanotubes have stimulated the interests because of their semiconducting. and piezoelectric properties. Among them, vertically aligned ZnO nanorods can bring the improved performance in various promising photoelectric fields including piezo-nanogenerators, UV lasers, dye sensitized solar cells, and photo-catalysis. In this work, we studied the effect of the annealing temperature of homo seed layers on the formation of ZnO nanorods grown by hydrothermal method. The effect of annealing temperature of seed layer on the length and orientation of the nanorods was investigated scanning electron microscopy investigation. Transmission electron microscopy and X-ray diffraction measurement were performed to understand the effect of annealing temperatures of seed layers on the formation of nanorods. Moreover, the optical properties of the seed layers and the nanorods were studied by room temperature photoluminescence.

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Synthesis and Applications of Noble Metal and Metal Silicide and Germanide 1-Dimensional Nanostructures

  • Yoon, Ha-Na;Yoo, Young-Dong;Seo, Kwan-Yong;In, June-Ho;Kim, Bong-Soo
    • Bulletin of the Korean Chemical Society
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    • v.33 no.9
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    • pp.2830-2844
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    • 2012
  • This review covers recent developments in our group regarding the synthesis, characterization and applications of single-crystalline one-dimensional nanostructures based on a wide range of material systems including noble metals, metal silicides and metal germanides. For the single-crystalline one-dimensional nanostructures growth, we have employed chemical vapor transport approach without using any catalysts, capping reagents, and templates because of its simplicity and wide applicability. Au, Pd, and Pt nanowires are epitaxially grown on various substrates, in which the nanowires grow from seed crystals by the correlations of the geometry and orientation of seed crystals with those of as-grown nanowires. We also present the synthesis of numerous metal silicide and germanide 1D nanostructures. By simply varying reaction conditions, furthermore, nanowires of metastable phase, such as $Fe_5Si_3$ and $Co_3Si$, and composition tuned cobalt silicides (CoSi, $Co_2Si$, $Co_3Si$) and iron germanides ($Fe_{1.3}Ge$ and $Fe_3Ge$) nanowires are synthesized. Such developments can be utilized as advanced platforms or building blocks for a wide range of applications such as plasmonics, sensings, nanoelectronics, and spintronics.

Fabrication of polycrystalline Si films by rapid thermal annealing of amorphous Si film using a poly-Si seed layer grown by vapor-induced crystallization

  • Yang, Yong-Ho;An, Gyeong-Min;Gang, Seung-Mo;An, Byeong-Tae
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2010.05a
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    • pp.58.1-58.1
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    • 2010
  • We have developed a novel crystallization process, where the crystallization temperature is lowered compared to the conventional RTA process and the metal contamination is lowered compared to the conventional VIC process. A very-thin a-Si film was deposited and crystallized at $550^{\circ}C$ for 3 h by the VIC process and then a thick a-Si film was deposited and crystallized by the RTA process at $680^{\circ}C$ for 5 min using the VIC poly-Si layer as a crystallization seed layer. The RTA crystallized temperature could be lowered up to $50^{\circ}C$, compared to RTA process alone. The poly-Si film appeared a needle-like growth front and relatively well-arranged (111) orientation. In addition, the Ni concentration in the poly-Si film was lowered to $3{\times}10^{17}\;cm^{-3}$ and that at the poly-Si/$SiO_2$ interface was lowered to $5{\times}10^{19}\;cm^{-3}$. The reduction in metal contamination could be greatly helpful to achieve a low leakage current in poly-Si TFT, which is the critical parameter for commercialization of AMOLED.

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The growth YMnO$_3$ single crystals using a floating zone method (부유대용융법에 의한 YMnO$_3$단결정 성장)

  • 권달회;강승구;김응수;김유택;심광보
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.10 no.4
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    • pp.279-285
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    • 2000
  • High quality crystals of $YMnO_3$, which is interested in non-volatile memory device application, were grown by the floating zone method. Optimum condition for powder synthesis was established to be $1200^{\circ}C$ for 10 hrs and optimum condition for sintering of $YMnO_3$feed-rod was established to be $1500^{\circ}C$ for 10hrs respectively. It was found from non-seeded growth experiment that $YMnO_3$crystal was grown preferentially to the [1010] orientation. The $YMnO_3$single crystal, which was grown to the direction of perpendicular to C-axis, was typically 5mm in diameter, 50 mm in length and showed dark-blue color.

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Angle Sensors Based on Oblique Giant Magneto Impedance Devices

  • Kim, Do-Hun;Na, Ji-Won;Jeung, Won-Young
    • Journal of Magnetics
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    • v.14 no.1
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    • pp.42-46
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    • 2009
  • The measurement of external magnetic field orientation using Giant Magneto Impedance (GMI) sensors has been performed. A soft magnetic alloy of $Co_{30}Fe_{34}Ni_{36}$ was electroplated on a Si wafer with a CoFeNi seed layer. V-shaped microwire patterns were formed using a conventional photolithography process. An external magnetic field was generated by a rectangular AlNiCo permanent magnet. The reference direction was defined as the external magnetic field direction oriented in the middle of 2 GMI devices. As the orientation of the magnetic field deviated from the reference direction, variation in the field component along each device introduced voltage changes. It was found that, by taking the voltage difference between the left and right arms of the Vshaped device, the nonlinearity of each device could be significantly reduced. The fabricated angle sensor had a linear range of approximately $70^{\circ}$ and an overall sensitivity of approximately 10 mV.

Integration Technologies for 3D Systems

  • Ramm, P.;Klumpp, A.;Wieland, R.;Merkel, R.
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2003.09a
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    • pp.261-278
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    • 2003
  • Concepts.Wafer-Level Chip-Scale Concept with Handling Substrate.Low Accuracy Placement Layout with Isolation Trench.Possible Pitch of Interconnections down to $10{\mu}{\textrm}{m}$ (Sn-Grains).Wafer-to-Wafer Equipment Adjustment Accuracy meets this Request of Alignment Accuracy (+/-1.5 ${\mu}{\textrm}{m}$).Adjustment Accuracy of High-Speed Chip-to-Wafer Placement Equipment starts to meet this request.Face-to-Face Modular / SLID with Flipped Device Orientation.interchip Via / SLID with Non-Flipped Orientation SLID Technology Features.Demonstration with Copper / Tin-Alloy (SLID) and W-InterChip Vias (ICV).Combination of reliable processes for advanced concept - Filling of vias with W as standard wafer process sequence.No plug filling on stack level necessary.Simultanious formation of electrical and mechanical connection.No need for underfiller: large area contacts replace underfiller.Cu / Sn SLID layers $\leq$ $10{\mu}{\textrm}{m}$ in total are possible Electrical Results.Measurements of Three Layer Stacks on Daisy Chains with 240 Elements.2.5 Ohms per Chain Element.Contribution of Soldering Metal only in the Range of Milliohms.Soldering Contact Resistance ($0.43\Omega$) dominated by Contact Resistance of Barrier and Seed Layer.Tungsten Pin Contribution in the Range of 1 Ohm

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Preparation and Pervaporative Alcohol Dehydration of Crystallographically b/c-axis Oriented Mordenite Zeolite Membranes (결정학적으로 b/c-축 방향으로 배향된 모데나이트 제올라이트 분리막의 제조 및 투과증발 알코올 탈수 거동)

  • Kim, Young-Mu;Lee, Du-Hyoung;Kim, Min-Zy;Cho, Churl-Hee
    • Membrane Journal
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    • v.28 no.5
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    • pp.340-350
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    • 2018
  • In the present study, crystallographically b- and c-axis oriented mordenite zeolite membranes were prepared and their pervaporative ethanol dehydration was investigated. The seed layer with a high coverage grew to be c-axis oriented dense layer, while the seed layer with a low coverage grew to be b-axis oriented layer. This phenomenon could be explained by the evolutionary selection growth mechanism. The b-axis grown membrane with 8-membered rings showed a high separation factor of above 1000 and a considerable total flux of around $0.2kg/m^2h$. The c-axis grown, columnar structured membrane with 8- and 12-membered rings showed a low separation factor of less than 200 and a relatively high total flux of around $0.25kg/m^2h$. The high performance of b-axis grown membrane was due to the relatively small opening of 8-membered rings. Water molecules can freely permeate through the openings, but ethanol molecules, difficultly. Therefore, in the present study, we introduced a new method to control crystallographic orientation of mordenite membrane by changing seeding amount of needle-like crystals, and elucidated that b-axis oriented mordenite membrane showed better performance than c-axis grown mordenite membrane.

Crystal structure investigation of AlN crystal grown on 6H-SiC seed by a physical vapor transport method (6H-SiC 종자 결정을 사용하여 PVT법으로 성장된 AlN 결정 연구)

  • Shin, Hee-Won;Lee, Dong-Hoon;Kim, Hwang-Ju;Park, Mi-Seon;Jang, Yeon-Suk;Lee, Won-Jae;Kim, Jung-Gon;Jeong, Seong-Min;Lee, Myung-Hyun;Seo, Won-Seon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.26 no.1
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    • pp.49-52
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    • 2016
  • The effect of process parameters such as the growth pressure and temperature on the AlN crystal growth has been investigated. AlN crystal was grown onto 6H-SiC seed crystal using PVT (Physical Vapor Transport) method. Crystal properties and morphology of AlN crystal was changed with growth pressure and temperature. Raman analysis confirmed that AlN crystals with different orientation were successfully grown on SiC seed crystal.