• 제목/요약/키워드: Random Telegraph Signal(RTS)

검색결과 7건 처리시간 0.019초

Random Telegraph Signal에 의한 1/f 잡음이 CMOS Ring Oscillator의 Phase Noise와 Jitter에 미치는 영향 (The effect of 1/f Noise Caused by Random Telegraph Signals on The Phase Noise and The Jitter of CMOS Ring Oscillator)

  • 박세훈;박세현;이정환;노석호
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2004년도 춘계종합학술대회
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    • pp.682-684
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    • 2004
  • Random Telegraph Signal(RTS)에 의한 1/f 잡음이 CMOS Ring Oscillator의 Phase Noise와 Jitter에 미치는 영향을 조사한다. 7단 Ring Oscillator의 각 노드에 병렬 연결된 10개의 Piece-Wise-Linear 전류원이 RTS 신호를 모델링 한다. RTS 전류원의 진폭과 Time Constant를 변화시키면서 Ring Oscillator 출력의 FFT 및 전력 스팩트럼 밀도, Jitter를 관찰한다. RTS 전류원의 진폭은 Phase Noise의 폭을 증가시키고 결과적으로 Jitter의 크기도 증가 시키는 것이 확인 되었다. 그리고 RTS Time Constant가 짧아질수록 출력 신호의 FFT peak의 폭이 커지고 Cycle to Cycle Jitter 값이 증가하였다.

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MOSFET의 1/f noise에 의한 Ring Oscillator의 Jitter 분석 (Jitter Analysis of Ring Oscillator with MOSFET 1/f Noise)

  • 박세훈;박세현
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2003년도 추계종합학술대회
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    • pp.606-609
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    • 2003
  • MOSFET의 1/f 잡음은 개별 Random Telegraph Signal (RTS)의 중첩에 의해 생성되는 것으로 알려져 있다. 본 연구에서는 CMOS 링 발진기 노드 중 하나에 RTS 전류원을 병렬로 연결하여 1/f 잡음에 의한 jitter를 분석하였다. 링 발진기의 숫자, 전원 전압, 그리고 RTS 진폭에 따른 litter rate 변화를 시뮬레이션을 통하여 분석하였다.

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MOSFET의 1/f noise에 의한 CMOS Ring Oscillator의 Jitter 분석 (Jitter Analysis of CMOS Ring Oscillator Due to 1/f Noise of MOSFET)

  • 박세훈
    • 한국정보통신학회논문지
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    • 제8권8호
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    • pp.1713-1718
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    • 2004
  • MOSFET의 1/f 잡음은 개별 Random Telegraph Signal(RTS)의 중첩에 의해 생성되는 것으로 알려져 있다. 본 연구는 CMOS 링발진기 노드에 병렬로 RTS 전류원을 연결하여 1/f 잡음에 의한 Jitter를 분석하였다. RTS의 진폭 변화에 따른 Jitter 및 Jitter Ratio의 변화를 조사하여 RTS 진폭과 Jitter 및 Jitter Ratio의 크기가 선형적으로 비례함을 밝혔고, 링발진기의 출력 FFT를 분석하여 Jitter의 원인이 높은 차수의 고주파 위상잡음에 있음을 밝혔다.

Random Telegraph Signals of the Scaling-down NOR Flash Cells

  • An, Ho-Joong;Lee, Gae-Hun;Kil, Gyu-Hyun;Song, Yun-Heup
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.250-250
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    • 2010
  • The random telegraph signal (RTS) for the NOR flash cell scaling is investigated. An innovative method to suppress the RTS, based on the device engineering, is proposed. By optimizing the channel doping profile and using the high-k tunnel dielectric, it is confirmed from three-dimensional (3-D) simulation, that the $V_{th}$ amplitude, dueto RTS, is significantly suppressed, from approximately 0.5 to 0.07 V in the middle of the channel at 45 nm NOR Flash technology. From this result, it is expected that the proposed method to suppress the RTS amplitude is essential for further cell size scaling in Flash memory.

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The jitter and phase noise caused by 1/f noise of MOSFET in 2.75 GHz CMOS ring oscillator

  • 박세훈
    • 센서학회지
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    • 제14권1호
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    • pp.42-46
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    • 2005
  • It has been known that 1/f noise of MOSFET is generated by superposition of random telelgraph signals (RTS). In this study, jitters and phase noise caused by 1/f noise of MOSFET are analysed with RTS supplied to all of the nodes of the CMOS ring oscillator under investigation. Through the analysis of jitters and jitter ratios with varying values of the amplitude of RTS, it is found that the jitters and the jitter ratios are proportional to the amplitude of RTS. And the analysis of FFT of the output of the ring oscillator reveals that the jitters are closely related to the phase noise of the high order harmonics of the ring oscillator outputs.

Methodology for Extracting Trap Depth using Statistical RTS Noise Data of Capture and Emission Time Constant

  • Oh, Dong-Jun;Kwon, Sung-Kyu;Song, Hyeong-Sub;Kim, So-Yeong;Lee, Ga-Won;Lee, Hi-Deok
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제17권2호
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    • pp.252-259
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    • 2017
  • In this paper, we propose a novel method for extracting an accurate depth of a trap that causes RTS(Random Telegraph Signal) noise. The error rates of the trap depth rely on the mean time constants and its ratio. Here, we determined how many data of the capture and emission time constant are necessary in order to reduce the trap depth error caused by an inaccurate mean time constant. We measured the capture and emission time constants up to 100,000 times in order to ensure that the samples had statistical meaning. As a result, we demonstrated that at least 1,000 samples are necessary to satisfy less than 10% error for trap depth. This result could be used to improve the accuracy of RTS noise analysis.

Fluorine 주입에 따른 NMOSFET의 소자 특성 연구 (Analysis of Device Characteristics of NMOSFETs on Fluorine Implantation)

  • 권성규;권혁민;이환희;장재형;곽호영;고성용;이원묵;이성재;이희덕
    • 한국전기전자재료학회논문지
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    • 제25권1호
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    • pp.20-23
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    • 2012
  • In this paper, we investigated the device performance on fluorine implantation, hot carrier reliability and RTS (random telegraph signal) noise characteristics of NMOSFETs. The capacitance of the fluorine implanted NMOSFET decreased due to the increase of the gate oxide thickness. RTS noise characteristics of the fluorine implated NMOSFET was improved approximately by 46% due to the decrease of trap density at Si/$SiO_2$ interface. The improved gate oxide quality also results in the longer hot carrier life time.