• Journal of Ginseng Research
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• 제38권3호
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• pp.180-186
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• 2014

Background: This study evaluated changes in ginsenoside compositions and antioxidant activities in hydroponic-cultured ginseng roots (HGR) and leaves (HGL) with heating temperature. Methods: Heat treatment was performed at temperatures of $90^{\circ}C$, $110^{\circ}C$, $130^{\circ}C$, and $150^{\circ}C$ for 2 hours Results: The ginsenoside content varied significantly with heating temperature. The levels of ginsenosides Rg1 and Re in HGR decreased with increasing heating temperature. Ginsenosides F2, F4, Rk3, Rh4, Rg3 (S form), Rg3 (R form), Rk1, and Rg5, which were absent in the raw ginseng, were formed after heat treatment. The levels of ginsenosides Rg1, Re, Rf, and Rb1 in HGL decreased with increasing heating temperature. Conversely, ginsenosides Rk3, Rh4, Rg3 (R form), Rk1, and Rg5 increased with increasing heating temperature. In addition, ginsenoside contents of heated HGL were slightly higher than those of HGR. The highest extraction yield was 14.39% at $130^{\circ}C$, whereas the lowest value was 10.30% at $150^{\circ}C$ After heating, polyphenol contents of HGR and HGL increased from 0.43 mg gallic acid equivalent/g (mg GAE eq/g) and 0.74 mg GAE eq/g to 6.16 mg GAE eq/g and 2.86 mg GAE eq/g, respectively. Conclusion: Antioxidant activities of HGR and HGL, measured by 1,1-diphenyl-2-picrylhydrazyl and 2,2-azino-bis-3-ethylbenzothiazoline-6-sulfonic acid radical scavenging ability, increased with increasing heating temperature. These results may aid in improving the biological activity and quality of ginseng subjected to heat treatments.

• 한국ITS학회 논문지
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• 제10권1호
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• pp.42-48
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• 2011

본 논문에서는 GaN HEMT (Gallium Nitride High Electron Mobility Transistor) bare-chip을 이용하여 X-대역에서 수동로드 풀(Passive load-pull)을 수행하였다. 열로 인한 특성 변화가 최소화 된 동작 조건을 얻기 위해 드레인 바이어스 전압과 입력 RF 신호를 펄스로 인가하였다. 전자기장 시뮬레이션과 회로 시뮬레이션을 병행하여, 와이어 본딩 효과를 고려하여 드레인 경계면에서의 정확한 임피던스 정합 회로를 구현하였다. 임피던스를 변화시키기 위해 마이크로스트립 라인 스터브의 길이가 조절 가능한 회로를 설계하였다. 펄스 로드 풀 실험 결과 8.5 GHz에서 9.2 GHz 대역에서 최대 42.46 dBm의 출력 전력을 얻었으며, 58.7%의 드레인 효율 특성을 얻었다.

• 한국전기전자재료학회논문지
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• 제13권6호
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• pp.509-513
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• 2000

The physical and electrical characteristics of MgO and Pt thin-films on it deposited by reactive sputtering and rf magnetron sputtering respectively were analyzed with annealing temperature and time by four point probe SEM and XRD. Under annealing conditions of 100$0^{\circ}C$ and 2 hr, MgO thin-film had the properties of improving Pt adhesion to SiO$_2$and insulation without chemical reaction to Pt thin-film and the sheet resistivity and the resistivity of Pt thin-film deposited on it were 0.1288 Ω/ and 12.88 $\mu$$\Omega$.cm respectively. We made Pt resistance pattern on SiO$_2$/Si substrate by life-off method and fabricated Pt thin-film type microheater for thermal microsensors by Pt-wire Pt-paste and SOG(spin-on-glass). In the temperature range of 25~40$0^{\circ}C$ we estimated TCR(temperature coefficient of resistance) and resistance ratio of thin-film type Pt-RTD(resistance thermometer device). We obtained TCR value of 3927 ppm/$^{\circ}C$ close to the bulk Pt value. Resistance values were varied linearly within the range of the measurement temperature. The thermal characteristics of fabricated thin-films type Pt micorheater were analyzed with Pt-RTD integrated on the same substrate. The heating temperature of Pt microheater could be up to 40$0^{\circ}C$ with 1.5 watts of the heating power.

• 대한화학회지
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• 제29권4호
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• pp.419-425
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• 1985

시험관내에서 효소에 의해 생성될 수 있을 것으로 생각되는 N-Methylamidinoglycine(isocreatine)을 glycine과 N, S-dimethylthiopseudouronium iodide로 부터 약 60% 수득율로 합성하였고, isocreation의 산성수용액을 가열하여, creatine이 creatinine으로 탈수 고리화되는 것처럼, 고리화된 isocreatinine도 얻었다. 한편 이들 화합물에 대해 원소분석, nmr 스펙트럼, 박층 크로마토그피(Rf) 및 아미노산분석기에서의 elution rate도 검토하였으며, 등전점을 측정하기 위해서 $^{14}C$-creatine, $^{14}C$-creatinine, $^{14}C$-isocreatine 및 $^{14}C$-isocreatinine도 합성하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2005년도 추계학술대회 논문집 전기물성,응용부문
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• pp.93-95
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• 2005

VASIMR (Variable Specific Impulse Magnetoplasma Rocket: JSC, NASA)의 개념을 바탕으로 하는 K2H (KBSI-KAIST-Hanyang University)라고 이름 붙여진 우주 추진체 모사장치 (Space Propulsion Simulator)를 개발하였다. 이 장치는 헬리콘 플라즈마 소스, 이온 가열부 (ICRH: Ion Cyclotron Resonance Heating), 자기노즐 부분으로 이루어져 있다. 헬리콘 플라즈마 소스는 m=+1 형태의 Right-helical 안테나를 사용하여 발생하였다. 본 연구에서는 K2H 장치의 기본적인 설계 개념 및 초기에 발생한 헬리콘 플라즈마의 물성을 RF 보상탐침을 이용하여 측정하였다. 그 결과 900 W, 13.56 MHz rf파워를 사용하여, 아르곤 7 mTorr하에서 전자밀도 = $10^{12}-10^{13}cm-3$, 전자온도 = 4-6 eV의 헬리콘 플라즈마를 안정적으로 발생시켰다.

• 한국표면공학회지
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• 제44권6호
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• pp.250-254
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• 2011

NiO-AZO films were deposited on glass substrate by DC and RF magnetron co-sputtering system in pure $O_2$ gas without substrate heating during deposition. In order to control the chemical composition of the film, NiO target was supplied with constant RF power of 150 W and AZO target (doped with 2.98 at% aluminum) with DC power varied between 40 W to 80 W. Deposited NiO-AZO films were evaluated by structural and chemical analysis. With introducing AZO, XRD and XPS data reveal that NiO were supplied with more oxygen. these results could be strongly affected by the higher bond enthalpy of NiO compared to ZnO, which makes it possible for NiO to obtain excessive oxygen from ZnO.

• 열처리공학회지
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• 제12권3호
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• pp.199-205
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• 1999

The quaternary Ti-Al-V-N films have been grown on glass substrates by reactive dc and rf magnetron sputter deposition from a Ti-6Al-4V target in mixed Ar-$N_2$ discharges. The Ti-Al-V-N films were investigated by means of X-ray diffraction(XRD), electron probe microanalysis(EPMA) and scratch tester. Both XRD and EPMA results indicated that the Ti-Al-V-N films were of single B1 NaCl phase having columnar structure with the (111) preferred orientation. Scratch tester results showed that the adhesion strength of Ti-Al-V-N films which treated with substrate heating and vacuum annealing was superior to that of as-deposited film. The good adhesion strength was also achieved in the double-layer structure of Ti-Al-V-N/Ti-Al-V/Glass.

• 열처리공학회지
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• 제24권3호
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• pp.140-143
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• 2011

In this work, Ga doped ZnO (GZO) films were prepared by radio frequency (RF) magnetron sputtering without intentional substrate heating on glass substrate and then the effect of the intense electron irradiation on structural and electrical properties and the NOx gas sensitivity were investigated. Although as deposited GZO films showed a diffraction peak for ZnO (002) in the XRD pattern, GZO films that electron irradiated at electron energy of 900 eV showed the higher intense diffraction peaks than that of the as deposited GZO films. The electrical property of the films are also influenced with electron's energy. As deposited GZO films showed the three times higher resistivity than that of the films irradiated at 900 eV In addition, the sensitivity for NOx gas is also increased with electron irradiation energy and the film sensor showed the proportionally increased gas sensitivity with NOx concentration. This approach is promising in gaining improvement in the performance of thin film gas sensors used for the detection of hazard gas phase.

• JSTS:Journal of Semiconductor Technology and Science
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• 제14권6호
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• pp.712-717
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• 2014

The performance of npn SiGe HBT on thin film SOI is investigated at 32 nm technology node by applying body bias. An n-well is created underneath thin BOX to isolate the body biased SOI HBT from SOI CMOS. The results show that the HBT voltage gain and power gain can be programmed by applying body bias to the n-well. This HBT can be used in variable gain amplifiers that are widely used in the receiver chain of RF systems. The HBT is compatible with 32 nm FDSOI technology having 10 nm film thickness and 30 nm BOX thickness. As the breakdown voltage increases by applying the body bias, the SOI HBT with 3 V $V_{CE}$ has very high $f_tBV_{CEO}$ product (839 GHzV). The self heating performance of the proposed SOI HBT is studied. The high voltage gain and power gain (60 dB) of this HBT will be useful in designing analog/RF systems which cannot be achieved using 32 nm SOI CMOS (usually voltage gain is in the range of 10-20 dB).

• 한국전기전자재료학회논문지
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• 제22권5호
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• pp.373-376
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• 2009

In this paper we report upon an investigation into the effect of DC bias voltage on the electrical and optical properties of Gallium doped zinc oxide (GZO) film. GZO films were deposited on glass substrate without substrate temperature by RF magnetron sputtering from a ZnO target mixed with 5 wt% $Ga_{2}O_{3}$. we investigated sample properties of bias voltage change in 0 to -60 V. We were able to achieve as low as $5.89{\times}10^{-4}{\Omega}cm$ and transmittance over 88 %. without substrate heating.