열처리공학회지 (Journal of the Korean Society for Heat Treatment)

  • 제12권3호
  • /
  • Pages.199-205
  • /
  • 1999
  • /
  • 1225-1070(pISSN)
  • /
  • 2508-4046(eISSN)
한국열처리공학회 (The Korean Society for Heat Treatment)
권호 표지

반응성 마그네트론 스퍼터링법으로 제조한 Ti-Al-V-N 박막의 미세조직 및 부착특성에 관한 연구

The microstructure and adhesive characteristics of Ti-Al-V-N films prepared by reactive magnetron sputtering

  • 손용운 (한국자원연구소 활용연구부) ;
  • 이영기 (위덕대학교 반도체공학과)
  • Sohn, Yong-Un (Minerals & Materials Division. Korea Institute of Geology. Mining & Materials (KIGAM)) ;
  • Lee, Young-Ki (Department of Semiconductor Engineering, Ui-Duk University)
  • 발행 : 1999.09.30
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초록

The quaternary Ti-Al-V-N films have been grown on glass substrates by reactive dc and rf magnetron sputter deposition from a Ti-6Al-4V target in mixed Ar-$N_2$ discharges. The Ti-Al-V-N films were investigated by means of X-ray diffraction(XRD), electron probe microanalysis(EPMA) and scratch tester. Both XRD and EPMA results indicated that the Ti-Al-V-N films were of single B1 NaCl phase having columnar structure with the (111) preferred orientation. Scratch tester results showed that the adhesion strength of Ti-Al-V-N films which treated with substrate heating and vacuum annealing was superior to that of as-deposited film. The good adhesion strength was also achieved in the double-layer structure of Ti-Al-V-N/Ti-Al-V/Glass.

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과제정보

연구 과제 주관 기관 : 산업자원부